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    • 62. 发明授权
    • Electroless palladium plating solution
    • 无电镀钯溶液
    • US08562727B2
    • 2013-10-22
    • US13319194
    • 2010-05-07
    • Hideto WatanabeKazuhiro KojimaKaoru Yagi
    • Hideto WatanabeKazuhiro KojimaKaoru Yagi
    • C23C18/44
    • C23C18/44H01L2224/85464H05K3/244
    • Disclosed is an electroless palladium plating solution which can form a plating layer having excellent soldering properties onto electronic components and the like and excellent wire bonding properties. The electroless palladium plating solution comprises a palladium compound, an amine compound, an inorganic sulfur compound and a reducing agent, wherein a combination of hypophosphorous acid or a hypophosphorous acid compound and formic acid or a formic acid compound is used as the reducing agent, and wherein the palladium compound, the amine compound, the inorganic sulfur compound, the hypophosphorous acid compound, and formic acid or the formic acid compound are contained in amounts of 0.001 to 0.1 mole/l, 0.05 to 5 mole/l, 0.01 to 0.1 mole/l, 0.05 to 1.0 mole/l and 0.001 to 0.1 mole/l, respectively. The electroless palladium plating solution is characterized by having excellent soldering properties and excellent wire bonding properties.
    • 公开了一种化学镀钯溶液,其可以形成对电子部件等具有优异的焊接性质的镀层,并且具有优异的引线接合性能。 化学镀钯溶液包括钯化合物,胺化合物,无机硫化合物和还原剂,其中使用次磷酸或次磷酸化合物与甲酸或甲酸化合物的组合作为还原剂,以及 其中钯化合物,胺化合物,无机硫化合物,次磷酸化合物,甲酸或甲酸化合物的含量为0.001至0.1摩尔/升0.05至5摩尔/升0.01至0.1摩尔 分别为0.05〜1.0摩尔/升和0.001〜0.1摩尔/升。 无电镀钯溶液的特征在于具有优异的焊接性能和优良的引线接合性能。
    • 68. 发明申请
    • COMPOSITE ELECTRODE AND METHOD OF MANUFACTURE THEREOF
    • 复合电极及其制造方法
    • US20130056876A1
    • 2013-03-07
    • US13696644
    • 2011-05-09
    • Thomas HarveyTimothy George Ryan
    • Thomas HarveyTimothy George Ryan
    • H01L21/283H01L29/41
    • H05K3/244H01L51/0023H01L51/003H01L51/0097H01L51/5212H01L2251/5338H01L2251/5361H05K2201/0108Y02E10/549Y02P70/521
    • The present invention provides a composite electrode and method of manufacturing such a composite electrode, the method comprising the steps of: providing a first substrate layer with an electrically conducting surface; providing a non-conducting curable material; providing a second substrate layer which has a surface relief pattern defining at least one retaining feature corresponding to a desired metal track pattern; forming a line of contact between the conducting carrier layer and at least a part of the surface relief pattern; depositing curable material onto at least part of the surface relief pattern or the electrically conducting surface along the line of contact; advancing the line of contact and curing the curable material through the second substrate layer; releasing the cured material from the surface relief pattern feature so as to leave behind a surface relief pattern on the conducting carrier layer; depositing a first metal layer onto the exposed regions of the electrically conducting surface of the conducting carrier layer and optionally deposition further metal layers on the first metal layer.
    • 本发明提供一种复合电极及其制造方法,该方法包括以下步骤:提供具有导电表面的第一基底层; 提供不导电的可固化材料; 提供具有限定对应于期望的金属轨道图案的至少一个保持特征的表面浮雕图案的第二基底层; 在所述导电载体层和所述表面浮雕图案的至少一部分之间形成接触线; 将可固化材料沿着所述接触线沉积到所述表面浮雕图案或所述导电表面的至少一部分上; 推进接触线并固化可固化材料通过第二基底层; 从表面浮雕图案特征释放固化材料,以便在导电载体层上留下表面浮雕图案; 将第一金属层沉积到导电载体层的导电表面的暴露区域上,以及任选地在第一金属层上沉积另外的金属层。