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    • 61. 发明申请
    • Immersion Exposure System, and Recycle Method and Supply Method of Liquid for Immersion Exposure
    • 浸没曝光系统,以及用于浸没曝光的液体的回收方法和供应方法
    • US20080129970A1
    • 2008-06-05
    • US11795809
    • 2006-01-20
    • Taiichi FurukawaKatsuhiko HiedaYakashi MiyamatsuYong WangKinji Yamada
    • Taiichi FurukawaKatsuhiko HiedaYakashi MiyamatsuYong WangKinji Yamada
    • G03B27/42H01L21/027G03F7/038G03B27/52G03F7/20
    • G03F7/70341
    • An immersion exposure system 1 performs an exposure process through a liquid 301 provided between an optical element of a projection optical means 121 and a substrate 111. The immersion exposure system 1 includes a liquid supply section 80 which supplies the liquid 301, an exposure section to which the liquid 301 (301b) supplied from the liquid supply section 80 is continuously introduced along a specific direction and which performs an exposure process in a state in which a space between the optical element of the projection optical means 121 and the substrate 111 is filled with the liquid 301, a liquid recovery section 90 which recovers the liquid 301 (301a) passed through the exposure section 110 at a symmetrical position against the substrate 111, and a liquid recycling section 20 which recycles the liquid 301 (301c) recovered by the liquid recovery section 90. The properties of the immersion exposure liquid can be stabilized when applying an immersion method, whereby exposure can be advantageously and continuously performed, and running cost can be reduced.
    • 浸没曝光系统1通过设置在投影光学装置121的光学元件和基板111之间的液体301进行曝光处理。 浸没曝光系统1包括供给液体301的液体供给部80,从液体供给部80供给的液体301(301b)沿特定方向连续导入的曝光部,并进行曝光处理 投影光学装置121的光学元件和基板111之间的空间被液体301填充的状态,使液体301(301a)以对称的方式通过曝光部110的液体回收部90 与液体回收部90回收的液体301(301c)的液体再循环部20。 浸渍曝光液体的性质可以通过浸渍法稳定化,可以有利且连续地进行曝光,能够降低运转成本。
    • 65. 发明申请
    • Method for producing saturated hydrocarbon compound
    • 饱和烃化合物的制备方法
    • US20070156003A1
    • 2007-07-05
    • US11635660
    • 2006-12-08
    • Taiichi FurukawaYong WangKinji Yamada
    • Taiichi FurukawaYong WangKinji Yamada
    • C07C7/17
    • C07C7/171C07C2602/28C07C13/50
    • A method for treating a saturated hydrocarbon compound suitable as a liquid for the immersion exposure method excelling in transmission in the deep ultraviolet region using sulfuric acid in an amount smaller than in a conventional method is provided. The above sulfuric acid washing treatment is the method for producing saturated hydrocarbon compound intended to reduce the absorbance, wherein the second sulfuric acid washing treatment step is conducted after the first sulfuric acid washing treatment step at a temperature 10° C. or more lower than the temperature of the first sulfuric acid washing treatment step. The absorbance of light with a wavelength of 193 nm of the saturated hydrocarbon compound to be treated in the above second sulfuric acid washing treatment step is 0.10 or less per 1 cm of a liquid optical path length, and the above saturated hydrocarbon compound is an alicyclic saturated hydrocarbon compound.
    • 提供一种处理适合作为浸渍曝光方法的饱和烃化合物的方法,其中使用比常规方法更小的硫酸,在深紫外区域中透射性优异。 上述硫酸洗涤处理是制造用于降低吸光度的饱和烃化合物的方法,其中第二硫酸洗涤处理步骤在第一硫酸洗涤处理步骤之后在10℃以上的温度下进行 第一硫酸洗涤处理步骤的温度。 在上述第二硫酸洗涤处理步骤中,待处理的饱和烃化合物的波长为193nm的光的吸光度为每1cm液体光程长度为0.10以下,上述饱和烃化合物为脂环式 饱和烃化合物。
    • 67. 发明申请
    • Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions
    • 酸产生剂,磺酸,磺酰卤和辐射敏感性树脂组合物
    • US20070054214A1
    • 2007-03-08
    • US10547769
    • 2004-02-20
    • Satoshi EbataYong WangIsao Nishimura
    • Satoshi EbataYong WangIsao Nishimura
    • G03C1/00
    • C07C309/19C07C309/17C07C309/23C07C381/12C07C2602/42C07C2603/86C07D207/46G03F7/0045G03F7/0382G03F7/0392G03F7/0397G03F7/0757Y10S430/106Y10S430/111Y10S430/115Y10S430/122Y10S430/126
    • The invention provides novel acid generators which are unproblematic in combustibility and accumulation inside the human body and can generate acids having high acidities and high boiling points and exhibiting properly short diffusion lengths in resist coating films and which permit the formation of resist patterns excellent smoothness with little dependence on the denseness of a mask pattern; sulfonic acids generated from the acid generators; sulfonyl halides useful as raw material in the synthesis of the acid generators; and radiation-sensitive resin compositions containing the acid generators. The acid generators have structures represented by the general formula (I), wherein R1 is a monovalent substituent such as alkoxycarbonyl, alkylsulfonyl, or alkoxysulfonyl, R2 to R4 are each hydrogen or alkyl; k is an integer of 0 or above; and n is an integer of 0 to 5. Among the radiation-sensitive resin compositions, a positive one contains a resin having acid-dissociable groups in addition to the above acid generator, while a negative one contains an alkali-soluble resin and a crosslinking agent in addition to the acid generator.
    • 本发明提供了新颖的酸产生剂,其在人体内的可燃性和积聚中是无问题的,并且可以产生具有高酸度和高沸点的酸,并且在抗蚀剂涂膜中显示适当短的扩散长度,并且允许形成抗蚀剂图案,具有极好的平滑性 依赖于掩模图案的致密度; 酸产生器产生的磺酸; 用于合成酸发生剂的原料的磺酰卤; 和含有酸发生剂的辐射敏感性树脂组合物。 酸产生剂具有由通式(I)表示的结构,其中R 1是一价取代基,例如烷氧基羰基,烷基磺酰基或烷氧基磺酰基,R 2至R“ > 4个各自为氢或烷基; k为0以上的整数; 并且n为0〜5的整数。在这些辐射敏感性树脂组合物中,除了上述酸产生剂之外,阳性物质含有具有酸解离基团的树脂,而负极性物质含有碱溶性树脂和交联 除酸产生剂外还可加入。