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    • 71. 发明授权
    • Magnetic recording medium
    • 磁记录介质
    • US4511629A
    • 1985-04-16
    • US463419
    • 1983-02-03
    • Ryozo KonnoMakio SugaiYuichi KubotaMasaharu NishimatsuYukihiro IsobeKazushi TanakaOsamu Shinoura
    • Ryozo KonnoMakio SugaiYuichi KubotaMasaharu NishimatsuYukihiro IsobeKazushi TanakaOsamu Shinoura
    • C09D5/23G11B5/738H01F10/00B05D5/12
    • G11B5/738Y10S428/90Y10T428/31935
    • In a magnetic recording medium made by applying a non-magnetic undercoat and a magnetic top coat on a base, the undercoat comprises a radiation-curable coating material which contains a compound with a molecular weight of not less than 400, having one type of double bond selected from among acrylic, allylic, and maleic double bonds, the undercoat being formed by exposure to radiation. Specifically, the undercoating material contains at least two types of compounds selected from (A) those having a molecular weight of over 5000, preferably over 8000 and having two or more double bonds selected as above, (B) those having a molecular weight of 400 or more but less than 500, preferably in the range of 600 to 3000, and two or more double bonds selected as above, and (C) those having a molecular weight of less than 400 and one or more double bonds selected from among acrylic, allylic, maleic, and styrenic double bonds. At least two types of the compounds are used in a mixing ratio of 0-90 wt % (A), 0-80 wt % (B), and 0-50 wt % wt % (C).
    • 在通过在基底上施加非磁性底涂层和磁性面漆制成的磁记录介质中,底涂层包含含有分子量不小于400的化合物的辐射固化涂层材料,具有一种类型的双 键从丙烯酸,烯丙基和马来双键中选择,底涂层通过暴露于辐射形成。 具体地说,底涂层材料含有至少两种选自(A)分子量超过5000,优选超过8000,具有两个以上选自上述双键的化合物,(B)分子量为400 或更多但小于500,优选在600至3000的范围内,以及如上选择的两个或更多个双键,和(C)分子量小于400的那些和选自丙烯酸, 烯丙基,马来酸和苯乙烯双键。 以0-90重量%(A),0-80重量%(B)和0-50重量%重量(C)的混合比使用至少两种类型的化合物。
    • 74. 发明授权
    • Methods for producing optical recording medium and optical recording medium
    • 光记录介质和光记录介质的制造方法
    • US07871685B2
    • 2011-01-18
    • US11101423
    • 2005-04-08
    • Naoki HayashidaKazushi Tanaka
    • Naoki HayashidaKazushi Tanaka
    • B32B3/02
    • G11B7/266G11B7/243G11B7/253G11B7/254Y10T428/21
    • The present invention provides a method for producing an optical recording medium having: a supporting substrate; a light transmission layer, which transmits a laser beam; and an information layer formed between the supporting substrate and the light transmission layer, which includes: applying a resin composition on the information layer by a spin coating method to form a coating film, wherein the resin composition contains, as main components: (A) a radical-curing urethane(meth)acrylate, which is obtained by reacting (a-1) a compound having three or more isocyanate groups binding to an aliphatic carbon atom per one molecule thereof and (a-2) a polycaprolacton-modified hydroxyethyl(meth)acrylate; and (B) a radical-curing monomer having a viscosity of 400 mPa.s or less at 25° C., curing the coating film by irradiating the coating film with an ultraviolet light or an electron beam to form the light transmission layer.
    • 本发明提供一种光记录介质的制造方法,其具有:支撑基板; 传输激光束的光透射层; 以及形成在所述支撑基板和所述透光层之间的信息层,其包括:通过旋涂法在所述信息层上涂布树脂组合物以形成涂膜,其中所述树脂组合物含有作为主要成分的主要成分:(A) 通过使(a-1)具有三个以上与每一分子中的脂肪族碳原子结合的异氰酸酯基的化合物与(a-2)聚己内酯改性的羟乙基(A-1)反应而得到的自由基固化性氨基甲酸酯(甲基) 甲基)丙烯酸酯; 和(B)在25℃下粘度为400mPa.s以下的自由基固化性单体,通过用紫外线或电子束照射该涂膜使该涂膜固化,形成透光层。
    • 76. 发明授权
    • Method of testing optical information medium
    • 光信息媒体测试方法
    • US07484400B2
    • 2009-02-03
    • US10547787
    • 2004-03-04
    • Naoki HayashidaTatsuya KatoKazushi Tanaka
    • Naoki HayashidaTatsuya KatoKazushi Tanaka
    • G01N3/56B32B3/02
    • G11B23/0021G11B7/268Y10T428/21
    • A testing method capable of quantifying abrasion resistance on the translucent base surface of a high-recording-density optical information medium simply and in a form of reflecting an actual application environment, and judging criteria appropriate for the testing method. When an evaluation test in terms of abrasion resistance on a laser beam incident-side surface is conducted on an optical information medium to and/or from which recording and/or reproducing is made by a laser beam shone into an information recording layer from a translucent base side, and which has the focused radius R, of a recording/reproducing laser beam on the translucent base surface, of 40-400 μm, defined by the following expression (1) R=2T tan [sin−1 (NA/n)](1) (in the expression, T is the thickness (μm) of the translucent base, NA numerical aperture of an object lens in the recording/reproducing device, and n refractive index of the translucent base), the abrasion resistance on a laser beam incident-side surface is evaluated based on the error amount of a reproduction signal after a laser beam incident-side surface is abraded by an abrasion wheel specified in ISO9352.
    • 能够简单地以反映实际应用环境的形式来量化高记录密度光学信息介质的半透明基面上的耐磨性的测试方法,以及适用于测试方法的判断标准。 当在激光束入射侧表面上的耐磨性的评价试验在由光学信息介质进行和/或从哪个记录和/或再现由激光束照射到信息记录层中的半透明 (1)定义的40-400μm的记录/再现激光束的焦点半径R,由下式(1)定义:R = 2T tan [sin-1(NA / n )](1)(在表达式中,T是半透明基底的厚度(母体),记录/再现装置中的物镜的NA数值孔径,以及半透明基底的n折射率),耐磨损性 基于由ISO9352中规定的磨轮磨损激光束入射侧表面之后的再生信号的误差量来评价激光束入射侧面。
    • 78. 发明申请
    • Apparatus and method for irradiating electron beam
    • 用于照射电子束的装置和方法
    • US20060163499A1
    • 2006-07-27
    • US11338392
    • 2006-01-24
    • Naoyuki EchigoYo MaruiYoshihiro FuseMamoru UsamiKazushi TanakaMinao HimenoYukio Kaneko
    • Naoyuki EchigoYo MaruiYoshihiro FuseMamoru UsamiKazushi TanakaMinao HimenoYukio Kaneko
    • G21K5/10G01N23/00
    • G21K5/10
    • An electron beam irradiation apparatus includes an electron beam emission section having an electron beam irradiating tube that emits an electron beam; an electron beam irradiation section for irradiating the emitted electron beam to a target; a transfer mechanism for transferring the target to the electron beam irradiation section; a rotation mechanism for rotating the target on its own axis when irradiating the electron beam; and a linear movement mechanism for generating a relative linear movement such that the electron beam irradiating tube passes right above the target, between the target and the electron beam irradiating tube, when irradiating the electron beam. The linear movement mechanism generates a relative linear movement such that the electron beam irradiating tube goes from an end portion of the target toward the center of the target and turns back before the center of the electron beam emitting portion of the electron beam irradiating tube reaches the center of the target.
    • 电子束照射装置包括具有发射电子束的电子束照射管的电子束发射部分; 用于将发射的电子束照射到目标的电子束照射部分; 用于将靶转移到电子束照射部的转移机构; 旋转机构,用于在照射电子束时使靶在其自身轴上旋转; 以及用于产生相对线性运动的直线运动机构,使得当照射电子束时,电子束照射管在目标和电子束照射管的正上方通过。 线性移动机构产生相对线性运动,使得电子束照射管从靶的端部向靶的中心移动,并且在电子束照射管的电子束发射部分的中心到达之前返回 目标中心。