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81. 发明申请

US20050185165A1 Illumination apparatus and exposure apparatus 失效
标题翻译：照明装置和曝光装置
公开(公告)号：US20050185165A1
公开(公告)日：2005-08-25
申请号：US11062024
申请日：2005-02-18
申请人： Yutaka Watanabe
发明人： Yutaka Watanabe
IPC分类号： G21K1/06 , G02B19/00 , G03B27/54 , G03F7/20 , G21K5/00 , G21K5/02 , H01L21/027
CPC分类号： G03B27/54 , G03F7/70075
摘要： An illumination apparatus for illuminating a target surface using light includes a light source that emits the light, a reflection integrator that forms plural secondary light sources using the light from the light source, and an optical unit that differentiates Helmholtz-Lagrange invariants in two orthogonal directions with respect to the light incident upon the reflection integrator.
摘要翻译：用于使用光照射目标表面的照明装置包括发射光的光源，使用来自光源的光形成多个次级光源的反射积分器，以及在两个正交方向上区分亥姆霍兹 - 拉格朗日不变量的光学单元相对于反射积分器发生的光线。

82. 发明授权

US06931097B1 Extreme ultraviolet soft x-ray projection lithographic method system and lithographic elements 有权
标题翻译：极紫外线软X射线投影光刻法和光刻元件
公开(公告)号：US06931097B1
公开(公告)日：2005-08-16
申请号：US10048138
申请日：2000-07-10
申请人： Claude L. Davis, Jr. , Kenneth E. Hrdina
发明人： Claude L. Davis, Jr. , Kenneth E. Hrdina
IPC分类号： C03B8/04 , C03B20/00 , C03C17/36 , G02B5/08 , G02B5/10 , G02B5/26 , G02B5/28 , G02B17/06 , G03F1/00 , G03F1/24 , G03F1/60 , G03F7/20 , G21K1/06 , G21K5/02 , H01L21/027
CPC分类号： B82Y10/00 , B82Y40/00 , C03B19/1415 , C03B2201/07 , C03B2201/42 , G02B5/0891 , G02B17/0615 , G02B17/0636 , G03F1/24 , G03F1/60 , G03F7/702 , G03F7/70233 , G03F7/70283 , G03F7/70891 , G03F7/70958 , G21K1/062 , G21K2201/064 , G21K2201/067
摘要： The projection lithographic method for producing integrated circuits and forming patterns with extremely small feature dimensions includes an illumination sub-system (36) for producing and directing an extreme ultraviolet soft x-ray radiation λ from an extreme ultraviolet soft x-ray source (38); a mask stage (22) illuminated by the extreme ultraviolet soft x-ray radiation λ produced by illumination stage and the mask stage (22) includes a pattern when illuminated by radiation λ. A protection sub-system includes reflective multilayer coated Ti doped high purity SiO2 glass defect free surface (32) and printed media subject wafer which has a radiation sensitive surface.
摘要翻译：用于制造集成电路和具有极小特征尺寸的图案的投影光刻方法包括用于产生和引导来自极紫外线软X射线源（38）的极紫外线软X射线辐射λ的照明子系统（36） ; 由照明级产生的极紫外线软X射线辐射λ照射的掩模台（22）和掩模台（22）包括当被辐射λ照射时的图案。保护子系统包括具有辐射敏感表面的反射多层涂覆的Ti掺杂的高纯度SiO 2玻璃无缺陷表面（32）和印刷媒体对象晶片。

83. 发明授权

US06924600B2 Laser plasma generation method and structure thereof 失效
标题翻译：激光等离子体生成方法及其结构
公开(公告)号：US06924600B2
公开(公告)日：2005-08-02
申请号：US10410269
申请日：2003-04-10
申请人： Takayasu Mochizuki
发明人： Takayasu Mochizuki
IPC分类号： G21K5/02 , G21K5/08 , H01L21/027 , H05G2/00 , H05H1/22 , H05H1/24 , H01J7/24 , H05B31/26
CPC分类号： H05G2/003 , G21B1/23 , H05G2/006 , H05G2/008
摘要： In laser-plasma generation, a fluid of target material is jet out to form a jet tube target 21 having a diameter φ and a wall thickness τ with a shell and a hollow space within the shell by using a core-column. A plurality of pulse-like laser beams 30 are directed to the jet tube target radially and equiangularly-spaced directions and are simultaneously focused and irradiated onto the jet tube target to generate the plasma.
摘要翻译：在激光等离子体生成中，通过使用核心柱将目标材料的流体喷射出来，形成具有外壳的壳体的直径φi和壁厚度τ的喷射管靶21和壳体内的中空空间。多个脉冲状激光束30以径向和等角方向的方向被引导到喷射管目标，同时聚焦并照射到喷射管靶上以产生等离子体。

84. 发明申请

US20050157279A1 Light source unit, exposure apparatus, and device manufacturing method 失效
标题翻译：光源单元，曝光装置和装置的制造方法
公开(公告)号：US20050157279A1
公开(公告)日：2005-07-21
申请号：US11016875
申请日：2004-12-21
申请人： Takeshi Miyachi , Kazuki Fujimoto
发明人： Takeshi Miyachi , Kazuki Fujimoto
IPC分类号： G21K5/00 , G03B27/52 , G03F7/20 , G21K5/02 , G21K5/08 , H01L21/027 , H05H1/24
CPC分类号： B82Y10/00 , G03F7/70033 , G03F7/70916
摘要： Disclosed is a light source unit for use in an exposure apparatus and an exposure apparatus having the same, wherein the light source unit includes a condensing mirror for collecting EUV light emitted from a light emission point, a debris reducing member for reducing debris produced or to be produced from the light emission point or from a portion around the light emission point, and a base member being arranged so that the condensing mirror and the debris reducing member can be mounted thereon.
摘要翻译：公开了一种在曝光装置中使用的光源单元和具有该光源单元的曝光装置，其中，光源单元包括用于收集从发光点发射的EUV光的聚光镜，用于减少产生的碎片的碎屑减少构件，从发光点或发光点周围的部分产生，并且基体部件被布置成使得聚光镜和碎屑减少部件能够安装在其上。

85. 发明申请

US20050151071A1 Method for performing in vivo dosimetry 有权
标题翻译：进行体内剂量测定的方法
公开(公告)号：US20050151071A1
公开(公告)日：2005-07-14
申请号：US10513240
申请日：2003-05-06
申请人： Gorgen Nilsson
发明人： Gorgen Nilsson
IPC分类号： G21K5/02 , A61N5/10 , G01T1/02 , G12B13/00
CPC分类号： A61N5/1048 , A61N5/1042 , A61N5/1071 , A61N2005/1076
摘要： The present invention relates to a method enabling quantification of dose delivery in radiotherapy treatment during patient-specific treatment of the patient utilising measurements in predefined time-intervals with information means positioned in the radiation beam, between the patient and the source and converting the readings to corresponding measures in a phantom. The invention additionally covers the method to obtain the said calibration factors for the detectors. The said calibration factors are obtained for each information means, field and said definable time-interval simultaneously irradiating the information means and said phantom including detectors to measure the absorbed dose using the said patient-specific treatment without patient.
摘要翻译：本发明涉及一种能够在患者特异性治疗患者特定治疗期间量化放射治疗的方法，利用位于患者和源之间的放射线束中的信息装置的预定时间间隔进行测量并将读数转换为幻影中的相应措施。本发明还包括获得检测器的所述校准因子的方法。对于每个信息装置，场和所述可定义的时间间隔，同时照射信息装置和所述幻影包括检测器获得所述校准因子，以在没有患者的情况下使用所述患者特异性治疗来测量吸收的剂量。

86. 发明授权

US06906788B2 Lithographic projection apparatus with multiple suppression meshes 失效
标题翻译：具有多个抑制网格的平版印刷设备
公开(公告)号：US06906788B2
公开(公告)日：2005-06-14
申请号：US10717929
申请日：2003-11-21
申请人： Levinus Pieter Bakker , Frank Jeroen Pieter Schuurmans
发明人： Levinus Pieter Bakker , Frank Jeroen Pieter Schuurmans
IPC分类号： G21K3/00 , G03F7/20 , G21K5/00 , G21K5/02 , H01L21/027 , H05G2/00 , G03B27/72 , G03B27/42 , G03B27/52
CPC分类号： G03F7/70941 , G03F7/70916 , G03F7/70983
摘要： A lithographic projection apparatus is disclosed. The apparatus includes a radiation system to transmit a beam of radiation emitted from a radiation source, and a support structure constructed to hold a patterning structure to be irradiated by the beam. A substrate holder is constructed to hold a substrate, and a projection system is constructed and arranged to project an irradiated portion of the patterning structure onto a target portion of the substrate. A first screen is positioned in a path of the beam between the radiation system and an optical element and a positive voltage is applied to the first screen to repel positively charged particles away from the optical element. A second screen is positioned in the path of the beam on at least one side of the first screen, and a negative voltage is applied to the second screen to repel negative particles away from the first screen.
摘要翻译：公开了一种光刻投影装置。该装置包括用于传输从辐射源发射的辐射束的辐射系统，以及构造成保持由光束照射的图案形成结构的支撑结构。衬底保持器被构造成保持衬底，并且构造和布置投影系统以将图案形成结构的照射部分投影到衬底的目标部分上。第一屏幕位于辐射系统和光学元件之间的光束的路径中，并且正电压被施加到第一屏幕以将带正电的粒子排斥离开光学元件。第二屏幕位于第一屏幕的至少一侧上的光束路径中，并且将负电压施加到第二屏幕以排除离开第一屏幕的负面颗粒。

87. 发明申请

US20050100071A1 Electromagnetic radiation generation using a laser produced plasma 失效
公开(公告)号：US20050100071A1
公开(公告)日：2005-05-12
申请号：US10363284
申请日：2001-08-30
申请人： Alan Taylor , David Klug , Ian Mercer , Daniel Allwood
发明人： Alan Taylor , David Klug , Ian Mercer , Daniel Allwood
IPC分类号： G21K5/00 , G03F7/20 , G21K5/02 , G21K5/08 , H01L21/027 , H05G2/00 , H05H1/24 , H01S3/22 , H01S3/223
CPC分类号： H05G2/003 , H05G2/006 , H05G2/008
摘要： An extreme ultraviolet radiation generator is disclosed in which Xenon gas is continuously ejected from a high pressure nozzle into a low pressure chamber to generate Xenon atom clusters which are irradiated with a high repetition rate pulsed laser to form a plasma and yield quasi-continuous EUV generation. The nozzle has a beveled outer rim to enable the focus point of the laser light to be brought close to the nozzle. The nozzle is cooled to a temperature at which background Xenon gas condenses onto the nozzle forming a protective layer. A gas compressor serves to recirculate the Xenon gas and batch purification triggered by a mass spectrometer monitoring gas purity may be periodically applied.

88. 发明申请

US20050093041A1 Illumination system having a nested collector for annular illumination of an exit pupil 失效
标题翻译：具有用于出射光瞳的环形照明的嵌套收集器的照明系统
公开(公告)号：US20050093041A1
公开(公告)日：2005-05-05
申请号：US10930302
申请日：2004-08-31
申请人： Wolfgang Singer , Johannes Wangler , Eric Sohmen
发明人： Wolfgang Singer , Johannes Wangler , Eric Sohmen
IPC分类号： G21K1/06 , G02B19/00 , G03F7/20 , G21K5/02 , H01L21/027 , H01L29/76
CPC分类号： B82Y10/00 , G02B19/0023 , G02B19/0047 , G02B19/0095 , G03F7/70108 , G03F7/70166
摘要： There is provided an illumination system. The illumination system includes a source for light having a wavelength ≦193 nm, a field plane, and a collector having a mirror shell for receiving a part of the light. The mirror shell is arranged so that a real image of the source is formed and comes to lie in a plane that is defocused relative to the field plane by more than 30 mm, so that the field plane is illuminated in a predetermined region, substantially homogeneously.
摘要翻译：提供照明系统。照明系统包括波长<= 193nm的光源，场平面和具有用于接收一部分光的镜壳的收集器。镜壳布置成使得源的真实图像形成并且位于相对于场平面散焦大于30mm的平面中，使得场平面基本上均匀地被照射在预定区域中。

89. 发明授权

US06864988B2 Optical system with isolated measuring structure 有权
标题翻译：具有隔离测量结构的光学系统
公开(公告)号：US06864988B2
公开(公告)日：2005-03-08
申请号：US10186600
申请日：2002-07-01
申请人： Albrecht Hof , Guenter Maul , Michael Muehlbeyer , Klaus Mehlkopp
发明人： Albrecht Hof , Guenter Maul , Michael Muehlbeyer , Klaus Mehlkopp
IPC分类号： G02B7/182 , G02B7/00 , G02B7/02 , G02B27/62 , G03F7/20 , G21K1/06 , G21K5/02 , H01L21/027 , G01B9/02
CPC分类号： G03F7/70258 , G02B7/008 , G02B7/02 , G03F7/70833
摘要： An optical system, in particular an exposure lens for semiconductor lithography, with a plurality of optical elements has at least one load-dissipating structure. The load-dissipating structure diverts the forces originating from the optical elements. The optical system also has a measuring structure constructed independently of the at least one load-dissipating structure.
摘要翻译：具有多个光学元件的光学系统，特别是用于半导体光刻的曝光透镜具有至少一个负载耗散结构。负载消散结构转移源自光学元件的力。光学系统还具有独立于至少一个负载消散结构构造的测量结构。

90. 发明授权

US06861036B2 Charging and capture of particles in coronas irradiated by in-situ X-rays 有权
标题翻译：由原位X射线照射的冠状体中的颗粒的充电和捕获
公开(公告)号：US06861036B2
公开(公告)日：2005-03-01
申请号：US10237268
申请日：2002-08-30
申请人： Pratim Biswas , Norikazu Namiki , Pramod Kulkarni
发明人： Pratim Biswas , Norikazu Namiki , Pramod Kulkarni
IPC分类号： B01J19/08 , B01J19/12 , G21K5/02
CPC分类号： B01J19/125 , B01J19/088 , B01J2219/0809 , B01J2219/0828 , B01J2219/083 , B01J2219/0841 , B01J2219/0849 , B01J2219/0869 , B01J2219/0871 , B01J2219/0886 , B01J2219/0892 , G21K5/02
摘要： An improved method for charging ultrafine particles in coronas (e.g., unipolar or bipolar corona discharges) by exposing the particles to X-ray irradiation. Experimental tests have verified that positive corona in the presence of X-ray irradiation results in maximum or optimum charging efficiency, followed by a negative corona in the presence of X-ray irradiation, X-ray radiation only (without corona), negative corona only (without X-ray irradiation), and finally positive corona only (without X-ray irradiation). This method and system is particularly well suited for use with bioaerosol particles wherein exposure to the corona discharge and X-ray irradiation serves to both capture and inactivate the bioaerosol particles using a single device.
摘要翻译：通过将颗粒暴露于X射线照射来改善冠状体中超细颗粒（例如单极或双极电晕放电）的方法。实验测试已经证实，在存在X射线照射的情况下，正电晕导致最大或最佳的充电效率，随后在存在X射线照射，只有X射线辐射（无电晕），仅负电晕（没有X射线照射），最后只有正电晕（没有X射线照射）。该方法和系统特别适用于生物气溶胶颗粒，其中暴露于电晕放电和X射线照射用于使用单个装置捕获和灭活生物气溶胶颗粒。

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