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    • 63. 发明授权
    • Method and apparatus for generating ions
    • 用于产生离子的方法和装置
    • US5780862A
    • 1998-07-14
    • US797954
    • 1997-02-12
    • Harold E. Siess
    • Harold E. Siess
    • F03H1/00H01J27/22H01J27/00
    • H01J27/26H01J37/08H01J2237/081H01J2237/0815
    • A surface ion source apparatus (10) creates a high purity ion beam (44) of molecules of metal compounds having a lower ionization energy than the metal they contain. Low energy dispersion in the ion beam and currents on the order of one ampere are attainable over long duration operation. Rhenium screen (12) is used in the ion source and related catalyzer (31). Temperatures vary in the range of 700 to 2500 degrees centigrade and a preferred vacuum pressure of 10.sup.-5 torr, or lower, is used. Wear and corrosion resistance of a wide variety of materials is greatly enhanced through ion deposition and/or implantation with the disclosed apparatus and methods. This high output ion source is also useful for electronic propulsion, separation of isotopes and production of electricity by forcing ions through a transverse magnetic field, such as used with a magnetohydrodynamic generator.
    • 表面离子源装置(10)产生具有比它们所含的金属低的电离能的金属化合物分子的高纯度离子束(44)。 离子束中的低能量色散和一安培数量级的电流可以在长时间运行下达到。 铼筛(12)用于离子源和相关催化剂(31)。 温度在700至2500摄氏度的范围内变化,优选的真空压力为10 -5乇或更低。 通过使用所公开的装置和方法的离子沉积和/或注入,大大增强了各种材料的耐磨性和耐腐蚀性。 这种高输出离子源也可用于电子推进,同位素分离和通过强迫离子通过横向磁场的产生,例如与磁流体动力发电机一起使用。
    • 65. 发明授权
    • Single axis combined ion and vapor source
    • 单轴组合离子和蒸气源
    • US4424104A
    • 1984-01-03
    • US493871
    • 1983-05-12
    • James M. E. HarperAlan W. Kleinsasser
    • James M. E. HarperAlan W. Kleinsasser
    • H01L21/31C23C14/22C23C14/54H01J37/08H01J37/305H01L21/203H01L39/24C23C15/00
    • H01J37/3053C23C14/221C23C14/542H01J37/08H01J2237/0815
    • Combining an evaporation source and an ion beam source to provide a crucible anode surface, and heating that crucible anode surface to a high enough temperature to cause evaporation of anode material, provides for emission of atoms and ions selectively and independently controllable and directed along the identical path. A high melting point material auxiliary anode, connected to the crucible anode by a variable resistance, provides independent control of the vapor flux by selectively shifting the discharge current from auxiliary anode to crucible anode. The crucible anode contains the material which is to be evaporated. A gas plasma discharge is supplied between a heated cathode filament and the heated crucible anode. Electrons carrying a discharge current bombard the crucible anode material surface, causing a temperature rise which causes an increase in discharge current. At a high enough discharge current level, the anode material in the crucible anode melts and vaporizes, forming a stream which passes through an extraction grid to deposit vaporized anode material on a substrate. The gas discharge generates ions, which are accelerated by voltages on the anodes, forming an ion beam which also strikes the substrate. The flux of the ion beam is controlled by the discharge current. The ion energy is controlled by the anode power supply. Shifting a portion of the discharge current from the auxiliary anode to the crucible anode increases the amount of vapor flux for a given ion flux.
    • 将蒸发源和离子束源组合以提供坩埚阳极表面,并且将坩埚阳极表面加热到足够高的温度以引起阳极材料的蒸发,从而提供原子和离子的发射,其选择性且独立地可控制并沿着相同的方向引导 路径。 通过可变电阻连接到坩埚阳极的高熔点材料辅助阳极通过将放电电流从辅助阳极选择性地移动到坩埚阳极来提供对蒸气通量的独立控制。 坩埚阳极含有待蒸发的材料。 在加热的阴极丝和加热的坩埚阳极之间提供气体等离子体放电。 携带放电电流的电子轰击坩埚阳极材料表面,引起升温,导致放电电流增加。 在足够高的放电电流水平下,坩埚阳极中的阳极材料熔化并蒸发,形成通过提取栅格的流,以将蒸发的阳极材料沉积在衬底上。 气体放电产生离子,其由阳极上的电压加速,形成也撞击衬底的离子束。 离子束的通量由放电电流控制。 离子能量由阳极电源控制。 将放电电流的一部分从辅助阳极转移到坩埚阳极增加给定离子通量的蒸气通量。