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71. 发明申请

US20110062328A1 Defect Review Apparatus and Method of Reviewing Defects 有权
标题翻译：缺陷评估装置及缺陷检查方法
公开(公告)号：US20110062328A1
公开(公告)日：2011-03-17
申请号：US12953170
申请日：2010-11-23
申请人： Takehiro HIRAI , Kenji Obara , Kohei Yamaguchi
发明人： Takehiro HIRAI , Kenji Obara , Kohei Yamaguchi
IPC分类号： G01N23/04
CPC分类号： H01J37/265 , H01J37/28 , H01J2237/221 , H01J2237/2817 , H01J2237/2826
摘要： The present invention aims to provide a defect review apparatus capable of suppressing a reduction in throughput with a minimized deviation-amount measurement, and capable of optimizing an FOV of a monitoring image. To this end, the review apparatus for reviewing a specimen by moving the specimen to pre-calculated coordinate includes: a function to measure a deviation amount between the pre-calculated coordinates and coordinates of an actual position of the specimen; a function to optimize a coordinate correcting expression to minimize the measured deviation amount; and a function to determine that the deviation amounts have converged. When the deviation amounts have converged, the measurement for the coordinate-correcting-expression optimization is terminated. Thereby, the reduction in throughput is suppressed to the minimum level, and furthermore a FOV necessary for the specimen to be within the field of view is set according to a convergence value of the calculated deviation amount.
摘要翻译：本发明的目的在于提供一种缺陷检查装置，其能够以最小化的偏差量测量来抑制吞吐量的降低，并能够优化监视图像的FOV。为此，用于通过将样本移动到预先计算的坐标来检查样本的检查装置包括：测量预先计算的坐标与样本的实际位置的坐标之间的偏差量的函数; 优化坐标校正表达式以最小化所测量的偏差量的函数; 以及确定偏差量已经收敛的函数。当偏差量收敛时，终止坐标校正表达式优化的测量。由此，将吞吐量的降低抑制到最小水平，并且根据计算出的偏差量的收敛值来设定样本在视野范围内所需的FOV。

72. 发明授权

US07869969B2 Defect review apparatus and method of reviewing defects 有权
标题翻译：缺陷检查设备和检查缺陷的方法
公开(公告)号：US07869969B2
公开(公告)日：2011-01-11
申请号：US12108068
申请日：2008-04-23
申请人： Takehiro Hirai , Kenji Obara , Kohei Yamaguchi
发明人： Takehiro Hirai , Kenji Obara , Kohei Yamaguchi
IPC分类号： G01C17/38 , G01N21/86
CPC分类号： H01J37/265 , H01J37/28 , H01J2237/221 , H01J2237/2817 , H01J2237/2826
摘要： A defect review apparatus for reviewing a specimen by moving the specimen to pre-calculated coordinate includes: a function to measure a deviation amount between the pre-calculated coordinates and coordinates of an actual position of the specimen; a function to optimize a coordinate correcting expression to minimize the measured deviation amount; and a function to determine that the deviation amounts have converged. When the deviation amounts have converged, the measurement for the coordinate-correcting-expression optimization is terminated, minimizing a reduction in throughput. field of view (FOV) necessary for the specimen to be within the FOV is set according to a convergence value of the calculated deviation amount.
摘要翻译：用于通过将样本移动到预先计算的坐标来检查样本的缺陷检查装置包括：测量预先计算的坐标和样本的实际位置的坐标之间的偏差量的函数; 优化坐标校正表达式以最小化所测量的偏差量的函数; 以及确定偏差量已经收敛的函数。当偏差量已经收敛时，终止坐标校正表达式优化的测量，从而最小化吞吐量的降低。根据计算出的偏差量的收敛值来设定样本在FOV内所必需的视场（FOV）。

73. 发明授权

US07866746B2 Structure of attaching monitor panel 有权
标题翻译：连接显示器面板的结构
公开(公告)号：US07866746B2
公开(公告)日：2011-01-11
申请号：US12271195
申请日：2008-11-14
申请人： Toyotaka Watanabe , Takayuki Niwa , Nobuhiko Kazui , Masahiro Iwamoto , Satoshi Sugiyama , Kenji Obara , Naoki Mitsuoka , Hideyuki Yamanaka , Yuji Nishiyama
发明人： Toyotaka Watanabe , Takayuki Niwa , Nobuhiko Kazui , Masahiro Iwamoto , Satoshi Sugiyama , Kenji Obara , Naoki Mitsuoka , Hideyuki Yamanaka , Yuji Nishiyama
IPC分类号： A47C31/00
CPC分类号： B60R11/0235 , B60N2002/905 , B60R2011/0015
摘要： The present invention can include a frame member which attaches the monitor panel at a back side of a vehicle seat, a skin member covering the vehicle seat, a pad member having a seat outer shape, the frame member is harder than the pad member, and the frame member is arranged at a back side of the vehicle seat in place of the pad member and covered by the skin member and the monitor panel is attached to the frame member through the skin member.
摘要翻译：本发明可以包括将监视器面板附接在车辆座椅的后侧的框架构件，覆盖车辆座椅的皮肤构件，具有座椅外部形状的衬垫构件，框架构件比衬垫构件更硬，以及框架构件布置在车辆座椅的后侧而不是衬垫构件并被皮肤构件覆盖，并且监视器面板通过皮肤构件附接到框架构件。

74. 发明授权

US07732765B2 Scanning electron microscope 有权
标题翻译：扫描电子显微镜
公开(公告)号：US07732765B2
公开(公告)日：2010-06-08
申请号：US11984319
申请日：2007-11-15
申请人： Kohei Yamaguchi , Kenji Obara
发明人： Kohei Yamaguchi , Kenji Obara
IPC分类号： H01J37/26
CPC分类号： H01J37/28 , H01J37/222 , H01J37/244 , H01J37/265 , H01J2237/216 , H01J2237/24475 , H01J2237/2448 , H01J2237/24495
摘要： A technique executes autofocus adjustment stably even when a plurality of patterns or foreign matter capable of being imaged only by a specific detector are included independently. Such an image as a concavo-convex image having a weak contrast can be picked up. The technique can automatically focus such an image even when it is difficult to find a focus position in the image. A scanning electron microscope includes a plurality of detectors for detecting secondary signals from a specimen when irradiated with an electron beam, and a calculation unit for combining the signals obtained from the detectors. At least two of the detectors are provided to be symmetric with respect to the electron beam. The focus of the electron beam is adjusted based on the signals of the detectors or on a signal corresponding to a combination of the signals.
摘要翻译：即使独立地包括仅能够由特定检测器成像的多个图案或异物也能够稳定地执行自动聚焦调整。可以拾取这样的具有弱对比度的凹凸图像的图像。即使在图像中难以找到焦点位置，该技术也可以自动对焦这样的图像。扫描电子显微镜包括多个用于在用电子束照射时检测来自样本的次级信号的检测器，以及用于组合从检测器获得的信号的计算单元。至少两个检测器被提供为相对于电子束对称。基于检测器的信号或对应于信号的组合的信号来调整电子束的焦点。

75. 发明授权

US07664562B2 Automatic defect review and classification system 有权
标题翻译：自动缺陷审查和分类系统
公开(公告)号：US07664562B2
公开(公告)日：2010-02-16
申请号：US11451330
申请日：2006-06-13
申请人： Takehiro Hirai , Kazuo Aoki , Kenji Obara
发明人： Takehiro Hirai , Kazuo Aoki , Kenji Obara
IPC分类号： G06F19/00
CPC分类号： G05B19/41875 , G05B2219/32218 , Y02P90/22
摘要： The invention proposes a system that interrupts a processing associated with an ADC having low priority when an ADC processing cannot catch up with ADR by an ADC alone that is not under execution but uses an ADC for an ADR having high priority. To preferentially execute ADR/ADC having high priority, the invention employs an algorithm for serially selecting ADR/ADC in the order of higher processing capacity (in the order of greater numerical values in the expression by a DPH unit) from among ADR/ADCs that have the lowest priority, no matter whether the ADR/DC is now under execution or not.
摘要翻译：本发明提出了一种系统，当ADC处理不能通过一个ADC不能跟踪ADR而不能执行但对具有高优先级的ADR使用ADC时，中断与具有低优先级的ADC相关联的处理的系统。为了优先执行具有高优先级的ADR / ADC，本发明采用一种用于从ADR / ADC中的处理能力较高（按DPH单元的表达式中的较大数值的数量级）的顺序选择ADR / ADC的算法，优先级最低，无论ADR / DC是否在执行中。

76. 发明授权

US07526143B2 Imaging method 有权
标题翻译：成像方法
公开(公告)号：US07526143B2
公开(公告)日：2009-04-28
申请号：US11411154
申请日：2006-04-26
申请人： Kohei Yamaguchi , Kazuo Aoki , Kenji Obara
发明人： Kohei Yamaguchi , Kazuo Aoki , Kenji Obara
IPC分类号： G06K9/36
CPC分类号： G01N23/2251
摘要： A method which, while displacing the field-of-view, allows the image in a target area to be acquired without degradations such as out-of-focus of the image. Plural pieces of images are acquired before and after a target area while displacing the field-of-view. Next, these images are grouped into groups each of which includes several pieces of images, and integrated images on each group basis are created. Moreover, a relational expression is calculated which holds between image displacement quantity calculated by comparing the integrated images with each other and the number of the photographed pieces of images. Furthermore, image displacement quantities between the acquired plural pieces of images are calculated from this relational expression. Finally, these images are corrected by the amounts of these displacement quantities, then being integrated. This process allows reconfiguration of the image in the target area.
摘要翻译：在移动视野的同时允许获取目标区域中的图像而不降低诸如图像的失焦的方法。在移动视野之前，在目标区域之前和之后获取多张图像。接下来，将这些图像分组成各自包括几个图像的组，并且创建基于每个组的集成图像。此外，计算出通过比较集成图像计算的图像位移量与拍摄的图像数量之间的关系表达式。此外，从该关系式计算所获取的多张图像之间的图像位移量。最后，这些图像被这些位移量的量校正，然后被整合。该过程允许重新配置目标区域中的图像。

77. 发明授权

US07485858B1 Inspection method for semiconductor wafer and apparatus for reviewing defects 有权
标题翻译：半导体晶圆检查方法及缺陷检查装置
公开(公告)号：US07485858B1
公开(公告)日：2009-02-03
申请号：US11607906
申请日：2006-12-04
申请人： Kenji Obara , Takehiro Hirai
发明人： Kenji Obara , Takehiro Hirai
IPC分类号： G01N23/00 , G21K7/00 , G21K5/10 , A61N5/00 , G21G5/00
CPC分类号： G01N23/2251 , H01J37/222 , H01J37/244 , H01J37/26 , H01J37/28 , H01J2237/24475 , H01J2237/2448 , H01J2237/24592 , H01J2237/28 , H01J2237/2809 , H01J2237/2817
摘要： An object of the present invention is to provide a suitable method of observing a wafer edge by using an electron microscope. The electron microscope includes a column which can take an image in being tilted, and thus allows a wafer edge to be observed from an oblique direction.
摘要翻译：本发明的目的是提供一种使用电子显微镜观察晶片边缘的合适方法。电子显微镜包括可以使图像倾斜的列，从而允许从倾斜方向观察晶片边缘。

78. 发明申请

US20050199808A1 Method and apparatus for collecting defect images 有权
标题翻译：用于收集缺陷图像的方法和装置
公开(公告)号：US20050199808A1
公开(公告)日：2005-09-15
申请号：US11020255
申请日：2004-12-27
申请人： Kenji Obara , Toshifumi Honda , Toshiro Kubo
发明人： Kenji Obara , Toshifumi Honda , Toshiro Kubo
IPC分类号： G01N23/225 , H01J37/28 , H01L21/66
CPC分类号： H01J37/28 , H01J37/241 , H01J37/263 , H01J37/265 , H01J2237/2809 , H01J2237/2817
摘要： To acquire defect images even when a defect exists below an optically transparent film, an electron optical system of an electron microscope is set to a first imaging condition. A defect position of a specimen is set so as to fall within the visual field of the electron microscope, using position data of a defect of the specimen. The position of the defect is imaged by the electron microscope set to the first imaging condition to obtain a first image corresponding to the defect position. The first image is processed to determine whether a defect exists. The electron optical system is then set to a second imaging condition on the basis of the result of determination. A point imaged under the first imaging condition is imaged by the electron microscope set to the second imaging condition to acquire a second image corresponding to a defect position.
摘要翻译：为了获得缺陷图像，即使当缺陷存在于光学透明膜下方时，将电子显微镜的电子光学系统设置为第一成像条件。使用试样的缺陷的位置数据，将试样的缺陷位置设定为落入电子显微镜的视野内。通过设置为第一成像条件的电子显微镜对缺陷的位置成像，以获得对应于缺陷位置的第一图像。处理第一个图像以确定是否存在缺陷。然后基于确定的结果将电子光学系统设置为第二成像条件。在第一成像条件下成像的点通过设置为第二成像条件的电子显微镜成像，以获得对应于缺陷位置的第二图像。

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