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    • 71. 发明授权
    • Nitride-based semiconductor laser device and method of fabricating the same
    • 氮化物半导体激光器件及其制造方法
    • US06928096B2
    • 2005-08-09
    • US10114298
    • 2002-04-03
    • Yasuhiko NomuraTatsuya Kunisato
    • Yasuhiko NomuraTatsuya Kunisato
    • H01S5/16H01S5/323H01S5/343H01S5/00
    • H01S5/162H01S5/32341Y10S977/951
    • A nitride-based semiconductor laser device capable of preventing deterioration in the vicinity of a facet is obtained. This nitride-based semiconductor laser device comprises a first conductivity type first cladding layer consisting of a nitride-based semiconductor formed on a substrate, an active layer formed on the first cladding layer, a second conductivity type second cladding layer consisting of a nitride-based semiconductor formed on the active layer and a high-resistance region formed at least portions of the active layer and the second cladding layer in the vicinity of the facet. The high-resistance region has higher resistance than the remaining regions, whereby a current hardly flows to the high-resistance region. Thus, temperature increase is suppressed in the vicinity of the facet, whereby deterioration can be prevented in the vicinity of the facet.
    • 可以获得能够防止小面附近的劣化的氮化物系半导体激光装置。 该氮化物系半导体激光装置包括由形成在基板上的氮化物系半导体构成的第一导电型第一包层,形成在第一包层上的有源层,由氮化物系形成的第二导电型第二包覆层 形成在有源层上的半导体层和形成在该小面附近的有源层和第二包层的至少一部分的高电阻区域。 高电阻区域比其余区域具有更高的电阻,因此电流几乎不流向高电阻区域。 因此,在小面附近抑制温度上升,从而可以防止在小面附近的劣化。