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1. 发明授权

US10266938B2 Deposition method, deposition apparatus, and structure 有权
公开(公告)号：US10266938B2
公开(公告)日：2019-04-23
申请号：US15665028
申请日：2017-07-31
申请人： Fuchita Nanotechnology Ltd.
发明人： Eiji Fuchita , Eiji Tokizaki , Eiichi Ozawa
IPC分类号： C23C24/02 , C23C14/34 , H01J37/34 , C09D5/00 , B05D1/12 , B05D1/00 , B05D1/06
摘要： A deposition method includes: introducing a gas into an airtight container containing electrically insulated raw material particles to generate an aerosol of the raw material particles; transferring the aerosol to a deposition chamber through a transfer tubing connected to the airtight container, the deposition chamber having a pressure maintained to be lower than that of the airtight container; injecting the aerosol from a nozzle mounted on a tip of the transfer tubing toward a target placed on the deposition chamber to cause the raw material particles to collide with the target, thereby causing the raw material particles to be positively charged; generating fine particles of the raw material particles by discharge of the charged raw material particles; and depositing the fine particles on a substrate placed on the deposition chamber.

2. 发明授权

US09752227B2 Deposition method 有权
公开(公告)号：US09752227B2
公开(公告)日：2017-09-05
申请号：US14626220
申请日：2015-02-19
申请人： Fuchita Nanotechnology Ltd.
发明人： Eiji Fuchita , Eiji Tokizaki , Eiichi Ozawa
IPC分类号： B05D1/00 , C23C14/34 , H01J37/34 , C09D5/00 , C23C24/02 , B05D1/12 , B05D1/06
CPC分类号： C23C14/34 , B05D1/007 , B05D1/06 , B05D1/12 , C09D5/00 , C23C24/02 , H01J37/3411
摘要： A deposition method includes: introducing a gas into an airtight container containing electrically insulated raw material particles to generate an aerosol of the raw material particles; transferring the aerosol to a deposition chamber through a transfer tubing connected to the airtight container, the deposition chamber having a pressure maintained to be lower than that of the airtight container; injecting the aerosol from a nozzle mounted on a tip of the transfer tubing toward a target placed on the deposition chamber to cause the raw material particles to collide with the target, thereby causing the raw material particles to be positively charged; generating fine particles of the raw material particles by discharge of the charged raw material particles; and depositing the fine particles on a substrate placed on the deposition chamber.

3. 发明授权

US08882970B2 Apparatus and method for manufacturing carbon nanohorns 有权
标题翻译：用于制造碳纳米角的装置和方法
公开(公告)号：US08882970B2
公开(公告)日：2014-11-11
申请号：US12226570
申请日：2007-04-19
申请人： Takeshi Azami , Daisuke Kasuya , Tsutomu Yoshitake , Yoshimi Kubo , Masako Yudasaka , Sumio Iijima , Eiji Fuchita
发明人： Takeshi Azami , Daisuke Kasuya , Tsutomu Yoshitake , Yoshimi Kubo , Masako Yudasaka , Sumio Iijima , Eiji Fuchita
IPC分类号： B01J19/12 , B82Y40/00 , B01D50/00 , B01D45/02 , B01D46/02 , B01D46/48 , B01J8/00 , B82Y30/00 , C01B31/02
CPC分类号： B01D50/002 , B01D45/02 , B01D46/02 , B01D46/48 , B01J8/006 , B01J19/121 , B01J2219/0879 , B82Y30/00 , B82Y40/00 , C01B32/18
摘要： An apparatus for manufacturing carbon nanohorns includes a production chamber configured to irradiate a solid carbon material with a laser beam to produce a product containing carbon nanohorns; and a separation mechanism configured to separate the product produced in the production chamber into a lightweight component and a heavyweight component. The heavyweight component includes carbon nanohorn aggregate with high purity, and high-purity carbon nanotubes can be obtained by collecting the heavyweight component.
摘要翻译：一种用于制造碳纳米角的装置包括：制造室，其配置成用激光束照射固体碳材料，以制造含有碳纳米角的产品; 以及分离机构，其被配置为将在所述生产室中产生的产品分离成轻质部件和重量级部件。重量级组分包括具有高纯度的碳纳米骨聚集体，并且通过收集重质组分可以获得高纯度碳纳米管。

4. 发明申请

US20210316330A1 DEPOSITION DEVICE 有权
公开(公告)号：US20210316330A1
公开(公告)日：2021-10-14
申请号：US17060695
申请日：2020-10-01
申请人： Fuchita Nanotechnology Ltd.
发明人： Eiji FUCHITA
IPC分类号： B05D1/12 , C23C24/04 , B05D1/32 , C23C14/04
摘要： A deposition device includes: a generation chamber; a deposition chamber; a transfer tubing; a target; a stage; and a mask member. The target is disposed in the deposition chamber, has an irradiation surface to be irradiated with the aerosol injected from the nozzle, and causes the raw material particles to be charged to plasma by collision with the irradiation surface. The stage has a support surface that supports a base material, fine particles of the raw material particles produced by discharging of the charged raw material particles being deposited on the base material. The mask member is disposed in the deposition chamber, and inhibits raw material particles specularly reflected on the irradiation surface, of the raw material particles that have been collided with the irradiation surface, from reaching the stage.

5. 发明申请

US20130280414A1 DEPOSITION METHOD 有权
标题翻译：沉积方法
公开(公告)号：US20130280414A1
公开(公告)日：2013-10-24
申请号：US13993266
申请日：2010-12-15
申请人： Eiji Fuchita , Eiji Tokizaki , Eiichi Ozawa
发明人： Eiji Fuchita , Eiji Tokizaki , Eiichi Ozawa
IPC分类号： B05B7/14
CPC分类号： B05B7/1404 , C23C24/04
摘要： [Object] To provide a deposition method that enables fine particles having a relatively large particle diameter (at least larger than 0.5 μm diameter) to be more stably deposited on a substrate by using a simple configuration.[Solving Means] In the deposition method, fine particles P whose surface is at least insulative are placed in an airtight container 2, and a carrier gas is introduced into the container, thereby triboelectrically charging the fine particles and generating an aerosol A of the fine particles. The fine particles in question are charged by friction with the inner surface of a transfer tubing 6 connected to the container, and the aerosol is conveyed via such tubing to a deposition chamber 3 which is maintained at a pressure lower than that in the airtight container. The charged fine particles are deposited on a substrate S placed in the deposition chamber.
摘要翻译：本发明提供一种能够通过简单的结构将具有较大粒径（至少大于0.5μm直径）的细颗粒更稳定地沉积在基板上的沉积方法。 [解决方案]在沉积方法中，将表面至少是绝缘的细颗粒P放置在气密容器2中，并将载气引入容器中，由此摩擦带电微细颗粒并产生微细气溶胶A 粒子。所讨论的细颗粒通过与连接到容器的转移管6的内表面的摩擦而被充电，并且气雾剂经由这样的管输送到沉积室3，沉积室3保持在低于气密容器中的压力。带电的微粒沉积在沉积室中的衬底S上。

6. 发明授权

US09034438B2 Deposition method using an aerosol gas deposition for depositing particles on a substrate 有权
标题翻译：使用气溶胶气体沉积法在基底上沉积颗粒的沉积方法
公开(公告)号：US09034438B2
公开(公告)日：2015-05-19
申请号：US13930328
申请日：2013-06-28
申请人： Fuchita Nanotechnology Ltd. , National University Corporation Nagoya University
发明人： Eiji Fuchita , Yasutoshi Iriyama
IPC分类号： B05D1/12 , C23C24/02
CPC分类号： B05D1/12 , C23C24/02
摘要： A deposition method includes placing fine particles in an airtight container, the fine particles being obtained by forming a coating layer on a surface of a matrix, the coating layer being more liable to be charged than the matrix with respect to a material of a conveying path, generating an aerosol of the fine particles by introducing a career gas into the airtight container, transporting the aerosol via a transfer tubing to a deposition chamber which is maintained at a pressure lower than that in the airtight container while charging the fine particles by friction with the inner surface of the transfer tubing, the transfer tubing being connected to the airtight container and having a nozzle at the tip, and depositing the charged fine particles on a substrate placed in the deposition chamber by spraying the aerosol from the nozzle.
摘要翻译：沉积方法包括将细颗粒放置在气密容器中，该微粒是通过在基体表面上形成涂层而获得的，所述涂层相对于输送路径的材料比基质更容易充电通过将惰性气体引入气密容器中而产生气溶胶，通过传输管将气溶胶输送到沉积室，该沉积室保持在低于气密容器中的压力下，同时通过与传输管的内表面，传输管连接到气密容器并且在尖端处具有喷嘴，并且通过从喷嘴喷射气溶胶将带电微粒沉积在放置在沉积室中的基板上。

7. 发明授权

US08877297B2 Deposition method 有权
标题翻译：沉积法
公开(公告)号：US08877297B2
公开(公告)日：2014-11-04
申请号：US13993266
申请日：2010-12-15
申请人： Eiji Fuchita , Eiji Tokizaki , Eiichi Ozawa
发明人： Eiji Fuchita , Eiji Tokizaki , Eiichi Ozawa
IPC分类号： B05D1/06 , C23C24/04 , B05B7/14
CPC分类号： B05B7/1404 , C23C24/04
摘要： A deposition method is provided to enable fine particles having a relatively large particle diameter, for example, a diameter larger than 0.5 μm, to be stably deposited on a substrate. The fine particles with insulating surface are placed in an airtight container, and a carrier gas is introduced into the container, triboelectrically charging the fine particles and generating an aerosol of the fine particles. The fine particles are charged by friction with the inner surface of a transfer tubing connected to the container, and the aerosol is conveyed via such tubing to a deposition chamber that is maintained at a pressure lower than that in the airtight container. The charged fine particles are deposited on a substrate placed in the deposition chamber.
摘要翻译：提供沉积方法以使得具有相对较大粒径（例如，大于0.5μm的直径）的细颗粒能够稳定地沉积在基底上。将具有绝缘表面的细颗粒放置在密封容器中，并将载气引入容器中，对细颗粒进行摩擦充电并产生细颗粒的气溶胶。微粒通过与连接到容器的输送管的内表面的摩擦而被加载，并且气雾剂经由这样的管输送到沉积室，该沉积室保持在低于气密容器中的压力。带电的微粒沉积在沉积室中的基底上。

8. 发明授权

US08137743B2 Method for forming zirconia film 有权
标题翻译：氧化锆膜的形成方法
公开(公告)号：US08137743B2
公开(公告)日：2012-03-20
申请号：US13057514
申请日：2010-01-21
申请人： Eiji Fuchita
发明人： Eiji Fuchita
IPC分类号： B05D1/12
CPC分类号： C23C24/04
摘要： [Object] To provide a method for forming a zirconia film, which is capable of obtaining favorable film quality by an aerosol gas deposition method.[Solving Means] The method for forming a zirconia film by an aerosol gas deposition method, the method including: placing zirconia fine particles P having a mean particle diameter of 0.7 μm or more and 11 μm or less and a specific surface area of 1 m2/g or more and 7 m2/g or less in a closed container 2; generating aerosol A of the zirconia fine particles P by introduction of a gas into the closed container 2; conveying the aerosol A through a transfer pipe 6 connected to the closed container 2 into a deposition chamber 3 kept at a pressure lower than that of the closed container 2; and depositing the zirconia fine particles P on a substrate S placed in the deposition chamber 3. It is possible to form a zirconia thin film that is dense and highly adhesive to the substrate by zirconia fine particles satisfying the above-mentioned conditions.
摘要翻译：本发明提供一种能够通过气溶胶气体沉积法获得良好的膜质量的形成氧化锆膜的方法。 [解决方案]通过气溶胶气体沉积法形成氧化锆膜的方法，该方法包括：将平均粒径为0.7μm以上且11μm以下，比表面积为1m 2的氧化锆微粒P / g以上且7m 2 / g以下的密闭容器2; 通过将气体引入密闭容器2中产生氧化锆微粒P的气溶胶A; 将气溶胶A通过连接到密闭容器2的输送管6输送到保持在比封闭容器2的压力低的压力下的沉积室3; 并将氧化锆微粒P沉积在沉积室3中的基板S上。可以通过满足上述条件的氧化锆细颗粒形成致密且高粘合性的氧化锆薄膜。

9. 发明申请

US20110305828A1 Method for Forming Zirconia Film 有权
标题翻译：形成氧化锆薄膜的方法
公开(公告)号：US20110305828A1
公开(公告)日：2011-12-15
申请号：US13057514
申请日：2010-01-21
申请人： Eiji Fuchita
发明人： Eiji Fuchita
IPC分类号： B05D1/24
CPC分类号： C23C24/04
摘要： [Object] To provide a method for forming a zirconia film, which is capable of obtaining favorable film quality by an aerosol gas deposition method.[Solving Means] The method for forming a zirconia film by an aerosol gas deposition method, the method including: placing zirconia fine particles P having a mean particle diameter of 0.7 μm or more and 11 μm or less and a specific surface area of 1 m2/g or more and 7 m2/g or less in a closed container 2; generating aerosol A of the zirconia fine particles P by introduction of a gas into the closed container 2; conveying the aerosol A through a transfer pipe 6 connected to the closed container 2 into a deposition chamber 3 kept at a pressure lower than that of the closed container 2; and depositing the zirconia fine particles P on a substrate S placed in the deposition chamber 3. It is possible to form a zirconia thin film that is dense and highly adhesive to the substrate by zirconia fine particles satisfying the above-mentioned conditions.
摘要翻译：本发明提供一种能够通过气溶胶气体沉积法获得良好的膜质量的形成氧化锆膜的方法。 [解决方案]通过气溶胶气体沉积法形成氧化锆膜的方法，该方法包括：将平均粒径为0.7μm以上且11μm以下，比表面积为1m 2的氧化锆微粒P / g以上且7m 2 / g以下的密闭容器2; 通过将气体引入密闭容器2中产生氧化锆微粒P的气溶胶A; 将气溶胶A通过连接到密闭容器2的输送管6输送到保持在比封闭容器2的压力低的压力下的沉积室3; 并将氧化锆微粒P沉积在沉积室3中的基板S上。可以通过满足上述条件的氧化锆细颗粒形成致密且高粘合性的氧化锆薄膜。

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