会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 89. 发明授权
    • Method, photolithography method, and method of manufacturing a semiconductor device using a pellicle film
    • 方法,光刻法和使用防护薄膜的半导体器件的制造方法
    • US09519220B2
    • 2016-12-13
    • US14706980
    • 2015-05-08
    • Su-Young LeeTae-Geun KimJong-Gul Doh
    • Su-Young LeeTae-Geun KimJong-Gul Doh
    • H01L21/00G03F7/20
    • G03F7/2004G03F1/62
    • A pellicle for an EUV lithography may include a pellicle film, a supporting structure and a handling block. The pellicle film may have a first surface for orienting opposite to a mask, and a second surface opposite to the first surface and for orienting toward the mask. The pellicle film may allow the EUV, which may pass through the mask, to penetrate the pellicle film. The supporting structure may be arranged on the second surface of the pellicle film to support the pellicle film. The handling block may be arranged on the first surface of the pellicle film. The handling block may have an opening configured to expose the pellicle film. Thus, the pellicle may be handled using the thick handling block, not the thin pellicle film, so that the thin pellicle film may not be damaged. The pellicle may protect the mask from byproducts generated in the EUV lithography process so that the mask may not be contaminated.
    • 用于EUV光刻的防护薄膜组件可以包括防护薄膜,支撑结构和处理块。 防护薄膜可以具有用于与掩模相对定向的第一表面和与第一表面相对的用于朝向掩模定向的第二表面。 防护薄膜可以允许穿过掩模的EUV穿透防护薄膜。 支撑结构可以布置在防护薄膜的第二表面上以支撑防护薄膜。 处理块可以布置在防护薄膜的第一表面上。 处理块可以具有用于暴露防护薄膜的开口。 因此,可以使用厚的处理块而不是薄的防护薄膜来处理防护薄膜,使得薄的防护薄膜不会被损坏。 防护薄膜组件可以保护面罩免于在EUV光刻工艺中产生的副产物,使得面罩不被污染。
    • 90. 发明授权
    • Gate driver with multiple slopes for plasma display panels
    • 具有多个斜坡的门驱动器用于等离子体显示面板
    • US09501966B2
    • 2016-11-22
    • US13022323
    • 2011-02-07
    • Dong Young Lee
    • Dong Young Lee
    • G09G3/28G09G3/292G09G3/296
    • G09G3/2927G09G3/296G09G2310/066G09G2330/028
    • According to an exemplary embodiment, a driver circuit for generating a reset pulse of an output waveform includes a plurality of ramp paths, each ramp path being configured to control the slope of the reset pulse. The driver circuit also includes a falling switch configured to selectively hold the output waveform low. The driver circuit further includes a switch controller for selectively enabling the plurality of ramp paths and the falling switch to generate the reset pulse. The switch controller can selectively enable the plurality of ramp paths responsive to a reference setting signal to select the slope of the reset pulse. The driver circuit can also generate a sustain pulse. The driver circuit is can generate the reset pulse and the sustain pulse by driving a transistor.
    • 根据示例性实施例,用于产生输出波形的复位脉冲的驱动器电路包括多个斜坡路径,每个斜坡路径被配置为控制复位脉冲的斜率。 驱动器电路还包括被配置为选择性地将输出波形保持为低的下降开关。 驱动器电路还包括开关控制器,用于选择性地使得多个斜坡路径和下降开关能够产生复位脉冲。 开关控制器可以根据参考设置信号选择性地启用多个斜坡路径,以选择复位脉冲的斜率。 驱动电路也可以产生维持脉冲。 驱动电路可以通过驱动晶体管产生复位脉冲和维持脉冲。