会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 72. 发明申请
    • APPARATUS TO DETECT FAULT CONDITIONS OF A PLASMA PROCESSING REACTOR
    • 检测等离子体加工反应器的故障条件的装置
    • US20110022215A1
    • 2011-01-27
    • US12898342
    • 2010-10-05
    • Douglas KeilEric HudsonChris KimballAndreas Fischer
    • Douglas KeilEric HudsonChris KimballAndreas Fischer
    • G06F17/00G06F15/00
    • C23C16/52C23C16/509H01J37/32935H01J37/3299
    • A method of fault detection for use in a plasma processing chamber is provided. The method comprises monitoring plasma parameters within a plasma chamber and analyzing the resulting information. Such analysis enables detection of failures and the diagnosis of failure modes in a plasma processing reactor during the course of wafer processing. The method comprises measuring the plasma parameters as a function of time and analyzing the resulting data. The data can be observed, characterized, compared with reference data, digitized, processed, or analyzed in any way to reveal a specific fault. Monitoring can be done with a detector such as a probe, which is preferably maintained within the plasma chamber substantively coplanar with a surface within the chamber, and directly measures net ion flux and other plasma parameters. The detector is preferably positioned at a grounded surface within the reactor such as a grounded showerhead electrode, and can be of a planar ion flux probe (PIF) type or a non-capacitive type. Chamber faults that can be detected include a build-up of process by-products in the process chamber, a helium leak, a match re-tuning event, a poor stabilization rate, and a loss of plasma confinement. If the detector is a probe, the probe can be embedded in a part of a plasma processing chamber and can comprises one or more gas feed-through holes.
    • 提供了一种用于等离子体处理室的故障检测方法。 该方法包括监测等离子体室内的等离子体参数并分析所得到的信息。 这样的分析使得能够在晶片处理过程中检测等离子体处理反应器中的故障和故障模式的诊断。 该方法包括测量作为时间的函数的等离子体参数并分析所得到的数据。 数据可以观察,表征,与参考数据进行比较,数字化,处理或分析,以显示特定故障。 可以用诸如探针的检测器进行监测,该探针优选地保持在与腔室内的表面基本上共面的等离子体室内,并且直接测量净离子通量和其它等离子体参数。 检测器优选地位于反应器内的接地表面,例如接地喷头电极,并且可以是平面离子通量探针(PIF)型或非电容型。 可以检测到的室内故障包括处理室中的过程副产物的积聚,氦泄漏,匹配重新调谐事件,差的稳定化速率和等离子体约束的损失。 如果检测器是探针,则探针可以嵌入在等离子体处理室的一部分中,并且可以包括一个或多个气体馈通孔。
    • 73. 发明授权
    • Hybrid-structure assembly support
    • 混合结构组装支持
    • US07845714B2
    • 2010-12-07
    • US12094664
    • 2006-11-23
    • Andreas FischerRobert Raulf
    • Andreas FischerRobert Raulf
    • B60N99/00
    • B62D25/084B62D29/001B62D29/004
    • An assembly support with hybrid structure for front ends of passenger vehicles and light trucks includes an upper cross member (1), a lateral member (2) attached to it from below with a flange plate (3) for connection with the face ends of vehicle longitudinal members and a lower cross member (4) connecting the lower sections (2.1) of these lateral members (2). In order to reinforce the assembly support in the area of the lower cross member (4), the lower cross member (4) consists of a shell body (5) with a flange (5.1) running along its edge and projecting outward, and of a sealing part (6) whose edge area overlaps it. The shell body (5) and the sealing part (6) are made of a stiff material, whereby the flange (5.1) and edge areas (6.1) of the above-mentioned components are surrounded by injected plastic used for the hybrid structure, and are thus bound together with the lateral members (2).
    • 用于乘客车辆和轻型卡车前端的混合结构的组件支撑件包括上横向构件(1),从下方连接到其上的侧部构件(2),其具有用于与车辆的端部连接的凸缘板(3) 纵向构件和连接这些横向构件(2)的下部(2.1)的下横向构件(4)。 为了加强在下横向构件(4)的区域中的组件支撑,下横向构件(4)由壳体(5)组成,壳体(5)具有沿其边缘延伸并向外突出的凸缘(5.1) 其边缘区域与其重叠的密封部分(6)。 壳体(5)和密封部分(6)由刚性材料制成,由此上述部件的凸缘(5.1)和边缘区域(6.1)被用于混合结构的注射塑料包围,并且 因此与横向构件(2)结合在一起。
    • 75. 发明授权
    • Confined plasma with adjustable electrode area ratio
    • 密闭等离子体具有可调电极面积比
    • US07837825B2
    • 2010-11-23
    • US11152022
    • 2005-06-13
    • Andreas Fischer
    • Andreas Fischer
    • H01L21/00
    • H01J37/32623H01J37/32642
    • A plasma reactor comprises a chamber, a bottom electrode, a top electrode, a first set of confinement rings, a second set of confinement rings, and a ground extension. The top and bottom electrodes, the first and second sets of confinement rings, and the ground extension are all enclosed within the chamber. The first set of confinement rings is substantially parallel to the bottom electrode and the top electrode and surrounds a first volume between the bottom electrode and the top electrode. The second set of confinement rings is substantially parallel to the bottom electrode and the top electrode and surrounds a second volume between the bottom electrode and the top electrode. The second volume is at least greater than the first volume. A ground extension is adjacent to and surrounds the bottom electrode. The first set of confinement rings and the second set of confinement rings are capable of being raised and lowered to extend into a region above the ground extension.
    • 等离子体反应器包括腔室,底部电极,顶部电极,第一组约束环,第二组约束环和地面延伸部。 顶部和底部电极,第一组和第二组约束环和接地延伸部都被封闭在腔室内。 第一组限制环基本上平行于底部电极和顶部电极并围绕底部电极和顶部电极之间的第一容积。 第二组限制环基本上平行于底部电极和顶部电极并围绕底部电极和顶部电极之间的第二体积。 第二卷至少大于第一卷。 接地延伸部分邻近并包围底部电极。 第一组限制环和第二组限制环能够被升高和降低以延伸到地面延伸部上方的区域中。
    • 78. 发明申请
    • CONTROLLING ION ENERGY DISTRIBUTION IN PLASMA PROCESSING SYSTEMS
    • 控制离子能量分布在等离子体处理系统中
    • US20100154994A1
    • 2010-06-24
    • US12634959
    • 2009-12-10
    • Andreas FischerEric Hudson
    • Andreas FischerEric Hudson
    • H01L21/306
    • H01J37/32623H01J37/32091
    • A plasma processing system for processing at least a substrate with plasma. The plasma processing chamber is capable of controlling ion energy distribution. The plasma processing system may include a first electrode. The plasma processing system also includes a second electrode that is different from the first electrode and is configured for bearing the substrate. The plasma processing system may also include a signal source coupled with the first electrode. The signal source may provide a non-sinusoidal signal through the first electrode to control ion energy distribution at the substrate when the substrate is processed in the plasma processing system, wherein the non-sinusoidal signal is periodic.
    • 一种等离子体处理系统,用于至少用等离子体处理衬底。 等离子体处理室能够控制离子能量分布。 等离子体处理系统可以包括第一电极。 等离子体处理系统还包括与第一电极不同的第二电极,并且构造成用于承载衬底。 等离子体处理系统还可以包括与第一电极耦合的信号源。 当在等离子体处理系统中处理衬底时,信号源可以通过第一电极提供非正弦信号以控制衬底处的离子能量分布,其中非正弦信号是周期性的。