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71. 发明申请

US20070249946A1 Non-invasive cardiac monitor and methods of using continuously recorded cardiac data 有权
标题翻译：非侵入性心脏监测器和使用连续记录的心脏数据的方法
公开(公告)号：US20070249946A1
公开(公告)日：2007-10-25
申请号：US11703428
申请日：2007-02-06
申请人： Uday Kumar , Kit Au-Yeung , John White , Joseph Knight
发明人： Uday Kumar , Kit Au-Yeung , John White , Joseph Knight
IPC分类号： A61B5/0402
CPC分类号： A61B5/02438 , A61B5/0006 , A61B5/0408 , A61B5/0432 , A61B5/04325 , A61B5/411 , A61B5/6833 , A61B2560/0412 , A61B2560/0468 , G06F19/00 , G16H10/60 , G16H15/00 , G16H40/63
摘要： Embodiments of the invention provide methods of obtaining continuous cardiac information from a mammal. First, attach a self-contained, wearable, portable continuous cardiac monitor to the mammal to create a chamber containing electrodes used to detect cardiac signals from the mammal. Next, continuously detect without analyzing the cardiac signals from the mammal for at least 24 hours. Next, store information related to substantially all detected cardiac signals in the cardiac monitor.
摘要翻译：本发明的实施方案提供从哺乳动物获得连续心脏信息的方法。首先，向哺乳动物附上一个独立的，可携带的便携式连续心脏监测器，以产生含有用于检测来自哺乳动物的心脏信号的电极的腔室。接下来，连续检测不分析来自哺乳动物的心脏信号至少24小时。接下来，在心脏监视器中存储与基本上所有检测到的心脏信号相关的信息。

72. 发明申请

US20070090516A1 Heated substrate support and method of fabricating same 审中-公开
标题翻译：加热衬底支架及其制造方法
公开(公告)号：US20070090516A1
公开(公告)日：2007-04-26
申请号：US11341297
申请日：2006-01-27
申请人： John White
发明人： John White
IPC分类号： H01L23/12
CPC分类号： C23C16/4586 , H01L21/67103
摘要： A method and apparatus for forming a substrate support is provided herein. In one embodiment, the substrate support is fabricated by a process that includes forming a groove in a body, disposing a heater element in the groove, and welding the groove to enclose the heater element, wherein the welding forces at least a portion of the body into intimate contact with the heater element. In another embodiment, a method of forming a substrate support is provided that includes forming a groove in a body, disposing a heater element in the groove and stir welding the groove closed to encase the heater element.
摘要翻译：本文提供了一种用于形成衬底支撑件的方法和装置。在一个实施例中，衬底支撑件通过包括在主体中形成凹槽，在槽中设置加热器元件并且焊接凹槽以封闭加热器元件的工艺来制造，其中焊接力至少部分身体与加热器元件紧密接触。在另一个实施例中，提供了一种形成衬底支撑件的方法，其包括在主体中形成凹槽，将加热器元件设置在凹槽中，并且将封闭的加热器元件的凹槽搅拌焊接。

73. 发明申请

US20070060998A1 Endoluminal delivery system 有权
标题翻译：腔内输送系统
公开(公告)号：US20070060998A1
公开(公告)日：2007-03-15
申请号：US11445952
申请日：2006-06-01
申请人： Alexander Butterwick , Ashish Mitra , Martin Ng , John White
发明人： Alexander Butterwick , Ashish Mitra , Martin Ng , John White
IPC分类号： A61F2/06
CPC分类号： A61F2/064 , A61F2/0077 , A61F2/07 , A61F2/90 , A61F2/958 , A61F2002/30448 , A61F2220/005 , A61F2250/0068 , A61L29/16 , A61L31/16 , A61L2300/62
摘要： An endoluminal delivery system is provided having an endoluminal prosthesis sized to fit through a body lumen in a first unexpanded state, where a second state is an expanded relative to the first state. At least one delivery capsule is incorporated to the outer wall of the endoluminal prosthesis, where each one of the delivery capsules has a predetermined delivery pressure. There is at least one reactant in the delivery capsule, where the endoluminal prosthesis is expanded from the first state to the second state to expand the endoluminal prosthesis against the body lumen and induce the predetermined delivery pressure to the delivery capsule, and deliver the reactants to the body lumen according to desired positioning and timing. At least one containment band incorporated to the outer wall of the endoluminal prosthesis and positioned near the delivery capsules to localize the reactants.
摘要翻译：提供了一种腔内递送系统，其具有尺寸适于穿过第一未展开状态的体腔的腔内假体，其中第二状态相对于第一状态是扩张的。至少一个输送胶囊被并入到腔内假体的外壁，其中每个输送胶囊具有预定的输送压力。在输送胶囊中存在至少一种反应物，其中腔内假体从第一状态扩张到第二状态，以将内腔假体膨胀抵靠体腔，并且将预定的输送压力输送到输送胶囊，并将反应物递送到体腔根据所需的定位和定时。至少一个容纳带，其结合到内腔假体的外壁并且定位在输送胶囊附近以使反应物定位。

74. 发明申请

US20070056850A1 Large-area magnetron sputtering chamber with individually controlled sputtering zones 审中-公开
标题翻译：具有单独控制溅射区的大面积磁控溅射室
公开(公告)号：US20070056850A1
公开(公告)日：2007-03-15
申请号：US11225922
申请日：2005-09-13
申请人： Yan Ye , John White , Akihiro Hosokawa , Hienminh Le
发明人： Yan Ye , John White , Akihiro Hosokawa , Hienminh Le
IPC分类号： C23C14/00
CPC分类号： C23C14/352 , C23C14/3407
摘要： The present invention generally provides an apparatus for processing a surface of a substrate in a physical vapor deposition (PVD) chamber that has a sputtering target that has separately biasable sections, regions or zones to improve the deposition uniformity. In general, aspects of the present invention can be used for flat panel display processing, semiconductor processing, solar cell processing, or any other substrate processing. In one aspect, each of the target sections of the multizone target assembly are biased at a different cathodic biases by use of one or more DC or RF power sources. In one aspect, each of the target sections of the multizone target assembly are biased at a different cathodic biases by use of one power source and one or more resistive, capacitive and/or inductive elements. In one aspect, the processing chamber contains a multizone target assembly that has one or more ports that are adapted deliver a processing gas to the processing region of the PVD chamber. In one aspect, the processing chamber contains a multizone target assembly that has one or more magnetron assemblies positioned adjacent to one or more of the target sections.
摘要翻译：本发明总体上提供了一种用于处理物理气相沉积（PVD）室中的衬底的表面的设备，其具有具有可分离的偏压部分，区域或区域以提高沉积均匀性的溅射靶。通常，本发明的各方面可用于平板显示处理，半导体处理，太阳能电池处理或任何其它基板处理。在一个方面，通过使用一个或多个DC或RF电源将多区域目标组件的每个目标区段偏置在不同的阴极偏压。在一个方面，通过使用一个电源和一个或多个电阻，电容和/或电感元件，多区域目标组件的每个目标部分被偏置在不同的阴极偏压。在一个方面，处理室包含一个多区域目标组件，其具有适于将处理气体输送到PVD室的处理区域的一个或多个端口。在一个方面，处理室包含一个多区域目标组件，其具有邻近一个或多个目标区段定位的一个或多个磁控管组件。

75. 发明申请

US20070056843A1 Method of processing a substrate using a large-area magnetron sputtering chamber with individually controlled sputtering zones 审中-公开
标题翻译：使用具有单独控制的溅射区域的大面积磁控溅射室来处理衬底的方法
公开(公告)号：US20070056843A1
公开(公告)日：2007-03-15
申请号：US11225923
申请日：2005-09-13
申请人： Yan Ye , John White , Akihiro Hosokawa , Hienminh Le
发明人： Yan Ye , John White , Akihiro Hosokawa , Hienminh Le
IPC分类号： C23C14/32
CPC分类号： C23C14/3407 , C23C14/352
摘要： The present invention generally provides a method for processing a surface of a substrate in a physical vapor deposition (PVD) chamber that has a sputtering target that has separately biasable sections, regions or zones to improve the deposition uniformity. In general, aspects of the present invention can be used for flat panel display processing, semiconductor processing, solar cell processing, or any other substrate processing. In one aspect, each of the target sections of the multizone target assembly are biased at a different cathodic biases by use of one or more DC or RF power sources. In one aspect, each of the target sections of the multizone target assembly are biased at a different cathodic biases by use of one power source and one or more resistive, capacitive and/or inductive elements. In one aspect, the processing chamber contains a multizone target assembly that has one or more ports that are adapted deliver a processing gas to the processing region of the PVD chamber. In one aspect, the processing chamber contains a multizone target assembly that has one or more magnetron assemblies positioned adjacent to one or more of the target sections.
摘要翻译：本发明通常提供了一种用于处理物理气相沉积（PVD）室中的衬底的表面的方法，所述物理气相沉积（PVD）室具有分离的偏压部分，区域或区域以提高沉积均匀性的溅射靶。通常，本发明的各方面可用于平板显示处理，半导体处理，太阳能电池处理或任何其它基板处理。在一个方面，通过使用一个或多个DC或RF电源将多区域目标组件的每个目标区段偏置在不同的阴极偏压。在一个方面，通过使用一个电源和一个或多个电阻，电容和/或电感元件，多区域目标组件的每个目标部分被偏置在不同的阴极偏压。在一个方面，处理室包含一个多区域目标组件，其具有适于将处理气体输送到PVD室的处理区域的一个或多个端口。在一个方面，处理室包含一个多区域目标组件，其具有邻近一个或多个目标区段定位的一个或多个磁控管组件。

76. 发明申请

US20070048451A1 Substrate movement and process chamber scheduling 审中-公开
标题翻译：基板运动和加工室调度
公开(公告)号：US20070048451A1
公开(公告)日：2007-03-01
申请号：US11213349
申请日：2005-08-26
申请人： John White , Takako Takehara , Inchen Huang
发明人： John White , Takako Takehara , Inchen Huang
IPC分类号： B05D1/36 , C23C28/00 , B05D5/12 , C23C16/00
CPC分类号： C23C14/568 , C23C14/165 , C23C14/185 , C23C14/205 , C23C14/566 , H01L21/67184 , H01L21/67201 , H01L21/67207 , H01L21/67236 , H01L21/67745
摘要： A method for depositing tree or more layers on two or more substrates using various chambers in a substrate processing system is provided. In addition, the invention provides substrate transfer methods and suitable substrate processing systems to maximize the throughput of the substrate processing systems and minimizing system footprint. The movements of a transfer robot in the substrate processing system are specifically configured for scheduling two or more process chambers in order to transfer multiple substrates and exchange the substrates between two chambers of the substrate processing system.
摘要翻译：提供了一种用于在衬底处理系统中使用各种腔室在两个或多个衬底上沉积树或更多层的方法。此外，本发明提供了衬底转移方法和合适的衬底处理系统，以最大限度地提高衬底处理系统的生产能力并使系统占地面积最小化。基板处理系统中的传送机器人的移动被具体地配置为调度两个或更多个处理室，以便传送多个基板并在基板处理系统的两个室之间更换基板。

77. 发明申请

US20070021043A1 Chemical mechanical polishing apparatus with rotating belt 有权
公开(公告)号：US20070021043A1
公开(公告)日：2007-01-25
申请号：US11531272
申请日：2006-09-12
申请人： Manoocher Birang , Lawrence Rosenberg , Sasson Somekh , John White
发明人： Manoocher Birang , Lawrence Rosenberg , Sasson Somekh , John White
IPC分类号： B24B21/00
CPC分类号： B24B21/004 , B24B21/008 , B24B21/04 , B24B27/0023 , B24B37/04 , B24B37/16 , B24B37/24 , B24B37/245 , B24B53/017 , B24D7/12 , H01L21/30625
摘要： A chemical mechanical polishing apparatus has a movable platen, a drive mechanism and a chucking mechanism. The drive mechanism is attached to the platen, is configured to support a generally linear polishing sheet with a portion of the polishing sheet extending over the platen, and is configured to incrementally advance the polishing sheet in a linear direction relative to the platen. The chucking mechanism is configured to intermittently secure the portion of the polishing sheet to the platen.

78. 发明申请

US20060289305A1 Centering mechanism for aligning sputtering target tiles 审中-公开
标题翻译：对准溅射靶砖的定心机构
公开(公告)号：US20060289305A1
公开(公告)日：2006-12-28
申请号：US11167628
申请日：2005-06-27
申请人： John White
发明人： John White
IPC分类号： C23C14/00
CPC分类号： C23C14/3407 , H01J37/3423 , H01J37/3435 , H01J37/3491
摘要： In a sputtering target assembly comprising a plurality of tiles bonded to a target backing plate with gaps formed between the tiles, centering mechanisms for aligning and centering each of the tiles to the backing plate. The centering mechanism for each tiles can comprise a two or three grooves formed in the backing plate along axes intersecting near the tile center and slidably accommodating corresponding pins extending from the tile. Alternately, a pin and groove can be combined with another tile pin and a circular hole in the backing plate near the tile center.
摘要翻译：在包括多个瓦片的溅射靶组件中，所述多个瓦片粘合到具有在瓦片之间形成的间隙的目标背板，定心机构用于对准和定中每个瓦片到背板。每个瓦片的定心机构可以包括沿着与瓦片中心相交的轴线在背板中形成的两个或三个凹槽，并且可滑动地容纳从瓦片延伸的相应的销。或者，销和槽可以与瓦片中心附近的垫板中的另一个瓦片销和圆形孔组合。

79. 发明申请

US20060280588A1 Substrate conveyor system 失效
标题翻译：基板输送机系统
公开(公告)号：US20060280588A1
公开(公告)日：2006-12-14
申请号：US11176861
申请日：2005-07-07
申请人： Wendell Blonigan , John White
发明人： Wendell Blonigan , John White
IPC分类号： B65G1/133 , H01L21/677
CPC分类号： B65G49/064 , B65G2249/02 , B65G2249/04 , H01L21/67706 , H01L21/67709 , H01L21/67736
摘要： Embodiments of a vacuum conveyor system are provided herein. In one embodiment, apparatus for conveying a substrate includes a vacuum sleeve and a plurality of rollers disposed within the vacuum sleeve for supporting and transporting the substrate thereupon. The plurality of rollers is adapted to simultaneously support the substrate thereupon at a plurality of elevations. A leading edge of the substrate is supported at an elevation above an adjacent one of the plurality of rollers in the direction of travel.
摘要翻译：本文提供了真空输送系统的实施例。在一个实施例中，用于输送基板的装置包括真空套筒和设置在真空套筒内的多个辊，用于在其上支撑和运输基板。多个辊适于在多个高度处同时支撑基底。基板的前缘在行进方向上支撑在多个辊中的相邻的一个上方的高度上。

80. 发明申请

US20060278497A1 Linear vacuum deposition system 失效
标题翻译：线性真空沉积系统
公开(公告)号：US20060278497A1
公开(公告)日：2006-12-14
申请号：US11176085
申请日：2005-07-07
申请人： John White , Wendell Blonigan
发明人： John White , Wendell Blonigan
IPC分类号： B23Q7/00
CPC分类号： H01L21/67739 , C23C14/56 , C23C14/568 , C23C16/54
摘要： Embodiments of a vacuum conveyor system are provided herein. In one embodiment a vacuum conveyor system includes a first vacuum sleeve having a plurality of rollers that support and move substrates through the first vacuum sleeve. A port is provided for sealably coupling the first vacuum sleeve to a process chamber. A first substrate handler is disposed proximate the port. Multiple ports may be provided for sealably coupling the first vacuum sleeve to a plurality of process chambers. A dedicated substrate handler is provided for each process chamber. A second vacuum sleeve may be sealably coupled to an opposing side of the process chambers. The vacuum conveyor system may be modular with independent modules linked via load lock chambers. The plurality of rollers may compensate for any sag of the leading edge of a substrate being transported thereupon.
摘要翻译：本文提供了真空输送系统的实施例。在一个实施例中，真空输送系统包括具有支撑并移动基板通过第一真空套筒的多个辊的第一真空套筒。提供端口用于将第一真空套筒密封地联接到处理室。第一衬底处理器设置在端口附近。可以提供多个端口用于将第一真空套管密封地联接到多个处理室。为每个处理室提供专用的基板处理器。第二真空套筒可以密封地联接到处理室的相对侧。真空输送系统可以是模块化的，具有通过负载锁定室连接的独立模块。多个辊可以补偿在其上运送的基板的前缘的任何下垂。

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