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81. 发明授权

US07717061B2 Gas switching mechanism for plasma processing apparatus 有权
标题翻译：等离子体处理装置的气体切换机构
公开(公告)号：US07717061B2
公开(公告)日：2010-05-18
申请号：US11232943
申请日：2005-09-23
申请人： Tadahiro Ishizaka , Naoki Yoshii , Kohei Kawamura , Yukio Fukuda , Takashi Shigeoka , Yasuhiko Kojima , Yasuhiro Oshima , Junichi Arami , Atsushi Gomi
发明人： Tadahiro Ishizaka , Naoki Yoshii , Kohei Kawamura , Yukio Fukuda , Takashi Shigeoka , Yasuhiko Kojima , Yasuhiro Oshima , Junichi Arami , Atsushi Gomi
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306 , F16K11/065 , F16K11/085 , F16K11/074 , F16K3/08 , F16K47/04
CPC分类号： C23C16/45542 , C23C16/34 , C23C16/452 , C23C16/45561 , Y10T137/86558 , Y10T137/86566 , Y10T137/86638 , Y10T137/86726 , Y10T137/86743 , Y10T137/86751 , Y10T137/86871
摘要： A processing apparatus is disclosed which is capable of switching supplies of a raw material gas and a reducing gas alternately, while continuously forming a plasma of the reducing gas. An excitation device (12) excites a reducing gas supplied thereinto, and the excited reducing gas is supplied into a process chamber (2). A switching mechanism (20) is arranged between the excitation device (12) and the process chamber (2), and a bypass line (22) is connected to the switching mechanism (20). The switching mechanism (20) switches the flow of the excited reducing gas from the excitation device (12) between the process chamber (2) and the bypass line (22).
摘要翻译：公开了能够在连续地形成还原气体的等离子体的同时交替地切换原料气体和还原气体的供给的处理装置。励磁装置（12）激发供给到其中的还原气体，并将被激发的还原气体供给到处理室（2）。在励磁装置（12）和处理室（2）之间设置有切换机构（20），旁通管路（22）与切换机构（20）连接。切换机构（20）切换来自处理室（2）和旁通管线（22）之间的激发装置（12）的被激发的还原气体的流动。

82. 发明授权

US07664135B2 Control of network plug-and-play compliant device 有权
标题翻译：控制网络即插即用兼容设备
公开(公告)号：US07664135B2
公开(公告)日：2010-02-16
申请号：US11517439
申请日：2006-09-06
申请人： Yasuhiro Oshima , Tsutomu Motegi , Yoichi Ikeda
发明人： Yasuhiro Oshima , Tsutomu Motegi , Yoichi Ikeda
IPC分类号： H04J3/02
CPC分类号： H04N5/765 , H04L67/16 , H04L69/18 , H04L69/22 , H04N5/77 , H04N5/775
摘要： A network device includes a network protocol controller and a device controller. The device controller controls a plurality of service devices including a first device, and a second device of different type from the first device. The network protocol controller and the device controller are connected by a packetized logical channel for the first device. The network protocol controller, upon having received a message in the network plug-and-play protocol and destined for the second device, transfers the content of the message body of the received message to the device controller, using the logical channel for the first device.
摘要翻译：网络设备包括网络协议控制器和设备控制器。设备控制器控制包括与第一设备不同类型的第一设备和第二设备的多个服务设备。网络协议控制器和设备控制器通过第一设备的分组化逻辑信道连接。网络协议控制器在已经在网络即插即用协议中接收到目的地为第二设备的消息时，使用第一设备的逻辑信道将接收到的消息的消息体的内容传送到设备控制器。

83. 发明申请

US20070074739A1 Cleaning method of treatment equipment and treatment equipment 审中-公开
标题翻译：处理设备和处理设备的清洁方法
公开(公告)号：US20070074739A1
公开(公告)日：2007-04-05
申请号：US11603196
申请日：2006-11-22
申请人： Yasuhiko Kojima , Yasuhiro Oshima
发明人： Yasuhiko Kojima , Yasuhiro Oshima
IPC分类号： C23G1/02 , B08B9/00 , C23G1/00 , B08B7/00 , C23C16/00
CPC分类号： C23C16/4405
摘要： In a state of the inside of a treatment chamber of treatment equipment being evacuated, therein a cleaning gas containing trifluoroacetic acid (TFA) as a cleaning agent is supplied. Metal such as copper used in the formation of an interconnection or an electrode and stuck on an inner wall surface of the treatment chamber, when coming into contact with the cleaning agent (TFA) in the cleaning gas, without forming an oxide or a metallic salt, is directly complexed. The complex is sublimed due to the evacuation and is exhausted outside the treatment chamber. Accordingly, at less labor and low cost, the cleaning can be efficiently implemented.
摘要翻译：在处理设备的处理室的内部被抽真空的状态下，提供含有作为清洁剂的三氟乙酸（TFA）的清洁气体。当形成互连或电极并且在与清洁气体中的清洁剂（TFA）接触时粘附在处理室的内壁表面上的金属，例如铜，而不形成氧化物或金属盐，直接复合。复合体由于排空而升华，并在处理室外排出。因此，以较少的劳动力和低成本，可以有效地实施清洁。

84. 发明申请

US20070055970A1 Control software updating technique for a network apparatus 失效
标题翻译：网络设备的控制软件更新技术
公开(公告)号：US20070055970A1
公开(公告)日：2007-03-08
申请号：US11514616
申请日：2006-09-01
申请人： Kenji Sakuda , Yasuhiro Oshima
发明人： Kenji Sakuda , Yasuhiro Oshima
IPC分类号： G06F9/44
CPC分类号： G06F8/65
摘要： A network apparatus has first and second controllers that are coupled via communication channel, and is coupled to a network by the first controller. In order to update the firmware of this first controller, the first controller obtains update data for updating via the network and transfers the obtained data to the second controller. The second controller stores the update data transferred from the first controller in a storage device incorporated in the second controller. After the entirety of the update data has been stored in the storage device by the second controller, the second controller transfers the update data to the first controller. The first controller updates the firmware for the first controller using the update data transferred from the second controller.
摘要翻译：网络设备具有经由通信信道耦合的第一和第二控制器，并且由第一控制器耦合到网络。为了更新该第一控制器的固件，第一控制器获得经由网络进行更新的更新数据，并将获得的数据传送到第二控制器。第二控制器将从第一控制器传送的更新数据存储在并入第二控制器的存储装置中。在通过第二控制器将整个更新数据存储在存储设备中之后，第二控制器将更新数据传送到第一控制器。第一控制器使用从第二控制器传送的更新数据来更新第一控制器的固件。

85. 发明申请

US20070053376A1 Control of network plug-and-play compliant device 有权
标题翻译：控制网络即插即用兼容设备
公开(公告)号：US20070053376A1
公开(公告)日：2007-03-08
申请号：US11517439
申请日：2006-09-06
申请人： Yasuhiro Oshima , Tsutomu Motegi , Yoichi Ikeda
发明人： Yasuhiro Oshima , Tsutomu Motegi , Yoichi Ikeda
IPC分类号： H04J3/02
CPC分类号： H04N5/765 , H04L67/16 , H04L69/18 , H04L69/22 , H04N5/77 , H04N5/775
摘要： A network device includes a network protocol controller and a device controller. The device controller controls a plurality of service devices including a first device, and a second device of different type from the first device. The network protocol controller and the device controller are connected by a packetized logical channel for the first device. The network protocol controller, upon having received a message in the network plug-and-play protocol and destined for the second device, transfers the content of the message body of the received message to the device controller, using the logical channel for the first device.
摘要翻译：网络设备包括网络协议控制器和设备控制器。设备控制器控制包括与第一设备不同类型的第一设备和第二设备的多个服务设备。网络协议控制器和设备控制器通过第一设备的分组化逻辑信道连接。网络协议控制器在已经在网络即插即用协议中接收到目的地为第二设备的消息时，使用第一设备的逻辑信道将接收到的消息的消息体的内容传送到设备控制器。

86. 发明申请

US20060154383A1 Processing apparatus and processing method 审中-公开
标题翻译：处理装置及处理方法
公开(公告)号：US20060154383A1
公开(公告)日：2006-07-13
申请号：US10526019
申请日：2003-08-15
申请人： Hiroshi Kannan , Tadahiro Ishizaka , Yasuhiko Kojima , Yasuhiro Oshima , Takashi Shigeoka
发明人： Hiroshi Kannan , Tadahiro Ishizaka , Yasuhiko Kojima , Yasuhiro Oshima , Takashi Shigeoka
IPC分类号： H01L21/00 , C23C16/00
CPC分类号： H01L21/28562 , C23C16/34 , C23C16/45557
摘要： In a processing apparatus, a process gas including a source gas (TiCl4, NH3) and an inert gas (N2) is supplied into a process chamber (2). A pressure meter (6) detects a pressure in the process chamber (2) so as to control an amount of flow of the process gas supplied to the process chamber (2) based on a result of the detection. A source gas is purged by the inert gas. By maintaining the amount of flow of the source gas constant and controlling the amount of flow of the inert gas, an amount of flow the entire process gas is controlled so as to maintain a pressure in the process chamber (2) constant. Since a time spent on evacuation of the source gas is reduced, a time for switching the source gas is reduced. Additionally, a temperature of a surface of a substrate during processing can be maintained constant.
摘要翻译：在处理装置中，提供包括源气体（TiCl 4，NH 3）和惰性气体（N 2）的工艺气体进入处理室（2）。压力计（6）检测处理室（2）中的压力，以便根据检测结果控制供给处理室（2）的处理气体的流量。源气体被惰性气体吹扫。通过保持源气体的流量恒定并控制惰性气体的流量，控制整个处理气体的流量，以保持处理室（2）中的压力恒定。由于减少了用于排出源气体的时间，因此减少了源气体的切换时间。此外，可以保持处理期间的基板表面的温度恒定。

87. 发明申请

US20060027167A1 Processing apparatus and processing method 有权
标题翻译：处理装置及处理方法
公开(公告)号：US20060027167A1
公开(公告)日：2006-02-09
申请号：US11232943
申请日：2005-09-23
申请人： Tadahiro Ishizaka , Naoki Yoshii , Kohei Kawamura , Yukio Fukuda , Takashi Shigeoka , Yasuhiko Kojima , Yasuhiro Oshima , Junichi Arami , Atsushi Gomi
发明人： Tadahiro Ishizaka , Naoki Yoshii , Kohei Kawamura , Yukio Fukuda , Takashi Shigeoka , Yasuhiko Kojima , Yasuhiro Oshima , Junichi Arami , Atsushi Gomi
IPC分类号： C23C16/00
CPC分类号： C23C16/45542 , C23C16/34 , C23C16/452 , C23C16/45561 , Y10T137/86558 , Y10T137/86566 , Y10T137/86638 , Y10T137/86726 , Y10T137/86743 , Y10T137/86751 , Y10T137/86871
摘要： A processing apparatus is disclosed which is capable of switching supplies of a raw material gas and a reducing gas alternately, while continuously forming a plasma of the reducing gas. An excitation device (12) excites a reducing gas supplied thereinto, and the excited reducing gas is supplied into a process chamber (2). A switching mechanism (20) is arranged between the excitation device (12) and the process chamber (2), and a bypass line (22) is connected to the switching mechanism (20). The switching mechanism (20) switches the flow of the excited reducing gas from the excitation device (12) between the process chamber (2) and the bypass line (22).
摘要翻译：公开了能够在连续地形成还原气体的等离子体的同时交替地切换原料气体和还原气体的供给的处理装置。励磁装置（12）激发供给到其中的还原气体，并将被激发的还原气体供给到处理室（2）。在励磁装置（12）和处理室（2）之间设置有切换机构（20），旁通管路（22）与切换机构（20）连接。切换机构（20）切换来自处理室（2）和旁通管线（22）之间的激发装置（12）的被激发的还原气体的流动。

88. 发明申请

US20050241761A1 Substrate processing unit, method of detecting end point of cleaning of substrate processing unit, and method of detecting end point of substrate processing 失效
标题翻译：衬底处理单元，检测衬底处理单元的清洁终点的方法以及检测衬底处理终点的方法
公开(公告)号：US20050241761A1
公开(公告)日：2005-11-03
申请号：US10525797
申请日：2003-08-28
申请人： Hiroshi Kannan , Tadahiro Ishizaka , Yasuhiko Kojima , Yasuhiro Oshima , Takashi Shigeoka
发明人： Hiroshi Kannan , Tadahiro Ishizaka , Yasuhiko Kojima , Yasuhiro Oshima , Takashi Shigeoka
IPC分类号： C23C16/44 , C23C16/52 , H01L21/00 , H01L21/205 , H01L21/66 , B08B7/04 , C23F1/00
CPC分类号： C23C16/4412 , C23C16/4405 , C23C16/52 , H01L21/67028 , H01L21/67253 , H01L22/26
摘要： A substrate processing unit comprises a processing vessel for receiving a substrate, a cleaning gas supply system for supplying cleaning gas to the processing vessel so as to clean the interior of the processing vessel, an exhauster for exhausting the processing vessel, an operating state detector for detecting the operating state of the exhauster, and an end point detector for detecting the end point of the cleaning on the basis of the detection result from the operating state detector.
摘要翻译：基板处理单元包括用于接收基板的处理容器，用于向处理容器提供清洁气体以清洁处理容器内部的清洁气体供应系统，用于排出处理容器的排气器，用于排出处理容器的操作状态检测器检测排气器的运行状态，以及终点检测器，用于根据来自运行状态检测器的检测结果来检测清洗的终点。

89. 发明申请

US20050139234A1 Method of cleaning substrate processing apparatus and computer-readable recording medium 审中-公开
标题翻译：清洗基板处理装置和计算机可读记录介质的方法
公开(公告)号：US20050139234A1
公开(公告)日：2005-06-30
申请号：US11028585
申请日：2005-01-05
申请人： Kazuya Dobashi , Yasuhiro Oshima
发明人： Kazuya Dobashi , Yasuhiro Oshima
IPC分类号： B08B7/00 , C23C16/44
CPC分类号： C23C16/4405 , B08B7/00
摘要： A process chamber having an insulative substance adhering thereto is heated to not lower than 300° C. nor higher than 450° C. and a cleaning gas containing β diketone and one of water and alcohol is supplied into the process chamber. When the cleaning gas supplied into the process chamber adheres to an inner wall of the process chamber and a susceptor to be in contact with the insulative substance, a complex of a substance composing the insulative substance is formed. The complex easily vaporizes owing to a high vapor pressure, to be discharged out of the process chamber by the exhaust of the inside of the process chamber.
摘要翻译：将具有粘附在其上的绝缘物质的处理室加热至不低于300℃，也不高于450℃，并将含有β二酮和水和醇之一的清洁气体供入处理室。当提供给处理室的清洁气体附着到处理室的内壁和与绝缘物质接触的基座时，形成构成绝缘物质的物质的络合物。复合物由于高蒸汽压而容易蒸发，通过处理室内部的排气而排出处理室。

90. 发明授权

US06217303B1 Displacement fluid machine 有权
标题翻译：排液机
公开(公告)号：US06217303B1
公开(公告)日：2001-04-17
申请号：US09611532
申请日：2000-07-06
申请人： Hirokatsu Kohsokabe , Masahiro Takebayashi , Shunichi Mitsuya , Hiroaki Hata , Kenichi Oshima , Yasuhiro Oshima
发明人： Hirokatsu Kohsokabe , Masahiro Takebayashi , Shunichi Mitsuya , Hiroaki Hata , Kenichi Oshima , Yasuhiro Oshima
IPC分类号： F01C104
CPC分类号： F04C18/04 , F01C1/04 , F04C27/008 , F04C29/023
摘要： An orbiting fluid machine has a feature that the speed of sliding movement is low, while vibrations are small, its performance is lowered when the rotational speed becomes high, and this problem is resolved by the following structure. A displacement fluid machine includes a displacer making an orbital motion within a casing into which a working fluid is drawn, thereby drawing and discharging the working fluid, in which an oil retaining mechanism or a seal mechanism is provided at each of opposite end surfaces of the displacer. This results that, axial gaps at the end surfaces of the displacer are effectively sealed so as to reduce a leakage loss, thereby achieving a high performance and a high reliability.
摘要翻译：旋转流体机械具有滑动运动速度低，振动小的特点，在转速变高的情况下，其性能降低，通过以下结构来解决问题。排量流体机械包括在壳体内进行轨道运动的置换器，工作流体被拉入其中，从而拉出和排出工作流体，其中在每个相对端面处设置有油保持机构或密封机构置换器这样就可以有效地密封置换器端面的轴向间隙，以减少泄漏损失，从而实现高性能和高可靠性。

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