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    • 86. 发明授权
    • Convergence correction apparatus
    • 收敛校正装置
    • US4704564A
    • 1987-11-03
    • US889331
    • 1986-07-23
    • Masaaki ItoToshio Kobayashi
    • Masaaki ItoToshio Kobayashi
    • H04N9/28H01J29/70H01J29/76
    • H01J29/705H01J2229/5687
    • A convergence correction apparatus comprises a pair of horizontal deflecting coils and a pair of vertical deflecting coils constituting a deflection yoke of a self-convergence system color picture tube, saturable reactors for correcting convergence error in horizontal lines by varying a distribution of a horizontal deflection magnetic field with time, auxiliary control coils coupled to the vertical deflecting coils and wound of the saturable reactors for varying inductances of coils of the saturable reactors by auxiliary control magnetic fields generated by the auxiliary control coils, and a correcting circuit for supplying to the auxiliary control coils a current which has a waveform other than a sawtooth waveform and has a period equal to the vertical deflection period, and for non-linearly varying magnitudes of the auxiliary magnetic fields generated thereby.
    • 会聚校正装置包括一对水平偏转线圈和一对构成自会聚系统彩色显象管的偏转线圈的垂直偏转线圈,用于通过改变水平偏转磁体的分布来校正水平线中的会聚误差的可饱和电抗器 具有时间的辅助控制线圈,耦合到垂直偏转线圈和可饱和电抗器的绕组,用于通过由辅助控制线圈产生的辅助控制磁场来改变可饱和电抗器的线圈的电感;以及校正电路,用于向辅助控制器 对具有不同于锯齿波形的波形的电流进行线圈化,并具有与垂直偏转周期相等的周期,以及由此产生的辅助磁场的非线性变化幅度。
    • 90. 发明授权
    • Inspection apparatus
    • 检验仪器
    • US08542354B2
    • 2013-09-24
    • US12361954
    • 2009-01-29
    • Masaaki ItoMinori NoguchiShigeru Matsui
    • Masaaki ItoMinori NoguchiShigeru Matsui
    • G01N21/00
    • G01N21/9501G01N21/95623G01N2021/8822G06K9/74
    • The present invention provides an inspection apparatus having a high throughput and high sensitivity with respect to a number of various manufacturing processes and defects of interest in inspection of a specimen such as a semiconductor wafer on which a pattern is formed. The apparatus illuminates with light the specimen having the pattern formed thereon, forms an image of the specimen on an image sensor through a reflective optics, and determines the existence/nonexistence of a defect. The reflective optics has a conjugate pair of Fourier transform optics. An aberration of the reflective optics is corrected off-axis. The reflective optics has a field of view in non-straight-line slit form on the specimen surface. Also, the optics is of a reflection type, includes a conjugate pair of Fourier transform optics and has a field of view in non-straight-line slit form. An optimum wavelength band is selected according to the specimen (FIG. 1).
    • 本发明提供了一种检测装置,其相对于在其上形成有图案的半导体晶片的样本的检查中的多种制造工艺和多个不同的制造工艺和缺陷而具有高生产率和高灵敏度。 该装置用光照射具有形成在其上的图案的样本,通过反射光学元件在图像传感器上形成样本的图像,并且确定缺陷的存在/不存在。 反射光学器件具有傅立叶变换光学器件的共轭对。 反射光学器件的像差被偏离校正。 反射光学元件在样品表面上具有非直线狭缝形式的视场。 此外,光学器件是反射型的,包括傅立叶变换光学器件的共轭对,并且具有非直线狭缝形式的视场。 根据样品选择最佳波长带(图1)。