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81. 发明授权

US09203809B2 Communication system and method of transmitting and receiving data in communication system 有权
标题翻译：通信系统中通信系统和数据收发方法
公开(公告)号：US09203809B2
公开(公告)日：2015-12-01
申请号：US13563003
申请日：2012-07-31
申请人： Jeong-Hyun Kim , Young-Ho Kim , Jun-Ho Kim , Dong-Jun Lee
发明人： Jeong-Hyun Kim , Young-Ho Kim , Jun-Ho Kim , Dong-Jun Lee
IPC分类号： G06F15/16 , G06F15/173 , H04L29/06 , H04L29/12 , H04L29/08
CPC分类号： H04L63/029 , H04L61/2514 , H04L61/2575 , H04L67/14
摘要： A communication system and a method of transmitting and/or receiving data in the communication system are provided. A method of transmitting media data of a camera to a user terminal in a communication environment in which the camera connected to a first network and the user terminal connected to a third network are connected to a second network includes: obtaining second address information of the second network that corresponds to first address information of the first network, from an address conversion apparatus; obtaining third address information of the second network from an address providing apparatus connected to the second network; transmitting the first through third address information to the user terminal through a session control server connected to the second network; and transmitting the media data to the user terminal based on at least one of the first through third address information.
摘要翻译：提供了一种在通信系统中发送和/或接收数据的通信系统和方法。在连接到第一网络的摄像机和连接到第三网络的用户终端连接到第二网络的通信环境中，将照相机的媒体数据传送到用户终端的方法包括：获得第二网络的第二地址信息网络，其对应于第一网络的第一地址信息; 从连接到第二网络的地址提供装置获取第二网络的第三地址信息; 通过连接到第二网络的会话控制服务器将第一到第三地址信息发送给用户终端; 以及基于所述第一至第三地址信息中的至少一个将所述媒体数据发送到所述用户终端。

82. 发明授权

US08871423B2 Photoresist composition for fabricating probe array, method of fabricating probe array using the photoresist composition, composition for photosensitive type developed bottom anti-reflective coating, fabricating method of patterns using the same and fabricating method of semiconductor device using the same 有权
标题翻译：用于制造探针阵列的光致抗蚀剂组合物，使用光致抗蚀剂组合物制造探针阵列的方法，用于感光型显影底部抗反射涂层的组合物，使用其的图案的制造方法和使用其的半导体器件的制造方法
公开(公告)号：US08871423B2
公开(公告)日：2014-10-28
申请号：US13015869
申请日：2011-01-28
申请人： Hyo-Jin Yun , Jae-Ho Kim , Young-Ho Kim , Boo-Deuk Kim , Jin-A Ryu , Myung-Sun Kim , Se-Kyung Baek , Soo-Kyung Kim , Ji-Yun Ham
发明人： Hyo-Jin Yun , Jae-Ho Kim , Young-Ho Kim , Boo-Deuk Kim , Jin-A Ryu , Myung-Sun Kim , Se-Kyung Baek , Soo-Kyung Kim , Ji-Yun Ham
IPC分类号： G03F7/004 , G03F7/38 , C07C303/32 , C07C309/06 , C07C309/12 , G03F7/039 , G03F7/20
CPC分类号： G03F7/004 , C07C303/32 , C07C309/06 , C07C309/12 , G03F7/0045 , G03F7/0397 , G03F7/20 , Y10S430/122 , Y10S430/123
摘要： A photoresist composition for fabricating a probe array is provided. The photoresist composition includes a photoacid generator having an onium salt and an i-line reactive sensitizer.
摘要翻译：提供了用于制造探针阵列的光致抗蚀剂组合物。光致抗蚀剂组合物包括具有鎓盐和i线反应性敏化剂的光酸产生剂。

83. 发明申请

US20130258119A1 COMMUNICATION SYSTEM AND METHOD OF TRANSMITTING AND RECEIVING DATA IN COMMUNICATION SYSTEM 有权
标题翻译：通信系统和通信系统中发送和接收数据的方法
公开(公告)号：US20130258119A1
公开(公告)日：2013-10-03
申请号：US13563003
申请日：2012-07-31
申请人： Jeong-Hyun Kim , Young-Ho Kim , Jun-Ho Kim , Dong-Jun Lee
发明人： Jeong-Hyun Kim , Young-Ho Kim , Jun-Ho Kim , Dong-Jun Lee
IPC分类号： H04N5/225
CPC分类号： H04L63/029 , H04L61/2514 , H04L61/2575 , H04L67/14
摘要： A communication system and a method of transmitting and/or receiving data in the communication system are provided. A method of transmitting media data of a camera to a user terminal in a communication environment in which the camera connected to a first network and the user terminal connected to a third network are connected to a second network includes: obtaining second address information of the second network that corresponds to first address information of the first network, from an address conversion apparatus; obtaining third address information of the second network from an address providing apparatus connected to the second network; transmitting the first through third address information to the user terminal through a session control server connected to the second network; and transmitting the media data to the user terminal based on at least one of the first through third address information.
摘要翻译：提供了一种在通信系统中发送和/或接收数据的通信系统和方法。在连接到第一网络的摄像机和连接到第三网络的用户终端连接到第二网络的通信环境中，将照相机的媒体数据传送到用户终端的方法包括：获得第二网络的第二地址信息网络，其对应于第一网络的第一地址信息; 从连接到第二网络的地址提供装置获取第二网络的第三地址信息; 通过连接到第二网络的会话控制服务器将第一到第三地址信息发送给用户终端; 以及基于所述第一至第三地址信息中的至少一个将所述媒体数据发送到所述用户终端。

84. 发明申请

US20130241188A1 PRODUCTION METHOD FOR A SPLASH SHIELD USING A CONTINUOUS EXTRUSION-INJECTION-FOAMING MOULDING PROCESS 有权
标题翻译：使用连续挤压注塑成型工艺生产喷砂膜的方法
公开(公告)号：US20130241188A1
公开(公告)日：2013-09-19
申请号：US13988526
申请日：2011-11-28
申请人： Yong-Hoon Yoon , Moo-Sun Kim , Kyu-Se Lee , Young-Min Kim , Byeong-Sang Mun , Sung-Woon Cha , Young-Ho Kim , Soo-Hyun Cho
发明人： Yong-Hoon Yoon , Moo-Sun Kim , Kyu-Se Lee , Young-Min Kim , Byeong-Sang Mun , Sung-Woon Cha , Young-Ho Kim , Soo-Hyun Cho
IPC分类号： B62D25/16 , B29C44/04
CPC分类号： B62D25/161 , B29C44/04 , B29C44/0461 , B29C44/08 , B29C45/045 , B29C45/162 , B29C45/1816 , B29C2045/1692 , B29K2075/00 , B29K2105/04 , B29K2105/12 , B29K2995/0002 , B29L2031/3005
摘要： The present invention relates to a method for producing a splash shield, in which method a base-portion raw material comprising a plastic, glass fibers, a compatibilizer and rubber is subjected to melt extrusion while at the same time injection molding is performed, and then, without removing the injection-molded article from the injection mold, the injection mold is rotated in the open state, and the injection-molded article is conveyed to a foaming mold and subsequently undergoes flame treatment and a polyurethane foam molding step. A single process in the production method is used for the procedure in which the materials are separately compounded and pelletized and the procedure in which the injection-molded article is molded.
摘要翻译：防溅罩的制造方法技术领域本发明涉及防溅罩的制造方法，其中包括塑料，玻璃纤维，增容剂和橡胶的基底原料在熔融挤出的同时进行注射成型，然后在不从注射模具中取出注射成型制品的情况下，注射模具在打开状态下旋转，并且将注射成型制品输送到发泡模具，随后进行火焰处理和聚氨酯泡沫模制步骤。在制造方法中使用单一的方法，其中分别复合和造粒材料以及注模制品的成型方法。

85. 发明授权

US08450444B2 Siloxane polymer composition 失效
标题翻译：硅氧烷聚合物组合物
公开(公告)号：US08450444B2
公开(公告)日：2013-05-28
申请号：US12856359
申请日：2010-08-13
申请人： Kyoung-Mi Kim , Young-Ho Kim , Youn-Kyung Wang , Mi-Ra Park
发明人： Kyoung-Mi Kim , Young-Ho Kim , Youn-Kyung Wang , Mi-Ra Park
IPC分类号： C08G77/385
CPC分类号： C08G77/38 , H01L28/91
摘要： A siloxane polymer composition includes an organic solvent in an amount of about 93 percent by weight to about 98 percent by weight, based on a total weight of the siloxane polymer composition, and a siloxane complex in an amount of about 2 percent by weight to about 7 percent by weight, based on the total weight of the siloxane polymer composition, the siloxane complex including a siloxane polymer with an introduced carboxylic acid and being represented by Formula 1 below, wherein each of R1, R2 R3, and R4 independently represents H, OH, CH3, C2H5, C3H7, C4H9 or C5H11, R′ represents CH2, C2H4, C3H6, C4H8, C5H10 or C6H12, and n represents a positive integer so the siloxane polymer of the siloxane complex has a number average molecular weight of about 4,000 to about 5,000.
摘要翻译：硅氧烷聚合物组合物包含基于硅氧烷聚合物组合物的总重量为约93重量％至约98重量％的量的有机溶剂和约2重量％至约2重量％的硅氧烷配合物 7重量％，基于硅氧烷聚合物组合物的总重量，硅氧烷配合物包括具有引入的羧酸的硅氧烷聚合物并由下式1表示，其中R1，R2 R3和R4各自独立地表示H， OH，CH3，C2H5，C3H7，C4H9或C5H11，R'表示CH2，C2H4，C3H6，C4H8，C5H10或C6H12，n表示正整数，硅氧烷配合物的硅氧烷聚合物的数均分子量为约4,000 至约5,000。

86. 发明授权

US08422289B2 Fabrication method of nanoparticles by chemical curing 有权
标题翻译：通过化学固化制备纳米颗粒的方法
公开(公告)号：US08422289B2
公开(公告)日：2013-04-16
申请号：US12303079
申请日：2007-06-05
申请人： Young-Ho Kim , Wenguo Dong , Gun-Hong Kim , Jun-Ro Yoon
发明人： Young-Ho Kim , Wenguo Dong , Gun-Hong Kim , Jun-Ro Yoon
IPC分类号： G11C11/34
CPC分类号： B22F9/16 , B22F1/0018 , B82Y20/00 , B82Y30/00 , G02B6/1226 , H01L21/28273 , H01L29/42332 , H01L29/7881 , Y10T428/31681 , Y10T428/31721
摘要： A method of producing nanoparticles by using chemical curing. The method includes depositing a metal thin film on a substrate, applying an insulator precursor on a metal thin film, and adding a curing agent and a catalyst to the insulator precursor to perform the chemical curing. The method also includes mixing metal powder and an insulator precursor, applying a mixture on a substrate, and adding a curing agent and a catalyst to the mixture to perform the chemical curing. Since the chemical curing process is used in the method, it is possible to form nanoparticles by using a simple process at low cost while a high temperature process such as thermal curing is not used.
摘要翻译：一种通过化学固化生产纳米颗粒的方法。该方法包括在基板上沉积金属薄膜，在金属薄膜上施加绝缘体前体，并向绝缘体前体添加固化剂和催化剂以进行化学固化。该方法还包括混合金属粉末和绝缘体前体，在基底上施加混合物，并向混合物中加入固化剂和催化剂以进行化学固化。由于在该方法中使用化学固化方法，所以可以在不使用诸如热固化的高温工艺的情况下以简单的方法以低成本形成纳米颗粒。

87. 发明授权

US08316507B2 Vacuum cleaner and dust separating apparatus thereof 有权
标题翻译：吸尘器及其除尘装置
公开(公告)号：US08316507B2
公开(公告)日：2012-11-27
申请号：US12537697
申请日：2009-08-07
申请人： Kie-Tak Hyun , Hae-Seock Yang , Kyeong-Seon Jeong , Chang-Hoon Lee , Seong-Koo Cho , Geun-Bae Hwang , Jin-Wook Seo , Heon-Pyeong Ji , Man-Tae Hwang , Young-Ho Kim , Hyo-Churl Shin , Jin-Hyouk Shin , Hoi-Kil Jeong , Moo-Hyun Ko
发明人： Kie-Tak Hyun , Hae-Seock Yang , Kyeong-Seon Jeong , Chang-Hoon Lee , Seong-Koo Cho , Geun-Bae Hwang , Jin-Wook Seo , Heon-Pyeong Ji , Man-Tae Hwang , Young-Ho Kim , Hyo-Churl Shin , Jin-Hyouk Shin , Hoi-Kil Jeong , Moo-Hyun Ko
IPC分类号： A47L9/10
CPC分类号： A47L9/108 , A47L9/1608 , A47L9/1641 , A47L9/165 , A47L9/1666 , A47L9/1683
摘要： A dust separating apparatus for a vacuum cleaner is provided. The dust separating apparatus includes a cyclone configured to provide a plurality of cyclone airflows therein and a dust container provided separate from the cyclone. The cyclone includes a first air inlet configured to receive an airflow containing dust and a dust outlet configured to discharge dust separated by the plurality of cyclone airflows. The dust outlet is located in a central portion of the cyclone. The dust container is removably placeable into communication with the dust outlet to collect dust separated in the cyclone. A vacuum cleaner including the dust separating apparatus is also provided.
摘要翻译：提供一种用于真空吸尘器的除尘装置。灰尘分离装置包括旋风分离器，其构造成在其中提供多个旋风分离器气流，和与旋风分离器分离设置的灰尘容器。旋风分离器包括构造成接收含有灰尘的气流的第一空气入口和被构造成排出由多个旋流器气流分离的灰尘的灰尘出口。除尘器位于旋风分离器的中心部分。贮尘容器可拆卸地放置在与排尘口连通的地方，以收集在旋风分离器中分离的灰尘。还提供了包括灰尘分离装置的真空吸尘器。

88. 发明授权

US08247162B2 Methods of forming a pattern using photoresist compositions 有权
标题翻译：使用光致抗蚀剂组合物形成图案的方法
公开(公告)号：US08247162B2
公开(公告)日：2012-08-21
申请号：US12662455
申请日：2010-04-19
申请人： Ji-Man Park , Young-Ho Kim , Hyo-Jin Yun , Sun-Yul Ahn , Song-Se Yi , Kyung-Woo Park
发明人： Ji-Man Park , Young-Ho Kim , Hyo-Jin Yun , Sun-Yul Ahn , Song-Se Yi , Kyung-Woo Park
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0048 , G03F7/0046 , G03F7/0392
摘要： A method of forming a pattern and a photoresist composition, the method including forming a photoresist film on a substrate by coating a photoresist composition thereon, the photoresist composition including a polymerized photoresist additive, a polymer including an acid-labile protective group at a side chain, a photoacid generator, and a solvent; exposing the photoresist film; and forming a photoresist pattern by developing the photoresist film using an aqueous alkali developer, wherein the polymerized photoresist additive includes a hydrophilic repeating unit having an aliphatic hydrocarbon backbone and a side chain containing an oxygen heteroatom in a heterocyclic ring substituted with at least three hydroxyl groups, and a hydrophobic repeating unit having an aliphatic hydrocarbon backbone and a side chain containing a fluorinated aliphatic hydrocarbon group.
摘要翻译：一种形成图案和光致抗蚀剂组合物的方法，所述方法包括通过在其上涂覆光致抗蚀剂组合物在基底上形成光致抗蚀剂膜，光致抗蚀剂组合物包括聚合的光致抗蚀剂添加剂，在侧链上包含酸不稳定保护基的聚合物，光致酸发生剂和溶剂; 曝光光刻胶膜; 以及通过使用含水碱性显影剂显影所述光致抗蚀剂膜来形成光致抗蚀剂图案，其中所述聚合的光致抗蚀剂添加剂包括具有脂族烃骨架的亲水性重复单元和在至少三个羟基取代的杂环中含有氧杂原子的侧链，以及具有脂肪族烃主链和含有氟化脂肪族烃基的侧链的疏水性重复单元。

89. 发明授权

US08118624B2 Lead plate with a joint portion having a surface area smaller than that of its mounting portion 有权
标题翻译：铅板，其接合部分的表面积小于其安装部分的表面积
公开(公告)号：US08118624B2
公开(公告)日：2012-02-21
申请号：US12923563
申请日：2010-09-28
申请人： Bong-Young Kim , Young-Ho Kim
发明人： Bong-Young Kim , Young-Ho Kim
IPC分类号： H01R9/24
CPC分类号： H05K3/3426 , H01M2/0404 , H01M2/22 , H01M10/052 , H05K3/3405 , H05K2201/1034 , H05K2201/10757 , H05K2201/1084 , Y02P70/613
摘要： A lead plate for connecting a printed circuit board (PCB) of a secondary battery to an bare cell includes a mounting portion connected to the PCB, a joint portion connected to the bare cell, a surface area of the joint portion facing the bare cell being smaller than a surface area of the mounting portion facing the PCB, and a step portion connecting the mounting portion and the joint portion to each other.
摘要翻译：用于将二次电池的印刷电路板（PCB）连接到裸电池的引线板包括连接到PCB的安装部分，连接到裸电池的接合部分，与裸电池相对的接合部分的表面区域小于面向PCB的安装部分的表面积，以及将安装部分和接合部分彼此连接的台阶部分。

90. 发明申请

US20110300712A1 Methods of Forming a Photoresist Pattern Using Plasma Treatment of Photoresist Patterns 审中-公开
标题翻译：使用等离子体处理光刻胶图案形成光刻胶图案的方法
公开(公告)号：US20110300712A1
公开(公告)日：2011-12-08
申请号：US13103375
申请日：2011-05-09
申请人： Kyoung-Mi Kim , Jeong-Ju Park , Mi-Ra Park , Bo-Hee Lee , Jae-Ho Kim , Young-Ho Kim
发明人： Kyoung-Mi Kim , Jeong-Ju Park , Mi-Ra Park , Bo-Hee Lee , Jae-Ho Kim , Young-Ho Kim
IPC分类号： H01L21/308 , H01L21/312
CPC分类号： H01L21/0273 , H01L21/0337 , H01L21/0338 , H01L21/3086 , H01L21/3088 , H01L21/31144 , H01L21/32139 , H01L27/11521
摘要： Methods of forming a photoresist pattern include forming a first photoresist pattern on a substrate and treating the first photoresist pattern with plasma that modifies etching characteristics of the first photoresist pattern. This modification may include making the first photoresist pattern more susceptible to removal during subsequent processing. The plasma-treated first photoresist pattern is covered with a second photoresist layer, which is patterned into a second photoresist pattern that contacts sidewalls of the plasma-treated first photoresist pattern. The plasma-treated first photoresist pattern is selectively removed from the substrate to reveal the remaining second photoresist pattern. The second photoresist pattern is used as an etching mask during the selective etching of a portion of the substrate (e.g., target layer). The use of the second photoresist pattern as an etching mask may yield narrower linewidths in the etched portion of the substrate than are achievable using the first photoresist pattern alone.
摘要翻译：形成光致抗蚀剂图案的方法包括在基板上形成第一光致抗蚀剂图案，并用等离子体处理第一光致抗蚀剂图案，其改变第一光致抗蚀剂图案的蚀刻特性。该修改可以包括使第一光致抗蚀剂图案在随后的处理期间更易于去除。等离子体处理的第一光致抗蚀剂图案被第二光致抗蚀剂层覆盖，第二光致抗蚀剂层被图案化成与等离子体处理的第一光致抗蚀剂图案的侧壁接触的第二光致抗蚀剂从衬底选择性地去除等离子体处理的第一光致抗蚀剂图案以显示剩余的第二光致抗蚀剂图案。在选择性蚀刻基板（例如，目标层）的一部分期间，将第二光致抗蚀剂图案用作蚀刻掩模。使用第二光致抗蚀剂图案作为蚀刻掩模可以在衬底的蚀刻部分中产生比仅使用第一光致抗蚀剂图案可实现的更窄的线宽。

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