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81. 发明授权

US07101273B2 Carrier head with gimbal mechanism 有权
标题翻译：承载头与万向架机构
公开(公告)号：US07101273B2
公开(公告)日：2006-09-05
申请号：US11237062
申请日：2005-09-28
申请人： Ming-Kuei Tseng , Steven M. Zuniga
发明人： Ming-Kuei Tseng , Steven M. Zuniga
IPC分类号： B24B5/00
CPC分类号： B24B37/30
摘要： A carrier head includes a housing connectable to a drive shaft to rotate therewith, a lower assembly having a substrate mounting surface, and a gimbal mechanism that connects the housing to the lower assembly to permit the lower assembly to pivot with respect to the housing about an axis substantially parallel to the polishing surface. The gimbal mechanism includes a shaft having an upper end slidably disposed in a vertical passage in a vertical passage in the housing, and a lower member that connects a lower end of the shaft to the lower assembly. The lower member bends to permit the base to pivot with respect to the housing. The shaft and the lower member are a unitary body.
摘要翻译：载体头包括可连接到驱动轴以与其一起旋转的壳体，具有基板安装表面的下部组件和将壳体连接到下部组件的万向节机构，以允许下部组件相对于壳体绕枢轴转动基本上平行于抛光表面。万向架机构包括：轴，其上端部可滑动地设置在壳体中的垂直通道中的垂直通道中;以及下部构件，其将轴的下端连接到下部组件。下部构件弯曲以允许基部相对于壳体枢转。轴和下部构件是一体的。

82. 发明授权

US07081042B2 Substrate removal from polishing tool 有权
公开(公告)号：US07081042B2
公开(公告)日：2006-07-25
申请号：US11004223
申请日：2004-12-02
申请人： Hung Chih Chen , Steven M. Zuniga , Tsz-Sin Siu
发明人： Hung Chih Chen , Steven M. Zuniga , Tsz-Sin Siu
IPC分类号： B24B1/00
CPC分类号： B24B37/345 , B24B37/30
摘要： Techniques for removing a substrate from a polishing pad are described. A substrate is pulled away from the polishing pad such that the edges of the substrate are pulled away from the polishing pad before the center of the substrate is pulled from the polishing pad.

83. 发明授权

US07001260B2 Carrier head with a compressible film 有权
公开(公告)号：US07001260B2
公开(公告)日：2006-02-21
申请号：US10187143
申请日：2002-06-28
申请人： Hung Chih Chen , Steven M. Zuniga
发明人： Hung Chih Chen , Steven M. Zuniga
IPC分类号： B24B5/00
CPC分类号： B24B37/30 , B24B37/32 , B24B49/16
摘要： A compressible film that is detachably securable to a surface of a rigid structure in the carrier head. The compressible film has a plurality of apertures positioned to create a non-uniform pressure distribution on a substrate during polishing so as to improve polishing uniformity. The apertures may be spaced and positioned to provide a pressure distribution on the substrate that is locally uniform but globally non-uniform.

84. 发明授权

US07001257B2 Multi-chamber carrier head with a flexible membrane 有权
标题翻译：具有柔性膜的多室载具头
公开(公告)号：US07001257B2
公开(公告)日：2006-02-21
申请号：US11054128
申请日：2005-02-08
申请人： Hung Chih Chen , Steven M. Zuniga
发明人： Hung Chih Chen , Steven M. Zuniga
IPC分类号： B24B29/00
CPC分类号： B24B37/30 , B24B41/061 , B24B49/16
摘要： A carrier head that has a base assembly and a flexible membrane. The flexible membrane has a generally circular main portion with a lower surface that provides a substrate-mounting surface and a plurality of concentric annular portions extending from the main portion and secured to the base assembly. The volume between the base assembly and the flexible membrane forming a plurality of pressurizable chambers.
摘要翻译：具有基座组件和柔性膜的承载头。柔性膜具有大致圆形的主要部分，具有下表面，其提供基板安装表面和从主要部分延伸并固定到基座组件的多个同心环形部分。基座组件和柔性膜之间的体积形成多个可加压室。

85. 发明授权

US06872122B2 Apparatus and method of detecting a substrate in a carrier head 有权
标题翻译：检测载体头中的基底的装置和方法
公开(公告)号：US06872122B2
公开(公告)日：2005-03-29
申请号：US10670888
申请日：2003-09-24
申请人： Steven M. Zuniga
发明人： Steven M. Zuniga
IPC分类号： B24B37/30 , B24B37/32 , B24B49/16 , B24B51/00 , B24B49/00
CPC分类号： B24B37/32 , B24B37/30 , B24B49/16
摘要： A method of detecting a substrate in a carrier head for a chemical mechanical polishing system includes connecting a chamber in a carrier head to a pressure source, measuring the pressure in the chamber as a function of time, calculating the derivative of the pressure in the chamber, and determining whether the substrate is adjacent a substrate receiving surface in the carrier head from the derivative.
摘要翻译：一种检测用于化学机械抛光系统的载体头中的基底的方法包括将载体头中的腔室连接到压力源，测量腔室中的压力作为时间的函数，计算腔室中的压力的导数并且从所述导数确定所述衬底是否与所述载体头中的衬底接收表面相邻。

86. 发明授权

US06835125B1 Retainer with a wear surface for chemical mechanical polishing 有权
标题翻译：具有化学机械抛光磨损表面的保持器
公开(公告)号：US06835125B1
公开(公告)日：2004-12-28
申请号：US10327235
申请日：2002-12-20
申请人： Ming-Kuei Tseng , Michael Richter , Steven M. Zuniga
发明人： Ming-Kuei Tseng , Michael Richter , Steven M. Zuniga
IPC分类号： B24B4702
CPC分类号： B24B37/32
摘要： A retaining ring has an inner core of a first material and an outer layer of a second, different material that is deposited on the first material. The outer layer can be deposited by spraying, e.g., by powder coating, and can be a polymer, e.g., polyetheretherketone.
摘要翻译：保持环具有第一材料的内芯和沉积在第一材料上的第二不同材料的外层。外层可以通过例如通过粉末涂覆的喷涂沉积，并且可以是聚合物，例如聚醚醚酮。

87. 发明授权

US06776694B2 Methods for carrier head with multi-part flexible membrane 失效
标题翻译：带有多部分柔性膜的载体头的方法
公开(公告)号：US06776694B2
公开(公告)日：2004-08-17
申请号：US10188259
申请日：2002-07-01
申请人： Steven M. Zuniga , Hung Chih Chen , Ming Kuie Tseng
发明人： Steven M. Zuniga , Hung Chih Chen , Ming Kuie Tseng
IPC分类号： B24B100
CPC分类号： B24B37/30 , F16J3/02
摘要： A carrier head for a chemical mechanical polishing apparatus includes a flexible membrane that applies a load to a substrate. A central portion of the flexible membrane is formed of a first material with a different rigidity than a second material that forms the annular portion of the flexible membrane.
摘要翻译：用于化学机械抛光装置的载体头包括向基底施加载荷的柔性膜。柔性膜的中心部分由与形成柔性膜的环形部分的第二材料刚度不同的第一材料形成。

88. 发明授权

US06602114B1 Multilayer retaining ring for chemical mechanical polishing 失效
标题翻译：用于化学机械抛光的多层固定环
公开(公告)号：US06602114B1
公开(公告)日：2003-08-05
申请号：US09574391
申请日：2000-05-19
申请人： Junshi Wang , Steven M. Zuniga
发明人： Junshi Wang , Steven M. Zuniga
IPC分类号： B24B100
CPC分类号： B24B37/32
摘要： A carrier head for a chemical mechanical polishing apparatus includes a retaining ring having a flexible lower portion and a rigid upper portion. A shim can be inserted between the retaining ring and a base of the carrier head to improve the retaining ring lifetime. A seal may be inserted between the retaining ring and a flexible membrane to seal the chamber between the flexible membrane and the base.
摘要翻译：用于化学机械抛光装置的承载头包括具有柔性下部和刚性上部的保持环。可以在保持环和承载头的基座之间插入垫片，以改善保持环的使用寿命。可以在保持环和柔性膜之间插入密封件，以密封柔性膜和基底之间的腔室。

89. 发明授权

US06494774B1 Carrier head with pressure transfer mechanism 失效
标题翻译：承载头带压力传递机构
公开(公告)号：US06494774B1
公开(公告)日：2002-12-17
申请号：US09610559
申请日：2000-07-05
申请人： Steven M. Zuniga , Hung Chih Chen
发明人： Steven M. Zuniga , Hung Chih Chen
IPC分类号： B24B500
CPC分类号： B24B37/30
摘要： A carrier head with a housing, a lower flexible membrane that defines a first chamber, an upper flexible membrane that defines a second chamber, and a pressure distribution assembly positioned between the upper flexible membrane and the lower flexible membrane. A lower surface of the lower flexible membrane provides a substrate mounting surface, and a portion of the upper flexible membrane can be biasable into contact with an upper surface of the lower flexible membrane. The pressure distribution assembly can include an upper surface in contact with the upper flexible membrane and a lower surface in contact with the lower flexible membrane. The pressure distribution assembly can be configured to transfer pressure from a portion of the upper flexible membrane to a more concentrated region of the substrate.
摘要翻译：具有壳体的承载头，限定第一室的下柔性膜，限定第二室的上柔性膜，以及定位在上柔性膜和下柔性膜之间的压力分布组件。下柔性膜的下表面提供了基板安装表面，并且上柔性膜的一部分可以偏压成与下柔性膜的上表面接触。压力分配组件可以包括与上柔性膜接触的上表面和与下柔性膜接触的下表面。压力分布组件可以被配置成将压力从上柔性膜的一部分转移到衬底的更集中的区域。

90. 发明授权

US06436828B1 Chemical mechanical polishing using magnetic force 失效
标题翻译：化学机械抛光使用磁力
公开(公告)号：US06436828B1
公开(公告)日：2002-08-20
申请号：US09565200
申请日：2000-05-04
申请人： Hung Chih Chen , Steven M. Zuniga
发明人： Hung Chih Chen , Steven M. Zuniga
IPC分类号： H01L21461
CPC分类号： B24B1/005 , B24B37/042
摘要： A chemical mechanical polishing apparatus includes a carrier head, a platen positioned on an opposing side of the carrier head, and a polishing pad positioned on the platen to contact and polish the substrate received on the substrate receiving surface. The carrier head includes a housing, a flexible membrane attached to the housing and having a substrate receiving surface to receive a substrate. The flexible membrane has magnetically sensitive particles distributed therein. One or more coils are positioned above the flexible membrane to generate magnetic fields to exert magnetic forces on the particles.
摘要翻译：化学机械抛光装置包括载体头，位于载体头的相对侧上的压板和位于压板上的抛光垫，用于接触并抛光容纳在基板接收表面上的基板。承载头包括壳体，附接到壳体的柔性膜，并具有用于接收衬底的衬底接收表面。柔性膜具有分布在其中的磁敏颗粒。一个或多个线圈位于柔性膜上方以产生磁场以对颗粒施加磁力。

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