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    • 72. 发明申请
    • SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
    • 基板加工方法和基板加工装置
    • US20120160805A1
    • 2012-06-28
    • US13329985
    • 2011-12-19
    • Kiyoshi EharaMitsuo Suzuki
    • Kiyoshi EharaMitsuo Suzuki
    • C23F1/12C23F1/08B05D1/36B05D3/02B05D3/00C23C16/52B05D3/10
    • H01L21/67745H01L21/67167H01L21/67196H01L21/67393
    • A substrate processing method comprises: an execution step of executing the first processing for the plurality of substrates, and executing the second processing for the substrates having undergone the first processing; a recovery step of recovering the plurality of substrates having undergone the first processing and the second processing to the retraction chamber; a conditioning step of, after completion of the first processing for the last substrate among the plurality of substrates, loading a dummy substrate into the first processing chamber, executing the third processing for the dummy substrate, and unloading the dummy substrate from the first processing chamber; and a second execution step of, after the dummy substrate is unloaded from the first processing chamber in the conditioning step, loading the substrates recovered in the recovery step into the first processing chamber, and executing the third processing for the substrates loaded into the first processing chamber.
    • 一种基板处理方法,包括:执行步骤,对所述多个基板执行所述第一处理,并对经过所述第一处理的基板执行所述第二处理; 回收步骤,将经过第一处理和第二处理的多个基板回收到回缩室; 调整步骤,在所述多个基板中的最后基板的第一处理完成之后,将虚设基板装载到所述第一处理室中,对所述虚设基板进行所述第三处理,从所述第一处理室卸载所述虚设基板 ; 以及第二执行步骤,在所述调节步骤中从所述第一处理室中卸载所述虚设基板之后,将在所述回收步骤中回收的所述基板装载到所述第一处理室中,并对被加载到所述第一处理中的所述基板执行所述第三处理 房间。
    • 78. 发明申请
    • OPTICAL SCANNING APPARATUS AND IMAGE FORMING APPARATUS
    • 光学扫描装置和图像形成装置
    • US20080068678A1
    • 2008-03-20
    • US11855883
    • 2007-09-14
    • Mitsuo SuzukiShigeaki Imai
    • Mitsuo SuzukiShigeaki Imai
    • H04N1/04
    • H04N1/053H04N1/1135H04N1/12H04N2201/0082H04N2201/0471H04N2201/04732H04N2201/04744H04N2201/04749
    • An optical scanning apparatus which includes: a light source unit which emits a light beam; a deflection scanning device which deflects the light beam emitted from the light source unit; an optical scanning unit having a scanning imaging lens and which scans a surface to be scanned; and a light beam detector which detects a position in a sub-scanning direction of the light beam, and is disposed in a position maintaining a correlation, in a time-varying characteristic, between an amount of change of a position in the sub-scanning direction of the light beam on the surface to be scanned and an amount of change of a position in the sub-scanning direction of the light beam detected by the light beam detector, in which a difference between the amount of change of the position in the sub-scanning direction of the light beam on the surface to be scanned and the amount of change of the position in the sub-scanning direction of the light beam detected by the light beam detector is equal to or less than a set value.
    • 一种光学扫描装置,包括:发射光束的光源单元; 偏转扫描装置,其使从所述光源单元发射的光束偏转; 具有扫描成像透镜并且扫描待扫描的表面的光学扫描单元; 以及光束检测器,其检测光束的副扫描方向上的位置,并且设置在保持时变特性中的相关性的位置之间,在副扫描中的位置的变化量 要被扫描的表面上的光束的方向和由光束检测器检测到的光束的副扫描方向上的位置的变化量,其中, 要扫描的表面上的光束的副扫描方向和由光束检测器检测的光束的副扫描方向上的位置的变化量等于或小于设定值。