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81. 发明申请

US20080096131A1 Resist composition and patterning process 有权
标题翻译：抗蚀剂组成和图案化工艺
公开(公告)号：US20080096131A1
公开(公告)日：2008-04-24
申请号：US11976279
申请日：2007-10-23
申请人： Jun Hatakeyama , Wataru Kusaki , Yuji Harada , Takao Yoshihara
发明人： Jun Hatakeyama , Wataru Kusaki , Yuji Harada , Takao Yoshihara
IPC分类号： G03C1/00 , G03C5/00
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： A resist composition comprises a polymer which increases its alkali solubility under the action of an acid as a base resin, and a copolymer comprising recurring units containing a sulfonic acid amine salt and recurring units containing at least one fluorine atom as an additive. The composition is suited for immersion lithography.
摘要翻译：抗蚀剂组合物包含在酸作为基础树脂的作用下增加其碱溶解性的聚合物，以及包含含有磺酸胺盐的重复单元和含有至少一个氟原子作为添加剂的重复单元的共聚物。该组合物适用于浸没光刻。

82. 发明申请

US20070275326A1 Resist protective film composition and patterning process 有权
标题翻译：抗保护膜组成和图案化工艺
公开(公告)号：US20070275326A1
公开(公告)日：2007-11-29
申请号：US11798471
申请日：2007-05-14
申请人： Jun Hatakeyama , Yuji Harada , Takeru Watanabe
发明人： Jun Hatakeyama , Yuji Harada , Takeru Watanabe
IPC分类号： G03C1/00
CPC分类号： G03F7/11 , G03F7/0046 , G03F7/2041
摘要： There is disclosed a resist protective film composition for forming a protective film on a photoresist film, comprising: at least a polymer including a repeating unit having one or more groups selected from a carboxyl group and α-trifluoromethyl alcohol groups; and an amine compound. There can be provided a resist protective film composition that makes it possible to provide more certainly rectangular and excellent patterns when a protective film is formed on a photoresist film.
摘要翻译：公开了一种用于在光致抗蚀剂膜上形成保护膜的抗蚀保护膜组合物，其包括：至少包含具有一个或多个选自羧基和α-三氟甲醇基团的基团的重复单元的聚合物; 和胺化合物。可以提供一种抗蚀剂保护膜组合物，当在光致抗蚀剂膜上形成保护膜时，可以提供更确定的矩形和优异的图案。

83. 发明授权

US06835524B2 Polymers, chemical amplification resist compositions and patterning process 有权
标题翻译：聚合物，化学放大抗蚀剂组合物和图案化工艺
公开(公告)号：US06835524B2
公开(公告)日：2004-12-28
申请号：US09783321
申请日：2001-02-15
申请人： Jun Hatakeyama , Jun Watanabe , Yuji Harada
发明人： Jun Hatakeyama , Jun Watanabe , Yuji Harada
IPC分类号： G03C173
CPC分类号： C08F20/22 , C08F220/22 , G03F7/0045 , G03F7/0046 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/108 , Y10S430/143
摘要： Polymers comprising recurring units of an acrylic derivative of fluorinated backbone represented by formula (1) are novel. R1, R2 and R3 are independently H, F, C1-20 alkyl or fluorinated C1-20 alkyl, at least one of R1, R2 and R3 contains fluorine, and R4 is a hydrophilic group. Using the polymers, chemical amplification positive resist compositions featuring low absorption of F2 excimer laser light are obtained.
摘要翻译：包含由式（1）表示的氟化主链的丙烯酸衍生物的重复单元的聚合物是新颖的.R 1，R 2和R 3独立地是H，F，C 1-20烷基或氟化C 1-20烷基，R 1，R 2和R 3中的至少一个含有氟，R 4是亲水基团。使用聚合物，得到具有F2准分子激光的低吸收性的化学放大阳性抗蚀剂组合物。

84. 发明授权

US06436606B1 Polymers, resist compositions and patterning process 有权
标题翻译：聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US06436606B1
公开(公告)日：2002-08-20
申请号：US09650408
申请日：2000-08-29
申请人： Jun Hatakeyama , Jun Watanabe , Yuji Harada
发明人： Jun Hatakeyama , Jun Watanabe , Yuji Harada
IPC分类号： C08F22202
CPC分类号： G03F7/0392 , C08F234/02 , G03F7/0045 , G03F7/0397
摘要： Polymers comprising recurring units of formula (1) and recurring units having acid labile groups are novel. At least one of R1 and R2 is fluorine or a trifluoromethyl group, and the remainder is hydrogen or a C1-20 alkyl, R3 and R4 each are hydrogen or an unsubstituted or fluorine-substituted C1-20 alkyl, or R3 and R4 may form a ring. Using such polymers, resist compositions featuring transparency to excimer laser light and alkali solubility are obtained.
摘要翻译：包含式（1）的重复单元的聚合物和具有酸不稳定基团的重复单元是新的.R 1和R 2中的至少一个是氟或三氟甲基，其余是氢或C 1-20烷基，R 3和R 4各自是氢或未取代或氟取代的C 1-20烷基，或者R 3和R 4可以形成环。使用这种聚合物，获得具有对准分子激光的透明度和碱溶性的抗蚀剂组合物。

85. 发明授权

US08361703B2 Resist protective coating composition and patterning process 有权
标题翻译：抗蚀保护涂料组合物和图案化工艺
公开(公告)号：US08361703B2
公开(公告)日：2013-01-29
申请号：US12628705
申请日：2009-12-01
申请人： Yuji Harada , Jun Hatakeyama , Koji Hasegawa
发明人： Yuji Harada , Jun Hatakeyama , Koji Hasegawa
IPC分类号： G03F7/11 , G03F7/20 , G03F7/30
CPC分类号： C09D127/12 , C08F220/18 , C08F220/24 , C08F220/26 , C08F220/30 , C08L33/16 , C09D125/18 , C09D133/16 , G03F7/0046 , G03F7/11 , G03F7/2041 , C08L2666/04 , C08F212/14 , C08F232/08 , C08F212/32
摘要： A protective coating composition comprising a polymer of acyl-protected hexafluoroalcohol structure as a base polymer, optionally in admixture with a second polymer containing sulfonic acid amine salt in recurring units is applied onto a resist film. The protective coating is transparent to radiation of wavelength up to 200 nm.
摘要翻译：包含酰基保护的六氟醇结构的聚合物作为基础聚合物的保护性涂料组合物，任选地与含有重复单元的磺酸胺盐的第二聚合物的混合物施加到抗蚀剂膜上。保护涂层对波长高达200nm的辐射是透明的。

86. 发明授权

US08101335B2 Resist composition and patterning process 有权
标题翻译：抗蚀剂组成和图案化工艺
公开(公告)号：US08101335B2
公开(公告)日：2012-01-24
申请号：US12463751
申请日：2009-05-11
申请人： Yuji Harada , Jun Hatakeyama , Kazunori Maeda , Koji Hasegawa , Satoshi Shinachi
发明人： Yuji Harada , Jun Hatakeyama , Kazunori Maeda , Koji Hasegawa , Satoshi Shinachi
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0395 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041 , Y10S430/106 , Y10S430/111
摘要： A copolymer of an alkali-soluble (α-trifluoromethyl)-acrylate and a norbornene derivative is useful as an additive to a resist composition. When processed by immersion lithography, the resist composition exhibits excellent water repellency and water slip and forms a pattern with few development defects.
摘要翻译：碱溶性（α-三氟甲基）丙烯酸酯和降冰片烯衍生物的共聚物可用作抗蚀剂组合物的添加剂。当通过浸渍光刻处理时，抗蚀剂组合物表现出优异的防水性和水滑动性并且形成几乎没有显影缺陷的图案。

87. 发明授权

US08088537B2 Resist top coat composition and patterning process 有权
标题翻译：抵抗面漆组合和图案化工艺
公开(公告)号：US08088537B2
公开(公告)日：2012-01-03
申请号：US12320183
申请日：2009-01-21
申请人： Jun Hatakeyama , Yuji Harada
发明人： Jun Hatakeyama , Yuji Harada
IPC分类号： G03F7/26 , G03F7/11 , C08L33/02
CPC分类号： G03F7/11 , G03F7/2041
摘要： The present invention relates to a resist top coat composition and a patterning process adopting such a material, which resist top coat composition is provided for forming a top coat on a photoresist film so as to protect the photoresist film, in liguid immersion photolithography. The present invention provides a resist top coat composition for forming a top coat on a photoresist film, wherein the resist top coat composition comprises, at least: a polymer I including a repeating unit a represented by the following general formula (1); and a polymer II including repeating unit having a sulfonic acid or an amine salt of a sulfonic acid:
摘要翻译：本发明涉及一种抗蚀剂面漆组合物和采用这种材料的图案化方法，其抗蚀面漆组合物用于在光致抗蚀剂膜上形成顶涂层以保护光致抗蚀剂膜，在液体浸渍光刻中。本发明提供了一种用于在光致抗蚀剂膜上形成顶涂层的抗蚀剂面漆组合物，其中抗蚀剂面漆组合物至少包含：包含由以下通式（1）表示的重复单元的聚合物I; 和包含具有磺酸或磺酸胺盐的重复单元的聚合物II：

88. 发明申请

US20100136482A1 RESIST COMPOSITION AND PATTERNING PROCESS 有权
标题翻译：耐腐蚀组合物和方法
公开(公告)号：US20100136482A1
公开(公告)日：2010-06-03
申请号：US12628794
申请日：2009-12-01
申请人： Yuji Harada , Jun Hatakeyama , Koji Hasegawa , Kazunori Maeda , Tomohiro Kobayashi
发明人： Yuji Harada , Jun Hatakeyama , Koji Hasegawa , Kazunori Maeda , Tomohiro Kobayashi
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0392 , G03F7/0395 , G03F7/0397 , G03F7/2041
摘要： A resist composition is provided comprising (A) an additive polymer of acyl-protected hexafluoroalcohol structure, (B) a base polymer having a structure derived from lactone ring, hydroxyl group and/or maleic anhydride, the base polymer becoming soluble in alkaline developer under the action of acid, (C) a photoacid generator, and (D) an organic solvent. The additive polymer is transparent to radiation of wavelength up to 200 nm, and its properties can be tailored by a choice of the polymer structure.
摘要翻译：提供了抗蚀剂组合物，其包含（A）酰基保护的六氟醇结构的添加剂聚合物，（B）具有衍生自内酯环，羟基和/或马来酸酐的结构的基础聚合物，所述基础聚合物在碱性显影剂中变得可溶酸的作用，（C）光致酸发生剂，和（D）有机溶剂。添加剂聚合物对波长高达200nm的辐射是透明的，并且其性质可以通过选择聚合物结构来定制。

89. 发明授权

US07592407B2 Polymerizable fluorinated compound, making method, polymer, resist composition and patterning process 有权
标题翻译：可聚合氟化合物，制备方法，聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US07592407B2
公开(公告)日：2009-09-22
申请号：US11259179
申请日：2005-10-27
申请人： Yuji Harada , Jun Hatakeyama , Takeru Watanabe , Takeshi Kinsho
发明人： Yuji Harada , Jun Hatakeyama , Takeru Watanabe , Takeshi Kinsho
IPC分类号： C07C69/52
CPC分类号： G03F7/0397 , C07D309/10 , C08F220/24 , G03F7/0046 , G03F7/0392 , Y02P20/55
摘要： A polymerizable fluorinated compound having formula (2a) or (2b) wherein R1 and R2 are H or C1-C20 alkyl or fluoroalkyl, R3 is H, F or C1-C4 alkyl or fluoroalkyl, and R is H or a protective group is polymerized into a fluorinated polymer which is used as a base polymer to formulate a resist composition having transparency to laser light of wavelength≦300 nm, alkali development amenability, and dry etch resistance.
摘要翻译：具有式（2a）或（2b）的可聚合氟化化合物，其中R 1和R 2是H或C 1 -C 20烷基或氟代烷基，R 3是H，F或C 1 -C 4烷基或氟代烷基，R是H或保护基团是聚合的转化成氟化聚合物，其用作基础聚合物以配制对波长<= 300nm的激光具有透明度的抗蚀剂组合物，碱显影易化性和耐干蚀刻性。

90. 发明申请

US20080085466A1 Polymer, resist protective coating material, and patterning process 有权
标题翻译：聚合物，抗蚀剂保护涂层材料和图案化工艺
公开(公告)号：US20080085466A1
公开(公告)日：2008-04-10
申请号：US11905727
申请日：2007-10-03
申请人： Yuji Harada , Jun Hatakeyama , Koji Hasegawa
发明人： Yuji Harada , Jun Hatakeyama , Koji Hasegawa
IPC分类号： G03C1/73 , C08G63/06 , G03F7/20
CPC分类号： G03F7/11 , C09D133/066 , C09D133/16 , G03F7/0046 , G03F7/2041
摘要： A resist protective coating material comprises a polymer comprising repeat units having formulae (1a) and (1b) and having a Mw of 1,000-500,000. R1a and R1b are H, F or alkyl or fluoroalkyl, R2a, R2b, R3a and R3b are H or alkyl, or R2a and R2b, and R3a and R3b may bond together to form a ring, 0
摘要翻译：抗蚀剂保护涂层材料包括包含具有式（1a）和（1b）的重复单元并且具有1,000-500,000的Mw的聚合物。 R 1a和R 1b是H，F或烷基或氟代烷基，R 2a，R 2b，R b， R 3a和R 3b是H或烷基，或R 2a和R 2b和R 3a， / SUP>和R 3b可以键合在一起形成环，0

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