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    • 81. 发明授权
    • Antenna array for the measurement of complex electromagnetic fields
    • 天线阵列用于测量复杂电磁场
    • US06762726B2
    • 2004-07-13
    • US10345931
    • 2003-01-17
    • Adrian AldenPeter BoulianeMing Zhang
    • Adrian AldenPeter BoulianeMing Zhang
    • H01Q300
    • G01R29/0878G01R29/0814
    • A method and apparatus for measuring an electromagnetic field are disclosed. In accordance with the apparatus an array of substantially identical antenna elements having a substantially shorter length than a wavelength of the electromagnetic field and being equi-spaced are provided. The spacing is larger than approximately three times the length of the antenna elements. Each antenna element is for sensing the electromagnetic field at a predetermined location and for providing a signal in dependence upon the sensed field. By providing antenna elements meeting the criteria set out herein accurate electromagnetic field strengths are measurable absent significant mutual coupling and scattering effects between the antenna elements.
    • 公开了一种用于测量电磁场的方法和装置。 提供了一种基本上相同的天线元件的阵列,其具有比电磁场的波长基本上短的等距离的长度。 间距大于天线元件长度的大约三倍。 每个天线元件用于感测预定位置处的电磁场,并用于根据所感测的场提供信号。 通过提供符合本文列出的标准的天线元件,在不存在天线元件之间的重要的相互耦合和散射效应的情况下,可测量精确的电磁场强度。
    • 90. 发明授权
    • Dual wafer stage switching system for a lithography machine
    • 用于光刻机的双晶片级切换系统
    • US09547245B2
    • 2017-01-17
    • US14009289
    • 2012-03-23
    • Yu ZhuYaying ChenMing ZhangDengfeng XuJinsong Wang
    • Yu ZhuYaying ChenMing ZhangDengfeng XuJinsong Wang
    • G03B27/58G03F7/20
    • G03F7/70725G03F7/70733
    • Disclosed is a dual wafer stage switching system for a lithography machine. The system comprises a base stage (30), a wafer stage (16.1) running at a pre-processing workstation, and a wafer stage (16.2) running at an exposure workstation. A rotating motor (41) is mounted under the base stage (30) for rotating the two wafer stages after the wafer stages have completed pre-processing and exposure operations in order to complete position switch of the wafer stages, wherein the base stage (30) is kept stationary during the switch. The present invention avoids rotation of a large inertia base stage and has low requirement for motor power, while eliminating a guide rail docking device and an auxiliary device and greatly simplifying system configuration. The system is easy and convenient to operate and easy to control.
    • 公开了一种用于光刻机的双晶片级切换系统。 该系统包括基台(30),在预处理工作站处运行的晶片台(16.1)和在曝光工作站运行的晶片台(16.2)。 旋转马达(41)安装在底座(30)的下面,用于在晶片台完成预处理和曝光操作之后旋转两个晶片台,以便完成晶片台的位置切换,其中基台 )在开关期间保持静止。 本发明避免了大惯性基台的旋转,并且对电机功率的要求较低,同时消除了导轨对接装置和辅助装置,并大大简化了系统配置。 该系统操作简便,易于控制。