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    • 83. 发明申请
    • Method of determining flying height of magnetic head
    • 确定磁头飞行高度的方法
    • US20110211275A1
    • 2011-09-01
    • US12659129
    • 2010-02-26
    • Yosuke AntokuNoboru YamanakaMasashi SanoKosuke TanakaMan TseEric Cheuk Wing LeungLuke Hung Leung Chung
    • Yosuke AntokuNoboru YamanakaMasashi SanoKosuke TanakaMan TseEric Cheuk Wing LeungLuke Hung Leung Chung
    • G11B21/02
    • G11B5/6005G11B5/6064
    • For obtaining a flying height of a magnetic head from a magnetic disk, the magnetic head being placed in a slider arranged at an interval with the magnetic disk, an initial setting process and a flying height detecting process are performed. In the initial setting process, driving power to a heater is increased gradually, from a state where the heater arranged at a position in proximity to the magnetic head in the slider is not driven, until the magnetic head makes contact with the magnetic disk. Then, in each stage, an electrical resistance value of the sensor arranged at a position in proximity to the magnetic head in the slider, which is increased due to the heat from heater, and either an approach distance of the magnetic head toward the magnetic disk or the flying height of the magnetic head from the magnetic disk are acquired. Then, basic data is prepared by obtaining the relationship between a variation of the electrical resistance value of the sensor and the flying height of the magnetic head from the magnetic disk, which is obtained in each stage or which calculated from the approach distance in each stage. In the flying height detecting process, an electrical resistance value of the sensor is determined, and a variation of the electrical resistance value is calculated from the determined values. Then, the flying height of the magnetic head from the magnetic disk in the state where the electrical resistance value was determined is obtained based on the basic data obtained in the initial setting process, using the calculated variation of the electrical resistance value.
    • 为了从磁盘获得磁头的飞行高度,磁头被放置在与磁盘间隔设置的滑块中,执行初始设定处理和飞行高度检测处理。 在初始设定处理中,从布置在滑动件附近的磁头的位置的加热器未被驱动的状态直到磁头与磁盘接触的状态逐渐增加到加热器的驱动电力。 然后,在各阶段,布置在靠近滑块的磁头的位置处的传感器的电阻值由于来自加热器的热而增加,并且磁头朝向磁盘的接近距离 或者从磁盘获取磁头的飞行高度。 然后,通过获得传感器的电阻值的变化与来自磁盘的磁头的飞行高度之间的关系来准备基本数据,该关系是在每个阶段中获得的,或者由每个阶段中的接近距离计算 。 在飞行高度检测处理中,确定传感器的电阻值,并根据确定的值计算电阻值的变化。 然后,使用计算出的电阻值的变化,基于在初始设定处理中获得的基本数据,求出在确定了电阻值的状态下磁头从磁盘的飞行高度。
    • 84. 发明申请
    • REFRIGERATING CYCLE DEVICE
    • 制冷循环装置
    • US20110197607A1
    • 2011-08-18
    • US13124252
    • 2009-03-10
    • Kosuke TanakaYutaka Aoyama
    • Kosuke TanakaYutaka Aoyama
    • F25D17/06F25D17/02
    • F24F11/008B60H1/3211F24F11/46F24F11/77F24F11/83F25B13/00F25B2313/0233F25B2313/02741F25B2313/0293F25B2313/0294F25B2313/0314F25B2500/18F25B2600/2513F25B2700/15G05D7/0635Y02B30/746
    • A refrigerating cycle device that can reduce power consumption while cooling capacity or heating capacity is maintained is obtained. Operation control means that controls at least one of an operation capacity of a compressor, an air amount of an outdoor blower, an air amount of an indoor blower, and a throttle opening degree of throttle means so that a deviation between a target value and a sucked air temperature or blowoff air temperature becomes small and power detecting means that detects power consumption of the refrigerating cycle device are provided, and the operation control means acquires an operation manipulation amount with which the power consumption of the refrigerating cycle device becomes the minimum for at least one operation manipulation amount of the operation capacity of the compressor, the air amount of the outdoor blower, the air amount of the indoor blower, and the throttle opening degree of the throttle means and controls at least one of operation capacity of a compressor, the air amount of the outdoor blower, the air amount of the indoor blower, and the throttle opening degree of the throttle means in accordance with the operation manipulation amount.
    • 可以获得能够在保持冷却能力或加热能力的同时降低功耗的制冷循环装置。 操作控制装置控制压缩机的操作能力,室外鼓风机的空气量,室内鼓风机的空气量和节气门开度的至少一个,使得目标值和 吸入空气温度或吹出空气温度变小,并且提供检测制冷循环装置的功率消耗的功率检测装置,并且操作控制装置获取冷冻循环装置的功率消耗成为最小的操作操作量 压缩机的操作能力,室外鼓风机的空气量,室内鼓风机的空气量以及节流装置的节气门开度的操作操作量的至少一个操作量控制压缩机的操作能力, 室外鼓风机的空气量,室内鼓风机的空气量和节流阀的节气门开度 意味着根据操作操作量。
    • 85. 发明授权
    • Thermally assisted magnetic head, head gimbal assembly, and hard disk drive
    • 热辅助磁头,磁头万向节组件和硬盘驱动器
    • US07940486B2
    • 2011-05-10
    • US11892882
    • 2007-08-28
    • Koji ShimazawaKosuke TanakaTakaaki Domon
    • Koji ShimazawaKosuke TanakaTakaaki Domon
    • G11B11/105G11B11/10G11B5/02G11B7/135G11B7/125
    • G11B5/02G11B5/314G11B2005/0005G11B2005/0021
    • A laser diode is fixed to a light source support substrate and a first surface of a slider substrate is fixed to a second surface of the light source support substrate; therefore, the slider substrate and the laser diode are kept in a fixed positional relation. Since the laser diode faces a light entrance face of a core, long-distance propagation of light as in the conventional technology does not occur, and light emitted from a light emitting element is guided well to a medium-facing surface while permitting some mounting error and coupling loss of light. A spot size w of a light intensity distribution along the X-axis in the XY plane including an incident-light centroid position on the light entrance face is set larger than a thickness of the core, whereby variation in incidence efficiency is well suppressed against positional deviation.
    • 激光二极管被固定到光源支撑基板上,并且滑块基板的第一表面固定到光源支撑基板的第二表面; 因此,滑块基板和激光二极管保持固定的位置关系。 由于激光二极管面向芯的光入射面,因此不会像现有技术那样发生长距离传播光,并且从发光元件发出的光很好地被引导到面向中间的表面,同时允许一些安装误差 和光耦合损耗。 在包括光入射面上的入射光重心位置的XY平面中沿着X轴的光强度分布的光斑尺寸w被设定为大于芯的厚度,由此良好地抑制了位置上的入射效率的变化 偏差。
    • 87. 发明授权
    • Thin-film patterning method for magnetoresistive device
    • 用于磁阻器件的薄膜图案化方法
    • US07916432B2
    • 2011-03-29
    • US12000285
    • 2007-12-11
    • Naoki OhtaKazuki SatoKosuke Tanaka
    • Naoki OhtaKazuki SatoKosuke Tanaka
    • G11B5/33G11B5/127
    • G03B31/00G11B5/3163G11B5/3903G11B5/3909
    • The thin-film patterning method for a magnetoresistive device comprises forming a functional layer on a substrate; forming a first mask layer above the functional layer; forming a patterned resist on the first mask layer; etching the first mask layer by using the resist; removing the resist; forming a second mask layer by atomic layer deposition, the second mask layer covering a step defined by an edge of the first mask layer; dry-etching the second mask layer in a thickness direction of the substrate so as to leave the second mask layer on a side face of the step; removing the first mask layer so as to expose the functional layer under the first mask; and dry-etching the functional layer by using the second mask layer.
    • 用于磁阻器件的薄膜构图方法包括在衬底上形成功能层; 在功能层上形成第一掩模层; 在所述第一掩模层上形成图案化抗蚀剂; 通过使用抗蚀剂蚀刻第一掩模层; 去除抗蚀剂; 通过原子层沉积形成第二掩模层,所述第二掩模层覆盖由所述第一掩模层的边缘限定的台阶; 在所述基板的厚度方向上干蚀刻所述第二掩模层,以将所述第二掩模层留在所述台阶的侧面上; 去除所述第一掩模层以使所述功能层暴露在所述第一掩模下方; 并通过使用第二掩模层对功能层进行干蚀刻。
    • 89. 发明授权
    • Thin film magnetic head which suppresses inflow of magnetic generated by bias-applying layers into a free layer from a layering direction
    • 薄膜磁头,其抑制由偏置施加层从层叠方向向自由层产生的磁的流入
    • US07817381B2
    • 2010-10-19
    • US11798744
    • 2007-05-16
    • Naoki OhtaKosuke TanakaKazuki Sato
    • Naoki OhtaKosuke TanakaKazuki Sato
    • G11B5/33
    • G11B5/3909B82Y10/00B82Y25/00G01R33/093G11B5/3932
    • A thin film magnetic head comprises a lower magnetic shield layer and an upper magnetic shield layer which are mutually opposed in the layering direction, a magnetoresistance effect element having a free layer, and a bias-applying layer which applies a bias magnetic field to the magnetoresistance effect element. The free layer is positioned between the lower magnetic shield layer and the upper magnetic shield layer, and is positioned on the side of the media-opposed surface. The bias-applying layer has a first portion, a second portion, and a third portion. The first portion and the second portion are positioned at a distance in the track width direction so as to enclose the magnetoresistance effect element therebetween. The third portion is positioned either between the magnetoresistance effect element and the lower magnetic shield layer or between the magnetoresistance effect element and the upper magnetic shield layer, and connects the first portion and the second portion.
    • 薄膜磁头包括在分层方向上相互相对的下磁屏蔽层和上磁屏蔽层,具有自由层的磁阻效应元件和向磁阻施加偏置磁场的偏置施加层 效果元素。 自由层位于下磁屏蔽层和上磁屏蔽层之间,并位于介质相对表面的一侧。 偏置施加层具有第一部分,第二部分和第三部分。 第一部分和第二部分位于轨道宽度方向上的一定距离处,以便在其间包围磁阻效应元件。 第三部分位于磁阻效应元件和下磁屏蔽层之间,或位于磁阻效应元件和上磁屏蔽层之间,并连接第一部分和第二部分。
    • 90. 发明申请
    • Near-Field Light Generating Element And Method For Forming The Element
    • 近场光发射元件及其形成方法
    • US20100142079A1
    • 2010-06-10
    • US12328232
    • 2008-12-04
    • Kosuke TanakaSeiichi TakayamaSatoshi Tomikawa
    • Kosuke TanakaSeiichi TakayamaSatoshi Tomikawa
    • G11B5/02B44C1/22
    • G11B5/3163G11B5/314G11B5/6088G11B2005/0005G11B2005/0021
    • Provided is a method for forming a near-field light generating element, which is capable of sufficiently suppressing the unevenness of a waveguide surface and the distortion within the waveguide. The forming method comprises the steps of: forming a first etching stopper layer on a lower waveguide layer; forming a second etching stopper layer; forming, on the second etching stopper layer, a plasmon antenna material layer; performing etching with the second etching stopper layer used as a stopper, to form a first side surface of plasmon antenna; forming a side-surface protecting mask so as to cover the first side surface; and performing etching with the first and second etching stopper layers used as stoppers, to form the second side surface. By providing the first and second etching stopper layer, over-etching can be prevented even when each etching process takes enough etch time, which allows easy management of etching endpoints.
    • 本发明提供一种形成近场光产生元件的方法,其能够充分地抑制波导表面的不均匀性和波导内的变形。 成形方法包括以下步骤:在下波导层上形成第一蚀刻阻挡层; 形成第二蚀刻停止层; 在第二蚀刻停止层上形成等离子体激元天线材料层; 用作为阻挡件的第二蚀刻阻挡层进行蚀刻,以形成等离子体激元的第一侧表面; 形成侧面保护罩以覆盖第一侧面; 并且利用用作塞子的第一和第二蚀刻阻挡层进行蚀刻,以形成第二侧表面。 通过设置第一和第二蚀刻停止层,即使每个蚀刻工艺都需要足够的蚀刻时间,也可以防止过蚀刻,这允许蚀刻端点的容易管理。