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81. 发明授权

US08224850B2 Method and system for determining users that satisfy desired conditions 有权
标题翻译：用于确定满足所需条件的用户的方法和系统
公开(公告)号：US08224850B2
公开(公告)日：2012-07-17
申请号：US12191055
申请日：2008-08-13
申请人： Sean Kelley , Bin Hu
发明人： Sean Kelley , Bin Hu
IPC分类号： G06F7/00
CPC分类号： H04L67/24 , H04L67/18 , H04L67/306 , H04W4/02
摘要： A method and system are disclosed allowing for determining those users of multiple users who satisfy desired condition(s), where characteristics of the users in at least some embodiments vary dynamically. In at least one embodiment, the method includes receiving at a server device a request for a determination regarding which of a plurality of users satisfies a plurality of conditions respectively relating to a plurality of user characteristics, and obtaining at the server device a conditions specification. Additionally, the method includes accessing at least one repository in which is stored information regarding the users to obtain at least some of the information, the information concerning the user characteristics. The method also includes making a determination regarding which of the users satisfies the plurality of conditions, obtaining at the first server device updated information from the at least one repository, re-evaluating the determination, and sending output information regarding the re-evaluated determination.
摘要翻译：公开了一种方法和系统，其允许确定满足期望条件的多个用户的那些用户，其中至少一些实施例中的用户的特征动态变化。在至少一个实施例中，该方法包括在服务器设备处接收关于多个用户中的哪一个满足多个用户特征的多个条件的确定请求，以及在服务器设备处获取条件规范。此外，该方法包括访问至少一个存储库，其中存储关于用户的信息以获得关于用户特征的信息中的至少一些信息。该方法还包括确定哪个用户满足多个条件，从第一服务器设备获取来自至少一个存储库的更新信息，重新评估该确定，以及发送关于重新评估的确定的输出信息。

82. 发明授权

US08211193B2 Ultrapure colloidal silica for use in chemical mechanical polishing applications 有权
标题翻译：超纯胶体二氧化硅用于化学机械抛光应用
公开(公告)号：US08211193B2
公开(公告)日：2012-07-03
申请号：US11526132
申请日：2006-09-22
申请人： Deepak Mahulikar , Yuhu Wang , Ken A. Delbridge , Gert R. M. Moyaerts , Saeed H. Mohseni , Nichole R. Koontz , Bin Hu , Liqing Wen
发明人： Deepak Mahulikar , Yuhu Wang , Ken A. Delbridge , Gert R. M. Moyaerts , Saeed H. Mohseni , Nichole R. Koontz , Bin Hu , Liqing Wen
IPC分类号： B24D3/02 , C09C1/68 , C09K3/14 , C09K13/00 , C09K13/02 , B24B1/00 , C01B33/12 , C03C15/00 , C03C25/68
CPC分类号： C23F3/04 , C01B33/1435 , C01B33/1485 , C01P2004/62 , C01P2004/64 , C01P2006/80 , C09G1/02 , C09K3/1463 , C09K3/1472 , H01L21/31053 , H01L21/3212
摘要： A method of chemical mechanical polishing a surface of a substrate including the step of: contacting the substrate and a composition including a plurality of colloidal silica particles having less than 200 ppb of each trace metal impurity, excluding potassium and sodium, have less than 2 ppm residual alcohol and wherein the cumulative concentration of the trace metal, excluding potassium and sodium, is in the range from about 0.5 to about 5 ppm; and a medium for suspending the particles; wherein the composition is an ultrapure colloidal silica dispersion; and wherein the contacting is carried out at a temperature and for a period of time sufficient to planarize the substrate.
摘要翻译：一种对基材表面进行化学机械抛光的方法，包括以下步骤：使除了钾和钠之外的每种微量金属杂质含有少于200ppb的多种胶体二氧化硅颗粒的组合物接触，其含量小于2ppm 残余醇，其中不包括钾和钠的痕量金属的累积浓度在约0.5至约5ppm的范围内; 和用于悬浮颗粒的介质; 其中所述组合物是超纯胶体二氧化硅分散体; 并且其中所述接触在足以平坦化基底的温度和时间段内进行。

83. 发明授权

US08192644B2 Highly dilutable polishing concentrates and slurries 有权
标题翻译：高度可稀释的抛光浓缩液和浆液
公开(公告)号：US08192644B2
公开(公告)日：2012-06-05
申请号：US12580868
申请日：2009-10-16
申请人： Hyungjun Kim , Richard Wen , Bin Hu , Minae Tanaka , Deepak Mahulikar
发明人： Hyungjun Kim , Richard Wen , Bin Hu , Minae Tanaka , Deepak Mahulikar
IPC分类号： C09K13/00
CPC分类号： H01L21/30625 , C09G1/02 , H01L21/3212 , H01L21/7684
摘要： The present disclosure provides a concentrate for use in chemical mechanical polishing slurries, and a method of diluting that concentrate to a point of use slurry. The concentrate comprises abrasive, complexing agent, and corrosion inhibitor, and the concentrate is diluted with water and oxidizer. These components are present in amounts such that the concentrate can be diluted at very high dilution ratios, without affecting the polishing performance.
摘要翻译：本公开提供了用于化学机械抛光浆料的浓缩物，以及将该浓缩物稀释到使用点浆料的方法。浓缩物包括研磨剂，络合剂和缓蚀剂，浓缩物用水和氧化剂稀释。这些组分的存在量使得浓缩物可以以非常高的稀释比稀释，而不影响抛光性能。

84. 发明申请

US20120083483A1 INHIBITORS OF HEPATITIS C VIRUS REPLICATION 有权
标题翻译： HEPATITIS C VIRUS REPLICATION的抑制剂
公开(公告)号：US20120083483A1
公开(公告)日：2012-04-05
申请号：US13260684
申请日：2010-03-25
申请人： Craig A. Coburn , John A. McCauley , Steven W. Ludmerer , Kun Liu , Joseph P. Vacca , Hao Wu , Bin Hu , Richard Soll , Fei Sun , Xinghai Wang , Man Yan , Chengren Zhang , Mingwei Zheng , Bin Zhong , Jian Zhu
发明人： Craig A. Coburn , John A. McCauley , Steven W. Ludmerer , Kun Liu , Joseph P. Vacca , Hao Wu , Bin Hu , Richard Soll , Fei Sun , Xinghai Wang , Man Yan , Chengren Zhang , Mingwei Zheng , Bin Zhong , Jian Zhu
IPC分类号： A61K31/553
CPC分类号： C07D498/04 , A61K31/4025 , A61K31/404 , A61K31/4178 , A61K31/4184 , A61K31/423 , A61K31/437 , A61K31/4439 , A61K31/4985 , A61K31/506 , A61K31/5365 , A61K31/5377 , A61K31/5383 , A61K31/553 , A61K38/05 , A61K38/06 , A61K45/06 , C07D401/14 , C07D403/12 , C07D403/14 , C07D405/12 , C07D405/14 , C07D409/14 , C07D413/14 , C07D471/04 , C07D487/04 , C07D498/10 , C07K5/06 , C07K5/08
摘要： The present invention relates to compounds of formula (I) that are useful as hepatitis C virus (HCV) NS5A inhibitors, the synthesis of such compounds, and the use of such compounds for inhibiting HCV NS5A activity, for treating or preventing HCV infections and for inhibiting HCV viral replication and/or viral production in a cell-based system.
摘要翻译：本发明涉及可用作丙型肝炎病毒（HCV）NS5A抑制剂，这种化合物的合成以及这些化合物用于抑制HCV NS5A活性用于治疗或预防HCV感染的用途的式（I）化合物和抑制基于细胞的系统中的HCV病毒复制和/或病毒生产。

85. 发明申请

US20120077810A1 Inhibitors Of AKT Activity 有权
标题翻译： AKT活性抑制剂
公开(公告)号：US20120077810A1
公开(公告)日：2012-03-29
申请号：US13262096
申请日：2010-03-29
申请人： Qi Chen , Mingxiang Cui , Bin Hu , Shuangxi Hu , Zhifa Pu , Philip E. Sanderson , Richard Soll , Xue Tang , Jiabing Wang , Yongjin Yan , Jinfeng Yao , Hongjie Zhang
发明人： Qi Chen , Mingxiang Cui , Bin Hu , Shuangxi Hu , Zhifa Pu , Philip E. Sanderson , Richard Soll , Xue Tang , Jiabing Wang , Yongjin Yan , Jinfeng Yao , Hongjie Zhang
IPC分类号： A61K31/5377 , A61K31/519 , A61P35/00 , C07D487/04
CPC分类号： A61K31/44 , C07D487/04
摘要： The instant invention provides for substituted fused pyrimidine compounds that inhibit Akt activity. In particular, the compounds disclosed selectively inhibit one or two of the Akt isoforms. The invention also provides for compositions comprising such inhibitory compounds and methods of inhibiting Akt activity by administering the compound to a patient in need of treatment of cancer.
摘要翻译：本发明提供抑制Akt活性的取代的稠合嘧啶化合物。特别地，所公开的化合物选择性地抑制一种或两种Akt同种型。本发明还提供了包含这种抑制化合物的组合物和通过将该化合物给予需要治疗癌症的患者来抑制Akt活性的方法。

86. 发明授权

US08112726B2 Phase-shifting masks with sub-wavelength diffractive optical elements 有权
$Phase-shifting masks with sub-wavelength diffractive optical elements$
标题翻译：具有亚波长衍射光学元件的相移掩模
公开(公告)号：US08112726B2
公开(公告)日：2012-02-07
申请号：US12316064
申请日：2008-12-09
申请人： Bin Hu , Vivek Singh , Yan Borodovsky
发明人： Bin Hu , Vivek Singh , Yan Borodovsky
IPC分类号： G06F17/50 , G03F1/00 , G03C5/00
CPC分类号： G03F7/70283 , G03F1/32 , G03F1/36 , G03F7/70433 , G03F7/705
摘要： The present invention discloses a method of designing a set of two tiled masks, as well as, a mask including: a first tile, the first tile being transparent to a light, the first tile having a first characteristic linear dimension that is 15% or less of a wavelength of the light; a second tile, the second tile being transparent to the light, the second tile having a second characteristic linear dimension that is 15% or less of the wavelength of the light; and a third tile, the third tile being opaque to the light, the third tile having a third characteristic linear dimension that is 15% or less of the wavelength of the light.
摘要翻译：本发明公开了一种设计一组两个平铺掩模的方法，以及掩模，包括：第一瓦片，第一瓦片对于光是透明的，第一瓦片具有15％的第一特征线性尺寸或较少的波长的光; 第二瓦片，所述第二瓦片对于所述光是透明的，所述第二瓦片具有光的波长的15％或更小的第二特征线性尺寸; 以及第三瓦片，所述第三瓦片对于所述光不透明，所述第三瓦片具有光的波长的15％以下的第三特征线性尺寸。

87. 发明申请

US20120003901A1 COMPOSITION FOR ADVANCED NODE FRONT-AND BACK-END OF LINE CHEMICAL MECHANICAL POLISHING 有权
标题翻译：线性化学机械抛光的前置和后端的组合物
公开(公告)号：US20120003901A1
公开(公告)日：2012-01-05
申请号：US12828766
申请日：2010-07-01
申请人： Bin Hu , Abhishek Singh , Gert Moyaerts , Deepak Mahulikar , Richard Wen
发明人： Bin Hu , Abhishek Singh , Gert Moyaerts , Deepak Mahulikar , Richard Wen
IPC分类号： B24B1/00 , C09K13/04 , C09K13/00
CPC分类号： H01L21/30625 , C09G1/02 , C09K3/1463 , H01L21/0475 , H01L21/31053 , H01L21/31055 , H01L21/3212 , H01L21/76819 , H01L29/66545
摘要： The present disclosure is directed to a highly dilutable chemical mechanical polishing concentrate comprising an abrasive, an acid, a stabilizer, and water with a point-of-use pH ranging from 2.2-3.5 for planarizing current and next generation semiconductor integrated circuit FEOL/BEOL substrates.
摘要翻译：本公开涉及一种高度可稀释的化学机械抛光浓缩物，其包含研磨剂，酸，稳定剂和水，其使用点pH为2.2-3.5，用于平坦化电流和下一代半导体集成电路FEOL / BEOL 底物。

88. 发明申请

US20110089143A1 HIGHLY DILUTABLE POLISHING CONCENTRATES AND SLURRIES 有权
标题翻译：高灵敏度的抛光浓度和流动性
公开(公告)号：US20110089143A1
公开(公告)日：2011-04-21
申请号：US12580868
申请日：2009-10-16
申请人： Hyungjun Kim , Richard Wen , Bin Hu , Minae Tanaka , Deepak Mahulikar
发明人： Hyungjun Kim , Richard Wen , Bin Hu , Minae Tanaka , Deepak Mahulikar
IPC分类号： C23F1/18 , C09K13/00
CPC分类号： H01L21/30625 , C09G1/02 , H01L21/3212 , H01L21/7684
摘要： The present disclosure provides a concentrate for use in chemical mechanical polishing slurries, and a method of diluting that concentrate to a point of use slurry. The concentrate comprises abrasive, complexing agent, and corrosion inhibitor, and the concentrate is diluted with water and oxidizer. These components are present in amounts such that the concentrate can be diluted at very high dilution ratios, without affecting the polishing performance.
摘要翻译：本公开提供了用于化学机械抛光浆料的浓缩物，以及将该浓缩物稀释到使用点浆料的方法。浓缩物包括研磨剂，络合剂和缓蚀剂，浓缩物用水和氧化剂稀释。这些组分的存在量使得浓缩物可以以非常高的稀释比稀释，而不影响抛光性能。

89. 发明申请

US20090100400A1 Phase-shifting masks with sub-wavelength diffractive optical elements 有权
$Phase-shifting masks with sub-wavelength diffractive optical elements$
标题翻译：具有亚波长衍射光学元件的相移掩模
公开(公告)号：US20090100400A1
公开(公告)日：2009-04-16
申请号：US12316085
申请日：2008-12-09
申请人： Bin Hu , Vivek Singh , Yan Borodovsky
发明人： Bin Hu , Vivek Singh , Yan Borodovsky
IPC分类号： G06F17/50
CPC分类号： G03F7/70283 , G03F1/32 , G03F1/36 , G03F7/70433 , G03F7/705
摘要： The present invention discloses a method of designing a set of two tiled masks, as well as, a mask including: a first tile, the first tile being transparent to a light, the first tile having a first characteristic linear dimension that is 15% or less of a wavelength of the light; a second tile, the second tile being transparent to the light, the second tile having a second characteristic linear dimension that is 15% or less of the wavelength of the light; and a third tile, the third tile being opaque to the light, the third tile having a third characteristic linear dimension that is 15% or less of the wavelength of the light.
摘要翻译：本发明公开了一种设计一组两个平铺掩模的方法，以及掩模，包括：第一瓦片，第一瓦片对于光是透明的，第一瓦片具有15％的第一特征线性尺寸或较少的波长的光; 第二瓦片，所述第二瓦片对于所述光是透明的，所述第二瓦片具有光的波长的15％或更小的第二特征线性尺寸; 以及第三瓦片，所述第三瓦片对于所述光不透明，所述第三瓦片具有光的波长的15％以下的第三特征线性尺寸。

90. 发明申请

US20090010387A1 RADIATION IMAGING SYSTEM 有权
标题翻译：辐射成像系统
公开(公告)号：US20090010387A1
公开(公告)日：2009-01-08
申请号：US12165846
申请日：2008-07-01
申请人： Kejun Kang , Zhiqiang Chen , Yuanjing Li , Liming Wang , Yinong Liu , Shangmin Sun , Li Zhang , Yaohong Liu , Guang Yang , Qingjun Zhang , Wenguo Liu , Siyuan Liang , Zhenbin Guo , Bin Hu , Yanli Deng , Yucheng Wu
发明人： Kejun Kang , Zhiqiang Chen , Yuanjing Li , Liming Wang , Yinong Liu , Shangmin Sun , Li Zhang , Yaohong Liu , Guang Yang , Qingjun Zhang , Wenguo Liu , Siyuan Liang , Zhenbin Guo , Bin Hu , Yanli Deng , Yucheng Wu
IPC分类号： G01N23/04
CPC分类号： G01N23/04
摘要： The present invention discloses an radiation imaging system, comprising: an accelerator for generating rays which penetrate through the objects to be inspected and an synchronous signal; a detector with a plurality of detecting modules, adapted for detecting rays; a signal processor for generating a selection signal according to the synchronous signal, so as to select a detecting module for detecting the rays; a data converter for converting the signal detected by said detecting module into digital data, and then buffering the digital data in said signal processor; and a communication controller connected to an image processor, adapted for transmitting the digital data buffered in said signal processor to said image processor. The system according to the present invention allows high-speed and stable data acquisition and data conversion and accurate and reliable data transmission, when the data amount is significant.
摘要翻译：本发明公开了一种辐射成像系统，包括：用于产生穿过待检查物体的射线的加速器和同步信号; 具有多个检测模块的检测器，适于检测射线; 信号处理器，用于根据同步信号产生选择信号，以便选择用于检测光线的检测模块; 数据转换器，用于将由所述检测模块检测的信号转换为数字数据，然后在所述信号处理器中缓冲数字数据; 以及连接到图像处理器的通信控制器，适于将缓冲在所述信号处理器中的数字数据发送到所述图像处理器。当数据量显着时，根据本发明的系统允许高速稳定的数据采集和数据转换以及准确可靠的数据传输。

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