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    • 5. 发明授权
    • Substrate coated with silica-containing film with low-dielectric constant
    • 底物用低介电常数的含二氧化硅的薄膜涂覆
    • US06893726B2
    • 2005-05-17
    • US10649575
    • 2003-08-26
    • Akira NakashimaMichio Komatsu
    • Akira NakashimaMichio Komatsu
    • C09D5/25C09D183/04H01L21/3105H01L21/312
    • H01L21/3122C09D183/04H01L21/02126H01L21/02216H01L21/02282H01L21/31058Y10S525/903Y10T428/31663C08L2666/14C08L2666/54C08L2666/04
    • A coating liquid for forming a silica-containing film with a low-dielectric constant which enables formation of low-density film having a dielectric constant as low as 3 or less and having excellent resistance to oxygen plasma and process adaptation but also in the adhesion to a substrate and film strength. A substrate coated with the silica-containing film having the above characteristics, obtained by the use of the above coating liquid. The coating liquid for forming a silica-containing film with a low-dielectric constant comprises a polymer composition mainly constituted by a polysiloxane and a readily decomposable resin, said polysiloxane being a reaction product between fine particles of silica and a hydrolyzate of at least one alkoxysilane represented by the following formula (I): XnSi(OR)4-n, wherein X represents a hydrogen atom, a fluorine atom, an unfluorinated or fluorinated alkyl group of 1 to 8 carbon atoms, an aryl group or a vinyl group; R represents a hydrogen atom, an alkyl group of 1 to 8 carbon atoms, an aryl group or a vinyl group; and n is an integer of 0 to 3.
    • 一种用于形成具有低介电常数的含二氧化硅的膜的涂布液,其能够形成介电常数低至3或更低的低密度膜,并且具有优异的耐氧等离子体和工艺适应性,而且在与 基材和膜强度。 通过使用上述涂布液获得具有上述特性的含二氧化硅的膜的基材。 用于形成具有低介电常数的含二氧化硅膜的涂布液包括主要由聚硅氧烷和易分解树脂构成的聚合物组合物,所述聚硅氧烷是二氧化硅微粒与至少一种烷氧基硅烷的水解产物之间的反应产物 由下式(I)表示:X Si(OR)4-n,其中X表示氢原子,氟原子,未氟化或氟化烷基 1至8个碳原子,芳基或乙烯基; R表示氢原子,1〜8个碳原子的烷基,芳基或乙烯基; n为0〜3的整数。
    • 8. 发明申请
    • Photovoltaic cell
    • 光伏电池
    • US20030196692A1
    • 2003-10-23
    • US10417659
    • 2003-04-17
    • CATALYSTS & CHEMICALS INDUSTRIES CO., LTD.
    • Tsuguo KoyanagiMichael Graetzel
    • H01L031/00
    • H01L51/4226H01G9/2031H01G9/2036H01L51/0086Y02E10/542Y02E10/549
    • Disclosed is a photovoltaic cell comprising a substrate having an electrode layer (1) on the surface and having a porous metal oxide semiconductor film (2) which is formed on the electrode layer (1) and on which a photosensitizer is adsorbed, a substrate having an electrode layer (3) on the surface, both of said substrates being arranged in such a manner that the electrode layer (1) and the electrode layer (3) face each other, and an electrolyte layer provided between the semiconductor film (2) and the electrode layer (3), wherein the semiconductor film (2) contains an inhibitor of back current, and at least one pair of substrate and electrode layer thereon have transparency. The photovoltaic cell is capable of inhibiting back current and decomposition of a spectrosensitizing dye caused by the ultraviolet rays, has high photoelectric conversion efficiency and is capable of generating high electromotive force.
    • 公开了一种光伏电池,其包括在表面上具有电极层(1)的基板,并且具有多孔金属氧化物半导体膜(2),该多孔金属氧化物半导体膜形成在电极层(1)上,吸附有光敏剂,基板具有 表面上的电极层(3),两个基板以电极层(1)和电极层(3)彼此面对的方式排列,并且设置在半导体膜(2)之间的电解质层 和所述电极层(3),其中所述半导体膜(2)包含反向电流抑制剂,并且其上至少一对基板和电极层具有透明性。 光电池能够抑制由紫外线引起的光敏染料的回流和分解,具有高的光电转换效率并且能够产生高电动势。
    • 9. 发明授权
    • Thermoplastic resin film and method of manufacturing the same
    • 热塑性树脂薄膜的制造方法
    • US5880201A
    • 1999-03-09
    • US968524
    • 1997-11-12
    • Naoyuki EnomotoHiroyasu NishidaMichio Komatsu
    • Naoyuki EnomotoHiroyasu NishidaMichio Komatsu
    • C08K3/34C08K3/00
    • C08K3/34
    • A thermoplastic resin film excellent in slipperiness, wear resistance and transparency. The film contains 0.005 to 20 wt. % of specified fine particles of composite oxide comprising silica and at least one inorganic oxide other than silica. The film is preferably a polyester film having a hazing value of 5 % or less. It is suitable for use as magnetic tape, capacitor, photographic film and pressure-sensitive adhesive tape. The film is manufactured by adding a silicate of alkali metals, ammonium or organic bases and an alkali-soluble inorganic compound simultaneously to an alkali solution with pH 9 or above, generating fine particles of composite oxide without any control of the pH of this reaction solution, adding the obtaind sol to a thermoplastic resin and/or the reaction system thereof, and processing of a film.
    • 热滑性,耐磨性和透明性优异的热塑性树脂膜。 该膜含有0.005〜20wt。 包括二氧化硅和除二氧化硅以外的至少一种无机氧化物的复合氧化物的指定细颗粒的%。 该膜优选为具有5%以下的雾度值的聚酯膜。 适用于磁带,电容器,照相胶片和压敏胶带。 该膜通过将碱金属,铵或有机碱的硅酸盐和碱溶性无机化合物同时加入到pH9或更高的碱溶液中来制造,产生复合氧化物的细颗粒,而不受该反应溶液的pH的任何控制 将获得的溶胶加入到热塑性树脂和/或其反应体系中,加工薄膜。