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81. 发明授权

US08124906B2 Method and apparatus for processing metal bearing gases 有权
标题翻译：处理金属轴承气体的方法和装置
公开(公告)号：US08124906B2
公开(公告)日：2012-02-28
申请号：US12511785
申请日：2009-07-29
申请人： William M. Holber , John A. Smith , Xing Chen , Donald K. Smith
发明人： William M. Holber , John A. Smith , Xing Chen , Donald K. Smith
IPC分类号： B23K10/00
CPC分类号： H01J37/32174 , H01J37/321 , H05H1/46 , H05H2001/4667
摘要： A method and apparatus for processing metal bearing gases involves generating a toroidal plasma in a plasma chamber. A metal bearing gas is introduced into the plasma chamber to react with the toroidal plasma. The interaction between the toroidal plasma and the metal bearing gas produces at least one of a metallic material, a metal oxide material or a metal nitride material.
摘要翻译：用于处理金属轴承气体的方法和装置涉及在等离子体室中产生环形等离子体。将金属轴承气体引入到等离子体室中以与环形等离子体反应。环形等离子体和金属承载气体之间的相互作用产生金属材料，金属氧化物材料或金属氮化物材料中的至少一种。

82. 发明申请

US20110297319A1 Reduction of Copper or Trace Metal Contaminants in Plasma Electrolytic Oxidation Coatings 有权
标题翻译：减少等离子体电解氧化涂层中的铜或微量金属污染物
公开(公告)号：US20110297319A1
公开(公告)日：2011-12-08
申请号：US12794470
申请日：2010-06-04
申请人： Xing Chen , Chengxiang Ji , Chiu-Ying Tai
发明人： Xing Chen , Chengxiang Ji , Chiu-Ying Tai
IPC分类号： H01L21/306 , C25D11/24 , C25D11/16 , C25D11/04 , C25D11/18
CPC分类号： C25D11/04 , C23C28/321 , C25D5/48 , C25D11/026 , C25D11/16 , H01J37/16 , H01J37/32357 , H01J37/32431 , H01J37/32467
摘要： A method for creating an oxide layer having a reduced copper concentration over a surface of an object comprising aluminum and copper for use in a semiconductor processing system. The oxide layer produced using a plasma electrolytic oxidation process has a reduced copper peak concentration, which decreases a risk of copper contamination, and includes magnesium oxides that can be converted to magnesium halide upon exposure to an excited halogen-comprising gas or halogen-comprising plasma to increase the erosion/corrosion resistance of the oxide layer.
摘要翻译：一种在半导体处理系统中用于产生包含铝和铜的物体表面上的铜浓度降低的氧化物层的方法。使用等离子体电解氧化法生产的氧化物层具有降低的铜峰浓度，这降低了铜污染的风险，并且包括在暴露于含激发的含卤素气体或含卤素的等离子体时可转化为卤化镁的氧化镁以增加氧化物层的侵蚀/耐腐蚀性。

83. 发明申请

US20110005922A1 Methods and Apparatus for Protecting Plasma Chamber Surfaces 审中-公开
标题翻译：用于保护等离子体腔体表面的方法和装置
公开(公告)号：US20110005922A1
公开(公告)日：2011-01-13
申请号：US12499453
申请日：2009-07-08
申请人： Chiu-Ying Tai , Xing Chen , Chaolin Hu , Andrew Cowe , Ali Shajii
发明人： Chiu-Ying Tai , Xing Chen , Chaolin Hu , Andrew Cowe , Ali Shajii
IPC分类号： C23C14/34
CPC分类号： C25D11/04 , C25D11/026 , C25D11/18 , C25D11/30 , H01J37/32477
摘要： A method for creating a protective layer over a surface of an object comprising aluminum and magnesium for use in a semiconductor processing system, which includes oxidizing the surface of the object using a plasma electrolytic oxidation process. The method also includes generating a halogen-comprising plasma by exciting a gas comprising a halogen. The method also includes exposing the oxidized surface to the halogen-comprising plasma or excited gas.
摘要翻译：一种用于在半导体处理系统中使用的用于在包括铝和镁的物体的表面上形成保护层的方法，其包括使用等离子体电解氧化工艺氧化物体的表面。该方法还包括通过激发包含卤素的气体产生含卤素的等离子体。该方法还包括将氧化的表面暴露于含卤素等离子体或激发气体。

84. 发明申请

US20100206847A1 Toroidal plasma chamber for high gas flow rate process 有权
标题翻译：环形等离子体室用于高气体流量过程
公开(公告)号：US20100206847A1
公开(公告)日：2010-08-19
申请号：US12738314
申请日：2007-10-19
申请人： Xing Chen , Andrew Cowe
发明人： Xing Chen , Andrew Cowe
IPC分类号： C23F1/00 , C23F1/08 , C23C16/00 , C23C16/455
CPC分类号： H01J37/32357 , H01J37/3244 , H01J37/32449
摘要： A plasma chamber for activating a process gas, including at least four legs forming a toroidal plasma channel, each leg having a cross-sectional area, and an outlet formed on one leg, the outlet having a greater cross-sectional area than the cross-sectional area of the other legs. The plasma chamber further includes an inlet for receiving the process gas and a plenum for introducing the process gas over a broad area of the leg opposing the outlet to reduce localized high plasma impedance and gas flow instability, wherein the leg opposing the outlet defines a plurality of holes for providing a helical gas rotation in the plasma channel.
摘要翻译：一种用于激活处理气体的等离子体室，包括形成环形等离子体通道的至少四条腿，每条腿具有横截面积，以及形成在一条腿上的出口，该出口具有比截面积更大的横截面面积，其他腿的截面积。等离子体室还包括用于接收处理气体的入口和用于将处理气体引导到与出口相对的腿的宽阔区域上以减少局部高等离子体阻抗和气流不稳定性的集气室，其中与出口相对的腿限定多个的孔用于在等离子体通道中提供螺旋形气体旋转。

85. 发明申请

US20090095901A1 CHEMICAL IONIZATION REACTION OR PROTON TRANSFER REACTION MASS SPECTROMETRY WITH A QUADRUPOLE MASS SPECTROMETER 失效
标题翻译：化学离子反应或原子转移反应用四倍子质谱仪的质谱
公开(公告)号：US20090095901A1
公开(公告)日：2009-04-16
申请号：US11869978
申请日：2007-10-10
申请人： Timothy Roger Robinson , Mark Attwood , Xing Chen , William M. Holber , Mark Philip Longson , Jonathan Henry Palk , Ali Shajii , John A. Smith
发明人： Timothy Roger Robinson , Mark Attwood , Xing Chen , William M. Holber , Mark Philip Longson , Jonathan Henry Palk , Ali Shajii , John A. Smith
IPC分类号： H01J49/26
CPC分类号： H01J49/145
摘要： A system and methods are described for generating reagent ions and product ions for use in a quadrupole mass spectrometry system. A microwave or high-frequency RF energy source ionizes particles of a reagent vapor to form reagent ions. The reagent ions enter a chamber, such as a drift chamber, to interact with a fluid sample. An electric field directs the reagent ions and facilitates an interaction with the fluid sample to form product ions. The reagent ions and product ions then exit the chamber under the influence of an electric field for detection by a quadrupole mass spectrometer module. The system includes various control modules for setting values of system parameters and analysis modules for detection of mass values for ion species during spectrometry and faults within the system.
摘要翻译：描述了用于产生用于四极质谱系统的试剂离子和产物离子的系统和方法。微波或高频RF能源将试剂蒸气的颗粒电离以形成试剂离子。试剂离子进入诸如漂移室的室以与流体样品相互作用。电场引导试剂离子并促进与流体样品的相互作用以形成产物离子。然后试剂离子和产物离子在电场的影响下离开室，由四极质谱仪模块进行检测。该系统包括各种控制模块，用于设置系统参数值和分析模块，用于在光谱测定和系统内故障时检测离子物质的质量值。

86. 发明申请

US20090067125A1 SCREEN OF LAPTOP COMPUTER AND LAPTOP COMPUTER HAVING THE SAME 失效
标题翻译： LAPTOP计算机屏幕和具有相同功能的笔记本计算机
公开(公告)号：US20090067125A1
公开(公告)日：2009-03-12
申请号：US12208627
申请日：2008-09-11
申请人： XIAOSONG XIA , Huajun Dong , Xiufeng He , Xing Chen
发明人： XIAOSONG XIA , Huajun Dong , Xiufeng He , Xing Chen
IPC分类号： G06F1/16
CPC分类号： G06F1/1637 , G06F1/1616 , Y10T16/554
摘要： The present invention relates to a screen of a laptop computer and a laptop computer having the same. And the laptop computer comprises: a back cover; a fixing body mounted on the back cover; a liquid crystal screen mounted on the fixing body; and a cover plate received on the fixing body, wherein the cover plate covers the liquid crystal screen and the fixing unit, and the area of the cover plate corresponding to the liquid crystal screen is transparent. The fixing body comprises a fixing frame and/or supporting member. Each supporting member is connected to a side of the liquid crystal screen. The screen for a laptop computer having a configuration described above has an integral appearance, which not only protects the screen but also makes the screen appear more neat enhancing visual effect of the screen. The present invention also proposes a laptop computer having the above screen so that the computer has an excellent visual appearance in usage, which is more adapted to practical use.
摘要翻译：本发明涉及膝上型计算机的屏幕和具有该屏幕的膝上型计算机。笔记本电脑包括：后盖; 安装在后盖上的固定体; 安装在固定体上的液晶屏; 以及容纳在固定体上的盖板，其中盖板覆盖液晶屏和定影单元，并且与液晶屏相对应的盖板的面积是透明的。固定体包括固定框架和/或支撑构件。每个支撑构件连接到液晶屏的一侧。具有上述配置的膝上型计算机的屏幕具有整体外观，其不仅保护屏幕，而且使得屏幕看起来更加整洁地增强屏幕的视觉效果。本发明还提出一种具有上述屏幕的膝上型计算机，使得计算机具有优异的使用视觉外观，更适用于实际应用。

87. 发明申请

US20080302652A1 Particle Reduction Through Gas and Plasma Source Control 审中-公开
标题翻译：通过气体和等离子体源控制减少粒子
公开(公告)号：US20080302652A1
公开(公告)日：2008-12-11
申请号：US12132294
申请日：2008-06-03
申请人： William Robert Entley , Xing Chen , Ali Shajii , Kaveh Bakhtari , Andrew Cowe
发明人： William Robert Entley , Xing Chen , Ali Shajii , Kaveh Bakhtari , Andrew Cowe
IPC分类号： H05H1/24
CPC分类号： H01J37/3299 , H01J37/32357 , H01J37/3244 , H01J37/32449
摘要： A system for producing excited gases for introduction to a semiconductor processing chamber. The system includes a plasma source for generating a plasma. The plasma source includes a plasma chamber and a gas inlet for receiving process gases from a gas source. A gas flow rate controller is coupled to the gas inlet for controlling an inlet flow rate of the process gases from the gas source to the plasma chamber via the gas inlet. The system includes a control loop for detecting a transition from a first process gas to a second process gas and for adjusting the inlet flow rate of the second process gas from about 0 sccm to about 10,000 sccm over a period of time greater than about 300 milliseconds to maintain transient heat flux loads applied by the plasma to an inner surface of the plasma chamber below a vaporization temperature of the plasma chamber.
摘要翻译：一种用于产生用于引入半导体处理室的激发气体的系统。该系统包括用于产生等离子体的等离子体源。等离子体源包括等离子体室和用于从气体源接收工艺气体的气体入口。气体流量控制器耦合到气体入口，用于经由气体入口控制从气体源到等离子体室的处理气体的入口流量。该系统包括用于检测从第一处理气体到第二处理气体的转变的控制回路，并且用于在大于约300毫秒的时间段内将第二处理气体的入口流量从约0sccm至约10,000sccm调节以将等离子体施加的瞬态热通量负载保持在等离子体室的内表面低于等离子体室的汽化温度。

88. 发明申请

US20070272299A1 Methods and apparatus for downstream dissociation of gases 审中-公开
标题翻译：气体下游解离的方法和装置
公开(公告)号：US20070272299A1
公开(公告)日：2007-11-29
申请号：US11640434
申请日：2006-12-15
申请人： Jack Schuss , William Holber , John Summerson , Susan Trulli , Weiguo Zhang , Xing Chen
发明人： Jack Schuss , William Holber , John Summerson , Susan Trulli , Weiguo Zhang , Xing Chen
IPC分类号： B01D53/00 , F17D1/02
CPC分类号： B01D53/68 , B01D53/32 , B01D53/70 , B01D2257/204 , B01D2257/206 , B01D2259/818 , Y10T137/0391
摘要： A method and apparatus for activating and dissociating gases involves generating an activated gas with a plasma located in a chamber. A downstream gas input is positioned relative to an output of the chamber to enable the activated gas to facilitate dissociation of a downstream gas introduced by the gas input, wherein the dissociated downstream gas does not substantially interact with an interior surface of the chamber.
摘要翻译：用于激活和解离气体的方法和装置包括用位于室中的等离子体产生活化气体。下游气体输入端相对于腔室的输出定位，以使得活化气体能够促进由气体输入引入的下游气体的解离，其中解离的下游气体基本上不与腔室的内表面相互作用。

89. 发明申请

US20070145023A1 Toroidal Low-Field Reactive Gas and Plasma Source Having a Dielectric Vacuum Vessel 有权
标题翻译：具有介质真空容器的环形低场反应气体和等离子体源
公开(公告)号：US20070145023A1
公开(公告)日：2007-06-28
申请号：US11684916
申请日：2007-03-12
申请人： William Holber , Xing Chen , Andrew Cowe , Matthew Besen , Ronald Collins , Susan Trullin , Shouqian Shao
发明人： William Holber , Xing Chen , Andrew Cowe , Matthew Besen , Ronald Collins , Susan Trullin , Shouqian Shao
IPC分类号： B23K9/00
CPC分类号： H01J37/32357 , H01J37/32009 , H01J37/32091 , H01J37/321 , H01J37/32449 , H01J37/32467 , H01J37/32522
摘要： Plasma ignition and cooling apparatus and methods for plasma systems are described. An apparatus can include a vessel and at least one ignition electrode adjacent to the vessel. A total length of a dimension of the at least one ignition electrode is greater than 10% of a length of the vessel's channel. The apparatus can include a dielectric toroidal vessel, a heat sink having multiple segments urged toward the vessel by a spring-loaded mechanism, and a thermal interface between the vessel and the heat sink. A method can include providing a gas having a flow rate and a pressure and directing a portion of the flow rate of the gas into a vessel channel. The gas is ignited in the channel while the remaining portion of the flow rate is directed away from the channel.
摘要翻译：描述了等离子体点火和冷却装置和等离子体系统的方法。装置可以包括容器和与容器相邻的至少一个点火电极。所述至少一个点火电极的尺寸的总长度大于所述容器通道的长度的10％。该装置可以包括介质环形容器，具有通过弹簧加载机构朝向容器推动的多个部分的散热器以及容器和散热器之间的热界面。一种方法可以包括提供具有流速和压力的气体并将气体的一部分流量引导到容器通道中。气体在通道中被点燃，而流量的剩余部分被引导离开通道。

90. 发明授权

US07166816B1 Inductively-coupled torodial plasma source 有权
标题翻译：电感耦合等离子体源
公开(公告)号：US07166816B1
公开(公告)日：2007-01-23
申请号：US10837912
申请日：2004-05-03
申请人： Xing Chen , William M. Holber , Andrew Barnett Cowe , Eric Georgelis , Ilya M. Bystyak , Andrzej Bortkiewicz
发明人： Xing Chen , William M. Holber , Andrew Barnett Cowe , Eric Georgelis , Ilya M. Bystyak , Andrzej Bortkiewicz
IPC分类号： B23K10/00
CPC分类号： H05H1/46 , H05H2001/4667 , H05H2001/4682
摘要： Apparatus for dissociating gases includes a plasma chamber comprising a gas. A first transformer having a first magnetic core surrounds a first portion of the plasma chamber and has a first primary winding. A second transformer having a second magnetic core surrounds a second portion of the plasma chamber and has a second primary winding. A first solid state AC switching power supply including one or more switching semiconductor devices is coupled to a first voltage supply and has a first output that is coupled to the first primary winding. A second solid state AC switching power supply including one or more switching semiconductor devices is coupled to a second voltage supply and has a second output that is coupled to the second primary winding. The first solid state AC switching power supply drives a first AC current in the first primary winding. The second solid state AC switching power supply drives a second AC current in the second primary winding. The first AC current and the second AC current induce a combined AC potential inside the plasma chamber that directly forms a toroidal plasma that completes a secondary circuit of the transformer and that dissociates the gas.
摘要翻译：用于解离气体的装置包括包含气体的等离子体室。具有第一磁芯的第一变压器包围等离子体室的第一部分并且具有第一初级绕组。具有第二磁芯的第二变压器包围等离子体室的第二部分并且具有第二初级绕组。包括一个或多个切换半导体器件的第一固态AC开关电源耦合到第一电压源并且具有耦合到第一初级绕组的第一输出。包括一个或多个开关半导体器件的第二固态AC开关电源耦合到第二电压源，并且具有耦合到第二初级绕组的第二输出。第一固态交流开关电源驱动第一初级绕组中的第一交流电流。第二固态交流开关电源驱动第二初级绕组中的第二交流电流。第一AC电流和第二AC电流引起等离子体室内的组合AC电位，其直接形成环形等离子体，其完成变压器的次级电路并且解离气体。

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