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    • 63. 发明授权
    • Method of fabricating dome-shaped semiconductor device
    • 制造圆顶形半导体器件的方法
    • US5966609A
    • 1999-10-12
    • US974464
    • 1997-11-20
    • Jae-Soon Kwon
    • Jae-Soon Kwon
    • H01L29/78H01L21/02H01L21/8242H01L27/108H01L21/20
    • H01L27/10852H01L27/10876H01L28/82H01L27/10811H01L27/10823
    • A semiconductor device and a fabrication method thereof which are capable of enhancing the electrostatic capacity of a capacitor and preventing a short channel effect which occurs due to the decrease of a channel width. The semiconductor device includes a semiconductor substrate having a protrusion, a first insulation film formed on a lateral surface of the protrusion and on the semiconductor substrate neighboring with the protrusion, a conductive type sidewall spacer formed on the first insulation film, a first dopant region formed on an upper surface of the protrusion, a second dopant region formed in the semiconductor substrate in an outer portion from the conductive type sidewall spacer, an insulation film pattern formed on a surface of the conductive type sidewall spacer, a first conductive layer pattern contacting with the second dopant region and formed on the insulation film pattern, an interlayer insulation layer formed on an upper surface of the first conductive layer pattern, and a second conductive layer pattern formed on the interlayer insulation layer.
    • 一种半导体器件及其制造方法,其能够增强电容器的静电容量并防止由于沟道宽度的减小而发生的短沟道效应。 该半导体器件包括具有突起的半导体衬底,形成在突起的侧表面上的与突出部相邻的半导体衬底上的第一绝缘膜,形成在第一绝缘膜上的导电型侧壁间隔物,形成第一掺杂区域 在所述突起的上表面上形成在所述半导体衬底中的从所述导电型侧壁间隔物的外部的第二掺杂剂区域,形成在所述导电型侧壁间隔物的表面上的绝缘膜图案,与 所述第二掺杂剂区域形成在所述绝缘膜图案上,形成在所述第一导电层图案的上表面上的层间绝缘层和形成在所述层间绝缘层上的第二导电层图案。
    • 66. 发明授权
    • EEPROM cell and related method of making thereof
    • EEPROM单元具有改进的拓扑结构和减少的漏电流
    • US5953602A
    • 1999-09-14
    • US978028
    • 1997-11-25
    • Han Su OhJang Han Kim
    • Han Su OhJang Han Kim
    • H01L21/336H01L29/423H01L29/788H01L21/8238
    • H01L29/66825H01L29/42336H01L29/7883
    • An EEPROM cell of reduced leakage current during erasure and improved cell topology includes a first conductivity type substrate having a channel region, a trench formed in the channel region of the substrate, first spacers formed on opposed sidewalls of the trench, and a gate oxide film formed at the bottom of the trench between the first spacers. Second conductivity type source/drain regions are formed in the substrate at opposite side of the trench. A tunneling oxide film is further provided on the substrate overlying the drain region and proximate the trench. An insulation film is provided over the entire substrate surface except the trench and the tunneling oxide film. In addition, a floating gate is formed on the insulation film over the source and drain regions, as well as the gate oxide film at the trench bottom. Second spacers are provided on the insulation film at opposed side surfaces of the floating gate. A dielectric film is then provided on the surface of the floating gate and the second spacers, and a control gate is formed on the dielectric film.
    • 在擦除期间减小的漏电流和改进的电池拓扑的EEPROM单元包括具有沟道区的第一导电型衬底,形成在衬底的沟道区中的沟槽,形成在沟槽的相对侧壁上的第一衬垫和栅氧化膜 形成在第一间隔物之间​​的沟槽的底部。 在沟槽的相对侧的衬底中形成第二导电类型的源极/漏极区域。 隧道氧化膜还设置在衬底上,覆盖漏极区域并且靠近沟槽。 除了沟槽和隧道氧化物膜之外,在整个衬底表面上提供绝缘膜。 此外,在源极和漏极区域上的绝缘膜上以及沟槽底部的栅极氧化物膜上形成浮栅。 第二间隔件设置在浮动栅极的相对侧表面处的绝缘膜上。 然后在浮置栅极和第二间隔物的表面上提供电介质膜,并且在电介质膜上形成控制栅极。
    • 67. 发明授权
    • DRAM cell, DRAM and method for fabricating the same
    • US5949705A
    • 1999-09-07
    • US035841
    • 1998-03-06
    • Young Kwon JunYoo Chan Jeon
    • Young Kwon JunYoo Chan Jeon
    • G11C11/401G11C11/402G11C11/404G11C11/4074H01L21/8242H01L27/108G11C11/24G11C11/34
    • G11C11/4074G11C11/404H01L27/108
    • The DRAM cell includes a first transistor, a second transistor, and a capacitor. The first and second transistors each have a gate, a source, and a drain electrode. The gate electrode of the second transistor is connected to one of the source and drain electrodes of the first transistor, and a first electrode of the capacitor is connected to the gate electrode of the second transistor. Also, a second electrode of the capacitor is connected to one of the source and drain electrodes of the second transistor. One of the source and drain electrodes of the second transistor not connected to the second electrode of the capacitor is connected to the gate electrode of the second transistor. Accordingly, the second transistor is on when a logic value of "1" is stored in the gate thereof, and off when a logic value of `0` is stored in the gate thereof. A wordline is connected to the gate electrode of the first transistor, a bitline is connected to the one of the source and drain electrodes of the first transistor not connected to the gate of the second transistor, and a reading line is connected to the second electrode of the capacitor. By applying a voltage corresponding to a logic value to the bitline, and selectively turning on the writing wordline, the logic value on the bitline is stored in the gate electrode of the second transistor. During a reading operation, a reference voltage is applied to the bitline, and a reading voltage is applied to the reading wordline. Then, the first transistor is selectively turned on by applying a voltage to the writing wordline. Based on the fluctuation in the reference voltage applied to the bitline, the logic value stored in the gate of the second transistor is easily determined.
    • 70. 发明授权
    • Hierarchical word line structure
    • 分层字线结构
    • US5943289A
    • 1999-08-24
    • US25111
    • 1998-02-17
    • Jin-Hong AhnJeong-Su Jeong
    • Jin-Hong AhnJeong-Su Jeong
    • G11C11/407G11C8/08G11C8/14H01L21/8242H01L27/108G11C8/00
    • G11C8/14G11C8/08
    • A hierarchical word line structure for a semiconductor memory is provided that substantially eliminates coupling noise between neighboring wiring lines by driving neighboring sub-word lines by different main word lines. The hierarchical word line structure further reduces a layout size. The hierarchical word line structure uses one less transistor than a related art sub-word line driver. The word line includes a plurality of word line rows that each include a plurality of sub-word line drivers. The sub-word line drivers receive sub-word line driver enable signals among which only one signal becomes high level at a time. Each of the word line rows correspond to a main word line and a subset of the plurality of sub-word line drivers that drive neighboring sub-word lines are coupled to different respective main word lines.
    • 提供一种用于半导体存储器的分层字线结构,通过用不同的主字线驱动相邻子字线,从而基本上消除了相邻布线之间的耦合噪声。 分层字线结构进一步减少了布局尺寸。 分层字线结构使用比现有技术的子字线驱动器少一个的晶体管。 字线包括多个字线行,每行包括多个子字线驱动器。 子字线驱动器接收子字线驱动器使能信号,其中一次只有一个信号变为高电平。 每个字线行对应于主字线,并且驱动相邻子字线的多个子字线驱动器的子集耦合到不同的相应主字线。