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    • 71. 发明申请
    • METHOD OF MANUFACTURING SILICON CARBIDE SINGLE CRYSTAL
    • 制造单晶碳化硅的方法
    • US20160122902A1
    • 2016-05-05
    • US14804438
    • 2015-07-21
    • SUMITOMO ELECTRIC INDUSTRIES, LTD.
    • Shin HARADATsutomu HORI
    • C30B23/06C30B29/36
    • C30B23/066C30B29/36
    • A crucible having a top surface, a bottom surface opposite to the top surface, and a tubular side surface located between the top surface and the bottom surface, a resistive heater provided outside of the crucible and made of carbon, a source material provided in the crucible, and a seed crystal provided to face the source material in the crucible are prepared. A silicon carbide single crystal is grown on the seed crystal by sublimating the source material with the resistive heater. In the step of growing a silicon carbide single crystal, a value obtained by dividing a value of a current flowing through the resistive heater by a cross-sectional area of the resistive heater perpendicular to a direction in which the current flows is maintained at 5 A/mm2 or less.
    • 一种具有顶表面,与顶表面相对的底表面和位于顶表面和底表面之间的管状侧表面的坩埚,设置在坩埚外部并由碳制成的电阻加热器,设置在该坩埚中的源材料 坩埚,和准备面对坩埚中的原料的晶种。 通过用电阻加热器升华源材料,在晶种上生长碳化硅单晶。 在生长碳化硅单晶的步骤中,通过将流经电阻加热器的电流值除以与电流流动方向垂直的电阻加热器的横截面面积获得的值保持在5A / mm2以下。