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    • 71. 发明授权
    • Flare measuring mask and flare measuring method of semiconductor aligner
    • 半导体校准器的耀斑测量面罩和耀斑测量方法
    • US07186481B2
    • 2007-03-06
    • US10761215
    • 2004-01-22
    • Yasuhiro YamamotoAkira Watanabe
    • Yasuhiro YamamotoAkira Watanabe
    • G03F9/00
    • G03F7/7085G03F1/44
    • A flare measuring mask and a flare measuring method are capable of measuring flare at high sensitivity by an optical measuring instrument. The first measuring portion has a double cross shielding area including first stripe-shaped shielding portions of the same figure aligned in parallel at regular intervals and third stripe-shaped shielding portions of the same figure aligned in parallel at regular intervals, crossing with the first shielding portions at right angles, and the second measuring portion includes second-stripe shaped shielding portions identical to the first shielding portions of the first measuring portion and fourth stripe-shaped shielding portions identical to the third shielding portions, crossing with the second shielding portions at right angles in a central portion. In the resist length measuring process, the presence of the flare is checked by measuring the length of the resist pattern corresponding to the respective shielding portions in the longitudinal direction.
    • 耀斑测量面罩和耀斑测量方法能够通过光学测量仪器以高灵敏度测量耀斑。 第一测量部分具有双交叉屏蔽区域,包括以规则间隔平行排列的同一图形的第一条形屏蔽部分和同一图形的第三条形屏蔽部分以规则间隔平行排列,与第一屏蔽 第二测量部分包括与第一测量部分的第一屏蔽部分相同的第二条形屏蔽部分和与第三屏蔽部分相同的第四条形屏蔽部分,与第二屏蔽部分在右边交叉 中心部分的角度。 在抗蚀剂长度测量过程中,通过测量与纵向上各个屏蔽部分对应的抗蚀剂图案的长度来检查闪光的存在。
    • 72. 发明申请
    • METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE
    • 制造半导体器件的方法
    • US20060199089A1
    • 2006-09-07
    • US11306380
    • 2005-12-27
    • Akira WatanabeYasuhiro Yamamoto
    • Akira WatanabeYasuhiro Yamamoto
    • G06F17/50G03C5/00
    • G03F7/70641G03F7/70625
    • A method for manufacturing a semiconductor device is disclosed. The method can assess exposure conditions by forming a predetermined assessment pattern on a principal surface of a semiconductor wafer. The predetermined assessment pattern includes a first assessment pattern having a remaining pattern, and a second assessment pattern which includes a remaining pattern formed in a position lower than the first assessment pattern in the direction of the optical axis of an exposure device. The method includes a preparation step, and a step of manufacturing an actual semiconductor device. The preparation step includes a forming step, a measuring step, a calculating step, and a creating step. The step of manufacturing an actual semiconductor device includes a forming step, a measuring step, a calculating step and an assessing step.
    • 公开了一种制造半导体器件的方法。 该方法可以通过在半导体晶片的主表面上形成预定的评估图案来评估曝光条件。 预定评估图案包括具有剩余图案的第一评估图案和包括在曝光装置的光轴方向上形成在比第一评估图案低的位置的剩余图案的第二评估图案。 该方法包括制备步骤和制造实际半导体器件的步骤。 准备步骤包括形成步骤,测量步骤,计算步骤和创建步骤。 制造实际半导体器件的步骤包括形成步骤,测量步骤,计算步骤和评估步骤。
    • 75. 发明申请
    • Image processing device
    • 图像处理装置
    • US20060001929A1
    • 2006-01-05
    • US11169917
    • 2005-06-30
    • Yasuhiro Yamamoto
    • Yasuhiro Yamamoto
    • G06F15/00H04N1/46
    • H04N1/40
    • An image is divided into first and second images, whose pixel data are processed using different processors simultaneously. The pixel data of the first and second image is stored in a first memory field and a second memory field including top and lower fields. The processed data produced from the pixel data of the first image (the first processed data) is stored in the first memory field. The processed data produced from the top line of the second image (the partial processed data) is temporarily stored in a temporary memory field. The processed data produced from the other lines of the second image except for the top line (the second processed data) is stored in the lower field. The partial processed data which is temporarily stored in a temporary memory field is stored in the upper field after the second image processed data has finished being stored.
    • 图像被分成第一和第二图像,其像素数据被同时使用不同的处理器处理。 第一和第二图像的像素数据被存储在包括顶部和下部场的第一存储器字段和第二存储器字段中。 从第一图像的像素数据(第一处理数据)产生的处理数据被存储在第一存储器字段中。 从第二图像的顶行产生的处理数据(部分处理的数据)被临时存储在临时存储器字段中。 从除了顶行(第二处理数据)之外的第二图像的其他行生成的处理数据被存储在下部字段中。 暂时存储在临时存储器字段中的部分处理数据在第二图像处理数据被存储完成之后被存储在上部场中。
    • 78. 发明申请
    • Compiler apparatus and linker apparatus
    • 编译器装置和连接器装置
    • US20050086651A1
    • 2005-04-21
    • US10950397
    • 2004-09-28
    • Yasuhiro YamamotoHajime OgawaTaketo HeishiShohei Michimoto
    • Yasuhiro YamamotoHajime OgawaTaketo HeishiShohei Michimoto
    • G06F12/08G06F9/45
    • G06F8/4442
    • A compiler capable of increasing the hit rate of the cache memory is a compiler that targets at a computer having a cache memory, and that converts a source program into an object program, the compiler causing a computer to execute the following steps: a grouping step of analyzing grouping information that is used for grouping data objects included in the source program, and placing said data objects into groups based on a result of said analysis; and an object program generation step of generating the object program based on a result of the grouping performed in the grouping step, said object program not allowing data objects belonging to different groups to be laid out in any blocks with the same set number on the cache memory.
    • 能够增加高速缓冲存储器的命中率的编译器是在具有高速缓存存储器的计算机上进行目标的编译器,并且将源程序转换为对象程序,编译器使计算机执行以下步骤:分组步骤 分析用于对源程序中包括的数据对象进行分组的分组信息,以及基于所述分析的结果将所述数据对象分组成组; 以及目标程序生成步骤,基于在分组步骤中执行的分组的结果生成对象程序,不允许属于不同组的数据对象的任何对象程序被布置在高速缓存上具有相同设定编号的任何块中 记忆。
    • 79. 发明授权
    • Image reading device
    • 图像读取装置
    • US06862119B1
    • 2005-03-01
    • US09385417
    • 1999-08-30
    • Yasuhiro Yamamoto
    • Yasuhiro Yamamoto
    • H04N1/04
    • H04N1/00912H04N1/04H04N2201/0408H04N2201/0416
    • The image reading device has a reading operation control processor that automatically starts a reading operation. In the reading operation, first, it is determined whether a film is attached to the image reading device. When the film is not attached to the image reading device, the reading operation is not proceeded. Conversely, when the film is attached to the image reading device, a pre-scanning operation is performed in which an image recorded in a film is read with a relatively coarse pitch, after a waiting time has passed. Then, a regular scanning operation is performed in which the image is read with a pitch finer than that of the pre-scanning operation.
    • 图像读取装置具有自动开始读取操作的读取操作控制处理器。 在读取操作中,首先,确定胶片是否附着在图像读取装置上。 当胶片未附着到图像读取装置时,读取操作不进行。 相反,当胶片附着到图像读取装置时,在等待时间过去之后,执行预扫描操作,其中以相对较粗的音调读取记录在胶卷中的图像。 然后,执行以比预扫描操作更精细的音调读取图像的常规扫描操作。
    • 80. 发明授权
    • Exposure control device of image reading device
    • 图像读取装置的曝光控制装置
    • US06750994B1
    • 2004-06-15
    • US09379602
    • 1999-08-24
    • Yasuhiro Yamamoto
    • Yasuhiro Yamamoto
    • G03F308
    • H04N1/40056H04N1/4074H04N2201/0404H04N2201/0416
    • The exposure control device has a line sensor sensing image data corresponding to a color image recorded in a negative film. The line sensor is exposed using first, second and third exposure times so that image data are obtained for each of the exposure times. Histograms, representing a distribution of pixel values of the each of image data, are generated for each of the exposure times. Regarding each of the histograms, maximum effective values are obtained. A first histogram, in which the maximum effective value is the greatest, is selected. The optimum exposure time is calculated, based on the maximum effective value (Hr2D) of the first histogram and the maximum effective value (Hr1D) of the second histogram which corresponds to image data, obtained by an exposure time which is subsequently shorter than the exposure time of the first histogram.
    • 曝光控制装置具有感测与记录在负片中的彩色图像相对应的图像数据的线传感器。 使用第一,第二和第三曝光时间曝光线传感器,从而获得每个曝光时间的图像数据。 针对每个曝光时间产生表示每个图像数据的像素值分布的直方图。 关于每个直方图,获得最大有效值。 选择最大有效值最大的第一直方图。 基于第一直方图的最大有效值(Hr2D)和对应于图像数据的第二直方图的最大有效值(Hr1D)计算最佳曝光时间,该曝光时间随后比曝光时间短 第一个直方图的时间。