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71. 发明授权

US07821654B2 System for scatterometric measurements and applications 有权
标题翻译：散射测量和应用系统
公开(公告)号：US07821654B2
公开(公告)日：2010-10-26
申请号：US12410379
申请日：2009-03-24
申请人： Anatoly Fabrikant , Guoheng Zhao , Daniel C. Wack , Mehrdad Nikoonahad
发明人： Anatoly Fabrikant , Guoheng Zhao , Daniel C. Wack , Mehrdad Nikoonahad
IPC分类号： G01B11/34 , G01J4/00
CPC分类号： G01N21/45 , G01N21/21 , G01N21/4788 , G01N21/9501 , G01N2021/213 , G01N2021/217 , G01N2021/8416 , G02B5/18
摘要： Instead of constructing a full multi-dimensional look-up-table as a model to find the critical dimension or other parameters in scatterometry, regression or other optimized estimation methods are employed starting from a “best guess” value of the parameter. Eigenvalues of models that are precalculated may be stored and reused later for other structures having certain common characteristics to save time. The scatterometric data that is used to find the value of the one or more parameter can be limited to those at wavelengths that are less sensitive to the underlying film characteristics. A model for a three-dimensional grating may be constructed by slicing a representative structure into a stack of slabs and creating an array of rectangular blocks to approximate each slab. One dimensional boundary problems may be solved for each block which are then matched to find a two-dimensional solution for the slab. A three-dimensional solution can then be constructed from the two-dimensional solutions for the slabs to yield the diffraction efficiencies of the three-dimensional grating. This model can then be used for finding the one or more parameters of the diffracting structure in scatterometry. Line roughness of a surface can be measured by directing a polarized incident beam in an incident plane normal to the line grating and measuring the cross-polarization coefficient. The value of the one or more parameters may then be supplied to a stepper or etcher to adjust a lithographic or etching process.
摘要翻译：不需要构建一个完整的多维查找表作为模型来查找散点图中的关键维度或其他参数，而是从参数的“最佳猜测”值开始采用回归或其他优化的估计方法。预先计算的模型的特征值可以稍后存储并重用于具有某些共同特征的其他结构以节省时间。用于查找一个或多个参数的值的散点数据可以限于那些对底层薄膜特性较不敏感的波长数据。三维光栅的模型可以通过将代表性结构切片成一叠平板并且产生矩形块阵列来近似每个平板来构造。可以为每个块解决一维边界问题，然后将其匹配以找到板的二维解。然后可以从板的二维解决方案中构建三维解，以产生三维光栅的衍射效率。然后，该模型可用于在散射测量中找到衍射结构的一个或多个参数。可以通过将垂直于线光栅的入射平面中的偏振入射光束引导并测量交叉极化系数来测量表面的线粗糙度。然后可以将一个或多个参数的值提供给步进器或蚀刻器以调整光刻或蚀刻工艺。

72. 发明申请

US20090190141A1 SYSTEM FOR MEASURING A SAMPLE WITH A LAYER CONTAINING A PERIODIC DIFFRACTING STRUCTURE 审中-公开
标题翻译：用于测量具有周期性差分结构的层的样品的系统
公开(公告)号：US20090190141A1
公开(公告)日：2009-07-30
申请号：US12419158
申请日：2009-04-06
申请人： Noah Bareket , Daniel C. Wack , Guoheng Zhao
发明人： Noah Bareket , Daniel C. Wack , Guoheng Zhao
IPC分类号： G01B11/06
CPC分类号： G01N21/211 , G01N21/8422 , G01N2021/213
摘要： To measure the critical dimensions and other parameters of a one- or two-dimensional diffracting structure of a film, the calculation may be simplified by first performing a measurement of the thickness of the film, employing a film model that does not vary the critical dimension or parameters related to other characteristics of the structure. The thickness of the film may be estimated using the film model sufficiently accurately so that such estimate may be employed to simplify the structure model for deriving the critical dimension and other parameters related to the two-dimensional diffracting structure.
摘要翻译：为了测量膜的一维或二维衍射结构的临界尺寸和其它参数，可以通过首先进行薄膜厚度的测量来简化计算，使用不改变临界尺寸的膜模型或与结构的其他特征相关的参数。可以使用膜模型来充分准确地估计膜的厚度，使得可以采用这种估计来简化用于导出临界尺寸和与二维衍射结构相关的其它参数的结构模型。

73. 发明授权

US07564544B2 Method and system for inspecting surfaces with improved light efficiency 有权
标题翻译：用于检查表面光线效率提高的方法和系统
公开(公告)号：US07564544B2
公开(公告)日：2009-07-21
申请号：US11626102
申请日：2007-01-23
申请人： Guoheng Zhao , Zheng Yan , Bo Li , Wayne Chen
发明人： Guoheng Zhao , Zheng Yan , Bo Li , Wayne Chen
IPC分类号： G01N21/00
CPC分类号： G01N21/8901 , G01N21/9501 , G01N2021/9513 , G01N2201/0627
摘要： The radiation beam of discrete light source such as LEDs is shaped by a cylindrical lens and a spherical lens to form two perpendicular narrow lines to illuminate a surface. The first line is projected onto a sample surface to improve illumination efficiency, and the second line is projected onto a pupil plane of an imaging lens to improve illumination uniformity. The layout of the LED chip is optimized to match the aspect ratio of the imaging detector. Multiple LEDs at different wavelengths are combined to improve sensitivity. The full surface of the sample is inspected through the relative motion between the sample and the optics.
摘要翻译：诸如LED的离散光源的辐射束由柱面透镜和球面透镜形成，以形成两条垂直的窄线以照射表面。将第一行投影到样本表面上以提高照明效率，并且将第二行投影到成像透镜的光瞳平面上以改善照明均匀性。优化了LED芯片的布局，以匹配成像检测器的宽高比。组合不同波长的多个LED以提高灵敏度。通过样品和光学元件之间的相对运动来检查样品的整个表面。

74. 发明申请

US20080218762A1 System For Detecting Anomalies And/Or Features of a Surface 有权
标题翻译：检测表面异常和/或特征的系统
公开(公告)号：US20080218762A1
公开(公告)日：2008-09-11
申请号：US12123393
申请日：2008-05-19
申请人： Guoheng Zhao , Stanley Stokowski , Mehdi Vaez-Iravani
发明人： Guoheng Zhao , Stanley Stokowski , Mehdi Vaez-Iravani
IPC分类号： G01N21/55
CPC分类号： G01N21/9501
摘要： A cylindrical mirror or lens is used to focus an input collimated beam of light onto a line on the surface to be inspected, where the line is substantially in the plane of incidence of the focused beam. An image of the beam is projected onto an array of charge-coupled devices parallel to the line for detecting anomalies and/or features of the surface, where the array is outside the plane of incidence of the focused beam.
摘要翻译：使用圆柱形镜或透镜将输入的准直光束聚焦到要检查的表面上的线上，其中线基本上在聚焦束的入射平面中。光束的图像被投影到平行于线的电荷耦合器件的阵列上，用于检测表面的异常和/或特征，其中阵列位于聚焦光束的入射平面之外。

75. 发明授权

US07301649B2 System for scatterometric measurements and applications 有权
标题翻译：散射测量和应用系统
公开(公告)号：US07301649B2
公开(公告)日：2007-11-27
申请号：US11192056
申请日：2005-07-27
申请人： Anatoly Fabrikant , Guoheng Zhao , Daniel C. Wack , Mehrdad Nikoonahad
发明人： Anatoly Fabrikant , Guoheng Zhao , Daniel C. Wack , Mehrdad Nikoonahad
IPC分类号： G01B11/34 , G01J4/00
CPC分类号： G01N21/45 , G01N21/21 , G01N21/4788 , G01N21/9501 , G01N2021/213 , G01N2021/217 , G01N2021/8416 , G02B5/18
摘要： Instead of constructing a full multi-dimensional look-up-table as a model to find the critical dimension or other parameters in scatterometry, regression or other optimized estimation methods are employed starting from a “best guess” value of the parameter. Eigenvalues of models that are precalculated may be stored and reused later for other structures having certain common characteristics to save time. The scatterometric data that is used to find the value of the one or more parameter can be limited to those at wavelengths that are less sensitive to the underlying film characteristics. A model for a three-dimensional grating may be constructed by slicing a representative structure into a stack of slabs and creating an array of rectangular blocks to approximate each slab. One dimensional boundary problems may be solved for each block which are then matched to find a two-dimensional solution for the slab. A three-dimensional solution can then be constructed from the two-dimensional solutions for the slabs to yield the diffraction efficiencies of the three-dimensional grating. This model can then be used for finding the one or more parameters of the diffracting structure in scatterometry. Line roughness of a surface can be measured by directing a polarized incident beam in an incident plane normal to the line grating and measuring the cross-polarization coefficient. The value of the one or more parameters may then be supplied to a stepper or etcher to adjust a lithographic or etching process.
摘要翻译：不需要构建一个完整的多维查找表作为模型来查找散点图中的关键维度或其他参数，而是从参数的“最佳猜测”值开始采用回归或其他优化的估计方法。预先计算的模型的特征值可以稍后存储并重用于具有某些共同特征的其他结构以节省时间。用于查找一个或多个参数的值的散点数据可以限于那些对底层薄膜特性较不敏感的波长数据。三维光栅的模型可以通过将代表性结构切片成一叠平板并且产生矩形块阵列来近似每个平板来构造。可以为每个块解决一维边界问题，然后将其匹配以找到板的二维解。然后可以从板的二维解决方案中构建三维解，以产生三维光栅的衍射效率。然后，该模型可用于在散射测量中找到衍射结构的一个或多个参数。可以通过将垂直于线光栅的入射平面中的偏振入射光束引导并测量交叉极化系数来测量表面的线粗糙度。然后可以将一个或多个参数的值提供给步进器或蚀刻器以调整光刻或蚀刻工艺。

76. 发明授权

US07221444B1 Method and system for improved defect sensitivity for inspecting surfaces 失效
标题翻译：提高检测表面缺陷灵敏度的方法和系统
公开(公告)号：US07221444B1
公开(公告)日：2007-05-22
申请号：US11251129
申请日：2005-10-14
申请人： Guoheng Zhao
发明人： Guoheng Zhao
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/8806
摘要： Techniques for inspecting a substrate with improved defect sensitivity are disclosed. High sensitivity is achieved by reducing the noise due by using multiple laser beams for illumination, in which each beam is nearly collimated and illuminates uniformly a field of view. The images generated respectively by the laser beams are added incoherently by means of delivering the illumination beams incoherently in either time domain or space domain. According to one embodiment, all the illumination beams may not be interact with each other coherently so that the images generated by each laser beams can be summed together incoherently to average out possible excessive noise.
摘要翻译：公开了用于检查具有改善的缺陷灵敏度的衬底的技术。通过减少使用多个激光束照明的噪音来实现高灵敏度，其中每个光束几乎被准直并且均匀地照射视场。通过在时域或空域中不连续地传递照明光束，通过激光束分别产生的图像被非相干地添加。根据一个实施例，所有照明光束可以不相干地相互作用，使得由每个激光束产生的图像可以非相干地相加在一起，以平均排除可能的过多噪声。

77. 发明授权

US07064821B2 Sample inspection system 失效
公开(公告)号：US07064821B2
公开(公告)日：2006-06-20
申请号：US10627402
申请日：2003-07-24
申请人： Mehdi Vaez-Iravani , Stanley Stokowski , Guoheng Zhao
发明人： Mehdi Vaez-Iravani , Stanley Stokowski , Guoheng Zhao
IPC分类号： G01N21/00
CPC分类号： G01J3/44 , G01J3/0216 , G01J3/0229 , G01N21/21 , G01N21/47 , G01N21/474 , G01N21/8806 , G01N21/94 , G01N21/9501 , G01N2021/8825 , G01N2021/8845 , G01N2021/8848 , G01N2201/065
摘要： A curved mirrored surface is used to collect radiation scattered by a sample surface and originating from a normal illumination beam and an oblique illumination beam. The collected radiation is focused to a detector. Scattered radiation originating from the normal and oblique illumination beams may be distinguished by employing radiation at two different wavelengths, by intentionally introducing an offset between the spots illuminated by the two beams or by switching the normal and oblique illumination beams on and off alternately. Beam position error caused by change in sample height may be corrected by detecting specular reflection of an oblique illumination beam and changing the direction of illumination in response thereto. Butterfly-shaped spatial filters may be used in conjunction with curved mirror radiation collectors to restrict detection to certain azimuthal angles.

78. 发明申请

US20060038984A9 System for detecting anomalies and/or features of a surface 有权
公开(公告)号：US20060038984A9
公开(公告)日：2006-02-23
申请号：US10360512
申请日：2003-02-06
申请人： Mehdi Vaez-Iravani , Guoheng Zhao , Stanley Stokowski
发明人： Mehdi Vaez-Iravani , Guoheng Zhao , Stanley Stokowski
IPC分类号： G01N21/00
CPC分类号： G01N21/95623 , G01N21/47 , G01N21/94 , G01N2201/1045
摘要： A cylindrical mirror or lens is used to focus an input collimated beam of light onto a line on the surface to be inspected, where the line is substantially in the plane of incidence of the focused beam. An image of the beam is projected onto an array of charge-coupled devices parallel to the line for detecting anomalies and/or features of the surface, where the array is outside the plane of incidence of the focused beam. For inspecting surface with a pattern thereon, the light from the surface is first passed through a spatial filter before it is imaged onto the charge-coupled devices. The spatial filter includes stripes of scattering regions that shift in synchronism with relative motion between the beam and the surface to block Fourier components from the pattern. The spatial filter may be replaced by reflective strips that selectively reflects scattered radiation to the detector, where the reflective strips also shifts in synchronism with the relative motion.

79. 发明申请

US20050274901A1 System for scatterometric measurements and applications 有权
标题翻译：散射测量和应用系统
公开(公告)号：US20050274901A1
公开(公告)日：2005-12-15
申请号：US11192056
申请日：2005-07-27
申请人： Anatoly Fabrikant , Guoheng Zhao , Daniel Wack , Mehrdad Nikoonahad
发明人： Anatoly Fabrikant , Guoheng Zhao , Daniel Wack , Mehrdad Nikoonahad
IPC分类号： G01B11/00 , G01B11/30 , G01N21/21 , G01N21/27 , G01N21/47 , G01N21/95 , G02B5/18 , G03F1/08 , H01L21/027 , H01L21/66 , G06F19/00
CPC分类号： G01N21/45 , G01N21/21 , G01N21/4788 , G01N21/9501 , G01N2021/213 , G01N2021/217 , G01N2021/8416 , G02B5/18
摘要： Instead of constructing a full multi-dimensional look-up-table as a model to find the critical dimension or other parameters in scatterometry, regression or other optimized estimation methods are employed starting from a “best guess” value of the parameter. Eigenvalues of models that are precalculated may be stored and reused later for other structures having certain common characteristics to save time. The scatterometric data that is used to find the value of the one or more parameter can be limited to those at wavelengths that are less sensitive to the underlying film characteristics. A model for a three-dimensional grating may be constructed by slicing a representative structure into a stack of slabs and creating an array of rectangular blocks to approximate each slab. One dimensional boundary problems may be solved for each block which are then matched to find a two-dimensional solution for the slab. A three-dimensional solution can then be constructed from the two-dimensional solutions for the slabs to yield the diffraction efficiencies of the three-dimensional grating. This model can then be used for finding the one or more parameters of the diffracting structure in scatterometry. Line roughness of a surface can be measured by directing a polarized incident beam in an incident plane normal to the line grating and measuring the cross-polarization coefficient. The value of the one or more parameters may then be supplied to a stepper or etcher to adjust a lithographic or etching process.
摘要翻译：不需要构建一个完整的多维查找表作为模型来查找散点图中的关键维度或其他参数，而是从参数的“最佳猜测”值开始采用回归或其他优化的估计方法。预先计算的模型的特征值可以稍后存储并重用于具有某些共同特征的其他结构以节省时间。用于查找一个或多个参数的值的散点数据可以限于那些对底层薄膜特性较不敏感的波长数据。三维光栅的模型可以通过将代表性结构切片成一叠平板并且产生矩形块阵列来近似每个平板来构造。可以为每个块解决一维边界问题，然后将其匹配以找到板的二维解。然后可以从板的二维解决方案中构建三维解，以产生三维光栅的衍射效率。然后，该模型可用于在散射测量中找到衍射结构的一个或多个参数。可以通过将垂直于线光栅的入射平面中的偏振入射光束引导并测量交叉极化系数来测量表面的线粗糙度。然后可以将一个或多个参数的值提供给步进器或蚀刻器以调整光刻或蚀刻工艺。

80. 发明申请

US20050099627A1 System for measuring periodic structures 审中-公开
公开(公告)号：US20050099627A1
公开(公告)日：2005-05-12
申请号：US11016148
申请日：2004-12-17
申请人： Guoheng Zhao , Kenneth Gross , Rodney Smedt , Mehrdad Nikoonahad
发明人： Guoheng Zhao , Kenneth Gross , Rodney Smedt , Mehrdad Nikoonahad
IPC分类号： G01B11/00 , G01J4/00
CPC分类号： G01N21/21 , G01B11/00 , G01N21/4788 , G01N21/956
摘要： A periodic structure is illuminated by polychromatic electromagnetic radiation. Radiation from the structure is collected and divided into two rays having different polarization states. The two rays are detected from which one or more parameters of the periodic structure may be derived. In another embodiment, when the periodic structure is illuminated by a poly chromatic electromagnetic radiation, the collected radiation from the structure is passed through a polarization element having a polarization plane. The element and the polychromatic beam are controlled so that the polarization plane of the element are at two or more different orientations with respect to the plane of incidence of the polychromatic beam. Radiation that has passed through the element is detected when the plane of polarization is at the two or more positions so that one or more parameters of the periodic structure may be derived from the detected signals. At least one of the orientations of the plane of polarization is substantially stationary when the detection takes place. To have as small a footprint as possible, one employs an optical device that includes a first element directing a polychromatic beam of electromagnetic radiation to the structure and a second optical element collecting radiation from the structure where the two elements form an integral unit or are attached together to form an integrated unit. To reduce the footprint, the measurement instrument and the wafer are both moved. In one embodiment, both the apparatus and the wafer undergo translational motion transverse to each other. In a different arrangement, one of the two motions is translational and the other is rotational. Any one of the above-described embodiments may be included in an integrated processing and detection apparatus which also includes a processing system processing the sample, where the processing system is responsive to the output of any one of the above embodiments for adjusting a processing parameter.

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