会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 64. 发明授权
    • Solution for electroless chrome alloy plating
    • 化学镀铬合金电镀解决方案
    • US4028116A
    • 1977-06-07
    • US311437
    • 1972-12-01
    • Curtis E. Cedarleaf
    • Curtis E. Cedarleaf
    • C23C18/48C23C3/02
    • C23C18/48
    • There is herein disclosed an aqueous plating bath for electroless or catalytic deposition of chromium upon the surface of a substrate capable of accepting such deposition or which has been treated to provide a surface capable of accepting such deposition. The solution is characterized by the presence of chromium as an organic chromium compound such as chromium acetate or the equivalent in relatively high concentration, the presence of nickel as a nickel compound, such as nickel acetate or its equivalent in relatively low concentration only sufficient to render the deposit catalytic, together with the usual reducing and buffering compounds to which may be added a complexing reagent comprising the salts of oxalic acid all of which cooperate to produce a deposit substantially higher in chromium content than has heretofore been possible.
    • 本文公开了一种用于在能够接受这种沉积的基板的表面上化学镀或催化沉积铬的水性镀液,或者已经被处理以提供能够接受这种沉积的表面。 该溶液的特征在于铬作为有机铬化合物如乙酸铬或相当高浓度的当量,存在镍化合物的镍,如乙酸镍或其等同物,其浓度相对较低,足以使 沉积催化剂,以及通常的还原和缓冲化合物,其中可以加入包含草酸盐的络合试剂,所有这些化合物都配合以产生比迄今为止更高的铬含量的沉积物。