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    • 78. 发明申请
    • ULTRAVIOLET-RESISTANT MATERIALS AND DEVICES AND SYSTEMS INCLUDING SAME
    • 耐紫外线材料和包括其的器件和系统
    • US20100275845A1
    • 2010-11-04
    • US12048117
    • 2008-03-13
    • Yasuo Kogure
    • Yasuo Kogure
    • B65D25/54B32B19/02B32B5/16C23C16/48C09D1/00C08K3/34G02B13/14G21K5/02
    • C23C16/488C23C16/4409H01L21/67115
    • UV-resistant materials are disclosed that include at least one self-supporting film of UV-resistant clay particles and that are substantially non-reactive to incident UV radiation. An exemplary material is substantially non-transmissive to at least one UV wavelength of less than 300 nm, can include a polymeric material for enhanced flexibility, and can include an additive that is non-transmissive to at least one UV wavelength of greater than 300 nm. The material can be multiple layers of respective clay films. The materials can be used to form UV-resistant devices such as seals, mounting cushions, and light-shields for use in any of various UV-illumination sources and process systems. An example UV-illumination source is an excimer laser. An example system is a light-CVD system.
    • 公开了抗紫外线材料,其包括至少一种耐紫外线粘土颗粒的自支撑膜,并且基本上对入射的紫外线辐射无反应性。 示例性材料对于小于300nm的至少一个UV波长基本上是不透射的,可以包括用于增强柔性的聚合材料,并且可以包括对至少一个大于300nm的UV波长是不透射的添加剂 。 该材料可以是多层各自的粘土膜。 这些材料可用于形成用于各种UV照明源和工艺系统中的任何一种的耐紫外线装置,例如密封件,安装垫和遮光罩。 示例性UV照明源是准分子激光器。 示例系统是光CVD系统。