会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 61. 发明授权
    • Continuous feed chemical vapor deposition
    • 连续进料化学气相沉积
    • US08008174B2
    • 2011-08-30
    • US12577641
    • 2009-10-12
    • Gang HeGregg Higashi
    • Gang HeGregg Higashi
    • H01L21/20H01L21/36C23C16/00
    • C23C16/54C23C16/45519C23C16/458C30B25/025C30B29/40C30B29/42H01L21/02463H01L21/02543H01L21/02546H01L21/0262H01L21/67109H01L21/67115H01L21/67173H01L21/6776H01L21/67784
    • Embodiments of the invention generally relate to a method for forming a multi-layered material during a continuous chemical vapor deposition (CVD) process. In one embodiment, a method for forming a multi-layered material during a continuous CVD process is provided which includes continuously advancing a plurality of wafers through a deposition system having at least four deposition zones. Multiple layers of materials are deposited on each wafer, such that one layer is deposited at each deposition zone. The methods provide advancing each wafer through each deposition zone while depositing a first layer from the first deposition zone, a second layer from the second deposition zone, a third layer from the third deposition zone, and a fourth layer from the fourth deposition zone. Embodiments described herein may be utilized to form an assortment of materials on wafers or substrates, especially for forming Group III/V materials on GaAs wafers.
    • 本发明的实施方案一般涉及在连续化学气相沉积(CVD)工艺期间形成多层材料的方法。 在一个实施例中,提供了在连续CVD工艺期间形成多层材料的方法,其包括通过具有至少四个沉积区的沉积系统连续前进多个晶片。 在每个晶片上沉积多层材料,使得在每个沉积区域沉积一层。 该方法提供每个晶片通过每个沉积区域,同时从第一沉积区沉积第一层,从第二沉积区沉积第二层,从第三沉积区沉积第三层,以及从第四沉积区沉积第四层。 本文描述的实施例可以用于在晶片或衬底上形成各种材料,特别是用于在GaAs晶片上形成III / V族材料。
    • 67. 发明申请
    • Dynamic lateral deviation display
    • 动态横向偏差显示
    • US20070188350A1
    • 2007-08-16
    • US11353555
    • 2006-02-14
    • Gang HeAaron Gannon
    • Gang HeAaron Gannon
    • G01C21/00G06F15/00G06F17/00
    • G01C23/005
    • A method of dynamically displaying lateral deviation in formats on a display is provided. The method comprises assigning one or more positional boundaries for displaying the lateral deviation information, wherein the one or more positional boundaries define areas on a display. The method also comprises calculating display positions of a lateral deviation symbology and determining if each calculated display position is allowed based on where the lateral deviation display would be located, if displayed at each calculated position, in relation to the one or more positional boundaries. The method further comprises, displaying the lateral deviation symbology at the calculated positions when the calculated positions are allowed, and displaying a lateral deviation indicator when the calculated positions are not allowed.
    • 提供了一种在显示器上动态显示格式的横向偏差的方法。 该方法包括分配用于显示横向偏差信息的一个或多个位置边界,其中所述一个或多个位置边界限定显示器上的区域。 该方法还包括计算横向偏差符号系统的显示位置,并且相对于一个或多个位置边界,如果在每个计算位置显示,则基于横向偏差显示将位于哪里来确定是否允许每个计算的显示位置。 该方法还包括:当允许计算的位置时,在所计算的位置处显示横向偏差符号,并且当不允许计算的位置时显示横向偏差指示符。
    • 70. 发明授权
    • Optical spectrum analyzer using a diffraction grating and multi-pass optics
    • 光谱分析仪采用衍射光栅和多通道光学
    • US07116848B2
    • 2006-10-03
    • US10986833
    • 2004-11-15
    • Gang HeDaniel GariépyGregory Walter Schinn
    • Gang HeDaniel GariépyGregory Walter Schinn
    • G02B6/00G02B6/34G02B5/30G02B27/28G01J3/28
    • G02B5/3025
    • A polarization independent optical spectrum analyzer comprises a diffraction grating, input and output slit means and polarization-maintaining multi-pass optics for directing a light beam to and fro across the diffraction grating while maintaining its linear state of polarization. The optical spectrum analyzer further comprises a polarization control unit for decomposing a light beam for analysis into first and second beams having mutually orthogonal states of polarization (SOPs) and then adjusting one or both SOPs so that they are parallel to each other and to one of the dispersion plane of the diffraction grating which is rotated to select different wavelengths of the first and second light beams. The first and second light beams are passed across the diffraction grating repeatedly by multi-pass polarization-maintaining optics and are outputted and detected separately.
    • 偏振无关光谱分析仪包括衍射光栅,输入和输出狭缝装置和偏振保持多通道光学器件,用于引导光束穿过衍射光栅,同时保持其线性极化状态。 光谱分析仪还包括:偏振控制单元,用于将用于分析的光束分解成具有相互正交偏振态(SOP)的第一和第二光束,然后调整一个或两个SOP,使得它们彼此平行并且与 衍射光栅的色散平面被旋转以选择第一和第二光束的不同波长。 第一和第二光束通过多通道偏振保持光学器件反复穿过衍射光栅,并分别输出和检测。