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    • 81. 发明授权
    • Solid immersion lens holder
    • 固体浸没镜头支架
    • US07414800B2
    • 2008-08-19
    • US11333554
    • 2006-01-18
    • Yoshio IsobeHiroshi TanabeIkuo Arata
    • Yoshio IsobeHiroshi TanabeIkuo Arata
    • G02B7/02
    • G02B7/02G02B21/02
    • A solid immersion lens holder 8A is provided with a base part 50 attached to an objective lens 21, and a lens holding part 60 provided with the base part 50, extending in a direction of optical axis L of the objective lens 21, and arranged to hold a solid immersion lens 6 at an end portion thereof. The lens holding part holds the solid immersion lens so that light emerging from the solid immersion lens to the base part side travels through a region outside the lens holding part and toward the base part, and the base part has a light passing portion 53 which transmits the light toward the objective lens. Since the lens holding part extends in the direction of the optical axis L of the objective lens, even in a case where an observation object 11 is observed as located on a bottom surface of recess 13, the lens holding part will be prevented from contacting a side wall 13a of the recess. As a result, it becomes feasible to observe the observation object up to a region closer to the vicinity of peripheral part 11a of the observation object. This provides a solid immersion lens holder allowing observation up to a region closer to a peripheral part of an observation object even in a case where the observation object is set in a recess of a sample.
    • 固体浸没透镜保持器8A设置有附接到物镜21的基部50和设置有基部50的透镜保持部60,该物镜保持部60沿着物镜21的光轴L的方向延伸,并且布置 在其端部保持固体浸没透镜6。 透镜保持部保持固体浸没透镜,使得从固体浸没透镜向基部侧露出的光穿过透镜保持部分外部的区域并朝向基部,并且基部具有透光部分53 朝向物镜的光。 由于透镜保持部在物镜的光轴L的方向上延伸,所以即使在观察对象物11位于凹部13的底面的情况下,透镜保持部也不会与 凹部的侧壁13a。 结果,观察对象直到观察对象的周边部11a附近的区域变得可行。 即使在将观察对象设置在样本的凹部中的情况下,也能够观察到靠近观察对象的周边部的区域的固体浸没透镜保持架。
    • 89. 发明授权
    • Apparatus for transforming semiconducting thin layer
    • 用于转换半导体薄层的装置
    • US06486437B2
    • 2002-11-26
    • US09746433
    • 2000-12-21
    • Hiroshi Tanabe
    • Hiroshi Tanabe
    • B23K2612
    • H01L21/0268B23K26/12B23K26/123B23K26/125B23K26/127H01L21/02422H01L21/02532
    • Disclosed is an apparatus for modifying a semiconducting thin layer, which has: a hermetically sealed container having a substrate mount section for mounting thereon a substrate with an amorphous semiconducting thin layer formed thereon, and a light transmissive window for introducing a laser beam; laser beam irradiation means for heat-melting the amorphous semiconducting thin layer; holding means for fixing and holding the substrate on the substrate mount section; and pressure control means which regulates the flow rate of gas fed into the hermetically sealed container to control the pressure of the atmosphere within the hermetically sealed container at the time of irradiation with the laser beam at a value above a vapor pressure specified by the temperature of the heat-melted amorphous semiconducting thin layer.
    • 公开了一种用于修改半导体薄层的装置,其具有:密封容器,具有用于安装其上形成有非晶半导体薄层的基板的基板安装部分和用于引入激光束的透光窗口; 用于对非晶半导体薄层进行加热熔融的激光束照射装置; 保持装置,用于将基板固定和保持在基板安装部分上; 以及压力控制装置,其调节供给到所述密封容器中的气体的流量,以在激光束照射时控制所述气密密封容器内的气氛的压力,所述气压高于由 热熔融的非晶半导体薄层。
    • 90. 发明授权
    • Method of manufacturing thin film transistor
    • 制造薄膜晶体管的方法
    • US06444508B1
    • 2002-09-03
    • US09900007
    • 2001-07-09
    • Hiroshi TanabeKatsuhisa YudaHiroshi OkumuraYoshinobu Sato
    • Hiroshi TanabeKatsuhisa YudaHiroshi OkumuraYoshinobu Sato
    • H01L2184
    • H01L29/42384H01L27/14665H01L29/66757H01L29/78609
    • In a thin film transistor, a first insulating film on a silicon layer formed in an island on a substrate is smaller in thickness than the silicon layer so that the stepped island edges is gentle in slope to facilitate covering the island with a second insulating film. This reduces occurrence of gate leak considerably. Since the peripheral region of the stepped island is smaller in thickness than the central region above the channel, it is possible to minimize occurrence of gate electrode breakage. The silicon layer contains two or more inert gas atoms, and the atoms smaller in mass number (e.g., He) are contained in and near an interface with a silicon active layer while the atoms larger in mass number (e.g., Ar) than those smaller in mass number are contained in and near a second interface with a gate electrode.
    • 在薄膜晶体管中,形成在基板上的岛上的硅层上的第一绝缘膜的厚度比硅层的厚度小,使得台阶状的岛边缘倾斜平缓以便于用第二绝缘膜覆盖岛。 这可以大大减少闸门泄漏的发生。 由于阶梯状岛的周边区域的厚度比通道上方的中心区域的厚度小,所以能够最小化栅电极断裂的发生。 硅层含有两个或更多个惰性气体原子,质量数较小的原子(例如,He)包含在与硅有源层的界面中和附近,而质量数(例如Ar)的原子比较小 质量数量被包含在与栅电极的第二界面中和附近。