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    • 81. 发明申请
    • Distortion Compensation for Printing
    • 打印失真补偿
    • US20090009812A1
    • 2009-01-08
    • US11720430
    • 2005-11-10
    • Henning SirringhausJames D. Watts
    • Henning SirringhausJames D. Watts
    • H04N1/409
    • H04N1/409B41J2/2146H05K3/125
    • A printing machine includes a substrate and at least one printhead with at least two material deposition channels which are movable with respect to the substrate, wherein the printhead is mounted on a stage which allows rotation of the printhead around an axis perpendicular to the substrate and translation in a direction perpendicular to the print direction, and wherein during each print swath, the rotation angle and translation values of the printhead are varied in order to change the pitch and the lateral position in the direction perpendicular to the print direction of material deposited from the different deposition channels; and an algorithm which computes the required rotation angles and translation values for a given pattern of substrate distortion.
    • 印刷机包括基材和至少一个具有至少两个能够相对于基底移动的材料沉积通道的打印头,其中打印头安装在允许打印头围绕垂直于基底的轴旋转和平移的平台上 在垂直于打印方向的方向上,并且其中在每个打印条带期间,改变打印头的旋转角度和平移值,以便在垂直于从打印方向沉积的材料的打印方向垂直的方向上改变间距和横向位置 不同沉积通道; 以及为给定的衬底失真图案计算所需的旋转角度和平移值的算法。
    • 86. 发明授权
    • Method of processing solution on a substrate
    • 在基板上处理溶液的方法
    • US06808972B2
    • 2004-10-26
    • US10175909
    • 2002-06-21
    • Henning SirringhausTakeo KawaseRichard Henry Friend
    • Henning SirringhausTakeo KawaseRichard Henry Friend
    • H01L218238
    • H01L51/52B82Y30/00H01L21/31133H01L21/76838H01L27/283H01L27/32H01L51/0004H01L51/0012H01L51/0018H01L51/002H01L51/0021H01L51/0036H01L51/0037H01L51/0039H01L51/0043H01L51/0059H01L51/052H01L51/0541H01L51/0545
    • A method for forming on a substrate an electronic device including an electrically conductive or semiconductive material in a plurality or regions, the operation of the device utilising current flow from a first region to a second region, the method comprising: forming a mixture by mixing the material with a liquid; forming on the substrate a confinement structure including a first zone in a first area of the substrate and a second zone in a second area of the substrate, the first zone having a greater repellence for the mixture than the second zone, and a third zone in a third area of the substrate spaced from the second area by the first area, the first zone having a greater repellence for the mixture than the third zone, and depositing the material on the substrate by applying the mixture over the substrate whereby the deposited material may be confined by the relative repellence of the first zone to spaced apart regions defining the said first and second regions of the device and being electrically separate in their plane by means of the relative repellence of the first zone and to be absent from the first area of the substrate so as to resist the flow across the first zone of electrical current between the spaced a part regions of the deposited material.
    • 一种在衬底上形成包括多个或多个区域中的导电或半导体材料的电子器件的方法,所述器件利用从第一区域到第二区域的电流的操作,所述方法包括:通过将 液体材料; 在所述基板上形成约束结构,所述约束结构包括所述基板的第一区域中的第一区域和所述基板的第二区域中的第二区域,所述第一区域具有比所述第二区域更大的对混合物的排斥性,以及第三区域 所述基板的第三区域与所述第二区域间隔开所述第一区域,所述第一区域具有比所述第三区域更大的对混合物的排斥性,以及通过将所述混合物施加在所述基板上而将所述材料沉积在所述基板上,由此所沉积的材料 被限制为第一区域相对排斥限定装置的所述第一和第二区域的间隔开的区域,并且通过第一区域的相对排斥性在其平面中电分离,并且不存在于第一区域的第一区域 衬底,以便抵抗在沉积材料的间隔开的部分区域之间穿过第一区域的电流的流动。