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    • 72. 发明申请
    • Method and system for native-byte form handling
    • US20050027709A1
    • 2005-02-03
    • US10931248
    • 2004-08-31
    • Eric WhiteJohn Boyd
    • Eric WhiteJohn Boyd
    • G06F17/30
    • G06F17/30893Y10S707/99939Y10S707/99942
    • A method and system are provided for native-byte form handling, one embodiment comprising a method for encoding user-submitted native-byte form data in a client-server computer network. A user, at a client computer, can select a Uniform Resource Locator (“URL”) with his or her web browser for access to a content provider's website. When accessing the content provider's web server, the client computer can transmit client computer specific information to the web server that can be used by the web server to determine the user's locale. The web server can determine the user's (client computer's) locale using, for example, an automatic locale detection algorithm, and forward the user's locale information to a back-end server. The content provider's back-end server can generate a locale-specific form having a pre-populated, uniquely-named field, using, for example, a dynamic page generation program. The locale-specific form can be served to the user's web browser for display to the user. The user can enter, on the locale-specific form, information that he or she wishes to submit to the content provider (e.g., a request for content). The user can transmit the form-entered data, including the pre-populated, uniquely-named field, to the content provider's web server. The web server can process the user form data, and an encoding object can be created, based on the value of the pre-populated field. The user form data can then be transcoded from its original encoding to a new encoding (e.g., the content provider's scripting environment encoding) and forwarded to the content provider's scripting environment.
    • 76. 发明申请
    • Proximity brush unit apparatus and method
    • 接近刷单元装置和方法
    • US20050132515A1
    • 2005-06-23
    • US10742303
    • 2003-12-18
    • John BoydMichael OrbockFred Redeker
    • John BoydMichael OrbockFred Redeker
    • H01L21/00B08B1/04
    • H01L21/67046Y10S134/902
    • An apparatus is provided for producing a wet region and corresponding dry region on a wafer. A proximity brush unit delivers fluids with a rotatable brush to produce the wet region on the wafer. As the proximity brush unit moves in a selected scan method across the wafer, a plurality of ports produces the dry region on the wafer. Further, the rotatable brush disposed within the proximity brush unit can rotate via mechanical gears or electromagnetic levitation. The selected scan method that produces the wet region and the dry region moves the proximity brush unit in a variety of methods including a radial scan, a linear scan, a spiral scan and a raster scan. To further produce a dry region during the selected scan method, the plurality of ports disposed on the surface of the proximity brush unit is on the trailing edges of the proximity head unit and the wafer.
    • 提供了一种用于在晶片上产生湿区域和相应的干燥区域的装置。 接近刷单元用可旋转的刷子输送流体以在晶片上产生湿区域。 当接近刷单元以选定的扫描方法移动跨越晶片时,多个端口在晶片上产生干燥区域。 此外,设置在接近刷单元内的可旋转刷可以经由机械齿轮或电磁悬浮来旋转。 产生湿区域和干燥区域的选择的扫描方法以包括径向扫描,线性扫描,螺旋扫描和光栅扫描的各种方法移动接近刷单元。 为了在所选择的扫描方法期间进一步产生干燥区域,设置在接近刷单元表面上的多个端口位于邻近头单元和晶片的后缘。
    • 77. 发明授权
    • Method and apparatus to form a planarized Cu interconnect layer using electroless membrane deposition
    • 使用无电沉积膜形成平坦化Cu互连层的方法和装置
    • US06864181B2
    • 2005-03-08
    • US10402600
    • 2003-03-27
    • Fred C. RedekerJohn Boyd
    • Fred C. RedekerJohn Boyd
    • H01L21/288H01L21/768H01L21/311C03C15/00H01L23/48
    • H01L21/288H01L21/7684
    • A planarized conductive material is formed over a substrate including narrow and wide features. The conductive material is formed through a succession of deposition processes. A first deposition process forms a first layer of the conductive material that fills the narrow features and at least partially fills the wide features. A second deposition process forms a second layer of the conductive material within cavities in the first layer. A flexible material can reduce a thickness of the first layer above the substrate while delivering a solution to the cavities to form the second layer therein. The flexible material can be a porous membrane attached to a pressurizable reservoir filled with the solution. The flexible material can also be a poromeric material wetted with the solution.
    • 在包括窄和宽的特征的衬底上形成平坦化的导电材料。 导电材料通过一系列沉积工艺形成。 第一沉积工艺形成导电材料的第一层,其填充窄特征并且至少部分地填充宽的特征。 第二沉积工艺在第一层的空腔内形成导电材料的第二层。 柔性材料可以减小衬底之上的第一层的厚度,同时将溶液递送到空腔以在其中形成第二层。 柔性材料可以是连接到填充有溶液的可加压储存器的多孔膜。 柔性材料也可以是用溶液润湿的多孔体材料。
    • 78. 发明授权
    • Platen design for improving edge performance in CMP applications
    • 用于提高CMP应用中边缘性能的压板设计
    • US06776695B2
    • 2004-08-17
    • US09747828
    • 2000-12-21
    • Alek OwczarzJohn BoydRod Kistler
    • Alek OwczarzJohn BoydRod Kistler
    • B24B100
    • B24B37/32B24B21/04
    • An invention is disclosed for improving edge performance in a chemical mechanical polishing process is disclosed. The system includes a wafer head disposed above a wafer, where the wafer head includes a first active retaining ring capable of extension and retraction. Below the wafer head is a polishing belt, and disposed below the polishing belt is a platen having a second active retaining ring capable of extension and retraction. During operation the first active retaining ring and the second active retaining ring can be controlled to provide positional control for the polishing belt, thus adjusting and controlling the removal rate at the edge of the wafer.
    • 公开了一种用于改善化学机械抛光工艺中的边缘性能的发明。 该系统包括设置在晶片上方的晶片头,其中晶片头包括能够延伸和缩回的第一主动保持环。 在晶片头下方是抛光带,并且在抛光带下方设置有具有能够延伸和缩回的第二主动保持环的压板。 在操作期间,可以控制第一主动保持环和第二主动保持环以提供抛光带的位置控制,从而调整和控制在晶片边缘处的去除速率。