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71. 发明授权

US5333495A Method and apparatus for processing a minute portion of a specimen 失效
标题翻译：用于处理样本的微小部分的方法和装置
公开(公告)号：US5333495A
公开(公告)日：1994-08-02
申请号：US12758
申请日：1993-03-11
申请人： Hiroshi Yamaguchi , Minori Noguchi , Makiko Kohno , Toshihiko Nakata
发明人： Hiroshi Yamaguchi , Minori Noguchi , Makiko Kohno , Toshihiko Nakata
IPC分类号： G01Q10/00 , G01Q30/02 , G01Q30/16 , G01Q60/12 , G01Q60/18 , G01Q60/22 , G01Q60/56 , G01Q70/10 , H01J37/28 , G01B5/28 , G01N21/31 , G01N23/00 , C21K1/00
CPC分类号： G01Q30/02 , B82Y20/00 , B82Y35/00 , G01Q60/22 , H01J37/28 , Y10S977/859 , Y10S977/861 , Y10S977/862 , Y10S977/879
摘要： A method for detecting a photoacoustic signal includes the steps of modulating the intensity of light obtained from a light source at a predetermined modulation frequency, exciting a specimen by directing the intensity-modulated light onto the specimen, thereby generating a photoacoustic effect in the specimen, detecting the photoacoustic effect generated in the specimen and producing a detection signal indicative of the detected photoacoustic effect, and extracting information about the surface and interior of the specimen from the detection signal, wherein the intensity-modulated light is emitted from an aperture of a near-field optical scanning microscope used in directing the intensity-modulated light onto the specimen while a distance between the aperture of the near-field optical scanning microscope and the surface of the specimen is maintained constant irrespective of the photoacoustic effect generated in the specimen.
摘要翻译：一种用于检测光声信号的方法包括以预定调制频率调制从光源获得的光的强度的步骤，通过将强度调制的光引导到样本上来激发样本，从而在样本中产生光声效应，检测在样本中产生的光声效应，产生表示检测到的光声效应的检测信号，以及从检测信号中提取关于样本表面和内部的信息，其中强度调制光从近似的孔径发射用于将强度调制光引导到样本上的现场光学扫描显微镜，而近场光学扫描显微镜的孔径与样本表面之间的距离保持恒定，而与样品中产生的光声效应无关。

72. 发明授权

US5233191A Method and apparatus of inspecting foreign matters during mass production start-up and mass production line in semiconductor production process 失效
标题翻译：在半导体生产过程中批量生产启动和批量生产线中检查异物的方法和装置
公开(公告)号：US5233191A
公开(公告)日：1993-08-03
申请号：US679317
申请日：1991-04-02
申请人： Minori Noguchi , Yukio Kembo , Hiroshi Morioka , Hiroshi Yamaguchi , Makiko Kohno , Yoshimasa Ohshima
发明人： Minori Noguchi , Yukio Kembo , Hiroshi Morioka , Hiroshi Yamaguchi , Makiko Kohno , Yoshimasa Ohshima
IPC分类号： G01N21/94 , G01N21/956 , G01Q10/00 , G01Q30/02 , G01Q30/04 , G01Q30/14 , G01Q60/10 , G01R31/311 , H01J37/256 , H01L21/00 , H01L21/66
CPC分类号： H01L21/67253 , G01R31/311 , H01J37/256 , H01L21/67276 , H01L21/67288 , H01L22/20 , B82Y35/00 , G01N2021/8822 , G01N21/94 , G01N21/95623
摘要： Method and apparatus of detecting, analyzing and evaluating the content of foreign matters such as dusts and impurities contained in various materials, units, processes and environment standing for constituting components of a mass production line during mass production start-up and during mass production, in order to manage a semiconductor production process. A mass production off-line system including an apparatus for detecting, analyzing and evaluating the content of foreign matters during the mass production start-up is separated from the production line and installed independently thereof. Monitors for detection of foreign matters are provided at necessary locations in the production line and monitor data is evaluated through various units to manage the content of foreign matters in the production line, permitting efficient and economical mass production start-up and mass production. The kind of element of a foreign matter on sampling wafer detected in the mass production line is analyzed by means of STM/STS and the results are compared with a data base to effect identification. A foreign matter or a contaminant is detected by detecting a scatttered beam, of a light spot which scans the surface of a substrate. The detection of the scattered beam is carried out under the condition that Rayleigh scattering of the light spot on the light spot irradiation and reflection paths and Rayleigh scattering of the scattered beam on the scattered beam detection path are suppressed to a minimum. For the suppression of Rayleigh scattering, a low-pressure or low-temperature atmosphere may be used.
摘要翻译：检测，分析和评估大规模生产启动期间和批量生产期间大规模生产线组成部件的各种材料，单位，工艺和环境中所含的灰尘和杂质等杂质的含量，为了管理半导体生产过程。包括用于在批量生产启动期间检测，分析和评估异物含量的装置的批量生产离线系统与生产线分离并独立安装。在生产线必需的位置提供检测异物的监测器，通过各种单位对监测数据进行评估，对生产线内的异物含量进行管理，实现高效，经济的批量生产启动和批量生产。通过STM / STS分析在大规模生产线上检测到的采样晶圆上的异物元素的种类，并将结果与数据库进行比较以进行识别。通过检测扫描基板表面的光斑的光斑光束来检测异物或污染物。在光点照射和反射路径上的光斑的瑞利散射和散射光束检测路径上的散射光束的瑞利散射被抑制到最小的条件下进行散射光束的检测。为了抑制瑞利散射，可以使用低压或低温气氛。

73. 发明授权

US5214282A Method and apparatus for processing a minute portion of a specimen 失效
标题翻译：用于处理样品的分钟部分的方法和装置
公开(公告)号：US5214282A
公开(公告)日：1993-05-25
申请号：US707774
申请日：1991-05-30
申请人： Hiroshi Yamaguchi , Minori Noguchi , Makiko Kohno , Toshihiko Nakata
发明人： Hiroshi Yamaguchi , Minori Noguchi , Makiko Kohno , Toshihiko Nakata
IPC分类号： G01Q10/00 , G01Q30/02 , G01Q30/16 , G01Q60/12 , G01Q60/18 , G01Q60/22 , G01Q60/56 , G01Q70/10 , H01J37/28
CPC分类号： G01Q30/02 , B82Y20/00 , B82Y35/00 , G01Q60/22 , H01J37/28 , Y10S977/859 , Y10S977/861 , Y10S977/862 , Y10S977/879
摘要： An image of a specimen which is to be processed is detected by a near-field optical scanning microscope. An image with extremely high resolution for identifying a minute portion of several tens nm is detected. The detected minute portion is processed by, for example, a tunnel current of a scanning tunneling microscope.

74. 发明授权

US08482728B2 Apparatus and method for inspecting defect on object surface 有权
标题翻译：检测物体表面缺陷的装置和方法
公开(公告)号：US08482728B2
公开(公告)日：2013-07-09
申请号：US12244958
申请日：2008-10-03
申请人： Sachio Uto , Hidetoshi Nishiyama , Minori Noguchi
发明人： Sachio Uto , Hidetoshi Nishiyama , Minori Noguchi
IPC分类号： G01N21/00
CPC分类号： H01L21/02334 , B08B6/00 , G01B11/0625 , G01B11/303 , G01N3/04 , G01N21/15 , G01N21/94 , G01N21/9501 , G01N21/95623 , G01N2021/9563 , H01L21/02057 , H01L21/02082
摘要： An aspect of the invention provides a defect inspection apparatus being able to accurately inspect a micro foreign matter or defect at a high speed for an inspection target substrate in which a repetitive pattern and a non-repetitive pattern are mixed. In a foreign matter anti-adhesive means 180, a transparent plate 187 is placed on a placement table 34 through a frame 185. In the foreign matter anti-adhesive means 180, a shaft 181 which is rotatably supported by two columnar supports 184 fixed onto a base 186 is coupled to a motor 182 by a coupling 183. The shaft 181 is inserted into a part of a frame 185 between the two columnar supports 184 such that the frame 185 and the transparent plate 187 are turnable about the shaft 181. Therefore, the whole of the frame 185 is opened and closed in a Z-direction about the shaft 181, and a wafer 1 on the placement table 34 can be covered with the frame 185 and the transparent plate 187.
摘要翻译：本发明的一个方面提供了一种缺陷检查装置，其能够精确地检查混合有重复图案和非重复图案的检查对象基板的高速微细异物或缺陷。在异物防粘连装置180中，通过框架185将透明板187放置在放置台34上。在异物防粘装置180中，轴181可旋转地由两个柱状支撑件184支撑固定到基座186通过联轴器183联接到马达18.轴181插入到两个柱状支撑件184之间的框架185的一部分中，使得框架185和透明板187围绕轴181可转动。因此，整个框架185围绕轴181沿Z方向打开和关闭，并且放置台34上的晶片1可以被框架185和透明板187覆盖。

75. 发明申请

US20130148113A1 INSPECTION APPARATUS AND INSPECTION METHOD 审中-公开
标题翻译：检查装置和检查方法
公开(公告)号：US20130148113A1
公开(公告)日：2013-06-13
申请号：US13579965
申请日：2010-12-20
申请人： Mizuki Oku , Minori Noguchi , Hiroshi Kawaguchi , Kazuo Takahashi , Kei Shimura
发明人： Mizuki Oku , Minori Noguchi , Hiroshi Kawaguchi , Kazuo Takahashi , Kei Shimura
IPC分类号： G01N21/88
CPC分类号： G01N21/88 , G01N21/8806 , G01N21/9501 , G01N2201/062 , G01N2201/08
摘要： The light scattered from the sample surface and foreign matter is imaged on an image intensifier and detected by a lens-coupled multi-pixel sensor such as a TDI sensor or a CCD sensor. The light scattered by surface roughness is spatially eliminated to detect the light scattered from foreign matter with increased sensitivity. A mechanism for shifting the image intensifier is incorporated to prevent a signal intensity decrease, which may be caused by a decrease in the sensitivity of the image intensifier.
摘要翻译：从样品表面散射的光和异物在图像增强器上成像，并由诸如TDI传感器或CCD传感器的透镜耦合多像素传感器检测。通过表面粗糙度散射的光在空间上消除，以增加敏感度来检测从异物散射的光。并入用于移动图像增强器的机构以防止由于图像增强器的灵敏度的降低而引起的信号强度降低。

76. 发明申请

US20120312104A1 METHOD OF INSPECTING A SEMICONDUCTOR DEVICE AND AN APPARATUS THEREOF 有权
标题翻译：检查半导体器件的方法及其装置
公开(公告)号：US20120312104A1
公开(公告)日：2012-12-13
申请号：US13593171
申请日：2012-08-23
申请人： Akira HAMAMATSU , Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Kenji Oka , Takanori Ninomiya , Maki Tanaka , Kenji Watanabe , Tetsuya Watanabe , Yoshio Morishige
发明人： Akira HAMAMATSU , Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Kenji Oka , Takanori Ninomiya , Maki Tanaka , Kenji Watanabe , Tetsuya Watanabe , Yoshio Morishige
IPC分类号： G01N21/88
CPC分类号： G06T7/001 , G01N21/8851 , G01N21/9501 , G01N2021/8861 , G01N2021/8867 , G06T7/97 , G06T2207/10152 , G06T2207/30148
摘要： A method and apparatus of inspecting a sample, in which the sample is inspected under a plurality of inspection conditions, and inspection data obtained by inspecting the sample under each of the plurality of inspection conditions and position information on the sample of the inspection date in correspondence with the respective inspection conditions, are stored. The inspection data for each of the plurality of inspection conditions is against each other by the use of the position information on the sample to determine a position to be inspected in detail, and an image of the sample at a position to be inspected in detail is obtained. The obtained image is classified, the inspection condition of the sample by the use of information of classification of the image is determined.
摘要翻译：在多个检查条件下对样本进行检查的检查方法和装置以及在多个检查条件下检查样本而获得的检查数据和对应于检查日期样本的位置信息具有相应的检查条件。多个检查条件中的每一个的检查数据通过使用关于样本的位置信息彼此相对来确定待检查的位置，并且在待检查位置处的样本的图像是详细的获得。对所获得的图像进行分类，确定通过使用图像分类信息的样本的检查条件。

77. 发明授权

US08094295B2 Inspection method and inspection apparatus 有权
公开(公告)号：US08094295B2
公开(公告)日：2012-01-10
申请号：US12555610
申请日：2009-09-08
申请人： Akira Hamamatsu , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Takahiro Jingu , Sachio Uto
发明人： Akira Hamamatsu , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Takahiro Jingu , Sachio Uto
IPC分类号： G01N21/00
CPC分类号： G01N21/8806 , G01N21/94 , G01N21/9501 , G01N21/95623
摘要： The present invention provides an inspection apparatus and inspection method. The inspection apparatus includes a stage mechanism for supporting an object under inspection. A spatial filter is provided in the detection optical system to inspect the object. A printer is used to print the results of the spatial filter. The spatial filter can be provided in the form of a Fourier transformed image.

78. 发明授权

US07952700B2 Method of apparatus for detecting particles on a specimen 有权
标题翻译：用于检测样品上的颗粒的装置的方法
公开(公告)号：US07952700B2
公开(公告)日：2011-05-31
申请号：US12907895
申请日：2010-10-19
申请人： Akira Hamamatsu , Minori Noguchi , Yoshimasa Ohshima , Sachio Uto , Taketo Ueno , Hiroyuki Nakano , Takahiro Jingu , Hisashi Hatano , Yukihisa Mohara , Seiji Otani , Takahiro Togashi
发明人： Akira Hamamatsu , Minori Noguchi , Yoshimasa Ohshima , Sachio Uto , Taketo Ueno , Hiroyuki Nakano , Takahiro Jingu , Hisashi Hatano , Yukihisa Mohara , Seiji Otani , Takahiro Togashi
IPC分类号： G01N21/00
CPC分类号： G01N21/956
摘要： A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.
摘要翻译：通过检查其中形成有多个图案的样本的表面的样本来检测缺陷的方法和装置，通过从仰角不同的多个方向之一的细长形状的光束照射，根据要检测的缺陷的种类从照明光源发射的光束。通过用安装在不同仰角方向上的多个图像传感器捕获由细长形状光束照射的样本的多个光学图像，通过根据在照射细长的照射区域中在样品上形成的图案的密度来改变放大倍率形状光通量。通过处理由多个图像传感器捕获的图像来检测样本上的缺陷。

79. 发明授权

US07817261B2 Method of apparatus for detecting particles on a specimen 有权
标题翻译：用于检测样品上的颗粒的装置的方法
公开(公告)号：US07817261B2
公开(公告)日：2010-10-19
申请号：US12114139
申请日：2008-05-02
申请人： Akira Hamamatsu , Minori Noguchi , Yoshimasa Ohshima , Sachio Uto , Taketo Ueno , Hiroyuki Nakano , Takahiro Jingu , Hisashi Hatano , Yukihisa Mohara , Seiji Otani , Takahiro Togashi
发明人： Akira Hamamatsu , Minori Noguchi , Yoshimasa Ohshima , Sachio Uto , Taketo Ueno , Hiroyuki Nakano , Takahiro Jingu , Hisashi Hatano , Yukihisa Mohara , Seiji Otani , Takahiro Togashi
IPC分类号： G01N21/00
CPC分类号： G01N21/956
摘要： A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.
摘要翻译：通过检查其中形成有多个图案的样本的表面的样本来检测缺陷的方法和装置，通过从仰角不同的多个方向之一的细长形状的光束照射，根据要检测的缺陷的种类从照明光源发射的光束。通过用安装在不同仰角方向上的多个图像传感器捕获由细长形状光束照射的样本的多个光学图像，通过根据在照射细长的照射区域中在样品上形成的图案的密度来改变放大倍率形状光通量。通过处理由多个图像传感器捕获的图像来检测样本上的缺陷。

80. 发明授权

US07746453B2 Pattern defect inspection apparatus and method 有权
标题翻译：图案缺陷检查装置及方法
公开(公告)号：US07746453B2
公开(公告)日：2010-06-29
申请号：US12113781
申请日：2008-05-01
申请人： Hidetoshi Nishiyama , Kei Shimura , Sachio Uto , Minori Noguchi
发明人： Hidetoshi Nishiyama , Kei Shimura , Sachio Uto , Minori Noguchi
IPC分类号： G01N21/00
CPC分类号： G01N21/95607 , G01N21/94 , G01N21/9501 , G01N2021/4711
摘要： A pattern defect inspection apparatus capable of detecting minute defects on a sample with high sensitivity without generating speckle noise in signals is realized. Substantially the same region on a surface of a wafer is detected by using two detectors at mutually different timings. Output signals from the two detectors are summed and averaged to eliminate noise. Since a large number of rays of illumination light are not simultaneously irradiated to the same region on the wafer, a pattern defect inspection apparatus capable of suppressing noise resulting from interference of a large number of rays, eliminating noise owing to other causes and detecting with high sensitivity minute defects on the sample without the occurrence of speckle noise in the signal can be accomplished.
摘要翻译：实现能够以高灵敏度检测样品上的微小缺陷而不产生信号中的斑点噪声的图案缺陷检查装置。通过在相互不同的定时使用两个检测器来检测晶片表面上的基本上相同的区域。来自两个检测器的输出信号被相加和平均以消除噪声。由于大量的照明光线不能同时照射到晶片上的相同区域，所以能够抑制由于大量光线的干扰而产生的噪声的图案缺陷检查装置，消除由于其它原因引起的噪声和高检测可以实现样品上的灵敏度微小缺陷，而不会在信号中发生斑点噪声。

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