专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

81. 发明授权

US08357536B2 Inspection method and apparatus 有权
标题翻译：检验方法和装置
公开(公告)号：US08357536B2
公开(公告)日：2013-01-22
申请号：US12955550
申请日：2010-11-29
申请人： Sander Frederik Wuister
发明人： Sander Frederik Wuister
IPC分类号： G01N31/22 , G01N33/44 , G01N21/64
CPC分类号： G01N21/91
摘要： In an embodiment, there is disclosed an inspection method for detecting the presence of imprintable medium on an imprint lithography template. The method includes contacting the imprint lithography template with a marker, the marker being attachable to imprintable medium that may be on the imprint lithography template, the marker being configured to interact with incident radiation when attached to the imprintable medium, directing radiation at the imprint lithography template, and measuring radiation re-directed by the imprint lithography template to attempt to detect presence of a marker that has attached to the imprintable medium, from the interaction of the marker with the incident radiation, and thus detect the presence of imprintable medium to which the marker is attached.
摘要翻译：在一个实施例中，公开了一种用于在压印光刻模板上检测可压印介质的存在的检查方法。所述方法包括使压印光刻模板与标记物接触，所述标记可附接到可压印介质上，所述可压印介质可以在压印光刻模板上，所述标记被配置为在附着到可压印介质时与入射辐射相互作用，在刻印光刻时引导辐射模板和测量由压印光刻模板重新引导的辐射，以从标记与入射辐射的相互作用中尝试检测附着于可压印介质的标记物的存在，从而检测可压印介质的存在，附加标记。

82. 发明授权

US08318253B2 Imprint lithography 有权
标题翻译：印刷光刻
公开(公告)号：US08318253B2
公开(公告)日：2012-11-27
申请号：US11478305
申请日：2006-06-30
申请人： Marcus Antonius Verschuuren , Sander Frederik Wuister
发明人： Marcus Antonius Verschuuren , Sander Frederik Wuister
IPC分类号： B05D5/00
CPC分类号： B29C33/60 , B29C33/3857 , B29C33/40 , B29K2083/00 , B29L2031/756 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A method of making an imprint lithography template includes applying a curable material to a patterned surface of a master imprint template, allowing the curable material to cure and thereby forming a second imprint template having a patterned surface which is the inverse of the patterned surface of the master imprint template; removing the second imprint template from the master imprint template; applying inorganic sol-gel to a substrate; imprinting the inorganic sol-gel with the second imprint template; allowing the inorganic sol-gel to cure; and removing the second imprint template from the cured inorganic sol-gel, such that the inorganic sol-gel forms a third imprint template having a patterned surface which corresponds with the patterned surface of the master imprint template.
摘要翻译：制备压印光刻模板的方法包括将可固化材料施加到主压印模板的图案化表面，允许可固化材料固化，从而形成具有图案化表面的第二压印模板，该图案表面与图案化表面的图案表面相反主印模板; 从主印记模板中移除第二个印记模板; 将无机溶胶 - 凝胶施加到基底上; 用第二印记模板印刷无机溶胶 - 凝胶; 使无机溶胶 - 凝胶固化; 以及从固化的无机溶胶 - 凝胶中除去第二印迹模板，使得无机溶胶 - 凝胶形成具有对应于主印模模板的图案化表面的图案化表面的第三印模模板。

83. 发明申请

US20110233825A1 IMPRINT LITHOGRAPHY 有权
公开(公告)号：US20110233825A1
公开(公告)日：2011-09-29
申请号：US13070101
申请日：2011-03-23
申请人： Sander Frederik Wuister , Vadim Yevgenyevich Banine
发明人： Sander Frederik Wuister , Vadim Yevgenyevich Banine
IPC分类号： G01B11/25
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography apparatus is disclosed which includes a pattern fixing system configured to use actinic radiation to fix a pattern provided in a layer of imprintable medium by an imprint lithography template, and an inspection system configured to use inspection radiation to inspect an element constituting or, in use, being located within, the imprint lithography apparatus. The imprint lithography apparatus is configured such that the pattern fixing system and the inspection system are provided, in use, with, respectively, actinic radiation and inspection radiation from a single source of radiation.
摘要翻译：公开了一种压印光刻设备，其包括图案固定系统，其配置为使用光化辐射来通过压印光刻模板固定设置在可压印介质层中的图案;以及检查系统，被配置为使用检查辐射来检查构成或在使用中，位于压印光刻设备内。压印光刻设备被配置为使得图案固定系统和检查系统在使用中分别被提供来自单个辐射源的光化辐射和检查辐射。

84. 发明申请

US20110064925A1 AQUEOUS CURABLE IMPRINTABLE MEDIUM AND PATTERNED LAYER FORMING METHOD 有权
标题翻译：水性可固化介质和图案形成方法
公开(公告)号：US20110064925A1
公开(公告)日：2011-03-17
申请号：US12992219
申请日：2009-05-14
申请人： Ties Van Bommel , Sander Frederik Wuister , Emile Johannes Karel Verstegen , Rifat Ata Mustafa Hikmet
发明人： Ties Van Bommel , Sander Frederik Wuister , Emile Johannes Karel Verstegen , Rifat Ata Mustafa Hikmet
IPC分类号： B32B3/10 , C08F2/46 , B29C35/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/0755 , Y10T428/24802
摘要： An aqueous curable imprintable medium having at least one curable compound according to Formula 1: wherein R1-R3 are hydrolysable alkoxy groups, and wherein R4 is selected from the group consisting of C1-C6 linear alkyl groups, hydrolysable alkoxy groups and a phenyl group; and a photo-acid generator or a photo-base generator. Such a medium may have an extended shelf-life and may facilitate the formation of highly reproducible patterned layers when used in an imprint lithography process.
摘要翻译：一种具有至少一种根据式1的可固化化合物的水溶性可固化印迹介质：其中R 1 -R 3是可水解的烷氧基，其中R 4选自C 1 -C 6直链烷基，可水解烷氧基和苯基; 以及光酸发生器或光源发生器。这样的介质可能具有延长的保存期限，并且当用于压印光刻工艺时可以促进高度可再现的图案化层的形成。

85. 发明授权

US10538859B2 Methods for providing patterned orientation templates for self-assemblable polymers for use in device lithography 有权
公开(公告)号：US10538859B2
公开(公告)日：2020-01-21
申请号：US13994426
申请日：2011-12-09
申请人： Emiel Peeters , Wilhelmus Sebastianus Marcus Maria Ketelaars , Johan Frederik Dijksman , Sander Frederik Wuister , Roelof Koole , Christianus Martinus Van Heesch
发明人： Emiel Peeters , Wilhelmus Sebastianus Marcus Maria Ketelaars , Johan Frederik Dijksman , Sander Frederik Wuister , Roelof Koole , Christianus Martinus Van Heesch
IPC分类号： C30B19/12
摘要： A method is disclosed involving depositing a neutral orientation template layer onto a substrate after formation of chemical epitaxy or graphoepitaxy features on the substrate, but before deposition and orientation of a self-assemblable polymer. The orientation layer is arranged to bond with the substrate but not with certain features, so that it may be easily removed by vacuum or rinsing with organic solvent. The neutral orientation layer has a chemical affinity to match that of blocks in the self-assemblable polymer so that blocks of differing types wet the neutral orientation layer so that domains in the self-assembled polymer may lie side by side along the substrate surface, with interfaces normal to the substrate surface. The resulting aligned and oriented self-assembled polymer may itself be used as a resist for device lithography of the substrate.

86. 发明授权

US09927699B2 Imprint lithography 有权
公开(公告)号：US09927699B2
公开(公告)日：2018-03-27
申请号：US13070101
申请日：2011-03-23
申请人： Sander Frederik Wuister , Vadim Yevgenyevich Banine
发明人： Sander Frederik Wuister , Vadim Yevgenyevich Banine
IPC分类号： G01B11/25 , G03F7/00 , B82Y10/00 , B82Y40/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography apparatus is disclosed which includes a pattern fixing system configured to use actinic radiation to fix a pattern provided in a layer of imprintable medium by an imprint lithography template, and an inspection system configured to use inspection radiation to inspect an element constituting or, in use, being located within, the imprint lithography apparatus. The imprint lithography apparatus is configured such that the pattern fixing system and the inspection system are provided, in use, with, respectively, actinic radiation and inspection radiation from a single source of radiation.

87. 发明授权

US09285676B2 Self-assemblable polymer and method for use in lithography 有权
标题翻译：自组装聚合物和用于光刻的方法
公开(公告)号：US09285676B2
公开(公告)日：2016-03-15
申请号：US14124213
申请日：2012-06-07
申请人： Aurelie Marie Andree Brizard , Wilhelmus Sebastianus Marcus Maria Ketelaars , Sander Frederik Wuister , Roelof Koole , Emiel Peeters , Christianus Martinus Van Heesch , Henri Marie Joseph Boots , Thanh Trung Nguyen
发明人： Aurelie Marie Andree Brizard , Wilhelmus Sebastianus Marcus Maria Ketelaars , Sander Frederik Wuister , Roelof Koole , Emiel Peeters , Christianus Martinus Van Heesch , Henri Marie Joseph Boots , Thanh Trung Nguyen
IPC分类号： G03F7/11 , G03F7/00 , H01L51/00 , C08F299/02 , C08F299/04 , B82Y10/00 , B82Y40/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , C08F299/02 , C08F299/04 , H01L51/0043
摘要： A BCP having first block of first monomer and second block of second monomer, adapted to undergo a transition from disordered state to ordered state at a temperature less than TOD, further including a bridging moiety having a functional group to provide hydrogen bonding between bridging moieties of adjacent first and second BCP molecules when in the ordered state and at a temperature in excess of a glass transition temperature Tg for the BCP. Composition including BCP comprising first block of first monomer and second block of second monomer, and a crosslinking compound having first and second terminal groups joined by a central moiety and arranged to crosslink second blocks of adjacent first and second BCP molecules by providing non-covalent bonding between the terminal groups and a functional group of the second monomer of the second blocks when the BCP is in the ordered state.
摘要翻译： BCP具有第一单体的第一嵌段和第二单体的第二嵌段，适于在低于TOD的温度下经历从无序状态转化为有序状态，还包括具有官能团的桥连部分以在桥连部分之间提供氢键相邻的第一和第二BCP分子处于有序状态并且在超过BCP的玻璃化转变温度Tg的温度下。包含BCP的组合物包含第一单体的第一嵌段和第二单体的第二嵌段，以及具有通过中心部分连接的第一和第二端基的交联化合物，并且被布置成通过提供非共价键来交联相邻的第一和第二BCP分子的第二嵌段当BCP处于有序状态时，端子组与第二块的第二单体的官能团之间。

88. 发明授权

US09011978B2 Method and apparatus for treatment of self-assemblable polymer layers for use in lithography 有权
标题翻译：用于光刻的自组装聚合物层的处理方法和装置
公开(公告)号：US09011978B2
公开(公告)日：2015-04-21
申请号：US13580356
申请日：2011-01-06
申请人： Roelof Koole , Vadim Yevgenyevich Banine , Sander Frederik Wuister , Emiel Peeters
发明人： Roelof Koole , Vadim Yevgenyevich Banine , Sander Frederik Wuister , Emiel Peeters
IPC分类号： B05D3/02 , G03F7/00 , B82Y10/00 , B82Y40/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： Treatment of a layer comprising self-assemblable polymer at a surface of a substrate is disclosed. In an embodiment, the treatment includes arranging a zone of temperature change to sweep across the layer, wherein a temperature of the layer within the zone differs from an initial temperature of the layer prior to passage of the zone.
摘要翻译：公开了在衬底表面处理包含可自组装聚合物的层。在一个实施方案中，处理包括布置温度变化区域以扫过层，其中该区域内的层的温度与该区域通过之前该层的初始温度不同。

89. 发明授权

US08956804B2 Self-assemblable polymer and methods for use in lithography 有权
标题翻译：自组装聚合物和用于光刻的方法
公开(公告)号：US08956804B2
公开(公告)日：2015-02-17
申请号：US14123943
申请日：2012-06-07
申请人： Aurelie Marie Andree Brizard , Sander Frederik Wuister , Roelof Koole , Emiel Peeters
发明人： Aurelie Marie Andree Brizard , Sander Frederik Wuister , Roelof Koole , Emiel Peeters
IPC分类号： G03F7/26 , G03F7/004 , G03F7/00 , C30B19/00
CPC分类号： G03F7/004 , B82Y10/00 , B82Y40/00 , C30B19/00 , G03F7/0002
摘要： A block copolymer, adapted to self-assemble to form an ordered pattern on a substrate, has first and second blocks with a terminal moiety covalently bonded to the end of the first block. The molecular weight of the terminal moiety is 20% or less than that of the block copolymer and the terminal moiety has a low chemical affinity for the first block. The terminal moiety can assist the accurate positional placement of the domains of the ordered array and lead to improved critical dimension uniformity and/or reduced line edge roughness. The polymer may be useful in combination with a graphoepitaxy template, where the terminal moiety is chosen to associate with a sidewall of the template. This may reduce undesired aggregation of polymer domains at a sidewall and/or assist in domain placement accuracy.
摘要翻译：适于自组装以在基底上形成有序图案的嵌段共聚物具有第一和第二嵌段，其末端部分共价键合到第一嵌段的末端。末端部分的分子量为嵌段共聚物的分子量的20％以下，末端部分对第一嵌段具有低的化学亲和力。末端部分可以帮助有序阵列的域的精确位置放置并且导致改进的临界尺寸均匀性和/或减少的线边缘粗糙度。所述聚合物可以与骨架外延模板组合使用，其中末端部分被选择为与模板的侧壁缔合。这可以减少侧壁处的聚合物域的不希望的聚集和/或有助于域放置精度。

90. 发明授权

US08822139B2 Method for providing an ordered layer of self-assemblable polymer for use in lithography 有权
标题翻译：提供用于光刻的自组装聚合物的有序层的方法
公开(公告)号：US08822139B2
公开(公告)日：2014-09-02
申请号：US13640293
申请日：2011-01-19
申请人： Emiel Peeters , Sander Frederik Wuister , Roelof Koole
发明人： Emiel Peeters , Sander Frederik Wuister , Roelof Koole
IPC分类号： G03F7/26 , B29C59/00 , C08G83/00 , B82Y40/00 , B82Y10/00 , G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A method for providing an ordered polymer layer at a surface of a substrate includes depositing a self-assemblable polymer layer directly onto a primer layer on a substrate to provide an interface between the self-assemblable polymer layer and the primer layer, and treating the self-assemblable polymer layer to provide self-assembly into an ordered polymer layer, such as a block copolymer, having first and second domain types at the interface. The primer layer is adapted to improve its chemical affinity to each domain type at the interface, in response to the presence of the respective domain type in the self-assembled polymer at the interface during the self-assembly of the self-assemblable polymer layer into the ordered polymer layer. This may lead to reduction in defect levels and/or improved persistence length for the ordered polymer layer. The method may be useful for forming resist layers for use in device lithography.
摘要翻译：在衬底的表面提供有序聚合物层的方法包括将可自组装的聚合物层直接沉积在基底上的底漆层上，以提供可自组装的聚合物层和底漆层之间的界面，以及处理自身可以将聚合物层自组装成有序聚合物层，例如在界面处具有第一和第二域类型的嵌段共聚物。响应于在自组装聚合物层的自组装期间在界面处的自组装聚合物中存在相应的畴型，引物层适于改善其在界面处对每种畴型的化学亲和力有序聚合物层。这可能导致有序聚合物层的缺陷水平和/或改善的持续长度的降低。该方法可用于形成用于器件光刻的抗蚀剂层。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式