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71. 发明授权

US08482717B2 Polarization-modulating optical element 有权
标题翻译：极化调制光学元件
公开(公告)号：US08482717B2
公开(公告)日：2013-07-09
申请号：US12201767
申请日：2008-08-29
申请人： Damian Fiolka , Markus Deguenther
发明人： Damian Fiolka , Markus Deguenther
IPC分类号： G03B27/42
CPC分类号： G03F7/70191 , G02B7/008 , G02B27/286 , G03B27/72 , G03F7/70341 , G03F7/70566 , G03F7/70891 , G03F7/70966
摘要： The invention relates to a projection system, comprising a radiation source, an illumination system operable to illuminate a structured mask, and a projection objective for projecting an image of the mask structure onto a light-sensitive substrate, wherein said projection system comprises an optical system comprising an optical axis or a preferred direction given by the direction of a light beam propagating through the optical system; the optical system comprising a temperature compensated polarization-modulating optical element described by coordinates of a coordinate system, wherein one preferred coordinate of the coordinate system is parallel to the optical axis or parallel to said preferred direction; said temperature compensated polarization-modulating optical element comprising a first and a second polarization-modulating optical element, the first and/or the second polarization-modulating optical element comprising solid and/or liquid optically active material and a profile of effective optical thickness, wherein the effective optical thickness varies at least as a function of one coordinate different from the preferred coordinate of the coordinate system, in addition or alternative the first and/or the second polarization-modulating optical element comprises solid and/or liquid optically active material, wherein the effective optical thickness is constant as a function of at least one coordinate different from the preferred coordinate of the coordinate system; wherein the first polarization-modulating optical element comprises optically active material with a specific rotation of opposite sign compared to the optically active material of the second polarization-modulating optical element.
摘要翻译：本发明涉及一种投影系统，包括辐射源，可操作以照亮结构化掩模的照明系统和用于将掩模结构的图像投影到光敏基板上的投影物镜，其中所述投影系统包括光学系统包括通过光学系统传播的光束的方向给出的光轴或优选方向; 所述光学系统包括由坐标系的坐标描述的温度补偿偏振调制光学元件，其中所述坐标系的一个优选坐标平行于光轴或平行于所述优选方向; 所述温度补偿偏振调制光学元件包括第一和第二偏振调制光学元件，第一和/或第二偏振调制光学元件包括固体和/或液体光学活性材料和有效光学厚度的轮廓，其中另外或替代地，第一和/或第二偏振调制光学元件包括固体和/或液体光学活性材料，其中有效光学厚度至少作为不同于坐标系的优选坐标的一个坐标的函数而变化，其中有效光学厚度作为与坐标系的优选坐标不同的至少一个坐标的函数是恒定的; 其中与第二偏振调制光学元件的光学活性材料相比，第一偏振调制光学元件包括具有相反符号的特定旋转的光学活性材料。

72. 发明授权

US08416390B2 Illumination system for illuminating a mask in a microlithographic exposure apparatus 有权
标题翻译：用于在微光刻曝光设备中照射掩模的照明系统
公开(公告)号：US08416390B2
公开(公告)日：2013-04-09
申请号：US12533756
申请日：2009-07-31
申请人： Markus Deguenther , Paul Graeupner , Juergen Fischer
发明人： Markus Deguenther , Paul Graeupner , Juergen Fischer
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/70216 , G03F7/70116 , G03F7/70158
摘要： An illumination system for illuminating a mask in a microlithographic exposure apparatus has an optical axis and a pupil surface. The system can include an array of reflective or transparent beam deflection elements such as mirrors. Each deflection element can be adapted to deflect an impinging light ray by a deflection angle that is variable in response to a control signal. The beam deflection elements can be arranged in a first plane. The system can further include an optical raster element, which includes a plurality of microlenses and/or diffractive structures. The beam deflection elements), which can be arranged in a first plane, and the optical raster element, which can be arranged in a second plane, can commonly produce a two-dimensional far field intensity distribution. An optical imaging system can optically conjugate the first plane to the second plane.
摘要翻译：用于在微光刻曝光设备中照射掩模的照明系统具有光轴和光瞳表面。该系统可以包括反射或透明的束偏转元件阵列，例如反射镜。每个偏转元件可以适于使入射光线偏转响应于控制信号而变化的偏转角。光束偏转元件可以布置在第一平面中。该系统还可以包括光栅元件，其包括多个微透镜和/或衍射结构。可以布置在第一平面中的光束偏转元件）和可以布置在第二平面中的光栅元件可以共同地产生二维远场强度分布。光学成像系统可以将第一平面与第二平面光学共轭。

73. 发明授权

US08279524B2 Polarization-modulating optical element 有权
标题翻译：极化调制光学元件
公开(公告)号：US08279524B2
公开(公告)日：2012-10-02
申请号：US10580698
申请日：2005-01-14
申请人： Damian Fiolka , Markus Deguenther
发明人： Damian Fiolka , Markus Deguenther
IPC分类号： G02B5/30 , G02B27/28 , F21V9/14 , G03B27/72
CPC分类号： G02B5/3083 , G02B1/08 , G02B5/3025 , G02B5/3075 , G02B27/286 , G02F1/0136 , G02F1/0147 , G03F7/70058 , G03F7/70341 , G03F7/70566
摘要： A polarization-modulating optical element formed of an optically active crystal material has a thickness profile where the thickness, as measured in the direction of the optical axis, varies over the area of the optical element. The polarization-modulating optical element has the effect that the plane of oscillation of a first linearly polarized light ray and the plane of oscillation of a second linearly polarized light ray are rotated, respectively, by a first angle of rotation and a second angle of rotation, with the first angle of rotation and the second angle of rotation being different from each other.
摘要翻译：由光学活性晶体材料形成的偏振调制光学元件具有厚度分布，其中沿光轴方向测量的厚度在光学元件的面积上变化。偏振调制光学元件具有第一线性偏振光的振荡平面和第二直线偏振光的振动平面分别旋转第一旋转角度和第二旋转角度的效果具有第一旋转角度和第二旋转角度彼此不同。

74. 发明申请

US20120206704A1 ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY 有权
标题翻译：投影光刻照明光学单元
公开(公告)号：US20120206704A1
公开(公告)日：2012-08-16
申请号：US13368430
申请日：2012-02-08
申请人： Johannes Wangler , Markus Deguenther , Stig Bieling
发明人： Johannes Wangler , Markus Deguenther , Stig Bieling
IPC分类号： G03B27/54
CPC分类号： G03F7/70058
摘要： An illumination optical unit for projection lithography for illuminating an object field, in which an object to be imaged can be arranged, with illumination light has a field facet mirror having a plurality of field facets. A pupil facet mirror of the illumination optical unit has a plurality of pupil facets. The pupil facets serve for imaging the field facets respectively assigned individually to the pupil facets into the object field. An individual mirror array of the illumination optical unit has individual mirrors that can be tilted in driven fashion individually. The individual mirror array is arranged in an illumination light beam path upstream of the field facet mirror. This can result in flexibly configurable illumination by the illumination optical unit, this illumination being readily adaptable to predetermined values.
摘要翻译：用于照射物场的投影光刻用的照明光学单元，其中可以利用照明光布置要成像的物体，具有具有多个场面的场面反射镜。照明光学单元的瞳孔面镜具有多个光瞳面。瞳孔面用于将分别分配给瞳孔面的场面刻面成像为物场。照明光学单元的单个反射镜阵列具有可以分别以驱动方式倾斜的各个反射镜。单个反射镜阵列布置在场分面反射镜上游的照明光束路径中。这可以导致由照明光学单元灵活配置的照明，该照明容易适应于预定值。

75. 发明申请

US20080316598A1 POLARIZATION-MODULATING OPTICAL ELEMENT 有权
标题翻译：极化调制光学元件
公开(公告)号：US20080316598A1
公开(公告)日：2008-12-25
申请号：US12200068
申请日：2008-08-28
申请人： Damian Fiolka , Markus Deguenther
发明人： Damian Fiolka , Markus Deguenther
IPC分类号： G02B5/30
CPC分类号： G02B5/3083 , G02B1/08 , G02B5/3025 , G02B5/3075 , G02B27/286 , G02F1/0136 , G02F1/0147 , G03F7/70058 , G03F7/70341 , G03F7/70566
摘要： A polarization-modulating optical element consisting of an optically active crystal material has a thickness profile where the thickness, as measured in the direction of the optical axis, varies over the area of the optical element. The polarization-modulating optical element has the effect that the plane of oscillation of a first linearly polarized light ray and the plane of oscillation of a second line early polarized light ray are rotated, respectively, by a first angle of rotation and a second angle of rotation, with the first angle of rotation and the second angle of rotation being different from each other.
摘要翻译：由光学活性晶体材料组成的偏振调制光学元件具有厚度分布，其中沿光轴方向测量的厚度在光学元件的面积上变化。偏振调制光学元件具有如下效果：第一直线偏振光的振荡平面和第二行的早期偏振光的振动平面分别旋转第一旋转角度和第二角度旋转，第一旋转角度和第二旋转角度彼此不同。

76. 发明申请

US20080316459A1 POLARIZATION-MODULATING OPTICAL ELEMENT 有权
标题翻译：极化调制光学元件
公开(公告)号：US20080316459A1
公开(公告)日：2008-12-25
申请号：US12201767
申请日：2008-08-29
申请人： Damian Fiolka , Markus Deguenther
发明人： Damian Fiolka , Markus Deguenther
IPC分类号： G03B27/72
CPC分类号： G03F7/70191 , G02B7/008 , G02B27/286 , G03B27/72 , G03F7/70341 , G03F7/70566 , G03F7/70891 , G03F7/70966
摘要： The invention relates to a projection system, comprising a radiation source, an illumination system operable to illuminate a structured mask, and a projection objective for projecting an image of the mask structure onto a light-sensitive substrate, wherein said projection system comprises an optical system comprising an optical axis or a preferred direction given by the direction of a light beam propagating through the optical system; the optical system comprising a temperature compensated polarization-modulating optical element described by coordinates of a coordinate system, wherein one preferred coordinate of the coordinate system is parallel to the optical axis or parallel to said preferred direction; said temperature compensated polarization-modulating optical element comprising a first and a second polarization-modulating optical element, the first and/or the second polarization-modulating optical element comprising solid and/or liquid optically active material and a profile of effective optical thickness, wherein the effective optical thickness varies at least as a function of one coordinate different from the preferred coordinate of the coordinate system, in addition or alternative the first and/or the second polarization-modulating optical element comprises solid and/or liquid optically active material, wherein the effective optical thickness is constant as a function of at least one coordinate different from the preferred coordinate of the coordinate system; wherein the first polarization-modulating optical element comprises optically active material with a specific rotation of opposite sign compared to the optically active material of the second polarization-modulating optical element.
摘要翻译：本发明涉及一种投影系统，包括辐射源，可操作以照亮结构化掩模的照明系统和用于将掩模结构的图像投影到感光基板上的投影物镜，其中所述投影系统包括光学系统包括通过光学系统传播的光束的方向给出的光轴或优选方向; 所述光学系统包括由坐标系的坐标描述的温度补偿偏振调制光学元件，其中所述坐标系的一个优选坐标平行于光轴或平行于所述优选方向; 所述温度补偿偏振调制光学元件包括第一和第二偏振调制光学元件，第一和/或第二偏振调制光学元件包括固体和/或液体光学活性材料和有效光学厚度的轮廓，其中另外或替代地，第一和/或第二偏振调制光学元件包括固体和/或液体光学活性材料，其中有效光学厚度至少作为不同于坐标系的优选坐标的一个坐标的函数而变化，其中有效光学厚度作为与坐标系的优选坐标不同的至少一个坐标的函数是恒定的; 其中与第二偏振调制光学元件的光学活性材料相比，第一偏振调制光学元件包括具有相反符号的特定旋转的光学活性材料。

77. 发明申请

US20080111983A1 Illumination System for a Microlithographic Projection Exposure Apparatus 审中-公开
标题翻译：用于微光刻投影曝光装置的照明系统
公开(公告)号：US20080111983A1
公开(公告)日：2008-05-15
申请号：US11813529
申请日：2005-12-30
申请人： Wolfgang Singer , Dieter Bader , Johannes Wangler , Markus Deguenther
发明人： Wolfgang Singer , Dieter Bader , Johannes Wangler , Markus Deguenther
IPC分类号： G03B27/72
CPC分类号： G03F7/70066 , G03F7/70075 , G03F7/70083
摘要： An illumination system (12) of a microlithographic exposure system comprises a plurality of light emitting elements (24) that have light exit facets that are positioned in or in close proximity to a field plane (OP) or a pupil plane and are configured to be individually activated. Light collecting elements, for example microlenses of a fly-eye lens or arrays of cylinder lenses, may be used to collect the light bundles emitted by the light emitting elements (24). Homogenizing means, for example a rod integrator or an optical raster element (40), may be provided for improving the intensity uniformity in a reticle plane (RP).
摘要翻译：微光刻曝光系统的照明系统（12）包括多个发光元件（24），该发光元件具有光出射面，其位于或靠近场平面（OP）或光瞳平面，并被配置为单独激活。可以使用光收集元件，例如蝇眼透镜的微透镜或圆柱透镜阵列来收集由发光元件（24）发射的光束。可以提供均匀化装置，例如棒状积分器或光学光栅元件（40），以改善光罩平面（RP）中的强度均匀性。

78. 发明申请

US20070285644A1 Microlithographic Projection Exposure Apparatus 审中-公开
标题翻译：微光刻投影曝光装置
公开(公告)号：US20070285644A1
公开(公告)日：2007-12-13
申请号：US11575042
申请日：2005-09-13
申请人： Markus Brotsack , Markus Deguenther , Wilhelm Ulrich , Joachim Wietzorrek , Johannes Wangler , Heiko Feldmann , Andreas Zeiler
发明人： Markus Brotsack , Markus Deguenther , Wilhelm Ulrich , Joachim Wietzorrek , Johannes Wangler , Heiko Feldmann , Andreas Zeiler
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70066
摘要： An illumination system for a microlithographic projection exposure apparatus comprises a masking device and a masking objective which projects the masking device onto an image plane. The illumination system further includes an optical correction element having a surface that is either aspherically shaped or supports diffractive structures that have at least substantially the effect of an aspherical surface. This surface is arranged at least approximately in a field plane which precedes the image plane of the masking objective The aspherically acting surface is designed such that a principal ray distribution generated by the illumination system in the image plane matches a principal ray distribution required by a projection objective.
摘要翻译：用于微光刻投影曝光装置的照明系统包括掩蔽装置和将掩模装置投影到图像平面上的掩蔽对象。照明系统还包括光学校正元件，其具有非球面形状的表面或支撑具有至少基本上非球面的作用的衍射结构。该表面至少大致布置在掩蔽对象的图像平面之前的场平面中。非球面作用表面被设计成使得由照明系统在图像平面中产生的主射线分布与投影所需的主射线分布相匹配目的。

79. 发明申请

US20060268251A1 Illumination system for a microlithographic projection exposure apparatus 审中-公开
标题翻译：用于微光刻投影曝光装置的照明系统
公开(公告)号：US20060268251A1
公开(公告)日：2006-11-30
申请号：US10564639
申请日：2004-07-15
申请人： Markus Deguenther , Manfred Maul , Damian Fiolka
发明人： Markus Deguenther , Manfred Maul , Damian Fiolka
IPC分类号： G03B27/54
CPC分类号： G03F7/70058 , G03F7/70066 , G03F7/70158 , G03F7/70191
摘要： An illumination system for a microlithographic projection exposure apparatus includes a light source (12) for generating a projection light beam, a first objective (20) and a masking system (38, 52) for masking a reticle (30). The masking system (38, 52) includes adjustable first blades (40) for masking in a first spatial direction (X) and adjustable second blades (54, 56) for masking in a second spatial direction (Y). The first blades (40) are arranged in the region of a first field plane (36) and the second blades (54, 56) are arranged in the region of a second field plane (44) which is different to the first field plane (36). The masking system can therefore be made spatially less concentrated, whereby constructional difficulties in the region of the field plane before the masking objective resulting from space requirement problems are reduced. A further contribution is made to solving the space requirement problem if an attenuation system for achieving the most uniform possible light intensity in the wafer plane (122) includes a transmission filter (162) which has locally varying transmissivity and can be moved synchronously with traversing movements of the reticle (30).
摘要翻译：用于微光刻投影曝光装置的照明系统包括用于产生投影光束的光源（12），用于掩蔽掩模（30）的第一物镜（20）和掩蔽系统（38,52）。掩蔽系统（38,52）包括可调节的第一叶片（40），用于在第一空间方向（X）和第二空间方向（Y）上遮蔽的可调节的第二叶片（54,56）进行掩蔽。第一叶片（40）布置在第一场平面（36）的区域中，并且第二叶片（54,56）布置在与第一场平面不同的第二场平面（44）的区域中 36）。因此，掩蔽系统可以在空间上较少地集中，由此减少了由空间需求问题导致的掩蔽目标之前的场平面区域中的构造困难。如果用于在晶片平面（122）中实现最均匀可能的光强度的衰减系统包括具有局部变化的透射率的传输滤波器（162）并且可以与横移运动同步地移动，则进一步作出了解决空间需求问题的贡献的标线（30）。

80. 发明申请

US20060126049A1 Illumination system for a microlithography projection exposure apparatus 审中-公开
标题翻译：用于微光刻投影曝光装置的照明系统
公开(公告)号：US20060126049A1
公开(公告)日：2006-06-15
申请号：US11271844
申请日：2005-11-14
申请人： Markus Deguenther , Johannes Wangler , Markus Brotsack , Ella Mizkewitsch
发明人： Markus Deguenther , Johannes Wangler , Markus Brotsack , Ella Mizkewitsch
IPC分类号： G03B27/72
CPC分类号： G03F7/70075 , G03F7/70091
摘要： An illumination system for a microlithography projection exposure apparatus is designed for illuminating an illumination field with an illumination radiation with a predeterminable degree of coherence σ, it being possible to adjust the degree of coherence within a degree of coherence range extending into the range of very small degrees of coherence of significantly less than σ=0.2. The illumination system may have a first optical system for generating a predeterminable light distribution in an entrance plane of a light mixing device, and also a light mixing device for homogenizing the impinging radiation. The first optical system and the light mixing device can in each case be changed over between a plurality of configurations corresponding to different degree of coherence ranges. The degree of coherence ranges overlap and are dimensioned such that the resulting total degree of coherence range is larger than the individual degree of coherence ranges.
摘要翻译：用于微光刻投影曝光装置的照明系统设计成用具有可预定程度的一致性sigma的照明辐射照射照明场，可以在相干范围内的相干程度范围内调整相干度相干度显着小于σ= 0.2。照明系统可以具有用于在光混合装置的入射面中产生可预定的光分布的第一光学系统，以及用于均匀化入射辐射的光混合装置。在每种情况下，可以在对应于不同程度的相干范围的多个配置之间改变第一光学系统和光混合装置。相干度的重叠程度重叠，其尺寸使得所产生的总相干度范围大于相干范围的个体程度。

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