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    • 74. 发明申请
    • Brachytheraphy device
    • brachytheraphy设备
    • US20050065393A1
    • 2005-03-24
    • US10984164
    • 2004-11-09
    • Michael Miller
    • Michael Miller
    • A61B17/34A61M36/12A61N5/10A61N5/00
    • A61M37/0069A61N5/1007A61N5/1027A61N2005/1011
    • The present invention provides devices for depositing objects into tissue of an animal. The devices include a cannula having a proximal end and an opposite distal end insertable into tissue and defining an exit aperture. The cannula has a sidewall between the distal and proximal ends and defines a passageway in communication with the exit aperture. A distal retaining tab extends from an inner surface of the cannula and is positioned across at least a portion of the passageway adjacent the exit aperture. The distal tab has a first closed position blocking the passageway and a second open position wherein the tab is urged towards the sidewall to allow an object to pass. The tab is resilient to return to the first position after the object passes the tab. In some embodiments, the invention also includes a proximal retaining tab adjacent the proximal end of the cannula and positionable to block a portion of the passageway. The invention also a stylet that is slidable within the passageway to urge the objects out through the exit aperture.
    • 本发明提供了用于将物体沉积到动物组织中的装置。 这些装置包括具有近端和相对的远端插入到组织中并限定出口孔的插管。 套管在远端和近端之间具有侧壁,并且限定与出口孔连通的通道。 远侧保持突出部从套管的内表面延伸并且位于与出口孔相邻的通道的至少一部分上。 远端突片具有阻挡通道的第一关闭位置和第二打开位置,其中突片朝向侧壁被推动以允许物体通过。 标签弹性回到对象通过标签后的第一个位置。 在一些实施例中,本发明还包括邻近套管的近端并且可定位成阻挡通道的一部分的近侧保持突出部。 本发明还提供一种可在通道内滑动以便通过出口孔推动物体的探针。
    • 75. 发明申请
    • CCR5 antagonists useful for treating AIDS
    • 可用于治疗艾滋病的CCR5拮抗剂
    • US20050059666A1
    • 2005-03-17
    • US10970216
    • 2004-10-21
    • Michael Miller
    • Michael Miller
    • A61K31/18A61K31/506A61P1/04A61P11/06A61P17/00A61P17/06A61P19/02A61P25/28A61P29/00A61P31/12A61P31/18A61P37/02A61P37/08A61P43/00C07D401/14C07D403/06C07D409/14C07D417/14A61K31/496A61K31/4545C07D43/14
    • C07D401/14A61K31/18A61K31/506A61K45/06C07D403/06C07D409/14C07D417/14A61K2300/00
    • Compounds of the formula or a pharmaceutically acceptable salt or isomer thereof, wherein: Q, X and Z are CH or N; R, R4-R7 and R13 are H or alkyl; R1 is H, alkyl, fluoroalkyl, R9-arylalkyl, R9-heteroarylalkyl, alkyl-SO2—, cycloalkyl-SO2—, fluoroalkyl-SO2—, R9-aryl-SO2—, R9-heteroaryl-SO2-, N(R22)(R23)—SO2—, alkyl-C(O)—, cycloalkyl-C(O)—, fluoroalkyl-C(O)—, R9-aryl-C(O)—, NH-alkyl-C(O)— or R9-aryl-NH—C(O)—; R2 is H and R3 is H, alkyl, alkoxyalkyl, cycloalkyl, cycloalkylalkyl, R9-aryl, R9-arylalkyl, R9-heteroaryl, or R9-heteroarylalkyl, and when X and Z are each CH, R3 is alkoxy, R9-aryloxy, R9-heteroaryloxy, alkylC(O)O—, alkylaminoC(O)O—, alkylC(O)NR13—, alkylOC(O)NR13— or alkylaminoC(O)NR13—; or R2 and R3 together are ═O, ═NOR10, ═N—NR11R12 or ═CH-alkyl; R8 is substituted phenyl, substituted heteroaryl, naphthyl, fluorenyl, diphenymethyl, alpha-substituted benzyl or alpha-substituted heteroarylmethyl; R9-R12 are as defined; are disclosed for the treatment of HIV, solid organ transplant rejection, graft v. host disease, inflammatory diseases, atopic dermatitis, asthma, allergies or multiple sclerosis, as well as pharmaceutical compositions and combinations with antiviral or anti-inflammatory agents.
    • 下式的化合物或其药学上可接受的盐或异构体,其中:Q,X和Z是CH或N; R 4,R 4 -R 7和R 13是H或烷基; R 1是H,烷基,氟烷基,R 9 - 芳基烷基,R 9 - 杂芳基烷基,烷基-SO 2 - ,环烷基-SO 2 - ,氟烷基-SO 2 - ,R 9 - 芳基-SO 2 - R 9 - 杂芳基-SO 2 - ,N(R 22)(R 23)-SO 2 - ,烷基-C(O) - ,环烷基-C(O) - ,氟烷基-C(O) ,R 9 - 芳基-C(O) - ,NH-烷基-C(O) - 或R 9 - 芳基-NH-C(O) - ; R 2是H,R 3是H,烷基,烷氧基烷基,环烷基,环烷基烷基,R 9 - 芳基,R 9 - 芳基烷基,R 9 - 杂芳基或R 9 - 杂芳基烷基 当X和Z各自为CH时,R 3为烷氧基,R 9 - 芳氧基,R 9 - 杂芳氧基,烷基C(O)O-,烷基氨基C(O)O-,烷基C(O)NR 烷基OC(O)NR 13 - 或烷基氨基C(O)NR 13 - ; 或R 2和R 3一起为= O,= NOR 10,= N-NR 11或= CH-烷基; R 8是取代的苯基,取代的杂芳基,萘基,芴基,二苯甲基,α-取代的苄基或α-取代的杂芳基甲基; R 9 -R 12定义如上; 被公开用于治疗HIV,实体器官移植排斥,移植物抗宿主病,炎性疾病,特应性皮炎,哮喘,过敏或多发性硬化,以及药物组合物和与抗病毒或抗炎剂的组合。
    • 76. 发明授权
    • Ducted fan mower deck
    • 风扇割草机
    • US06282874B1
    • 2001-09-04
    • US09343158
    • 1999-06-29
    • Axel SchaedlerMichael Miller
    • Axel SchaedlerMichael Miller
    • A01D3482
    • A01D43/077A01D34/63A01D2101/00
    • A mower deck comprises an auxiliary source of pressurized air in order to avoid clipping buildup under the mowing deck, most particularly at the trailing edge of the discharge chute. The auxiliary source of air comes through a cloverleaf shaped hole in the mower deck. The spindle is mounted to the mower deck through this hole, as in conventional mowers. However, unlike conventional mowers, because the hole in the mower deck has a cloverleaf configuration air can flow through the corner portions of the cloverleaf configured hole and act as an auxiliary source of air even though the spindle is mounted to the mower deck through the hole.
    • 割草机甲板包括辅助加压空气源,以避免在割草甲板下的剪切积聚,特别是在卸料槽的后缘。 辅助的空气源通过割草机甲板上的三叶草形孔。 主轴通过这个孔安装到割草机甲板上,如传统的割草机。 然而,与传统割草机不同,由于割草机甲板上的孔具有苜蓿叶结构,空气可以流过苜蓿叶构型孔的角部,并且作为辅助空气源,即使主轴通过孔安装到割草机甲板 。
    • 77. 发明授权
    • Method and apparatus for controlling photolithography parameters based on photoresist images
    • 基于光致抗蚀剂图像控制光​​刻参数的方法和装置
    • US06259521B1
    • 2001-07-10
    • US09412216
    • 1999-10-05
    • Michael MillerGreg Goodwin
    • Michael MillerGreg Goodwin
    • G01N2100
    • G03F7/70558G03F7/70616
    • A method for controlling uniformity in a wafer is provided. A wafer is provided. A layer of photoresist is formed on the wafer, and the photoresist layer is patterned. A portion of the patterned photoresist layer is illuminated in at least first and second positions. Light reflected at the two positions is measured to generate first and second measurements. A recipe of a stepper is adjusted in response to the first measurement differing from the second measurement. A wafer processing system includes a stepper, a scatterometer, and a process controller. The stepper is adapted to expose a layer of photoresist in accordance with a recipe to generate an exposed layer of photoresist. The scatterometer is adapted to take first and second measurements in at least first and second positions on the exposed layer of photoresist. The process controller is adapted to compare the first and second measurements and adjust the recipe based on the first and second measurements.
    • 提供了一种用于控制晶片中的均匀性的方法。 提供晶片。 在晶片上形成一层光致抗蚀剂,并对光致抗蚀剂层进行图案化。 图案化光致抗蚀剂层的一部分在至少第一和第二位置被照亮。 测量在两个位置处反射的光以产生第一和第二测量。 响应于与第二测量不同的第一测量来调节步进器的配方。 晶片处理系统包括步进器,散射仪和过程控制器。 步进器适于根据配方暴露一层光致抗蚀剂以产生曝光的光致抗蚀剂层。 散射仪适于在曝光的光致抗蚀剂层上的至少第一和第二位置进行第一和第二测量。 过程控制器适于比较第一和第二测量值,并且基于第一和第二测量来调整配方。
    • 79. 发明授权
    • Sliding support
    • 滑动支撑
    • US5217181A
    • 1993-06-08
    • US843831
    • 1992-02-28
    • Christian U. HammarskjoldUlf G. HammarskjoldMichael Miller
    • Christian U. HammarskjoldUlf G. HammarskjoldMichael Miller
    • B60N2/07
    • B60N2/0715B60N2/071
    • A sliding support of the type which mounts to and traverses along a vertical support structure. The sliding support is comprised of a track, a sliding structure which is vertically supported and a non-lubricating bearing material. The track defines an interior channel which is co-extensive to the distance traversed by the sliding support and an aperture, opposite the support structure, and in communication with the internal channel. The sliding structure has a slide means located in the channel and overlying the aperture. A horizontal support means is secured to the slide means and extends through the aperture. A vertical support means is secured to the horizontal support means and maintains the horizontal support means in a horizontal plane. The non-lubricated bearing material is positioned in the channel between the channel and the slide means.
    • 一种滑动支架,其安装在垂直支撑结构上并沿其横向移动。 滑动支架由轨道,垂直支撑的滑动结构和非润滑轴承材料构成。 该轨道限定内部通道,该内部通道与由滑动支撑件穿过的距离共同延伸,并且与支撑结构相对并且与内部通道连通。 滑动结构具有位于通道中并覆盖孔的滑动装置。 水平支撑装置固定到滑动装置并延伸穿过孔。 垂直支撑装置被固定到水平支撑装置并将水平支撑装置保持在水平面中。 非润滑的轴承材料位于通道和滑动装置之间的通道中。