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71. 发明申请

US20120294421A1 X-RAY IMAGING APPARATUS AND X-RAY IMAGING METHOD 有权
标题翻译： X射线成像装置和X射线成像方法
公开(公告)号：US20120294421A1
公开(公告)日：2012-11-22
申请号：US13522474
申请日：2011-01-27
申请人： Taihei Mukaide , Takashi Noma , Kazunori Fukuda , Masatoshi Watanabe , Kazuhiro Takada
发明人： Taihei Mukaide , Takashi Noma , Kazunori Fukuda , Masatoshi Watanabe , Kazuhiro Takada
IPC分类号： G01T1/36 , G01N23/04
CPC分类号： G01T1/29 , G01N23/04
摘要： An X-ray imaging apparatus acquiring a differential phase contrast image of a test object without using a light-shielding mask for X-ray. The apparatus includes an X-ray source, a splitting element configured to spatially divide an X-ray emitted from an X-ray source and a scintillator configured to emit light when a divided X-ray beam divided at the splitting element is incident on the scintillator. The apparatus also includes a light-transmission limiting unit configured to limit transmitting amount of the light emitted from the scintillator and a plurality of light detectors each configured to detect the amount of light that has transmitted through the light-transmission limiting unit. The light-transmission limiting unit is configured such that a light intensity detected at each of the light detectors changes in response to a change in an incident position of the X-ray beam.
摘要翻译：一种X射线成像装置，在不使用用于X射线的遮光掩模的情况下获取被测物体的差分相位差图像。该装置包括X射线源，分配元件，被配置为空间上划分从X射线源发射的X射线;以及闪烁器，其被配置为当分裂元件分割的分割的X射线束入射到所述X射线源时发光闪烁体。该装置还包括：光限制单元，被配置为限制从闪烁体发射的光的发射量;以及多个光检测器，每个光检测器被配置为检测透射通过光传输限制单元的光量。光传输限制单元被配置为使得在每个光检测器处检测到的光强度响应于X射线束的入射位置的变化而变化。

72. 发明授权

US08214158B2 X-ray imaging apparatus, X-ray imaging method and method of controlling X-ray imaging apparatus 有权
标题翻译： X射线成像装置，X射线成像方法和X射线成像装置的控制方法
公开(公告)号：US08214158B2
公开(公告)日：2012-07-03
申请号：US12526418
申请日：2009-03-11
申请人： Taihei Mukaide , Kazuhiro Takada , Masatoshi Watanabe
发明人： Taihei Mukaide , Kazuhiro Takada , Masatoshi Watanabe
IPC分类号： G01N31/00
CPC分类号： G21K1/10 , A61B6/484 , G01N23/046 , G01N23/06 , G01N23/20 , G01N2223/419 , G21K2207/005
摘要： A simplified X-ray imaging apparatus is capable of computationally determining effective atomic numbers with small error factors even for light elements. In one embodiment, the X-ray imaging apparatus has an X-ray generation unit 101 (400) for generating X-rays and a detector 105 (405) for detecting X-rays transmitted through an object of examination 104 (403). A computing unit 106 (406) computationally determines a quantity of an X-ray phase attributable to the object of examination and an X-ray transmittance of the object of examination from data detected by the detector. The computing unit also computationally determines an effective atomic number of the object of examination from ρet determined from the quantity of the X-ray phase and μt determined from the X-ray transmittance.
摘要翻译：简化的X射线成像装置能够计算确定即使对于轻元素也具有小的误差因子的有效原子数。在一个实施例中，X射线成像装置具有用于产生X射线的X射线产生单元101（400）和用于检测透过检查对象104（403）的X射线的检测器105（405）。计算单元106（406）根据由检测器检测到的数据，计算地确定归因于检查对象的X射线相位的数量和检查对象的X射线透射率。计算单元还根据从X射线相位的量和从X射线透射率确定的μt来确定检查对象的有效原子序数。

73. 外观设计

USD658597S1 Combined switch for working machine 有权
标题翻译：工作机组合开关
公开(公告)号：USD658597S1
公开(公告)日：2012-05-01
申请号：US29387099
申请日：2011-03-09
申请人： Junta Kuwae , Masatoshi Watanabe
设计人： Junta Kuwae , Masatoshi Watanabe

74. 发明申请

US20110168905A1 X-RAY DETECTOR AND METHOD FOR MANUFACTURING THE SAME 有权
标题翻译： X射线探测器及其制造方法
公开(公告)号：US20110168905A1
公开(公告)日：2011-07-14
申请号：US12984515
申请日：2011-01-04
申请人： Hisato Yabuta , Nobuyuki Kaji , Ryo Hayashi , Masatoshi Watanabe , Taihei Mukaide , Kazunori Fukuda
发明人： Hisato Yabuta , Nobuyuki Kaji , Ryo Hayashi , Masatoshi Watanabe , Taihei Mukaide , Kazunori Fukuda
IPC分类号： G01T1/02 , H01L31/18
CPC分类号： G01T1/2928 , H01L31/085
摘要： An X-ray detector includes an X-ray photoelectric conversion layer configured to produce electric charges in proportion to X-ray irradiation incident on the layer, a collecting electrode configured to collect the electric charges produced by the X-ray photoelectric conversion layer, a common electrode disposed on a surface of the X-ray photoelectric conversion layer opposite to the collecting electrode, a storage capacitor configured to store the electric charges collected by the collecting electrode, and a readout unit configured to read out the electric charges stored in the storage capacitor. A voltage is to be applied between the collecting electrode and the common electrode. The X-ray photoelectric conversion layer is formed of a polycrystalline oxide.
摘要翻译： X射线检测器包括：X射线光电转换层，被配置为与入射在该层上的X射线照射成比例地产生电荷;收集电极，被配置为收集由X射线光电转换层产生的电荷; 配置在与集电电极相反的X射线光电转换层的表面上的公共电极，配置为存储由集电极收集的电荷的存储电容器，以及读出单元，被配置为读出存储在存储器中的电荷电容器。在集电极和公共电极之间施加电压。 X射线光电转换层由多晶氧化物形成。

75. 发明申请

US20100318302A1 X-RAY IMAGING APPARATUS, X-RAY IMAGING METHOD AND METHOD OF CONTROLLING X-RAY IMAGING APPARATUS 有权
标题翻译： X射线成像装置，X射线成像方法和控制X射线成像装置的方法
公开(公告)号：US20100318302A1
公开(公告)日：2010-12-16
申请号：US12526418
申请日：2009-03-11
申请人： Taihei Mukaide , Kazuhiro Takada , Masatoshi Watanabe
发明人： Taihei Mukaide , Kazuhiro Takada , Masatoshi Watanabe
IPC分类号： G06F19/00 , G01N23/04
CPC分类号： G21K1/10 , A61B6/484 , G01N23/046 , G01N23/06 , G01N23/20 , G01N2223/419 , G21K2207/005
摘要： A simplified X-ray imaging apparatus is capable of computationally determining effective atomic numbers with small error factors even for light elements. The X-ray imaging apparatus has an X-ray generation unit 101 (400) for generating X-rays and a detector 105 (405) for detecting X-rays transmitted through an object of examination 104 (403). A computing unit 106 (406) computationally determines a quantity of an X-ray phase attributable to the object of examination and an X-ray transmittance of the object of examination from data detected by the detector. The computing unit also computationally determines an effective atomic number of the object of examination from ρet determined from the quantity of the X-ray phase and μt determined from the X-ray transmittance.
摘要翻译：简化的X射线成像装置能够计算确定即使对于轻元素也具有小的误差因子的有效原子数。 X射线成像装置具有用于产生X射线的X射线产生单元101（400）和用于检测通过检查对象104（403）传输的X射线的检测器105（405）。计算单元106（406）根据由检测器检测到的数据，计算地确定归因于检查对象的X射线相位的数量和检查对象的X射线透射率。计算单元还根据从X射线相位的量和从X射线透射率确定的μt来确定检查对象的有效原子序数。

76. 发明申请

US20100109002A1 OXYNITRIDE SEMICONDUCTOR 有权
标题翻译：氧化硅半导体
公开(公告)号：US20100109002A1
公开(公告)日：2010-05-06
申请号：US12532185
申请日：2008-04-23
申请人： Naho Itagaki , Tatsuya Iwasaki , Masatoshi Watanabe , Toru Den
发明人： Naho Itagaki , Tatsuya Iwasaki , Masatoshi Watanabe , Toru Den
IPC分类号： H01L29/12
CPC分类号： H01L29/7869 , H01L29/247
摘要： Provided is an oxynitride semiconductor comprising a metal oxynitride. The metal oxynitride contains Zn and at least one element selected from the group consisting of In, Ga, Sn, Mg, Si, Ge, Y, Ti, Mo, W, and Al. The metal oxynitride has an atomic composition ratio of N, N/(N+O), of 7 atomic percent or more to 80 atomic percent or less.
摘要翻译：提供了包含金属氮氧化物的氧氮化物半导体。金属氮氧化物含有Zn和选自In，Ga，Sn，Mg，Si，Ge，Y，Ti，Mo，W和Al中的至少一种元素。金属氮氧化物的原子组成比为N，N /（N + O），为7原子％以上且在80原子％以下。

77. 发明授权

US07659137B2 Structure capable of use for generation or detection of electromagnetic radiation, optical semiconductor device, and fabrication method of the structure 失效
标题翻译：能够用于电磁辐射的产生或检测的结构，光学半导体器件以及该结构的制造方法
公开(公告)号：US07659137B2
公开(公告)日：2010-02-09
申请号：US11088719
申请日：2005-03-25
申请人： Shintaro Kasai , Toshihiko Ouchi , Masatoshi Watanabe , Mitsuru Ohtsuka , Taihei Mukaide
发明人： Shintaro Kasai , Toshihiko Ouchi , Masatoshi Watanabe , Mitsuru Ohtsuka , Taihei Mukaide
IPC分类号： H01L21/20
CPC分类号： H01S1/02 , H01L31/1035 , H01L31/184 , Y02E10/544
摘要： A fabrication method of fabricating a structure capable of being used for generation or detection of electromagnetic radiation includes a forming step of forming a layer containing a compound semiconductor on a substrate at a substrate temperature below about 300° C., a first heating step of heating the substrate with the layer in an ambience containing arsenic, and a second heating step of heating the substrate with the layer at the substrate temperature above about 600° C. in a gas ambience incapable of chemically reacting on the compound semiconductor. Structures of the present invention capable of being used for generation or detection of electromagnetic radiation can be fabricated using the fabrication method by appropriately regulating the substrate temperature, the heating time, the gas ambience and the like in the second heating step.
摘要翻译：制造能够用于电磁辐射的产生或检测的结构的制造方法包括：形成步骤，在基板温度低于约300℃时，在基板上形成含有化合物半导体的层，第一加热步骤，加热所述衬底具有包含砷的环境中的层，以及第二加热步骤，在不能对化合物半导体进行化学反应的气体环境中，使衬底温度高于约600℃的衬底加热衬底。能够利用第二加热工序适当地调节基板温度，加热时间，气氛等的制造方法来制造能够用于电磁辐射的产生或检测的本发明的结构。

78. 发明申请

US20090109287A1 INSPECTING METHOD AND INSPECTING SYSTEM OF ASSEMBLY 审中-公开
标题翻译：组装检查方法和检查系统
公开(公告)号：US20090109287A1
公开(公告)日：2009-04-30
申请号：US12260108
申请日：2008-10-29
申请人： Ichiro SASAKI , Noriyuki Sadaoka , Masatoshi Watanabe
发明人： Ichiro SASAKI , Noriyuki Sadaoka , Masatoshi Watanabe
IPC分类号： H04N7/18
CPC分类号： G01N23/046 , G01N2223/419 , G01N2223/643 , G01N2223/645
摘要： An inspecting system of an assembly, for inspecting the assembly, by obtaining three-dimensional position relationship, in short time, for each of parts building up the assembly, comprises: a data editor/processor portion 2 for storing design data therein, and for producing/editing a calculated projection view; a brightness calculating portion 3 for calculating brightness in vicinity of boundaries, which are obtained when photographing the part to be extracted in plural numbers of directions, from the design data, for each direction; a sensitivity determining portion 4 for determining sensitivity of the photographing apparatus upon basis of the brightness, so that the projection image becomes clear in the vicinity of said boundaries; a photographing apparatus 5 for obtaining the projection images in the plural number of directions for the assembly conveyed; a video processor portion 6 for conducting video processing with converting the projection image into an electric signal, as an actual projection view; and a determination portion 8 for determining success or failure of the assembly, depending upon the part presented on the actual projection lies or not within a tolerable region of the part, which is presented by the calculated projection view.
摘要翻译：组件的检查系统，用于通过在短时间内为构建组件的每个部件获得三维位置关系来检查组件，包括：数据编辑器/处理器部分2，用于存储设计数据，并且用于生成/编辑计算的投影视图; 亮度计算部分3，用于计算从每个方向从设计数据拍摄多个方向上要提取的部分时获得的边界附近的亮度; 灵敏度确定部分4，用于根据亮度确定拍摄装置的灵敏度，使得投影图像在所述边界附近变得清晰; 拍摄装置5，用于获得用于组装传送的多个方向的投影图像; 视频处理器部分6，用于通过将投影图像转换为电信号进行视频处理，作为实际的投影视图; 并且根据在实际投影中呈现的部分位于或不在该部分的可容忍区域内，用于确定组件的成功或失败的确定部分8，其由所计算的投影视图呈现。

79. 外观设计

USD578438S1 Automobile and/or toy replica thereof 有权
公开(公告)号：USD578438S1
公开(公告)日：2008-10-14
申请号：US29284240
申请日：2007-09-04
申请人： Hiroaki Suzuki , Masatoshi Watanabe
设计人： Hiroaki Suzuki , Masatoshi Watanabe

80. 发明授权

US07359886B2 Injection-molding cost estimation system 有权
标题翻译：注塑成本估算系统
公开(公告)号：US07359886B2
公开(公告)日：2008-04-15
申请号：US10437902
申请日：2003-05-15
申请人： Michikazu Sakurai , Hikaru Amano , Masayuki Ueda , Keiichi Kai , Hirokatsu Hiraoka , Katsuji Morita , Fuminari Yashiro , Masatoshi Watanabe , Noboru Sugawara , Megumi Yamamoto , Daiho Sakuragi
发明人： Michikazu Sakurai , Hikaru Amano , Masayuki Ueda , Keiichi Kai , Hirokatsu Hiraoka , Katsuji Morita , Fuminari Yashiro , Masatoshi Watanabe , Noboru Sugawara , Megumi Yamamoto , Daiho Sakuragi
IPC分类号： G06Q99/10
CPC分类号： B29C45/26 , B29C45/76 , G06Q10/06 , G06Q30/0283
摘要： An estimation system for estimating an injection-molding related cost comprises an input unit, storage, a data processing unit, and an output unit. The storage stores a mold estimation function for each of cost items of a mold used to produce a molded product, and a mold estimation reference value table for recording mold estimation reference values in association with prescribed conditions. The data processing unit acquires a fabrication condition of the molded product through the input unit, reads the mold estimation function and one of the mold estimation reference values from the storage corresponding to the fabrication condition, and estimates a cost of the mold based on the mold estimation function and the selected mold estimation reference value. The output unit outputs a mold cost estimation result made by the data processing unit.
摘要翻译：用于估计注射成型相关成本的估计系统包括输入单元，存储器，数据处理单元和输出单元。存储部存储用于生产模制产品的模具的成本项目的模具估计功能，以及用于与规定条件相关联地记录模具估计参考值的模具估计基准值表。数据处理单元通过输入单元获取模制产品的制造条件，从对应于制造条件的存储中读取模具估计功能和模具估计基准值之一，并且基于模具估计模具的成本估计函数和选定的模具估计参考值。输出单元输出由数据处理单元进行的模具成本估计结果。

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