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61. 发明授权

US08865599B2 Self-leveling planarization materials for microelectronic topography 有权
标题翻译：用于微电子拓扑的自流平平面化材料
公开(公告)号：US08865599B2
公开(公告)日：2014-10-21
申请号：US13672527
申请日：2012-11-08
申请人： Brewer Science Inc.
发明人： Dongshun Bai , Xie Shao , Michelle Fowler , Tingji Tang
IPC分类号： H01L21/31 , H01L21/3105 , H01L21/02 , H01L21/027 , C09D127/18 , H01L29/02 , B81C1/00 , C08L33/16 , C08L33/14
CPC分类号： H01L21/31058 , B81C1/00611 , B81C2201/0119 , C08L33/14 , C08L33/16 , C09D127/18 , H01L21/02118 , H01L21/0212 , H01L21/0271 , H01L29/02 , Y10S438/958
摘要： Planarization methods and microelectronic structures formed therefrom are disclosed. The methods and structures use planarization materials comprising fluorinated compounds or acetoacetylated compounds. The materials are self-leveling and achieve planarization over topography without the use of etching, contact planarization, chemical mechanical polishing, or other conventional planarization techniques.
摘要翻译：公开了由此形成的平面化方法和微电子结构。方法和结构使用包含氟化化合物或乙酰乙酰化化合物的平面化材料。材料是自流平的，并且在不使用蚀刻，接触平面化，化学机械抛光或其它常规平面化技术的情况下实现平面化。

62. 发明授权

US08771927B2 Acid-etch resistant, protective coatings 有权
标题翻译：耐酸蚀，保护涂层
公开(公告)号：US08771927B2
公开(公告)日：2014-07-08
申请号：US12718516
申请日：2010-03-05
申请人： Tingji Tang , Gu Xu , Xing-Fu Zhong , Wenbin Hong , Tony D. Flaim , Kimberly Yess , Ramachandran K. Trichur
发明人： Tingji Tang , Gu Xu , Xing-Fu Zhong , Wenbin Hong , Tony D. Flaim , Kimberly Yess , Ramachandran K. Trichur
IPC分类号： G03F7/26
CPC分类号： B81C1/00801 , B81C2201/053 , C08G61/08 , C08G2261/3324 , C08G2261/418 , G03F7/033 , G03F7/094 , H01L21/0274 , H01L21/3081 , Y10T428/31645 , Y10T428/31667 , Y10T428/31692 , Y10T428/31855 , Y10T428/31909
摘要： New compositions and methods of using those compositions as protective layers during the production of semiconductor and MEMS devices are provided. The compositions comprise a cycloolefin copolymer dispersed or dissolved in a solvent system, and can be used to form layers that protect a substrate during acid etching and other processing and handling. The protective layer can be photosensitive or non-photosensitive, and can be used with or without a primer layer beneath the protective layer. Preferred primer layers comprise a basic polymer in a solvent system.
摘要翻译：提供了在制造半导体和MEMS器件期间使用这些组合物作为保护层的新组合物和方法。组合物包含分散或溶解在溶剂体系中的环烯烃共聚物，并且可以用于在酸蚀刻和其它加工和处理期间形成保护基材的层。保护层可以是光敏的或非感光的，并且可以在保护层下面使用或不使用底漆层。优选的底漆层在溶剂体系中包含碱性聚合物。

63. 发明授权

US08771442B2 Cyclic olefin compositions for temporary wafer bonding 有权
标题翻译：用于临时晶圆键合的环状烯烃组合物
公开(公告)号：US08771442B2
公开(公告)日：2014-07-08
申请号：US13548674
申请日：2012-07-13
申请人： Wenbin Hong , Dongshun Bai , Tony D. Flaim , Rama Puligadda
发明人： Wenbin Hong , Dongshun Bai , Tony D. Flaim , Rama Puligadda
IPC分类号： C08L65/00 , C09J123/00 , B32B37/00 , C08G77/14 , C08G73/10
CPC分类号： H01L21/187 , C08G2261/332 , C08G2261/418 , C08L65/00 , C09J123/0823 , H01L21/6835 , H01L2221/68327 , H01L2221/6834 , H01L2221/68381 , Y10T156/10 , Y10T156/1153 , Y10T428/24355 , Y10T428/24802
摘要： New compositions and methods of using those compositions as bonding compositions are provided. The compositions comprise a cycloolefin copolymer dispersed or dissolved in a solvent system, and can be used to bond an active wafer to a carrier wafer or substrate to assist in protecting the active wafer and its active sites during subsequent processing and handling. The compositions form bonding layers that are chemically and thermally resistant, but that can also be softened or dissolved to allow the wafers to slide or be pulled apart at the appropriate stage in the fabrication process.
摘要翻译：提供了使用这些组合物作为粘合组合物的新组合物和方法。组合物包含分散或溶解在溶剂体系中的环烯烃共聚物，并且可用于将活性晶片结合到载体晶片或基底，以在随后的处理和处理期间有助于保护活性晶片及其活性位点。组合物形成化学和耐热的粘合层，但是也可以软化或溶解以允许晶片在制造过程中的适当阶段滑动或拉开。

64. 发明授权

US08668992B2 Fluorinated polyimides with fluorene cardo structure as optical materials that have low absolute thermo-optic coefficients 有权
标题翻译：具有芴卡诺结构的氟化聚酰亚胺作为具有低绝对热光系数的光学材料
公开(公告)号：US08668992B2
公开(公告)日：2014-03-11
申请号：US13150946
申请日：2011-06-01
申请人： Wenbin Hong , Tantiboro Ouattara , Kang Le Wang
发明人： Wenbin Hong , Tantiboro Ouattara , Heping Wang
IPC分类号： B32B17/10 , B32B27/06 , C08F16/24 , B05D5/06 , C08G73/10
CPC分类号： B32B17/064 , B29C47/0004 , B29C47/0021 , B29C47/004 , B29C47/02 , B32B2262/101 , C08G73/1039 , C08G73/1046 , C08G73/105 , C08G73/1067 , C08G73/1071 , C09D179/08 , Y10T428/31623 , Y10T428/31721
摘要： The present invention provides new polyimide materials suitable for use in optically transparent fiber composites, ribbon composites, and optical communications applications. The polyimide compounds include monomeric repeat units comprising a fluorinated moiety and a fluorene cardo structure. The polyimides exhibit good optical transparency and have a low absolute thermo-optic coefficient (|dn/dT|).
摘要翻译：本发明提供适用于光学透明纤维复合材料，带状复合材料和光学通信应用的新型聚酰亚胺材料。聚酰亚胺化合物包括包含氟化部分和芴卡诺结构的单体重复单元。聚酰亚胺显示出良好的光学透明度并且具有低绝对热光系数（| dn / dT |）。

65. 发明申请

US20130280656A1 PHOTOSENSITIVE, DEVELOPER-SOLUBLE BOTTOM ANTI-REFLECTIVE COATING MATERIAL 审中-公开
标题翻译：感光性，开发者可溶底料抗反射涂料
公开(公告)号：US20130280656A1
公开(公告)日：2013-10-24
申请号：US13867815
申请日：2013-04-22
申请人： BREWER SCIENCE INC.
发明人： Joyce Lowes , Jinhua Dai , Alice Guerrero
IPC分类号： G03F7/09
CPC分类号： G03F7/091 , G03F7/095 , G03F7/20 , G03F7/322 , G03F7/40 , H01L21/266
摘要： Photosensitive, developer-soluble bottom anti-reflective coatings are described. Compositions and methods of forming the same are also disclosed along with resulting microelectronic structures. The anti-reflective compositions comprise a multi-functional epoxy compound having multiple epoxy moieties pendant therefrom and one or more crosslinkable chromophores bonded thereto. The compounds are dispersed or dissolved in a solvent system with a vinyl ether crosslinker and can be used to create crosslinkable and de-crosslinkable coatings for microelectronics fabrication.
摘要翻译：描述了感光，显影剂可溶的底部抗反射涂层。还公开了组合物及其形成方法以及所得的微电子结构。抗反射组合物包含具有多个环氧基部分的多官能环氧化合物，和与其结合的一个或多个可交联的发色团。化合物分散或溶解在具有乙烯基醚交联剂的溶剂体系中，并且可以用于产生用于微电子制造的可交联和去交联的涂层。

66. 发明申请

US20130201635A1 FLUORINATED SILANE COATING COMPOSITIONS FOR THIN WAFER BONDING AND HANDLING 审中-公开
标题翻译：氟化硅烷涂料组合物，用于薄膜粘结和处理
公开(公告)号：US20130201635A1
公开(公告)日：2013-08-08
申请号：US13763251
申请日：2013-02-08
申请人： BREWER SCIENCE INC.
发明人： Gu Xu
IPC分类号： B32B7/06 , H05K1/18
CPC分类号： B32B7/06 , B32B7/12 , B32B2255/26 , B32B2457/00 , C09J5/00 , C09J2203/326 , H05K1/18 , Y10T428/24174 , Y10T428/24612 , Y10T428/3154 , Y10T428/31544
摘要： This invention is related to compositions that prepare substrate surfaces to enable temporary wafer bonding during microelectronics manufacturing, especially using a zonal bonding process. This invention, which comprises compositions made from fluorinated silanes blended in a polar solvent, can be used to form surface coatings or treatments having a high contact angle with water (>85°). The resulting silane solutions are stable at room temperature for longer than one month.
摘要翻译：本发明涉及制备衬底表面以在微电子制造期间实现临时晶片接合的组合物，特别是使用带状粘合工艺。包含由在极性溶剂中共混的氟化硅烷制成的组合物的本发明可用于形成与水（> 85°）高接触角的表面涂层或处理。得到的硅烷溶液在室温下稳定超过一个月。

67. 发明申请

US20130189524A1 VISCOUS FUGITIVE POLYMER-BASED CARBON NANOTUBE COATINGS 审中-公开
标题翻译： VISCOUS基于聚合物的碳纳米管涂料
公开(公告)号：US20130189524A1
公开(公告)日：2013-07-25
申请号：US13747011
申请日：2013-01-22
申请人： Brewer Science Inc.
发明人： Molly Hladik , Michael Stroder
IPC分类号： C09D1/00
CPC分类号： C09D1/00 , C08K3/04 , C08K3/041 , C08K7/06 , C09D5/24 , C09D7/70 , C09D171/02 , Y10T428/31507 , Y10T428/31678 , Y10T428/31993
摘要： Novel compositions comprising polymer solutions at various viscosities are provided. The polymer solutions are preferably fugitive, so as to avoid interfering with the properties of the nanomaterials after post-processing of the CNT-containing formulations. Additives, including acid generators, are added to the polymer solutions in order to allow the polymer carrier solutions to be degraded or decomposed at temperatures low enough to allow processing of commonly-used polymer film substrates. The invention further allows the carbon nanotube solutions to be screen printed or printed via inkjet.
摘要翻译：提供了包含各种粘度的聚合物溶液的新型组合物。聚合物溶液优选是非挥发性的，以避免在对含CNT制剂进行后处理之后干扰纳米材料的性质。将添加剂，包括酸发生剂加入到聚合物溶液中，以使得聚合物载体溶液在足够低的温度下降解或分解，以允许加工通常使用的聚合物膜基材。本发明还允许通过喷墨将丝网印刷或印刷碳纳米管溶液。

68. 发明授权

US08445591B2 Spin-on protective coatings for wet-etch processing of microelectronic substrates 有权
标题翻译：用于微电子衬底的湿法蚀刻加工的旋涂保护涂层
公开(公告)号：US08445591B2
公开(公告)日：2013-05-21
申请号：US13361556
申请日：2012-01-30
申请人： Gu Xu , Kimberly A. Yess , Tony D. Flaim
发明人： Gu Xu , Kimberly A. Yess , Tony D. Flaim
IPC分类号： C08L9/02 , B32B27/30 , B32B27/38
CPC分类号： H01L21/0271 , B81C1/00801 , C08L63/04 , C09D125/12 , Y10T428/31511 , Y10T428/31663 , C08L2666/14
摘要： New protective coating layers for use in wet etch processes during the production of semiconductor and MEMS devices are provided. The layers include a primer layer, a first protective layer, and an optional second protective layer. The primer layer preferably comprises an organo silane compound in a solvent system. The first protective layer includes thermoplastic copolymers prepared from styrene, acrylonitrile, and compatible compounds such as monomers, oligomers, and polymers comprising epoxy groups; poly(styrene-co-allyl alcohol); and mixtures thereof. The second protective layer comprises a highly halogenated polymer such as a chlorinated polymer to which may or may not be crosslinked upon heating.
摘要翻译：提供了在制造半导体和MEMS器件期间用于湿蚀刻工艺的新的保护涂层。这些层包括底漆层，第一保护层和可选的第二保护层。底漆层优选在溶剂体系中包含有机硅烷化合物。第一保护层包括由苯乙烯，丙烯腈和相容化合物如单体，低聚物和包含环氧基的聚合物制备的热塑性共聚物; 聚（苯乙烯 - 共 - 烯丙醇）; 及其混合物。第二保护层包括高度卤化的聚合物，例如氯化聚合物，其在加热时可能交联或不会交联。

69. 发明申请

US20120326093A1 HIGHLY SOLUBLE CARBON NANOTUBES WITH ENHANCED CONDUCTIVITY 有权
标题翻译：具有增强电导率的高度可溶性碳纳米管
公开(公告)号：US20120326093A1
公开(公告)日：2012-12-27
申请号：US13530471
申请日：2012-06-22
申请人： Christopher Landorf
发明人： Christopher Landorf
IPC分类号： H01B1/12 , B82Y40/00 , B82Y30/00
CPC分类号： C09D11/52 , B82Y30/00 , B82Y40/00 , C01B32/174 , H01B1/24
摘要： New methods for preparing carbon nanotube films having enhanced properties are provided. The method broadly provides reacting carbon nanotubes (CNTs) and compounds comprising a polyaromatic moieties in the presence a strong acid. During the reaction process, the polyaromatic moieties noncovalently bond with the carbon nanotubes. Additionally, the functionalizing moieties are further functionalized by the strong acid. This dual functionalization allows the CNTs to be dispersed at concentrations greater than 0.5 g/L in solution without damaging their desirable electronic and physical properties. The resulting solutions are stable on the shelf for months without observable bundling, and can be incorporated into solutions for printing conductive traces by a variety of means, including inkjet, screen, flexographic, gravure printing, or spin and spray coating.
摘要翻译：提供了制备具有增强性能的碳纳米管膜的新方法。该方法广泛地提供了在存在强酸的情况下使碳纳米管（CNT）和包含多芳族部分的化合物。在反应过程中，多芳族部分与碳纳米管非共价结合。此外，官能化部分进一步由强酸官能化。这种双官能化允许CNT在溶液中以大于0.5g / L的浓度分散，而不损害其所需的电子和物理性质。所得到的溶液在搁板上稳定几个月，不需要可观察到的捆扎，并且可以通过各种方式（包括喷墨，筛网，柔性版，凹版印刷或旋涂和喷涂）结合到用于印刷导电迹线的溶液中。

70. 发明授权

US08257910B1 Underlayers for EUV lithography 有权
标题翻译： EUV光刻底层
公开(公告)号：US08257910B1
公开(公告)日：2012-09-04
申请号：US12491009
申请日：2009-06-24
申请人： Douglas J. Guerrero , Hao Xu , Vandana Krishnamurthy
发明人： Douglas J. Guerrero , Hao Xu , Vandana Krishnamurthy
IPC分类号： G03F7/26
CPC分类号： G03F7/091
摘要： The present invention provides methods of fabricating microelectronics structures and the resulting structures formed thereby using EUV lithographic processes. The method involves utilizing an underlayer immediately below the photoresist layer. The underlayer can either be directly applied to the substrate, or it can be applied to any intermediate layer(s) that may be applied to the substrate. The preferred underlayers are formed from spin-coatable, polymeric compositions. The inventive method allows reduced critical dimensions to be achieved while improving adhesion and reducing or eliminating pattern collapse issues.
摘要翻译：本发明提供了制造微电子结构的方法以及由此形成的所得结构使用EUV光刻工艺。该方法涉及利用光致抗蚀剂层正下方的底层。底层可以直接施加到基底上，或者可以施加到可施加到基底上的任何中间层。优选的底层由可旋涂的聚合物组合物形成。本发明的方法允许在提高粘附性和减少或消除图案折叠问题的同时实现减少的临界尺寸。

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