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71. 发明授权

US08553217B2 EUV high throughput inspection system for defect detection on patterned EUV masks, mask blanks, and wafers 有权
标题翻译： EUV高通量检测系统，用于在图案化的EUV掩模，掩模毛坯和晶片上进行缺陷检测
公开(公告)号：US08553217B2
公开(公告)日：2013-10-08
申请号：US12812950
申请日：2010-06-18
申请人： Yung-Ho Chuang , Richard W. Solarz , David R. Shafer , Bin-Ming Benjamin Tsai , David L. Brown
发明人： Yung-Ho Chuang , Richard W. Solarz , David R. Shafer , Bin-Ming Benjamin Tsai , David L. Brown
IPC分类号： G01N21/00
CPC分类号： G01N21/95 , G01N21/8806 , G01N21/9501 , G01N21/956 , G01N2021/95676 , G01N2201/068 , G03F1/84 , G03F7/70616 , H05G2/008
摘要： Inspection of EUV patterned masks, blank masks, and patterned wafers generated by EUV patterned masks requires high magnification and a large field of view at the image plane. An EUV inspection system can include a light source directed to an inspected surface, a detector for detecting light deflected from the inspected surface, and an optic configuration for directing the light from the inspected surface to the detector. In particular, the detector can include a plurality of sensor modules. Additionally, the optic configuration can include a plurality of mirrors that provide magnification of at least 100× within an optical path less than 5 meters long. In one embodiment, the optical path is approximately 2-3 meters long.
摘要翻译：对EUV图案化掩模，空白掩模和由EUV图案化掩模生成的图案化晶片的检查需要高倍率和在图像平面上的大视场。 EUV检查系统可以包括指向检查表面的光源，用于检测从被检查表面偏转的光的检测器和用于将来自被检查表面的光引导到检测器的光学配置。特别地，检测器可以包括多个传感器模块。另外，光学配置可以包括在小于5米长的光路内提供至少100倍的放大倍数的多个反射镜。在一个实施例中，光路大约2-3米长。

72. 发明授权

US07672043B2 Catadioptric imaging system exhibiting enhanced deep ultraviolet spectral bandwidth 有权
标题翻译：反射折射成像系统表现出增强的深紫外光谱带宽
公开(公告)号：US07672043B2
公开(公告)日：2010-03-02
申请号：US10903494
申请日：2004-07-29
申请人： J. Joseph Armstrong , Yung-Ho Chuang , David R. Shafer
发明人： J. Joseph Armstrong , Yung-Ho Chuang , David R. Shafer
IPC分类号： G02B5/08
CPC分类号： G03F7/70225 , G02B17/0808 , G02B17/0812 , G02B17/0856 , G02B17/0892 , G02B21/02 , G03F7/70341
摘要： A relatively high spectral bandwidth objective employed for use in imaging a specimen and method for imaging a specimen is provided. The objective includes a lens group having at least one focusing lens configured to receive light energy and form an intermediate image, at least one field lens oriented to receive the intermediate image and provide intermediate light energy, and a Mangin mirror arrangement positioned to receive the intermediate light energy and apply light energy to the specimen. The objective may provide, in certain instances, a spectral bandwidth up to approximately 193 to 266 nanometers and can provide numerical apertures in excess of 0.9. Elements are less than 100 millimeters in diameter and may fit within a standard microscope. The field lens may include more than one lens and may be formed of a material different from at least one other lens in the objective.
摘要翻译：提供了用于成像试样的相对高的光谱带宽目标和用于成像试样的方法。该目的包括具有至少一个聚焦透镜的透镜组，该至少一个聚焦透镜被配置为接收光能并形成中间图像，定向成接收中间图像并提供中间光能的至少一个场透镜，以及定位成接收中间图像的中间图像光能并向样品施加光能。在某些情况下，目标可以提供高达约193至266纳米的光谱带宽，并且可以提供超过0.9的数值孔径。元素的直径小于100毫米，并且可以适合标准显微镜。场透镜可以包括多于一个透镜，并且可以由与物镜中的至少一个其它透镜不同的材料形成。

73. 发明授权

US07646533B2 Small ultra-high NA catadioptric objective 有权
标题翻译：小超高NA反射折射目标
公开(公告)号：US07646533B2
公开(公告)日：2010-01-12
申请号：US11093850
申请日：2005-03-29
申请人： Yung-Ho Chuang , David R. Shafer , J. Joseph Armstrong
发明人： Yung-Ho Chuang , David R. Shafer , J. Joseph Armstrong
IPC分类号： G02B17/00
CPC分类号： G02B17/0892 , G02B17/0812 , G02B17/0856 , G02B21/02 , G02B21/04 , G03F7/70225 , G03F7/70275 , G03F7/70341
摘要： A relatively high spectral bandwidth objective employed for use in imaging a specimen and method for imaging a specimen is provided. The objective includes a lens group having at least one focusing lens configured to receive light energy and form focused light energy. The focused light energy forms an intermediate image. The objective further includes at least one field lens located in proximity to an intermediate image, and a catadioptric arrangement positioned to receive the intermediate light energy from the at and form controlled light energy. The catadioptric arrangement may include at least one Mangin element and can include a meniscus lens element.
摘要翻译：提供了用于成像试样的相对高的光谱带宽目标和用于成像试样的方法。该目的包括透镜组，其具有被配置为接收光能并形成聚焦光能的至少一个聚焦透镜。聚焦光能形成中间图像。该目的还包括位于中间图像附近的至少一个场透镜，以及定位用于从中接收中间光能并形成受控光能的反射折射装置。折反射装置可以包括至少一个Mangin元件并且可以包括弯月形透镜元件。

74. 发明申请

US20090080065A1 Ultra-broadband UV microscope imaging system with wide range zoom capability 有权
公开(公告)号：US20090080065A1
公开(公告)日：2009-03-26
申请号：US12231693
申请日：2008-09-05
申请人： David R. Shafer , Yung-Ho Chuang , Bin-Ming B. Tsai
发明人： David R. Shafer , Yung-Ho Chuang , Bin-Ming B. Tsai
IPC分类号： G02B17/08 , G02B13/14 , G02B15/14
CPC分类号： G02B17/0896 , G02B17/023 , G02B17/0808 , G02B17/0812 , G02B17/0856 , G02B17/086 , G02B17/0892 , G02B21/16 , G03F1/84 , G03F7/70225 , G03F7/70275 , G03F7/70616 , G03F7/7065
摘要： An ultra-broadband ultraviolet (UV) catadioptric imaging microscope system with wide-range zoom capability. The microscope system, which comprises a catadioptric lens group and a zooming tube lens group, has high optical resolution in the deep UV wavelengths, continuously adjustable magnification, and a high numerical aperture. The system integrates microscope modules such as objectives, tube lenses and zoom optics to reduce the number of components, and to simplify the system manufacturing process. The preferred embodiment offers excellent image quality across a very broad deep ultraviolet spectral range, combined with an all-refractive zooming tube lens. The zooming tube lens is modified to compensate for higher-order chromatic aberrations that would normally limit performance.

75. 发明授权

US07474461B2 Broad band objective having improved lateral color performance 有权
标题翻译：具有改进的侧面颜色性能的宽带物镜
公开(公告)号：US07474461B2
公开(公告)日：2009-01-06
申请号：US11825405
申请日：2007-07-05
申请人： Yung-Ho Chuang , David R. Shafer , J. Joseph Armstrong
发明人： Yung-Ho Chuang , David R. Shafer , J. Joseph Armstrong
IPC分类号： G02B3/00
CPC分类号： G02B27/0025 , G01N21/8806 , G02B21/02
摘要： A system and method for inspection is disclosed. The design generally employs as many as four design principles, including employing at least one lens from a relatively low dispersion glass, at least one additional lens from an additional material different from the relatively low dispersion glass, generally matching the relatively low dispersion properties of the relatively low dispersion glass. The design also may include at least one further lens from a further material different from and exhibiting a significantly different dispersion power from the relatively low dispersion glass and the additional material. Finally, the design may include lenses positioned to insert a significant amount of color within the objective, a gap, and additional lenses, the gap and additional lenses serving to cancel the color inserted.
摘要翻译：公开了一种用于检查的系统和方法。该设计通常采用多达四个设计原理，包括使用来自相对低色散玻璃的至少一个透镜，来自不同于相对低色散玻璃的附加材料的至少一个附加透镜，通常匹配相对低色散玻璃的相对低的色散特性相对较低的分散玻璃。该设计还可以包括来自与相对低的分散玻璃和附加材料不同并表现出显着不同的色散功率的另外材料的至少一个另外的透镜。最后，设计可以包括定位成在物镜内插入大量颜色的透镜，间隙和附加透镜，间隙和附加透镜用于抵消所插入的颜色。

76. 发明授权

US06483638B1 Ultra-broadband UV microscope imaging system with wide range zoom capability 有权
标题翻译：超宽带紫外显微镜成像系统具有广泛的变焦能力
公开(公告)号：US06483638B1
公开(公告)日：2002-11-19
申请号：US09571109
申请日：2000-05-15
申请人： David R. Shafer , Yung-Ho Chuang , Bin-Ming B. Tsai
发明人： David R. Shafer , Yung-Ho Chuang , Bin-Ming B. Tsai
IPC分类号： G02B1708
CPC分类号： G02B17/0896 , G02B17/023 , G02B17/0808 , G02B17/0812 , G02B17/0856 , G02B17/086 , G02B17/0892 , G02B21/16 , G03F1/84 , G03F7/70225 , G03F7/70275 , G03F7/70616 , G03F7/7065
摘要： An ultra-broadband ultraviolet (UV) catadioptric imaging microscope system with wide-range zoom capability. The microscope system, which comprises a catadioptric lens group and a zooming tube lens group, has high optical resolution in the deep UV wavelengths, continuously adjustable magnification, and a high numerical aperture. The system integrates microscope modules such as objectives, tube lenses and zoom optics to reduce the number of components, and to simplify the system manufacturing process. The preferred embodiment offers excellent image quality across a very broad deep ultraviolet spectral range, combined with an all-refractive zooming tube lens. The zooming tube lens is modified to compensate for higher-order chromatic aberrations that would normally limit performance.
摘要翻译：超宽带紫外（UV）反折射成像显微镜系统，具有广泛的变焦能力。包括反射折射透镜组和变焦管透镜组的显微镜系统在深UV波长，连续可调放大倍数和高数值孔径中具有高的光学分辨率。该系统集成了诸如目标，管镜和变焦光学的显微镜模块，以减少部件数量，并简化系统制造过程。优选实施例在非常广泛的深紫外光谱范围内提供优异的图像质量，与全折射变焦管透镜组合。变焦管镜头被修改以补偿通常会限制性能的高阶色差。

77. 发明授权

US5973826A Reflective optical imaging system with balanced distortion 失效
标题翻译：具有平衡失真的反射光学成像系统
公开(公告)号：US5973826A
公开(公告)日：1999-10-26
申请号：US27281
申请日：1998-02-20
申请人： Henry N. Chapman , Russell M. Hudyma , David R. Shafer , Donald W. Sweeney
发明人： Henry N. Chapman , Russell M. Hudyma , David R. Shafer , Donald W. Sweeney
IPC分类号： G02B17/06 , G03F7/20 , G02B13/14
CPC分类号： G03F7/70233 , G02B17/0657 , G02B13/22
摘要： An optical system compatible with short wavelength (extreme ultraviolet) An optical system compatible with short wavelength (extreme ultraviolet) radiation comprising four reflective elements for projecting a mask image onto a substrate. The four optical elements comprise, in order from object to image, convex, concave, convex and concave mirrors. The optical system is particularly suited for step and scan lithography methods. The invention enables the use of larger slit dimensions associated with ring field scanning optics, improves wafer throughput and allows higher semiconductor device density. The inventive optical system is characterized by reduced dynamic distortion because the static distortion is balanced across the slit width.
摘要翻译：与短波长（极紫外）兼容的光学系统与短波长（极紫外）辐射兼容的光学系统包括用于将掩模图像投影到基板上的四个反射元件。四个光学元件按照从物体到图像的顺序包括凸形，凹形，凸形和凹面镜。光学系统特别适用于步进和扫描光刻方法。本发明使得能够使用与环形场扫描光学元件相关联的更大的狭缝尺寸，提高晶片生产量并允许更高的半导体器件密度。本发明的光学系统的特征在于减小动态失真，因为静态失真在狭缝宽度上是平衡的。

78. 发明授权

US5410434A Reflective projection system comprising four spherical mirrors 失效
标题翻译：反射投影系统包括四个球面镜
公开(公告)号：US5410434A
公开(公告)日：1995-04-25
申请号：US118303
申请日：1993-09-09
申请人： David R. Shafer
发明人： David R. Shafer
IPC分类号： G02B17/06 , G03F7/20 , G02B5/08
CPC分类号： G03F7/70233 , G02B17/0657
摘要： The reflective projection system has a relatively wide field of view that comprises two concave and two convex spherical mirrors, situated in certain non-light-blocking positions with respect to one another, for deriving, with negligible image aberrations, a projected magnified or demagnified image over at least one of a range of magnification or demagnification power values between 3 and infinity that may be zoomed over this range. Such a reflective projection system, utilizing a high-power excimer laser radiation source, may be employed for ablating the surface of a substrate, such as the surface of the coating of a coated wafer, with a demagnified image of an object pattern defined by a mask, the radiation intensity of the demagnified image being sufficiently high to effect this ablation.
摘要翻译：反射投影系统具有相对较宽的视野，其包括两个相对于彼此位于某些非遮光位置的凹形和两个凸球面镜，用于以可忽略的图像像差导出投影的放大或缩小的图像在可以在该范围上放大的3和无穷大之间的放大或缩小功率值范围中的至少一个。可以采用利用大功率准分子激光辐射源的这种反射投影系统，以消除基底的表面，例如涂覆晶片的涂层的表面，其具有由掩模，放大图像的辐射强度足够高以实现该消融。

79. 发明授权

US5353322A Lens system for X-ray projection lithography camera 失效
标题翻译： X射线投影光刻相机镜头系统
公开(公告)号：US5353322A
公开(公告)日：1994-10-04
申请号：US65116
申请日：1993-05-20
申请人： John H. Bruning , Anthony R. Phillips, Jr. , David R. Shafer , Alan D. White
发明人： John H. Bruning , Anthony R. Phillips, Jr. , David R. Shafer , Alan D. White
IPC分类号： G03F7/20 , G21K5/00
CPC分类号： G03F7/70233
摘要： Optimum solutions for three-mirror lenses for projection lithography cameras using X-ray radiation to image a mask on a wafer are represented as single points within regions of two-dimensional magnification space defined by the magnification of a convex mirror as one coordinate and the ratio of the magnifications of a pair of concave mirrors optically on opposite sides of the convex mirror as another coordinate. Lenses within region 30, 50, and preferably within region 40, 60, of such magnification space represent potential solutions that are optimizable by standard computer optical design programs and techniques to achieve extremely low distortion lenses having a resolution of about 0.1 micron or less. Two of these lens systems having large chief ray angles at the mask and chief rays inclined away from the optical axis of the lens system in a direction from the source toward the mask are described in more detail.
摘要翻译：用于使用X射线辐射成像晶片上的掩模的投影光刻相机的三镜透镜的最佳解决方案被表示为由作为一个坐标的凸面镜的倍率所限定的二维放大空间的区域内的单个点，一对凹面镜的放大倍率在光学上在凸面镜的相对侧上作为另一坐标。在这种放大空间的区域30,50内，优选在区域40,60内的透镜表示通过标准计算机光学设计程序和技术可优化的潜在解决方案，以实现具有约0.1微米或更小分辨率的极低失真透镜。这些透镜系统中的两个在掩模处具有较大的主光线角度，并且在从光源朝向掩模的方向上远离透镜系统的光轴倾斜的主光线被更详细地描述。

80. 发明授权

US5220590A X-ray projection lithography camera 失效
标题翻译： X光投影光刻相机
公开(公告)号：US5220590A
公开(公告)日：1993-06-15
申请号：US880080
申请日：1992-05-05
申请人： John H. Bruning , Anthony R. Phillips, Jr. , David R. Shafer , Alan D. White
发明人： John H. Bruning , Anthony R. Phillips, Jr. , David R. Shafer , Alan D. White
IPC分类号： G03F7/20
CPC分类号： G03F7/70233
摘要： Optimum solutions for three-mirror lenses for projection lithography cameras using X-ray radiation to image a mask on a wafer are represented as single points within regions of two-dimensional magnification space defined by the magnification of a convex mirror as one coordinate and the ratio of the magnifications of a pair of concave mirrors optically on opposite sides of the convex mirror as another coordinate. Lenses within region 30, 50, and preferably within region 40, 60, of such magnification space represent potential solutions that are optimizable by standard computer optical design programs and techniques to achieve extremely low distortion lenses having a resolution of about 0.1 micron or less.
摘要翻译：用于使用X射线辐射成像晶片上的掩模的投影光刻相机的三镜透镜的最佳解决方案被表示为由作为一个坐标的凸面镜的倍率所限定的二维放大空间的区域内的单个点，一对凹面镜的放大倍率在光学上在凸面镜的相对侧上作为另一坐标。在这种放大空间的区域30,50内，优选在区域40,60内的透镜表示通过标准计算机光学设计程序和技术可优化的潜在解决方案，以实现具有约0.1微米或更小分辨率的极低失真透镜。

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