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61. 发明授权

US5199055A X-ray lithographic mask blank with reinforcement 失效
标题翻译： X光平版印刷掩模板加强
公开(公告)号：US5199055A
公开(公告)日：1993-03-30
申请号：US908330
申请日：1992-07-06
申请人： Hitoshi Noguchi , Yoshihiko Nagata , Meguru Kashida , Yoshihiro Kubota
发明人： Hitoshi Noguchi , Yoshihiko Nagata , Meguru Kashida , Yoshihiro Kubota
IPC分类号： G03F1/22 , G03F7/20 , G21K1/06 , H01L21/027
CPC分类号： G03F1/22 , G03F7/70866 , G21K1/06
摘要： Proposed is a high-precision X-ray lithographic mask blank with reinforcement free from warping or distortion. The mask blank is an integral body comprising: (a) a frame made from a silicon wafer; (b) a membrane of an X-ray permeable material such as silicon carbide adhering to and supported by one surface of the frame; and (c) a reinforcing member made from a single crystal of silicon adhesively bonded to the other surface of the frame with (d) a layer of silicon oxide intervening between the frame and the reinforcing member. The mask blank can be prepared in a process of first forming a layer of silicon oxide on the surface of the silicon wafer and/or reinforcing member prior to deposition of the X-ray permeable film on the silicon wafer and heating them together at a temperature of 800.degree. C. or lower while they are in direct contact with each other with the silicon oxide layer intervening therebetween.
摘要翻译：提出了一种高精度的X光平版印刷掩模，无需翘曲或变形。掩模坯料是一体的主体，其包括：（a）由硅晶片制成的框架; （b）附着在框架的一个表面并由其支撑的诸如碳化硅的X射线透过材料的膜; 和（c）由硅的单晶制成的加强构件，其与（d）介于框架和加强构件之间的氧化硅层粘合地结合到框架的另一个表面。掩模坯料可以在将X射线透过膜沉积在硅晶片上之前首先在硅晶片和/或加强元件的表面上形成氧化硅层的过程中制备，并在温度 800℃以下，同时它们彼此直接接触，其间介于其间的氧化硅层。

62. 发明授权

US5139633A Film-forming on substrate by sputtering 失效
标题翻译：通过溅射在基底上形成膜
公开(公告)号：US5139633A
公开(公告)日：1992-08-18
申请号：US729450
申请日：1991-07-12
申请人： Meguru Kashida , Yoshihiko Nagata , Hitoshi Noguchi
发明人： Meguru Kashida , Yoshihiko Nagata , Hitoshi Noguchi
IPC分类号： C23C14/56 , C23C14/06 , C23C14/34 , H01J37/34 , H01L21/203 , H01L21/31 , H01L21/3205
CPC分类号： H01J37/347 , C23C14/34 , H01J37/34
摘要： In a process for the deposition of a film of an inorganic substance such as silicon carbide on the surface of a substrate such as a silicon wafer by the method of sputtering, as in the process for the preparation of a membrane to serve as an X-ray lithographic mask, using a target disc and a substrate disc held in parallel to each other, uniformity in the internal stress of the deposited film can be improved by displacing the target or the substrate relative to each other during the sputtering procedure in the direction parallel to the surface of the target or substrate in a distance of at least 1 mm.

63. 发明授权

US5132366A Curable silicone composition 失效
标题翻译：可固化硅酮组合物
公开(公告)号：US5132366A
公开(公告)日：1992-07-21
申请号：US470142
申请日：1990-01-25
申请人： Meguru Kashida , Yasushi Yamamoto , Hiroki Konno , Hirofumi Kishita
发明人： Meguru Kashida , Yasushi Yamamoto , Hiroki Konno , Hirofumi Kishita
IPC分类号： C08L27/12 , C08L83/04 , C08L83/05 , C08L83/07 , C08L83/08 , C08L87/00 , C09J7/02
CPC分类号： C08L27/12 , C08L83/04
摘要： The curable silicone composition of this invention contains as essential components, (A) a copolymer comprised of vinylidene fluoride and/or tetrafluoroethylene component(s), (B) an organopolysiloxane having in its molecule aliphatic unsaturated groups and a fluorine-containing substituent, (C) an organohydrogenpolysiloxane, and (D) a catalyst for addition reaction. This composition can be effectively used as a release agent.
摘要翻译：本发明的可固化有机硅组合物作为必要成分含有（A）由偏二氟乙烯和/或四氟乙烯组分组成的共聚物，（B）分子中具有脂族不饱和基团和含氟取代基的有机聚硅氧烷（ C）有机氢聚硅氧烷，（D）加成反应用催化剂。该组合物可以有效地用作脱模剂。

64. 发明授权

US4726964A Method for imparting releasability to a substrate surface 失效
标题翻译：赋予基材表面释放性的方法
公开(公告)号：US4726964A
公开(公告)日：1988-02-23
申请号：US848814
申请日：1986-04-04
申请人： Kenichi Isobe , Hisashi Aoki , Yasuaki Hara , Meguru Kashida , Kiyohiro Kondow
发明人： Kenichi Isobe , Hisashi Aoki , Yasuaki Hara , Meguru Kashida , Kiyohiro Kondow
IPC分类号： C08L83/00 , C08L83/04 , C08L83/05 , C08L83/07 , C09J7/02 , D21H19/32 , B05D3/06
CPC分类号： D21H19/32 , C08L83/04 , C09J7/0228 , C08G77/12 , C08G77/20 , C09J2205/31 , C09J2483/005
摘要： The invention provides a method for imparting releasability to the surface of a plastic film or paper by coating the surface with an organopolysiloxane composition followed by curing, in which the curing is complete by heating at a relatively low temperature and the cured surface film of the composition is very stable and free from the problem of transfer to another body in contact therewith. The composition comprises a vinyl-containing organopolysiloxane, an organohydrogenpolysiloxane and a platinum compound to catalyze the addition reaction between the silicon-bonded vinyl groups and silicon-bonded hydrogen atoms. Different from conventional organohydrogenpolysiloxane having a linear molecular structure, the organohydrogenpolysiloxane used in the invention is represented by the general unit formula (RSiO.sub.1.5).sub.m (RHSiO.sub.0.5).sub.n, in which R is a monovalent hydrocarbon group free form unsaturation and m and n are each a positive integer with the proviso that the ratio of n/m is from 0.1 to 3.0, or a combination thereof with a linear organohydrogenpolysiloxane.
摘要翻译：本发明提供了一种通过用有机聚硅氧烷组合物涂覆表面然后进行固化来赋予塑料膜或纸的表面释放性的方法，其中通过在相对低的温度下加热固化，并且组合物的固化表面膜非常稳定，没有转移到与其接触的另一身体的问题。该组合物包含含乙烯基的有机聚硅氧烷，有机氢聚硅氧烷和铂化合物，以催化与硅键合的乙烯基和与硅键合的氢原子之间的加成反应。与具有直链分子结构的常规有机氢聚硅氧烷不同，本发明中使用的有机氢聚硅氧烷由通式（RSiO 1.5）m（R HSiO 0.5）n表示，其中R是一价烃基不饱和键，m和 n各自为正整数，条件是n / m的比例为0.1至3.0，或其与线性有机氢聚硅氧烷的组合。

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