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    • 75. 发明申请
    • X-RAY GENERATING APPARATUS AND CONTROL METHOD THEREOF
    • X射线发生装置及其控制方法
    • US20110235783A1
    • 2011-09-29
    • US13043982
    • 2011-03-09
    • Takao OguraIchiro NomuraKazuyuki UedaOsamu Tsujii
    • Takao OguraIchiro NomuraKazuyuki UedaOsamu Tsujii
    • H05G1/32
    • H05G1/32H01J35/08H01J35/16H01J2235/087H01J2235/166H05G1/30
    • An X-ray generating apparatus controls driving of an X-ray tube. The X-ray tube includes an electron source emitting electrons due to application of a voltage, a transmission-type target generating an X-ray due to collision of electrons emitted from the electron source, and a shield member disposed between the electron source and the transmission-type target, the shield member having an opening that electrons emitted from the electron source pass through, and blocking an X-ray that scatters toward the electron source. When generating the X-ray, application of a voltage to the transmission-type target is started, and emission of electrons from the electron source is caused after passage of a predetermined period indicating a time period from starting voltage application until the transmission-type target reaches a predetermined voltage. When stopping X-ray generation, application of the voltage to the transmission-type target is stopped after stopping the emission of electrons from the electron source.
    • X射线发生装置控制X射线管的驱动。 X射线管包括由于施加电压而发射电子的电子源,由于从电子源发射的电子的碰撞而产生X射线的透射型靶以及设置在电子源与电子源之间的屏蔽部件 透射型靶,具有从电子源发射的电子通过的开口的屏蔽构件,以及阻挡向电子源散射的X射线。 当产生X射线时,开始向透射型靶标施加电压,并且在经过指示从启动电压施加到发射型靶标的时间段的预定周期之后引起来自电子源的电子发射 达到预定电压。 当停止X射线产生时,在停止从电子源发射电子之后停止向透射型靶施加电压。
    • 76. 发明授权
    • Semiconductor laser
    • 半导体激光器
    • US07656918B2
    • 2010-02-02
    • US11688275
    • 2007-03-20
    • Katsumi KishinoIchiro NomuraTsunenori AsatsumaHitoshi Nakamura
    • Katsumi KishinoIchiro NomuraTsunenori AsatsumaHitoshi Nakamura
    • H01S3/16H01S3/04
    • H01S5/327H01S5/3018H01S5/3216
    • A semiconductor laser having an n-cladding layer, an optical guide layer, an active layer, an optical guide layer, and a p-cladding layer above an InP substrate, in which the active layer has a layer constituted with Be-containing group II-VI compound semiconductor mixed crystals, and at least one of layers of the n-cladding layer, the optical guide layer, and the p-cladding layer has a layer constituted with elements identical with those of the Be-containing group II-VI compound semiconductor mixed crystals of the active layer, and the layer is constituted with a superlattice structure comprising, as a well layer, mixed crystals of a Be compositions with the fluctuation of the composition being within ±30% compared with the Be composition of the group II-VI compound semiconductor mixed crystals of the active layer, whereby the device characteristics of the semiconductor laser comprising the Be-containing group II-VI compound semiconductor matched with the InP substrate.
    • 一种在InP衬底上方具有n包层,导光层,有源层,导光层和p包覆层的半导体激光器,其中活性层具有由含Be的基团II构成的层 -VI化合物半导体混晶,并且n包层,导光层和p包层的层中的至少一层具有由与含Be的II-VI族化合物相同的元素构成的层 活性层的半导体混合晶体,并且该层由超晶格结构构成,该超晶格结构包括与组II的Be组分相比,Be组分与组合物的波动在±30%以内的混合晶体作为阱层 -VI化合物半导体混合晶体,由此包括与InP衬底相匹配的含Be基团II-VI化合物半导体的半导体激光器的器件特性。
    • 77. 发明申请
    • Optical semiconductor devices on InP substrate
    • InP衬底上的光学半导体器件
    • US20070051937A1
    • 2007-03-08
    • US11500292
    • 2006-08-08
    • Katsumi KishinoIchiro NomuraKoshi TamamuraHitoshi Nakamura
    • Katsumi KishinoIchiro NomuraKoshi TamamuraHitoshi Nakamura
    • H01L29/06
    • H01S5/347B82Y20/00H01L31/0296H01L31/035236H01L33/06H01L33/28H01S5/0218H01S2304/02
    • The present invention aims at providing a structure in which a high p-type carrier concentration of 1×1017 cm−3 or more is obtained in a material in which, although it shows normally p-type conductivity, a carrier concentration smaller than 1×1017 cm−3 is only obtained. Also, the present invention aims at providing highly reliable semiconductor element and device each of which has excellent characteristics such as light emitting characteristics and a long lifetime. Each specific layer, i.e., each ZnSe0.53Te0.47 layer (2ML) is inserted between host layers, i.e., Mg0.5Zn0.29Cd0.21Se layers (each having 10ML (atomic layer) thickness) each of which is lattice matched to an InP substrate. In this case, each specific layer in which a sufficient carrier concentration of 1×1018 cm−3 or more is obtained when a single layer is inserted at suitable intervals. As a result, a sufficient hole concentration of 1×1017 cm−3 or more is obtained in the overall crystal in a material in which a hole concentration smaller than 1×1017 cm−3 has been only conventionally obtained.
    • 本发明的目的在于提供一种结构,其中在其中显示出1×10 17 -3 -3以上的高p型载流子浓度的材料中获得 通常是p型导电性,仅获得小于1×10 17 cm -3的载流子浓度。 另外,本发明的目的在于提供高度可靠的半导体元件和器件,其各自具有优异的特性,例如发光特性和长寿命。 每个特定层,即每个ZnSe 0.53 Te 0.47层(2ML)被插入到主体层之间,即Mg 0.5 Zn 2+ 每个都具有与InP衬底晶格匹配的Se层(每个具有10ML(原子层)厚度)。 在这种情况下,当以适当的间隔插入单层时,获得其中足够的载流子浓度为1×10 18 cm -3以上的特定层。 结果,在其中空穴浓度小于1×10 6Ω的材料中,在整个晶体中获得足够的空穴浓度为1×10 17 cm -3以上的空穴浓度。 只有传统上获得了17厘米-3 -3。
    • 78. 发明授权
    • II-VI compound semiconductor crystal and photoelectric conversion device
    • II-VI化合物半导体晶体和光电转换器件
    • US07045871B2
    • 2006-05-16
    • US11115182
    • 2005-04-27
    • Katsumi KishinoIchiro NomuraSong-Bek CheKenji Sato
    • Katsumi KishinoIchiro NomuraSong-Bek CheKenji Sato
    • H01L31/272
    • H01L33/28H01L31/0296
    • Since a ZnTe-base compound semiconductor crystal was designed so as to have, on a ZnTe-base compound semiconductor layer, an n-type contact layer which includes a superlattice layer having n-type CdSe and n-type ZnTe grown with each other or a ZnCdSeTe-graded layer, it was made possible to raise carrier concentration of the n-type contact layer, and to control the conductivity type in a relatively easy manner.Moreover, formation of a CdSe/ZnTe superlattice layer or a ZnCdSeTe-graded layer between the contact layer and an electrode can prevent electric resistance from being increased due to difference in the energy gaps. Since CdSe and ZnTe, composing the CdSe/ZnTe superlattice or ZnCdSeTe composition-graded layer, have relatively close lattice constants, formation thereof is less likely to adversely affect the crystallinity of the semiconductor crystal, which is advantageous in obtaining the semiconductor crystal with an excellent quality.
    • 由于ZnTe基化合物半导体晶体被设计成在ZnTe基化合物半导体层上具有n型接触层,该n型接触层包括彼此生长的具有n型CdSe和n型ZnTe的超晶格层,或者 ZnCdSeTe梯度层,可以提高n型接触层的载流子浓度,并以相对容易的方式控制导电类型。 此外,在接触层和电极之间形成CdSe / ZnTe超晶格层或ZnCdSeTe梯度层可以防止由于能隙的差异而导致的电阻增加。 由于构成CdSe / ZnTe超晶格或ZnCdSeTe组成梯度层的CdSe和ZnTe具有相对较近的晶格常数,所以其形成不太可能不利地影响半导体晶体的结晶度,这有利于获得具有优异的半导体晶体 质量。
    • 79. 发明申请
    • II-VI compound semiconductor crystal and photoelectric conversion device
    • II-VI化合物半导体晶体和光电转换器件
    • US20050189553A1
    • 2005-09-01
    • US11115182
    • 2005-04-27
    • Katsumi KishinoIchiro NomuraSong-Bek CheKenji Sato
    • Katsumi KishinoIchiro NomuraSong-Bek CheKenji Sato
    • H01L31/0296H01L33/06H01L33/28H01L33/40H01L29/22
    • H01L33/28H01L31/0296
    • Since a ZnTe-base compound semiconductor crystal was designed so as to have, on a ZnTe-base compound semiconductor layer, an n-type contact layer which includes a superlattice layer having n-type CdSe and n-type ZnTe grown with each other or a ZnCdSeTe-graded layer, it was made possible to raise carrier concentration of the n-type contact layer, and to control the conductivity type in a relatively easy manner. Moreover, formation of a CdSe/ZnTe superlattice layer or a ZnCdSeTe-graded layer between the contact layer and an electrode can prevent electric resistance from being increased due to difference in the energy gaps. Since CdSe and ZnTe, composing the CdSe/ZnTe superlattice or ZnCdSeTe composition-graded layer, have relatively close lattice constants, formation thereof is less likely to adversely affect the crystallinity of the semiconductor crystal, which is advantageous in obtaining the semiconductor crystal with an excellent quality.
    • 由于ZnTe基化合物半导体晶体被设计成在ZnTe基化合物半导体层上具有n型接触层,该n型接触层包括彼此生长的具有n型CdSe和n型ZnTe的超晶格层,或者 ZnCdSeTe梯度层,可以提高n型接触层的载流子浓度,并以相对容易的方式控制导电类型。 此外,在接触层和电极之间形成CdSe / ZnTe超晶格层或ZnCdSeTe梯度层可以防止由于能隙的差异而导致的电阻增加。 由于构成CdSe / ZnTe超晶格或ZnCdSeTe组成梯度层的CdSe和ZnTe具有相对较近的晶格常数,所以其形成不太可能不利地影响半导体晶体的结晶度,这有利于获得具有优异的半导体晶体 质量。
    • 80. 发明授权
    • II-VI compound semiconductor crystal
    • II-VI化合物半导体晶体
    • US06933519B2
    • 2005-08-23
    • US10381880
    • 2002-08-02
    • Katsumi KishinoIchiro NomuraSong-Bek CheKenji Sato
    • Katsumi KishinoIchiro NomuraSong-Bek CheKenji Sato
    • H01L31/0296H01L33/06H01L33/28H01L33/40H01L29/06
    • H01L33/28H01L31/0296
    • The present invention relates to a II-VI compound semiconductor crystal comprising an n-type contact layer which includes a superlattice layer comprising n-type CdSe and n-type ZnTe stacked with each other, on a ZnTe-base compound semiconductor layer; a A II-VI compound semiconductor crystal comprising an n-type contact layer which includes an n-type ZnCdSeTe composition-graded layer in which composition of Zn, Cd, Se and Te is gradually varies, on a ZnTe-base compound semiconductor layer; a II-VI compound semiconductor crystal comprising a p-type contact layer which includes a superlattice layer comprising p-type CdSe and p-type ZnTe stacked with each other, on a CdSe-base compound semiconductor layer; and a II-VI compound semiconductor crystal comprising a p-type contact layer which includes a p-type ZnCdSeTe composition-graded layer in which composition of Zn, Cd, Se and Te is gradually varied, on a CdSe-base compound semiconductor layer.
    • 本发明涉及包含n型接触层的II-VI族化合物半导体晶体,所述n型接触层包括在ZnTe基化合物半导体层上彼此堆叠的包含n型CdSe和n型ZnTe的超晶格层; 包括在ZnTe基化合物半导体层上包含Zn,Cd,Se和Te的组成逐渐变化的n型ZnCdSeTe组成梯度层的n型接触层的A II-VI化合物半导体晶体; 包括p型接触层的II-VI族化合物半导体晶体,其包含在CdSe基化合物半导体层上彼此堆叠的包含p型CdSe和p型ZnTe的超晶格层; 以及包含在CdSe基化合物半导体层上包含Zn,Cd,Se和Te的组成逐渐变化的p型ZnCdSeTe组成分级层的p型接触层的II-VI族化合物半导体晶体。