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    • 66. 发明授权
    • X-ray imaging apparatus and control method thereof
    • X射线成像装置及其控制方法
    • US07945015B2
    • 2011-05-17
    • US12395773
    • 2009-03-02
    • Osamu TsujiiKeiji TsuchiyaMasahiko Okunuki
    • Osamu TsujiiKeiji TsuchiyaMasahiko Okunuki
    • G01N23/00
    • A61B6/00A61B6/03A61B6/06A61B6/4021A61B6/4028A61B6/4233
    • An X-ray imaging apparatus includes a multi X-ray generating unit in which multiple X-ray foci are disposed in two-dimensional form at a predetermined pitch in a first direction, and a slit unit having multiple slit members each disposed opposite to its respective X-ray focus. Each slit member has multiple slits arranged in the first direction, and each of the slits forms a slice-formed X-ray beam whose lengthwise direction is a second direction that is different from the first direction. The two-dimensional detection unit detects the X-ray intensity of the formed X-ray beams at the detection surface. The X-ray imaging apparatus executes X-ray imaging at multiple positions while moving the multi X-ray generating unit and the slit unit in the first direction by the amount of the predetermined pitch, while keeping the relative positional relationship therebetween, and reconstructs an X-ray image based on the obtained X-ray intensity.
    • 一种X射线摄像装置,具备多个X射线发生单元,其中多个X射线焦点以第一方向以预定间距以二维形式设置,并且具有多个狭缝部件的狭缝单元各自与其相对设置 各自的X射线焦点。 每个狭缝构件具有沿着第一方向布置的多个狭缝,并且每个狭缝形成长度方向是与第一方向不同的第二方向的切片形状的X射线束。 二维检测单元检测形成的X射线束在检测面的X射线强度。 X射线成像装置在多个X射线成像装置的同时,在保持其间的相对位置关系的同时,将多X射线产生部和狭缝部沿第1方向移动预定间距的量,进行X射线成像, 基于获得的X射线强度的X射线图像。
    • 69. 发明授权
    • Charged-particle beam drawing data creation method, and charged-particle beam drawing apparatus using the same
    • 带电粒子束绘制数据生成方法和使用其的带电粒子束描绘装置
    • US06787784B1
    • 2004-09-07
    • US09604739
    • 2000-06-28
    • Masahiko Okunuki
    • Masahiko Okunuki
    • G21K510
    • H01J37/3023H01J2237/31762
    • A charged-particle beam drawing data creation method of supplying bit information created from design pattern data in the scanning direction of a charged-particle beam, ON/OFF-controlling the charged-particle beam to irradiate a sample surface, and exposing a two-dimensional pattern by scanning the charged-particle beam includes the step of extracting a cell pattern as one unit of a periodic structure from design pattern data having a periodic structure, and registering the cell pattern, the step of creating arrangement data to be rearranged in a basic drawing region defined by a charged-particle beam exposure apparatus using the cell pattern, and registering the arrangement data, and the step of cutting out data from the cell pattern in accordance with information of the arrangement data, and creating data of the basic drawing region.
    • 一种带电粒子束描绘数据生成方法,用于提供由带电粒子束的扫描方向上的设计图案数据产生的位信息,对带电粒子束进行ON / OFF控制以照射样品表面, 通过扫描带电粒子束的三维图案包括从具有周期性结构的设计图案数据中提取作为周期性结构的一个单位的单元图案的步骤,并且注册单元图案,创建将要重排的布置数据的步骤 由使用单元图案的带电粒子束曝光装置定义的基本绘制区域,以及登记排列数据,以及根据排列数据的信息从单元图案中切出数据的步骤,以及创建基本图形的数据 地区。
    • 70. 发明授权
    • Electron beam exposure apparatus
    • 电子束曝光装置
    • US6054713A
    • 2000-04-25
    • US13304
    • 1998-01-26
    • Akira MiyakeMasato MurakiMasahiko OkunukiShigeru TerashimaShin Matsui
    • Akira MiyakeMasato MurakiMasahiko OkunukiShigeru TerashimaShin Matsui
    • G03F7/20H01J37/317H01L21/027H01J37/30
    • B82Y10/00B82Y40/00G03F7/70375H01J37/3175H01J2237/31779
    • An electron beam exposure apparatus, which illuminates a mask with light emitted by a light source, photoelectrically converts the light patterned by the mask using a photoelectric converter, and exposes an object to be exposed with a patterned electron beam emitted by the photoelectric converter. The apparatus includes an electron optical system for imaging the electron beam emitted by the photoelectric converter onto the object, an axial shifter for shifting an optical center of the electron optical system in a direction perpendicular to an optical axis, an axial deflector for deflecting the electron beam that propagates in the electron optical system, a region limiter for limiting a region of the mask to be projected onto the object via the photoelectric converter and the electron optical system to a partial region of the mask, and a scan controller for scanning the object with the region-limited electron beam by changing the partial region to be limited while controlling the axial shifter and axial deflector.
    • 用光源发出的光照射掩模的电子束曝光装置使用光电转换器对由掩模图案化的光进行光电转换,并用由光电转换器发射的图案化电子束曝光待曝光的物体。 该装置包括用于将由光电转换器发射的电子束成像到物体上的电子光学系统,用于沿垂直于光轴移动电子光学系统的光学中心的轴向移动器,用于偏转电子的轴向偏转器 在电子光学系统中传播的光束,用于将要经由光电转换器和电子光学系统投射到物体上的掩模的区域限制到掩模的部分区域的区域限制器,以及用于扫描物体的扫描控制器 通过在控制轴向移位器和轴向偏转器的同时改变局部区域来限制电子束区域。