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    • 85. 发明申请
    • Method of manufacturing thin-film magnetic head
    • 制造薄膜磁头的方法
    • US20050188530A1
    • 2005-09-01
    • US10786048
    • 2004-02-26
    • Yoshitaka SasakiKazuo IshizakiTakehiro Kamigama
    • Yoshitaka SasakiKazuo IshizakiTakehiro Kamigama
    • G11B5/17G11B5/31
    • G11B5/3163G11B5/3116Y10T29/49032
    • A track width defining layer includes: a track width defining portion having an end located in the air bearing surface and the other end located opposite to the air bearing surface; and a wide portion coupled to the other end of the track width defining portion. The track width defining layer is formed by frame plating. A frame is formed by exposing and developing a resist layer. The step of exposing the resist layer includes: a first exposure step for forming a first latent image in the resist layer; and a second exposure step for forming a second latent image in the resist layer. The first latent image is made up of a first portion corresponding to the track width defining portion and a second portion adjoining the first portion and extending along the contour of the wide portion. The second latent image is intended for use in combination with the first latent image so as to form a latent image corresponding to the track width defining layer, and does not include a portion corresponding to the track width defining portion.
    • 轨道宽度限定层包括:轨道宽度限定部分,其具有位于空气轴承表面中的端部,而另一端位于与空气支承表面相对的位置; 并且宽部分联接到轨道宽度限定部分的另一端。 轨道宽度限定层通过框架电镀形成。 通过曝光和显影抗蚀剂层形成框架。 曝光抗蚀剂层的步骤包括:用于在抗蚀剂层中形成第一潜像的第一曝光步骤; 以及在抗蚀剂层中形成第二潜像的第二曝光步骤。 第一潜像由对应于轨道宽度限定部分的第一部分和与第一部分邻接并沿着宽部分的轮廓延伸的第二部分组成。 第二潜像旨在与第一潜像组合使用以形成对应于轨道宽度限定层的潜像,并且不包括对应于轨道宽度限定部分的部分。