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61. 发明授权

US5675499A Optimal probe point placement 失效
标题翻译：最佳探针点放置
公开(公告)号：US5675499A
公开(公告)日：1997-10-07
申请号：US626484
申请日：1996-04-02
申请人： William T. Lee , Ronny Soetarman , Christopher Graham Talbot
发明人： William T. Lee , Ronny Soetarman , Christopher Graham Talbot
IPC分类号： G01R31/26 , G01R31/28 , G01R31/302 , G01R31/303
CPC分类号： G01R31/303 , G01R31/2886 , H01J2237/2594 , H01J2237/30416
摘要： Probe-point placement methods are described. A layout description, a netlist description and a cross-reference description of an IC are retrieved from storage. The data structures associate with each net name a list of polygons. Polygons of a selected net are broken into segments of a specified step size. Each segment is evaluated in accordance with a set of prober rules. Values produced by the prober rules are weighted and combined to obtain a prober score for each segment. The prober score indicates suitability of the corresponding net location for probing. If the best prober score indicates an optimal segment exists for probing, the coordinates of that segment are stored and used to direct a probe to the corresponding location of the IC. If the best prober score indicates no optimal segment exists for probing, each segment of the net is evaluated in accordance with a set of probe-point cutter rules. Values produced by the probe-point cutter rules are weighted and combined to obtain a cutter score for each segment. The cutter score indicates suitability of the corresponding net location for cutting a probe-point hole. A segment having the best cutter score is considered optimal for placing a probe point. The methods can be used, e.g., with electron-beam, focused-ion-beam and laser-beam systems, and with mechanical probe systems.
摘要翻译：描述探针点放置方法。从存储器检索布局描述，网表描述和IC的交叉引用描述。数据结构与每个网络名称相关联的多边形列表。所选网络的多边形被分解成指定步长的段。每个段都按照一组探测器规则进行评估。由探测器规则产生的值被加权并组合以获得每个段的探测器得分。探测器分数表示相应的净位置适用于探测。如果最好的探针分数表示存在用于探测的最佳分段，则该段的坐标被存储并用于将探针引导到IC的对应位置。如果最佳探测器分数表示探测不存在最佳分段，则根据一组探针切割器规则评估网络的每个分段。由探针切割器规则产生的值被加权并组合以获得每个切片的切割分数。切割分数表示用于切割探针孔的相应净位置的适用性。具有最佳切割分数的片段被认为是放置探针点的最佳选择。该方法可以用于例如电子束，聚焦离子束和激光束系统以及机械探针系统。

62. 发明授权

US5614725A Charged particle beam exposure system and method 失效
标题翻译：带电粒子束曝光系统及方法
公开(公告)号：US5614725A
公开(公告)日：1997-03-25
申请号：US610190
申请日：1996-03-04
申请人： Yoshihisa Oae , Tomohiko Abe , Soichiro Arai , Shigeru Maruyama , Hiroshi Yasuda , Kenichi Miyazawa , Junichi Kai , Takamasa Satoh , Keiichi Betsui , Hideki Nasuno
发明人： Yoshihisa Oae , Tomohiko Abe , Soichiro Arai , Shigeru Maruyama , Hiroshi Yasuda , Kenichi Miyazawa , Junichi Kai , Takamasa Satoh , Keiichi Betsui , Hideki Nasuno
IPC分类号： H01J37/147 , H01J37/30 , H01J37/302 , H01J37/304 , H01J37/317
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3023 , H01J37/3177 , H01J2237/0435 , H01J2237/30416 , H01J2237/31762 , H01L2223/54466
摘要： A charged particle beam exposure method includes the steps of creating dot pattern data indicative of a pattern to be exposed, storing the dot pattern data in a first storage device having a first access speed, transferring the dot pattern data from the first storage device to a second storage device having a second, higher access speed, reading the dot pattern data out from the second storage device, and producing a plurality of charged particle beams in response to the dot pattern data read out from the second storage device by means of a blanking aperture array, wherein the blanking aperture array includes a plurality of apertures each causing turning-on and turning-off of a changed particle beam pertinent to the aperture in response to the dot pattern data.
摘要翻译：带电粒子束曝光方法包括以下步骤：创建指示要曝光的图案的点阵图形数据，将点图案数据存储在具有第一存取速度的第一存储装置中，将点图案数据从第一存储装置传送到第二存储装置具有第二较高访问速度，从第二存储装置读出点阵图形数据，并响应于通过消隐从第二存储装置读出的点图形数据产生多个带电粒子束孔径阵列，其中消隐孔阵列包括多个孔，每个孔响应于点图案数据而导致与孔相关的改变的粒子束的导通和关断。

63. 发明授权

US5448075A Electron-beam exposure system having an improved rate of exposure throughput 失效
标题翻译：电子束曝光系统具有提高的曝光量
公开(公告)号：US5448075A
公开(公告)日：1995-09-05
申请号：US241409
申请日：1994-05-11
申请人： Shunsuke Fueki , Hiroshi Yasuda
发明人： Shunsuke Fueki , Hiroshi Yasuda
IPC分类号： H01L21/30 , G03F7/20 , H01J37/302 , H01L21/027
CPC分类号： H01J37/3023 , H01J2237/30416 , H01J2237/31762
摘要： An electron beam exposure system includes a pattern memory for storing bitmap data of a pattern to be exposed, wherein the pattern memory includes a number of latch elements arranged in rows and columns such that the writing of the bitmap data is achieved line by line and such that the reading of the bitmap data is achieved column by column.
摘要翻译：电子束曝光系统包括用于存储要曝光的图案的位图数据的图案存储器，其中，图案存储器包括排列成行和列的多个锁存元件，使得位图数据的写入被逐行实现逐位实现位图数据的读取。

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