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热词
    • 90. 发明授权
    • TFT with a negative substrate bias that decreases in time
    • 具有负的衬底偏置的TFT在时间上减小
    • US06713804B2
    • 2004-03-30
    • US10199173
    • 2002-07-22
    • Yuuichi HiranoTakuji MatsumotoYasuo Yamaguchi
    • Yuuichi HiranoTakuji MatsumotoYasuo Yamaguchi
    • H01L27108
    • H01L29/78648H01L27/1203H01L29/78615Y10S257/901
    • A voltage applying section (32) is connected to a silicon substrate (1). Emission of radiation to a semiconductor device causes a large number of holes to accumulate within a BOX layer (2) in the vicinity of the interface with respect to a silicon layer (3). The amount of accumulation of holes increases with a lapse of time. A voltage applying section (32) applies a negative voltage which decreases with the lapse of time to the silicon substrate (1) in order to cancel out a positive electric field resulting from the accumulated holes. The voltage applying section (32) includes a time counter (30) for detecting the lapse of time and a voltage generating section (31) connected to the silicon substrate (1) for generating a negative voltage (V1) which decreases in proportion to the lapse of time based on the result of detection (time T) carried out by the time counter (30). Consequently, a semiconductor device capable of suppressing occurrence of total dose effects is obtained.
    • 电压施加部分(32)连接到硅衬底(1)。 辐射到半导体器件的辐射导致大量孔相对于硅层(3)在界面附近的BOX层(2)内积累。 孔的积聚量随时间的推移而增加。 电压施加部分(32)将随着时间的流逝减小的负电压施加到硅衬底(1)上,以抵消由累积的孔产生的正电场。 电压施加部分(32)包括用于检测经过时间的时间计数器(30)和连接到硅衬底(1)的电压产生部分(31),用于产生与 基于由时间计数器(30)执行的检测结果(时间T)的时间逝去。 因此,获得能够抑制总剂量效应的发生的半导体装置。