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    • 73. 发明申请
    • MOLDING METHOD AND MOLDING DEVICE FOR FORMING IMPELLER
    • 用于形成叶轮的成型方法和成型装置
    • US20120104654A1
    • 2012-05-03
    • US13284225
    • 2011-10-28
    • Masami NATSUMETetsuo ShimizuTomoo Sagawa
    • Masami NATSUMETetsuo ShimizuTomoo Sagawa
    • B29C45/40
    • B29C45/4471B29L2031/08
    • A molding method for forming an impeller, includes a mold clamping process having a first mold for forming one side of blades, a second mold firmly clamped with the first mold, and a core arranged at the first mold relative to the blades, the mold clamping process clamping the first mold to the second mold in a state where the core is arranged between the first mold and the second mold, an injecting process injecting resin in a cavity obtained by the mold clamping process, and a mold removing process including the steps of releasing at least the first mold from the clamped state obtained by the mold clamping process to generate an opened portion in the first mold after the resin is hardened, rotating the core about a rotational axis toward the opened portion of the first mold, and separating the core from the resin-molded impeller.
    • 一种用于形成叶轮的成型方法,包括:模具夹紧工艺,其具有用于形成叶片的一侧的第一模具,与第一模具牢固夹紧的第二模具和相对于叶片在第一模具处布置的芯部,模具夹紧 在芯部布置在第一模具和第二模具之间的状态下,将第一模具夹紧到第二模具中,在通过模具夹紧工艺获得的模腔中注入树脂注入工艺,以及脱模工艺,包括以下步骤: 至少将第一模具从通过合模过程获得的夹紧状态释放,以在树脂硬化之后在第一模具中产生开口部分,使芯围绕旋转轴线朝向第一模具的开口部分旋转, 芯从树脂模制叶轮。
    • 74. 发明授权
    • Light source device and projector
    • 光源设备和投影机
    • US08128239B2
    • 2012-03-06
    • US12757188
    • 2010-04-09
    • Tetsuo ShimizuKaname NagataniKunihiko TakagiAkira EgawaYuji TakadoSatoshi Kinoshita
    • Tetsuo ShimizuKaname NagataniKunihiko TakagiAkira EgawaYuji TakadoSatoshi Kinoshita
    • G03B21/28
    • F21V7/0025F21V7/04G03B21/28
    • A light source device includes a light emitting tube having a light emitting section that emits light, a first sealing section on one side of the light emitting section formed integrally with the light emitting section, and a second sealing section on the other side of the light emitting section formed integrally with the light emitting section. A secondary reflecting mirror having a secondary reflecting surface covers part of a periphery of the light emitting section and reflects light emitted from the light emitting section. A primary reflecting mirror having a primary reflecting surface reflects the light emitted from the light emitting section and the light reflected by the secondary reflecting mirror. The secondary reflecting mirror has a first reference plane defined by a first boundary line as a boundary between the light emitting section and the first sealing section, which does not intersect with the secondary reflecting surface.
    • 光源装置包括具有发光部的发光部的发光管,与发光部一体形成的发光部的一侧的第一密封部和光的另一侧的第二密封部 发光部与发光部一体地形成。 具有副反射面的副反射镜覆盖发光部的周边的一部分,并且反射从发光部发射的光。 具有主反射面的主反射镜反射从发光部发射的光和由二次反射镜反射的光。 二次反射镜具有由与第二反射面不相交的第一边界线作为发光部与第一密封部之间的边界的第一基准面。
    • 79. 发明授权
    • Semiconductor fabrication system, and flow rate correction method and program for semiconductor fabrication system
    • 半导体制造系统,半导体制造系统的流量校正方法和程序
    • US07682843B2
    • 2010-03-23
    • US11817104
    • 2006-06-28
    • Shuji MoriyaTsuneyuki OkabeHiroyuki EbiTetsuo ShimizuHitoshi Kitagawa
    • Shuji MoriyaTsuneyuki OkabeHiroyuki EbiTetsuo ShimizuHitoshi Kitagawa
    • H01L21/66
    • G05D7/0658C23C16/455C23C16/45561C23C16/52
    • Zero point shift based on thermal siphon effect occurring actually when a substrate is processed is detected accurately and corrected suitably. The semiconductor fabrication system comprises a gas supply passage (210) for supplying gas into a heat treatment unit (110), an MFC (240) for comparing an output voltage from a detecting unit for detecting the gas flow rate of the gas supply passage with a set voltage corresponding to a preset flow rate and controlling the gas flow rate of the gas supply passage to the set flow rate, and a control unit (300). The control unit replaces gas in the MFC by gas which is to be used at least for processing a substrate before the substrate is processed, detects the output voltage from the MFC under a state where valves (230, 250) provided in the upstream and the downstream of the MFC are closed and stores the detected output voltage in a storage unit, corrects the set voltage corresponding to the flow rate of gas to be used for processing the substrate based on the output voltage from the MFC stored in the storage unit at the time of processing the substrate, and sets the corrected set voltage in the MFC.
    • 基于处理基板时实际发生的热虹吸效应的零点偏移被准确地检测并适当地校正。 半导体制造系统包括用于将气体供给到热处理单元(110)中的气体供给通道(210),MFC(240),用于将用于检测气体供应通道的气体流量的检测单元的输出电压与 与设定的流量对应的设定电压,将气体供给通路的气体流量控制为设定的流量,以及控制单元(300)。 控制单元通过在基板被处理之前至少用于处理基板的气体来替换MFC中的气体,在设置在上游的阀(230,250)的状态下检测来自MFC的输出电压, 关闭MFC的下游并将检测到的输出电压存储在存储单元中,基于来自存储在存储单元中的MFC的输出电压来校正与用于处理衬底的气体的流量对应的设定电压 处理基板的时间,并将校正的设定电压设置在MFC中。
    • 80. 发明授权
    • Curable fluorine-containing polymer, curable resin composition prepared from same and antireflection film
    • 可固化的含氟聚合物,由其制备的可固化树脂组合物和抗反射膜
    • US07670640B2
    • 2010-03-02
    • US11226355
    • 2005-09-15
    • Takayuki ArakiMihoko OhashiYoshito TanakaTetsuo Shimizu
    • Takayuki ArakiMihoko OhashiYoshito TanakaTetsuo Shimizu
    • B05D5/06
    • C09D127/12C08F8/00C08F8/14C08F16/32C08F214/18C08F290/04Y10T428/3154C08F14/18
    • There are provided a curable fluorine-containing polymer which can realize a high hardness by photo-curing while maintaining a low refractive index, an antireflection film possessing improved scratch resistance and abrasion resistance while maintaining a reflection reducing effect, and an antireflection-treated article provided with such an antireflection film. The curable fluorine-containing polymer has a number average molecular weight of from 500 to 1,000,000 and is represented by the formula (1): AM  (1) in which the structural unit M is a structural unit derived from a fluorine-containing ethylenic monomer and represented by the formula (M): wherein X1 and X2 are the same or different and each is H or F; X3 is H, F, CH3 or CF3; X4 and X5 are the same or different and each is H, F or CF3; Rf is an organic group in which 1 to 3 of Y1 (Y1 is a monovalent organic group having 2 to 10 carbon atoms and an ethylenic carbon-carbon double bond at its end) are bonded to a fluorine-containing alkyl group having 1 to 40 carbon atoms or a fluorine-containing alkyl group having 2 to 100 carbon atoms and ether bond; a is 0 or an integer of from 1 to 3; b and c are the same or different and each is 0 or 1, the structural unit A is a structural unit derived from a monomer copolymerizable with the fluorine-containing ethylenic monomer represented by the formula (M), and the structural unit M and the structural unit A are contained in amounts of from 0.1 to 100% by mole and from 0 to 99.9% by mole, respectively.
    • 提供了一种可固化的含氟聚合物,其可以通过光固化同时保持低折射率实现高硬度,在保持反射降低效果的同时具有改善的耐擦伤性和耐磨性的抗反射膜,以及提供的抗反射处理制品 具有这样的抗反射膜。 可固化含氟聚合物的数均分子量为500〜1,000,000,由式(1)表示:AM(1)其中,结构单元M是来自含氟乙烯性单体的结构单元, 由式(M)表示:其中X1和X2相同或不同,各自为H或F; X3是H,F,CH3或CF3; X4和X5相同或不同,分别为H,F或CF 3; Rf为1〜3的Y1(Y1为碳原子数为2〜10的一价有机基团,末端为烯属碳 - 碳双键)的1〜3的有机基团与1〜40的含氟烷基 碳原子或碳原子数2〜100的含氟烷基和醚键; a为0或1〜3的整数; b和c相同或不同,分别为0或1,结构单元A是衍生自与式(M)表示的含氟乙烯性单体共聚的单体的结构单元,结构单元M和 结构单元A的含量分别为0.1至100摩尔%和0至99.9摩尔%。