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81. 发明授权

US06841943B2 Plasma processor with electrode simultaneously responsive to plural frequencies 有权
标题翻译：等离子体处理器，电极同时响应多个频率
公开(公告)号：US06841943B2
公开(公告)日：2005-01-11
申请号：US10180978
申请日：2002-06-27
申请人： Vahid Vahedi , Peter Loewenhardt , Albert Ellingboe , Andras Kuthi , Andreas Fischer
发明人： Vahid Vahedi , Peter Loewenhardt , Albert Ellingboe , Andras Kuthi , Andreas Fischer
IPC分类号： H05H1/46 , C23C16/505 , H01J37/32 , H01L21/3065 , H01J7/24
CPC分类号： H01J37/32082 , H01J37/32165
摘要： A plasma in a vacuum chamber where a workpiece is processed is bounded by a plasma confinement volume including a region between a first electrode simultaneously responsive to power at first and second RF frequencies and a DC grounded second electrode. A DC grounded extension is substantially aligned with the first electrode. A substantial percentage of power at the first frequency is coupled to a path including the first and second electrodes but not the extension while a substantial percentage of power at the second frequency is coupled to a path including the first electrodes and extension, but not the second electrode. Changing the relative powers at the first and second frequencies, as applied to the first electrode, controls DC bias voltage of the first electrode.
摘要翻译：处理工件的真空室中的等离子体由包括第一电极同时响应于第一和第二RF频率的功率的第一电极和直流接地第二电极之间的等离子体约束体积界定。直流接地延伸部基本上与第一电极对准。在第一频率处的相当大的功率百分比被耦合到包括第一和第二电极而不是扩展的路径，而在第二频率处的相当大的功率百分比被耦合到包括第一电极和延伸的路径，而不是第二频率的路径电极。施加到第一电极的第一和第二频率处的相对功率的改变控制第一电极的直流偏置电压。

82. 发明授权

US06822124B2 Method for producing alcoxylated carbonyl compounds by an anodic oxidation method using a cathodic coupled reaction for organic synthesis 失效
公开(公告)号：US06822124B2
公开(公告)日：2004-11-23
申请号：US10432249
申请日：2003-05-22
申请人： Hermann Pütter , Andreas Fischer
发明人： Hermann Pütter , Andreas Fischer
IPC分类号： C07C4702
CPC分类号： C25B3/00
摘要： A method for producing alcoxylated carbonyl compounds of general formula (I) (compounds I): R1aR2C(OR3)b wherein R1, R2 represent hydrogen or C1-C6-alkyl, R3 independently means C1-C6-alkyl, a is 0 or 1, b 2 or 3 with the proviso that the sum of a and b is 3, by means of anodic oxidation of germinal dialcoxy compounds of general formula (II) (compounds II) wherein R4, R5, R6, R7 represent hydrogen or C1-C6-alkyl, R5, R6 represent C1-C6-alkyl or C1-C6-alcoxy, in the presence of a C1-C6-alkyl alcohol (compounds III). A usual compound (compound IV) is used as a cathodic depolarizer suitable for electrochemical oxidation. The anodic oxidation and cathodic reduction is carried out in an undivided electrolyte cell in the presence of C1-C6-alkyl alcohols.

83. 发明授权

US06744212B2 Plasma processing apparatus and method for confining an RF plasma under very high gas flow and RF power density conditions 有权
标题翻译：用于在非常高的气流和RF功率密度条件下限制RF等离子体的等离子体处理装置和方法
公开(公告)号：US06744212B2
公开(公告)日：2004-06-01
申请号：US10077072
申请日：2002-02-14
申请人： Andreas Fischer , Dave Trussell , Bill Kennedy , Peter Loewenhardt
发明人： Andreas Fischer , Dave Trussell , Bill Kennedy , Peter Loewenhardt
IPC分类号： C23C1600
CPC分类号： H01J37/32082 , H01J37/32623 , H01J37/32642
摘要： The present invention includes a system and method for confining plasma within a plasma processing chamber. The plasma processing apparatus comprises a first electrode, a power generator, a second electrode, at least one confinement ring, and a ground extension surrounding the first electrode. The first electrode is configured to receive a workpiece and has an associated first electrode area. The power generator is operatively coupled to the first electrode, and the power generator is configured to generate RF power that is communicated to the first electrode. The second electrode is disposed at a distance from the first electrode. The second electrode is configured to provide a complete electrical circuit for RF power communicated from the first electrode. Additionally, the second electrode has a second electrode area that is greater than the first electrode area. At least one confinement ring is configured to assist confine the plasma. The plasma is generated with the RF power being communicated between the first electrode and the gas residing inside the confinement rings. The ground extension drains charge from the plasma boundaries with a grounded conductive surface.
摘要翻译：本发明包括用于将等离子体限制在等离子体处理室内的系统和方法。等离子体处理装置包括第一电极，发电机，第二电极，至少一个限制环和围绕第一电极的接地延伸部。第一电极被配置为接收工件并且具有相关联的第一电极区域。功率发生器可操作地耦合到第一电极，并且发电机被配置为产生与第一电极连通的RF功率。第二电极设置在离第一电极一定距离处。第二电极被配置为提供从第一电极传送的RF功率的完整电路。另外，第二电极具有大于第一电极区域的第二电极区域。至少一个限制环被配置成辅助限制等离子体。产生等离子体，其中RF功率在第一电极和驻留在限制环内部的气体之间连通。接地延长线从等离子体边界带有接地导电表面的电荷。

84. 发明授权

US06713656B2 Preparation of diacetals of glyoxal 失效
标题翻译：乙二醛二缩醛的制备
公开(公告)号：US06713656B2
公开(公告)日：2004-03-30
申请号：US10262980
申请日：2002-10-03
申请人： Gunnar Heydrich , Nicola Christiane Aust , Hermann Pütter , Andreas Fischer , Jörg Botzem
发明人： Gunnar Heydrich , Nicola Christiane Aust , Hermann Pütter , Andreas Fischer , Jörg Botzem
IPC分类号： C07C4330
CPC分类号： C07C41/56 , C07C43/303 , C07C47/198
摘要： A process is described for preparing diacetals of glyoxal by reacting from 40 to 75% by weight aqueous glyoxal with monohydric alcohols in the presence of an acid catalyst, which comprises leaving a liquid mixture which, at the beginning of the reaction, comprises alcohol and glyoxal in a molar ratio of at least 15:1 and also water in a concentration of not more than 8% by weight in contact with the acid catalyst until concentration in the reaction mixture of the diacetal formed reaches at least 70% of the equilibrium concentration without more than 5% by weight of the alcohol used having already been distilled off.
摘要翻译：描述了一种通过在酸催化剂的存在下使40至75重量％的乙二醛与一元醇反应来制备乙二醛的二缩醛的方法，其包括在反应开始时包含醇和乙二醛的液体混合物至少15:1的摩尔比和与酸催化剂接触的浓度不超过8重量％的水，直到形成的二缩醛的反应混合物中的浓度达到平衡浓度的至少70％而没有超过5％（重量）所用的醇已被蒸馏掉。

85. 发明授权

US06623561B2 Rotary atomizer for particulate paints 有权
标题翻译：用于微粒涂料的旋转雾化器
公开(公告)号：US06623561B2
公开(公告)日：2003-09-23
申请号：US09769707
申请日：2001-01-25
申请人： Kurt Vetter , Rolf Schneider , Andreas Fischer , Robert F. Heldt
发明人： Kurt Vetter , Rolf Schneider , Andreas Fischer , Robert F. Heldt
IPC分类号： B05C500
CPC分类号： B05B3/1064 , B05B3/1014 , B05B3/1042 , B05B3/1092 , B05B5/0407 , B05B5/0426 , B05B13/0452
摘要： A rotary atomizer applies particulate paints with good color matching by reducing paint droplet size deviation and then optimizing the other paint spraying parameters. Paint droplet size parameters are reduced by using a bell cup having reduced flow deviations, including an overflow surface having a generally constant angle between a deflector and an atomizing edge.
摘要翻译：旋转雾化器通过减少油漆液滴尺寸偏差，然后优化其他喷漆参数来应用具有良好颜色匹配的颗粒涂料。通过使用具有减小的流动偏差的钟形杯来减少油漆液滴尺寸参数，包括在偏转器和雾化边缘之间具有大致恒定的角度的溢流表面。

86. 发明授权

US5926326A Arrangement for securing components in an optical system 失效
标题翻译：用于固定光学系统中部件的布置
公开(公告)号：US5926326A
公开(公告)日：1999-07-20
申请号：US000412
申请日：1998-02-03
申请人： Andreas Fischer , Reiner Hofmann , Armin Leitel
发明人： Andreas Fischer , Reiner Hofmann , Armin Leitel
IPC分类号： G02B7/02
CPC分类号： G02B7/026
摘要： An arrangement is provided for fixing components of an optical system such as lenses, mounting rings, and the like. The components which are guided radially in the tube are held in the axial direction under pretensioning in an elastic manner. The arrangement is designed for fixing components in the axial direction in which the pretensioning force can be varied in definable steps. This is done by providing that a detachable fastening ring and also the tube have catch elements at concentric circumferential surfaces, which catch elements are constructed as complementing locking elements. Under axially directed force, the catch elements of the fastening ring can be engaged in the catch elements at the tube and the catch elements can be disengaged in the opposite force direction. The pretensioning force which is exerted by the fastening ring on the components to be held depends upon the extent to which the catch elements of the fastening ring and of the tube overlap.
摘要翻译： PCT No.PCT / EP97 / 02928 371日期1998年2月3日 102（e）1998年2月3日PCT 1997年6月5日PCT公布。 WO97 / 48000 PCT出版物日期1997年12月18日提供了用于固定诸如透镜，安装环等的光学系统的部件的布置。在管内径向引导的部件以弹性方式在预拉伸下沿轴向保持。该装置被设计用于沿轴向方向固定部件，其中预张力可以在可定义的步骤中变化。这通过提供可拆卸的紧固环以及管在同心圆周表面处具有捕获元件来实现，该捕获元件被构造为补充锁定元件。在轴向定向的力下，紧固环的卡扣元件可以在管中接合在捕获元件中，并且捕获元件可以沿相反的力方向脱离。由紧固环施加在要保持的部件上的预张紧力取决于紧固环和管的捕获元件重叠的程度。

87. 发明授权

US5677518A Device for deadening sound in pipelines 失效
标题翻译：在管道中使声音衰减的装置
公开(公告)号：US5677518A
公开(公告)日：1997-10-14
申请号：US556129
申请日：1995-11-13
申请人： Andreas Fischer , Susanne Muller , Werner Strassen
发明人： Andreas Fischer , Susanne Muller , Werner Strassen
IPC分类号： F01N1/02 , F01N1/08 , F16L55/033
CPC分类号： F16L55/033 , F01N1/02 , F01N1/084 , F01N2490/20
摘要： A device for deadening sound in pipelines comprising a chamber (1) positioned on the pipeline (2, 7) with a discontinuous pipeline section (3) projecting inwards at the chamber inlet and a discontinuous section (7) of the pipeline connected at the chamber outlet. Disposed within the chamber (1) opposite the opening of the pipeline section (3) there is a cover cap (4), in the form of a pipe resonator, whose side wall encloses the pipeline section (3) on one part of its length so that an annular channel (5) remains between the side wall and the pipe section (3). This permits the attainment of a very efficient sound deadening under certain geometric conditions.
摘要翻译：一种用于在管道中使声音衰减的装置，包括位于管道（2,7）上的腔室（1），其中腔室入口处向内突出的不连续管道部分（3）和连接在腔室处的管线的不连续部分（7）出口。在与管道部分（3）的开口相对的腔室（1）内设置有以下管道谐振器形式的盖帽（4），其侧壁在其长度的一部分上包围管道部分（3）使得环形通道（5）保留在侧壁和管段（3）之间。这允许在某些几何条件下实现非常有效的声音衰减。

88. 发明授权

US11311903B2 Coating method and coating device with compensation for asymmetries of the spray jet 有权
公开(公告)号：US11311903B2
公开(公告)日：2022-04-26
申请号：US14345706
申请日：2012-09-05
申请人： Andreas Fischer , Ralph Glaser , Carmen Goltz
发明人： Andreas Fischer , Ralph Glaser , Carmen Goltz
IPC分类号： B05D1/04 , B05D1/02 , B05B12/08 , B05B13/04 , B05B12/16 , B05B5/04
摘要： The invention relates to a coating method for coating a component surface (4) with a coating agent, in particular for painting a motor vehicle body component with a paint, having the following steps: ⋅ emitting a spray jet (1) of the coating agent onto the component surface (4) of the component to be coated by means of an atomizer (2), said spray jet (1) having a main axis (5) and having an asymmetry with respect to the main axis (5) such that the spray jet (1) generates a spray pattern with a corresponding asymmetry on the component surface (4), and ⋅ at least partially compensating for the asymmetry of the spray jet (1) such that the asymmetry of the resulting spray pattern on the component surface (4) is reduced. The invention further relates to a corresponding coating device.

89. 发明授权

US09299541B2 Methods and apparatuses for effectively reducing gas residence time in a plasma processing chamber 有权
标题翻译：有效减少等离子体处理室中气体停留时间的方法和装置
公开(公告)号：US09299541B2
公开(公告)日：2016-03-29
申请号：US13436728
申请日：2012-03-30
申请人： Andreas Fischer
发明人： Andreas Fischer
IPC分类号： H01J37/32
CPC分类号： H01J37/32972
摘要： Methods and apparatuses for controlling plasma generation in a plasma processing chamber to reduce an effective residence time of by-product gases or to control in real time the concentration of certain polymer pre-cursors or reaction by-products in the plasma processing chamber are disclosed. The gas residence time is “effectively” reduced by reducing the plasma reaction for at least a portion of the process time. Thresholds can be provided to control when the plasma reaction is permitted to proceed at the full rate and when the plasma reaction is permitted to proceed at the reduced rate. By reducing the rate of plasma by-product generation at least for a portion of the process time, the by-product gas residence time may be effectively reduced to improve process results.
摘要翻译：公开了用于控制等离子体处理室中的等离子体产生以减少副产物气体的有效停留时间或实时控制等离子体处理室中某些聚合物前体或反应副产物的浓度的方法和装置。通过在处理时间的至少一部分减少等离子体反应，“有效地”减少气体停留时间。可以提供阈值以控制何时允许血浆反应以全速进行，并且允许血浆反应以降低的速率进行。通过至少在一部分处理时间内降低等离子体副产物产生速率，可以有效地减少副产物气体停留时间以改善工艺结果。

90. 发明授权

US09251999B2 Capacitively-coupled plasma processing system having a plasma processing chamber for processing a substrate 有权
标题翻译：具有用于处理衬底的等离子体处理室的电容耦合等离子体处理系统
公开(公告)号：US09251999B2
公开(公告)日：2016-02-02
申请号：US13526391
申请日：2012-06-18
申请人： Rajinder Dhindsa , Eric Hudson , Alexei Marakhtanov , Andreas Fischer
发明人： Rajinder Dhindsa , Eric Hudson , Alexei Marakhtanov , Andreas Fischer
IPC分类号： H01J37/32 , H01L21/306 , G03F7/42 , H01L21/311
CPC分类号： H01J37/32174 , G03F7/427 , H01J37/32091 , H01J37/32128 , H01J37/32165 , H01J37/32532 , H01L21/306 , H01L21/31138
摘要： A capacitively-coupled plasma processing system having a plasma processing chamber for processing a substrate is provided. The plasma processing system includes at least an upper electrode and a lower electrode for processing the substrate, the substrate being disposed on the lower electrode during plasma processing. The plasma processing system further includes means for providing at least a first RF signal to the lower electrode, the first RF signal having a first RF frequency. The first RF signal couples with a plasma in the plasma processing chamber, thereby inducing an induced RF signal on the upper electrode. The plasma processing system further includes means for rectifying the induced RF signal to generate a rectified RF signal such that the rectified RF signal is more positively biased than negatively biased, wherein the substrate is configured to be processed while the rectified RF signal is provided to the upper electrode.
摘要翻译：提供了具有用于处理衬底的等离子体处理室的电容耦合等离子体处理系统。等离子体处理系统至少包括用于处理衬底的上电极和下电极，衬底在等离子体处理期间设置在下电极上。等离子体处理系统还包括用于向下电极提供至少第一RF信号的装置，第一RF信号具有第一RF频率。第一RF信号与等离子体处理室中的等离子体耦合，从而在上电极上感应感应RF信号。等离子体处理系统还包括用于整流感应RF信号以产生经整流的RF信号的装置，使得整流的RF信号比负偏置更积极地偏置，其中衬底被配置为在被整流的RF信号被提供给上电极。

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