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71. 发明授权

US5961674A Abrasive article containing an inorganic metal orthophosphate 失效
标题翻译：含有无机金属正磷酸盐的研磨制品
公开(公告)号：US5961674A
公开(公告)日：1999-10-05
申请号：US942731
申请日：1997-10-02
申请人： John J. Gagliardi , Charles H. Houck
发明人： John J. Gagliardi , Charles H. Houck
IPC分类号： B24D3/00 , B24D3/34 , B24D11/00 , B24D11/04 , B24D11/02 , B32B5/16
CPC分类号： B24D3/004 , B24D11/001 , B24D11/04 , B24D3/344 , Y10T428/258 , Y10T428/31511 , Y10T428/31942 , Y10T428/31946
摘要： An abrasive article, and methods of making and using same, containing an inorganic metal orthophosphate salt. The abrasive article including a coated abrasive article having a size or supersize coating layer containing an alkali metal or alkaline earth metal orthophosphate salt devoid of hydrogen. The inventive abrasive article reduces the grinding energy required while improving abrading efficiency in some cases.
摘要翻译：含有无机金属正磷酸盐的磨料制品及其制造和使用方法。磨料制品包括具有尺寸或超大涂层的涂覆的磨料制品，其含有不含氢的碱金属或碱土金属正磷酸盐。在一些情况下，本发明的磨料制品降低了所需的磨削能量，同时提高了研磨效率。

72. 发明授权

US5295332A Perforated strip abrading element and abrading tool and method using such strip element 失效
标题翻译：穿孔带研磨元件和研磨工具以及使用这种带状元件的方法
公开(公告)号：US5295332A
公开(公告)日：1994-03-22
申请号：US908981
申请日：1992-08-14
申请人： James B. Tyler , Alfred F. Scheider , R. Brown Warner
发明人： James B. Tyler , Alfred F. Scheider , R. Brown Warner
IPC分类号： B24D13/06 , B24D11/04
CPC分类号： B24D13/06
摘要： An extruded plastic strip contains abrasive grains or minerals embedded homogeneously therein throughout is scored along the machine or extrusion axis direction, such scoring including elliptical or pointed perforations with the long axis or generally pointed ends aligned with the scoring and parallel to the machine or extrusion axis. The preferred plastic material is a 612 nylon, although other plastics may be employed. The material is heat workable, yet relatively stiff and can be used to form a wide variety of power driven abrasive tools such as shown in applicant's prior application Ser. No. 07/471,385 filed Jan. 29, 1990 entitled "Abrasive Tool and Method of Making", now U.S. Pat. No. 5,155,945. The present application also discloses a rotary wheel type tool utilizing the perforated strip, and a method of making that tool using a gel type cyanoacrylate as an adhesive. With the strip of the present invention, rotary wheel tools as well as many other tools can economically be produced. In tool use, the strip fractures along the scoring and perforations to provide a tool having closely packed individual rectangular fingers, each with a major flat side facing the direction of rotation.
摘要翻译：挤出的塑料条含有沿着机器或挤出轴线方向被均匀地嵌入的磨料颗粒或矿物，其中包括椭圆形或尖锐的穿孔，其中长轴线或大致尖端与刻痕对齐并平行于机器或挤出轴线。优选的塑料材料是612尼龙，尽管可以使用其它塑料。该材料是热可加工的，但相对较硬，并且可用于形成各种动力驱动的研磨工具，如申请人先前申请的Ser。 1990年1月29日提交的题为“Abrasive Tool and Method of Making”的美国专利No.07 / 471,385，现为美国专利第5,155,945号。本申请还公开了利用穿孔带的旋转轮式工具，以及使用凝胶型氰基丙烯酸酯作为粘合剂制造该工具的方法。利用本发明的条带，可以经济地生产旋转轮工具以及许多其他工具。在工具使用中，钢带沿着刻痕和穿孔断裂，以提供具有紧密包装的单个矩形手指的工具，每个具有面向旋转方向的主平面。

73. 发明授权

US11878388B2 Polishing pad, polishing apparatus and method of manufacturing semiconductor package using the same 有权
公开(公告)号：US11878388B2
公开(公告)日：2024-01-23
申请号：US16009226
申请日：2018-06-15
申请人： Taiwan Semiconductor Manufacturing Co., Ltd.
发明人： Kuan-Cheng Wang , Ching-Hua Hsieh , Yi-Yang Lei
IPC分类号： B24B37/26 , B24B37/16 , B24D11/04 , B24B37/22 , B24B37/24 , B24B7/22 , H01L21/321 , H01L23/00 , H01L21/48 , H01L21/687 , B24D13/14
CPC分类号： B24B37/22 , B24B7/228 , B24B37/245 , B24B37/26 , B24D11/04 , B24D13/142 , H01L21/3212 , H01L21/486 , H01L21/68764 , H01L24/08 , H01L2224/02372
摘要： A polishing pad, a polishing apparatus and a method of manufacturing a semiconductor package using the same are provided. In some embodiments, a polishing pad includes a sub-pad portion and a top pad portion over the sub-pad portion. The top pad portion includes a plurality of grooves having a first width and a plurality of openings having a second width different from the first width, and the openings are located in a center zone of the polishing pad.

74. 发明授权

US11471999B2 Integrated abrasive polishing pads and manufacturing methods 有权
公开(公告)号：US11471999B2
公开(公告)日：2022-10-18
申请号：US16042016
申请日：2018-07-23
申请人： Applied Materials, Inc.
发明人： Ashavani Kumar , Ashwin Chockalingam , Sivapackia Ganapathiappan , Rajeev Bajaj , Boyi Fu , Daniel Redfield , Nag B. Patibandla , Mario Dagio Cornejo , Amritanshu Sinha , Yan Zhao , Ranga Rao Arnepalli , Fred C. Redeker
IPC分类号： B24B37/24 , B24D11/04 , B24B37/26 , B24D18/00 , B24B37/16 , B24B37/20 , B33Y80/00 , B33Y10/00 , B29C64/112 , B33Y30/00 , H01L21/306
摘要： Embodiments described herein relate to integrated abrasive (IA) polishing pads, and methods of manufacturing IA polishing pads using, at least in part, surface functionalized abrasive particles in an additive manufacturing process, such as a 3D inkjet printing process. In one embodiment, a method of forming a polishing article includes dispensing a first plurality of droplets of a first precursor, curing the first plurality of droplets to form a first layer comprising a portion of a sub-polishing element, dispensing a second plurality of droplets of the first precursor and a second precursor onto the first layer, and curing the second plurality of droplets to form a second layer comprising portions of the sub-polishing element and portions of a plurality of polishing elements. Here, the second precursor includes functionalized abrasive particles having a polymerizable group chemically bonded to surfaces thereof.

75. 发明授权

US11040430B2 Texture pattern for abrasive tool 有权
公开(公告)号：US11040430B2
公开(公告)日：2021-06-22
申请号：US15443716
申请日：2017-02-27
申请人： Charles Neff
发明人： Charles Neff
IPC分类号： B24D5/14 , B24D11/04 , B24D18/00 , B24B5/04 , B41N3/04
摘要： The present disclosure relates to abrasives surfaces located on an outer diameter of a grinding wheel to provide grinding characteristics of both coarse and fine abrasive textures. The grinding wheel has a coarse abrasive portion located at one disclosure uses a transition band formed at an interface between the abrasive surfaces, that has an abrasive coating with a gradual change in texture from a coarse surface to a fine surface.

76. 发明授权

US11040429B2 Abrasive rotary tool with abrasive agglomerates 有权
公开(公告)号：US11040429B2
公开(公告)日：2021-06-22
申请号：US15758371
申请日：2016-09-06
申请人： 3M INNOVATIVE PROPERTIES COMPANY
发明人： Bruce A. Sventek , David G. Baird , Adam J. Painter , Tammy J. Engfer , Dennis J. Stapleton , John J. Gagliardi
IPC分类号： B24D3/10 , B24D3/18 , B24D11/02 , B24D3/28 , B24D11/04 , B24D13/12 , B24D13/14 , B24B5/313 , B24B5/48 , B24B9/06 , B24B9/10
摘要： An abrasive rotary tool includes a tool shank defining an axis of rotation for the rotary tool, and an abrasive external working surface. The abrasive external working surface includes a resin, and a plurality of porous ceramic abrasive composites dispersed in the resin, the porous ceramic abrasive composites including individual abrasive particles dispersed in a porous ceramic matrix. At least a portion of the porous ceramic matrix comprises glassy ceramic material. A ratio of the average porous ceramic abrasive composite size to the average individual abrasive particle size is no greater than 15 to 1.

77. 发明申请

US20210107116A1 POLISHING PADS PRODUCED BY AN ADDITIVE MANUFACTURING PROCESS 有权
公开(公告)号：US20210107116A1
公开(公告)日：2021-04-15
申请号：US17114633
申请日：2020-12-08
申请人： Applied Materials, Inc.
发明人： Rajeev BAJAJ , Daniel REDFIELD , Mahendra C. ORILALL , Boyi FU , Aniruddh Jagdish KHANNA , Jason G. FUNG , Ashwin CHOCKALINGAM , Mayu YAMAMURA , Veera Raghava Reddy KAKIREDDY , Gregory E. MENK , Nag B. PATIBANDLA
IPC分类号： B24D11/00 , B24B37/22 , B24B37/24 , B24B37/26 , B24D11/04 , B24D3/28
摘要： Embodiments of the present disclosure relate to advanced polishing pads with tunable chemical, material and structural properties, and new methods of manufacturing the same. According to one or more embodiments of the disclosure, it has been discovered that a polishing pad with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing process. Embodiments of the present disclosure thus may provide an advanced polishing pad that has discrete features and geometries, formed from at least two different materials that include functional polymers, functional oligomers, reactive diluents, and curing agents. For example, the advanced polishing pad may be formed from a plurality of polymeric layers, by the automated sequential deposition of at least one resin precursor composition followed by at least one curing step, wherein each layer may represent at least one polymer composition, and/or regions of different compositions.

78. 发明申请

US20200262031A1 ABRASIVE PARTICLES HAVING PARTICULAR SHAPES AND METHODS OF FORMING SUCH PARTICLES 审中-公开
公开(公告)号：US20200262031A1
公开(公告)日：2020-08-20
申请号：US16859336
申请日：2020-04-27
申请人： SAINT-GOBAIN ABRASIVES, INC. , SAINT-GOBAIN ABRASIFS
发明人： Anuj SETH , Darrell K. Everts , Vivek Cheruvari Kottieth Raman
IPC分类号： B24D18/00 , B24D11/04 , B24D3/00
摘要： A coated abrasive article comprising a backing, an adhesive layer disposed in a discontinuous distribution on at least a portion of the backing, wherein the discontinuous distribution comprises a plurality of adhesive contact regions and at least one shaped abrasive particle is disposed on a majority of each of the discrete adhesive contact regions, wherein at least 50% of the shaped abrasive particles comprise a predetermined side orientation and have a tilt angle of at least 45 degrees, wherein the shaped abrasive particles comprise a polycrystalline material and are free of binder, wherein the first plurality of discrete adhesive contact regions comprise a predetermined two-dimensional shape as viewed from above, and wherein each of the discrete contact regions comprises a length, a width, or a combination thereof that substantially corresponds to a dimension of the at least one abrasive particle.

79. 发明申请

US20190217442A1 ABRASIVE PARTICLES HAVING PARTICULAR SHAPES AND METHODS OF FORMING SUCH PARTICLES 审中-公开
公开(公告)号：US20190217442A1
公开(公告)日：2019-07-18
申请号：US16359370
申请日：2019-03-20
申请人： Saint-Gobain Abrasives, Inc. , Saint-Gobain Abrasifs
发明人： Anthony C. GAETA , Anuj SETH , Christopher ARCONA , Doruk O. YENER , Jennifer H. CZEREPINSKI , Sujatha K. IYENGAR , Frank J. CSILLAG , William C. RICE , Satyalakshmi K. RAMESH , Gregory G. LAFOND , Sidath S. WIJESOORIYA , Adam D. LIOR , Alan J. BRANDES , Anil PARMAR , Paul BRAUN , Darrell K. EVERTS
IPC分类号： B24D3/00 , B24D11/04 , B24D18/00 , B24D7/02 , C09K3/14
CPC分类号： B24D3/001 , B24D7/02 , B24D11/04 , B24D18/00 , B24D18/0072 , B24D2203/00 , C09K3/1409 , Y10T428/24 , Y10T428/24372 , Y10T428/24893 , Y10T428/25
摘要： An abrasive article comprising a first group including a plurality of shaped abrasive particles overlying a backing, wherein the plurality of shaped abrasive particles of the first group define a first non-shadowing distribution relative to each other.

80. 发明授权

US10220487B2 Customized polishing pads for CMP and methods of fabrication and use thereof 有权
公开(公告)号：US10220487B2
公开(公告)日：2019-03-05
申请号：US15042777
申请日：2016-02-12
申请人： NexPlanar Corporation
发明人： Pradip K. Roy , Manish Deopura , Sudhanshu Misra
IPC分类号： C09K3/14 , B24B37/26 , B24D7/14 , B24D11/04 , B24D3/00 , B24D11/00 , B24D18/00
摘要： The present application relates to polishing pads for chemical mechanical planarization (CMP) of substrates, and methods of fabrication and use thereof. The pads described in this invention are customized to polishing specifications where specifications include (but not limited to) to the material being polished, chip design and architecture, chip density and pattern density, equipment platform and type of slurry used. These pads can be designed with a specialized polymeric nano-structure with a long or short range order which allows for molecular level tuning achieving superior thermo-mechanical characteristics. More particularly, the pads can be designed and fabricated so that there is both uniform and nonuniform spatial distribution of chemical and physical properties within the pads. In addition, these pads can be designed to tune the coefficient of friction by surface engineering, through the addition of solid lubricants, and creating low shear integral pads having multiple layers of polymeric material which form an interface parallel to the polishing surface. The pads can also have controlled porosity, embedded abrasive, novel grooves on the polishing surface, for slurry transport, which are produced in situ, and a transparent region for endpoint detection.

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