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61. 发明授权

US06940592B2 Calibration as well as measurement on the same workpiece during fabrication 有权
标题翻译：在制造过程中对同一工件进行校准和测量
公开(公告)号：US06940592B2
公开(公告)日：2005-09-06
申请号：US09974571
申请日：2001-10-09
申请人： Peter G. Borden , Jiping Li , Jon Madsen
发明人： Peter G. Borden , Jiping Li , Jon Madsen
IPC分类号： G01N21/27 , G01N21/55 , G01N21/95 , G01J3/28 , G01B11/28 , G01N21/00 , G01N21/86
CPC分类号： G01N21/9501 , G01N21/274 , G01N21/55 , G01N21/95607
摘要： Two more measurements are made on the same workpiece, during fabrication. Each measurement may be made employing a different process. The measurements are used together to determine a property of the workpiece. For example, multiple measurements from a first process are used with a predetermined value of the property of interest in a simulator to generate a simulated value of a signal to be measured in a second process. One or more such simulated values and a measured value are used to identify a value of the property of interest. When the workpiece's property is found to not match the specification, a process control parameter used in the workpiece's fabrication is adjusted, thereby to implement process control.
摘要翻译：在制造过程中，在同一工件上进行两次测量。可以使用不同的处理来进行每个测量。这些测量结果一起用于确定工件的特性。例如，来自第一处理的多个测量与模拟器中感兴趣的属性的预定值一起使用，以在第二过程中产生要测量的信号的模拟值。使用一个或多个这样的模拟值和测量值来识别感兴趣的属性的值。当发现工件的特性不符合规范时，调整工件制造中使用的过程控制参数，从而实现过程控制。

62. 发明授权

US06878559B2 Measurement of lateral diffusion of diffused layers 有权
公开(公告)号：US06878559B2
公开(公告)日：2005-04-12
申请号：US10253121
申请日：2002-09-23
申请人： Peter G. Borden , G. Jonathan Kluth , Eric Paton
发明人： Peter G. Borden , G. Jonathan Kluth , Eric Paton
IPC分类号： G01N21/21 , G01N21/84 , G01N21/95 , G01N21/956 , G01R31/311 , H01L23/544 , H01L21/66
CPC分类号： H01L22/34 , G01N21/21 , G01N21/9501 , G01N21/95607 , G01N2021/8416 , G01N2201/0691 , G01R31/311 , H01L2924/0002 , H01L2924/3011 , H01L2924/00
摘要： Any semiconductor wafer fabrication process may be changed to monitor lateral abruptness of doped layers as an additional step in the wafer fabrication process. In one embodiment, a test structure including one or more doped regions is formed in a production wafer (e.g. simultaneously with one or more transistors) and one or more dimension(s) of the test structure are measured, and used as an estimate of lateral abruptness in other doped regions in the wafer, e.g. in the simultaneously formed transistors. Doped regions in test structures can be located at regularly spaced intervals relative to one another, or alternatively may be located with varying spacings between adjacent doped regions. Alternatively or in addition, multiple test structures may be formed in a single wafer, with doped regions at regular spatial intervals in each test structure, while different test structures have different spatial intervals.

63. 发明授权

US06489801B1 Apparatus and method for evaluating a semiconductor wafer 有权
标题翻译：用于评估半导体晶片的装置和方法
公开(公告)号：US06489801B1
公开(公告)日：2002-12-03
申请号：US09544280
申请日：2000-04-06
申请人： Peter G. Borden , Regina G. Nijmeijer , Jiping Li
发明人： Peter G. Borden , Regina G. Nijmeijer , Jiping Li
IPC分类号： G01R3126
CPC分类号： G01N21/1717 , G01R31/2648 , G01R31/2656 , G01R31/311 , H01L22/12
摘要： An apparatus and method uses diffusive modulation (without generating a wave of carriers) for measuring a material property (such as any one or more of: mobility, doping, and lifetime) that is used in evaluating a semiconductor wafer. The measurements are carried out in a small area, for use on wafers having patterns for integrated circuit dice. The measurements are based on measurement of reflectance, for example as a function of carrier concentration. In one implementation, the semiconductor wafer is illuminated with two beams, one with photon energy above the bandgap energy of the semiconductor, and another with photon energy near or below the bandgap. The diameters of the two beams relative to one another are varied to extract additional information about the semiconductor material, for use in measuring, e.g. lifetime.
摘要翻译：一种装置和方法使用扩散调制（不产生载波）来测量用于评估半导体晶片的材料性质（例如，迁移率，掺杂和寿命中的任何一个或多个）。测量在小面积上进行，用于具有用于集成电路芯片的图案的晶片。测量是基于反射率的测量，例如作为载流子浓度的函数。在一个实施方案中，用两个光束照射半导体晶片，一个光子能量高于半导体的带隙能量，另一个具有接近或低于带隙的光子能量。改变两个光束相对于彼此的直径以提取关于半导体材料的附加信息，以用于测量例如半导体材料。一生。

64. 发明授权

US6072187A Apparatus and method for reducing stray laser light in particle sensors using a narrow band filter 失效
标题翻译：使用窄带滤波器减少粒子传感器中杂散激光的装置和方法
公开(公告)号：US6072187A
公开(公告)日：2000-06-06
申请号：US271311
申请日：1994-07-06
申请人： Peter G. Borden , James B. Stolz
发明人： Peter G. Borden , James B. Stolz
IPC分类号： G01N15/14 , G01N21/53 , G01N21/00
CPC分类号： G01N21/53
摘要： A dark-field particle monitor and a method for reducing errors due to stray light in the particle monitor provides a particle monitor having (i) an optical element focussed on the laser beam for detecting particles and (ii) a filter for preferentially selecting light incident on said filter in a preferential direction. In one embodiments the filter is implemented by a narrow band filter having maximum transmission for light having a wavelength of the laser beam.
摘要翻译：一种暗场粒子监测器和一种用于减少粒子监测器中由于杂散光引起的误差的方法，提供了一种粒子监测器，其具有（i）聚焦在激光束上的用于检测粒子的光学元件，（ii）用于优先选择光入射的滤光器在所述过滤器上以优先方向。在一个实施例中，滤波器由对具有激光束波长的光具有最大透射率的窄带滤波器来实现。

65. 发明授权

US5877860A System and method for measuring the microroughness of a surface of a substrate 失效
公开(公告)号：US5877860A
公开(公告)日：1999-03-02
申请号：US648231
申请日：1996-05-13
申请人： Peter G. Borden
发明人： Peter G. Borden
IPC分类号： G01B11/30 , G02F1/1333 , G11B5/84 , G01B11/24
CPC分类号： G01B11/303
摘要： A system for measuring an amount of microroughness of a surface of a substrate, wherein a first beam of electromagnetic radiation and a second beam of electromagnetic radiation are generated, the first and second beams being substantially parallel and spaced apart from each other so that the first and second beams are substantially non-overlapping, and the first and second beams are focused onto the substrate so that the beams impinge upon a selected area of the surface of the substrate having a surface contour, the surface contour of the substrate causing a scattering of both beams. The scattering of the first and second beams is detected, the amount of scattering corresponding to a microroughness value of the selected area of the substrate, and the microroughness value of the selected area of the substrate is determined from the amount of scattering of the first and second beams. The microroughness measuring system may also be used for controlling a fabrication process.

66. 发明授权

US5436465A Modular particle monitor for vacuum process equipment 失效
标题翻译：真空工艺设备的模块式颗粒监测仪
公开(公告)号：US5436465A
公开(公告)日：1995-07-25
申请号：US60904
申请日：1993-05-13
申请人： Peter G. Borden , Hung H. Quach , Derek G. Aqui
发明人： Peter G. Borden , Hung H. Quach , Derek G. Aqui
IPC分类号： G01N21/53 , G01N15/06
CPC分类号： G01N21/53
摘要： An apparatus and a method provide a modular design for a particle monitor of external design used in a vacuum process equipment. In one embodiment, the key elements, i.e. laser assembly, the detection module, the beam stop and a darkened surface opposite the detection module, can be independently mounted on a pump line. The particle monitors of the present invention can be mounted on both straight sections and bends of the pump line. Each key element can be accessed independently of other key elements for repair and service.
摘要翻译：一种设备和方法为真空处理设备中使用的外部设计的粒子监测器提供了模块化设计。在一个实施例中，关键元件，即激光组件，检测模块，光束挡块和与检测模块相对的变暗表面可以独立地安装在泵管线上。本发明的颗粒监测器可以安装在泵管的直线段和弯管上。每个关键元素可以独立于其他关键元素进行修复和维护。

67. 发明授权

US5424558A Apparatus and a method for dynamically tuning a particle sensor in response to varying process conditions 失效
标题翻译：响应于变化的工艺条件动态地调整颗粒传感器的装置和方法
公开(公告)号：US5424558A
公开(公告)日：1995-06-13
申请号：US62904
申请日：1993-05-17
申请人： Peter G. Borden , James Stolz
发明人： Peter G. Borden , James Stolz
IPC分类号： G01N21/53 , H03G5/04 , G01N15/06
CPC分类号： G01N15/1425 , G01N21/53 , H03G5/04
摘要： A method and an apparatus allow dynamic tuning of a particle sensor. The particle sensor provides output signals indicating particle detection to a controller, which includes an amplifier whose bandwidth and gain can be adjusted. The bandwidth and the gain of the amplifier are adjusted in accordance with predetermined optimal performance levels under the varying process conditions in which the particle sensor is placed. The optimal signal-to-noise ratio is maintained by adjusting the bandwidth and the gain according to both expected particle velocities and whether a plasma glow is present in the exhaust line for carrying gasses out of a process chamber.
摘要翻译：一种方法和装置允许对粒子传感器进行动态调谐。粒子传感器向控制器提供指示粒子检测的输出信号，该控制器包括可调整其带宽和增益的放大器。在放置粒子传感器的变化过程条件下，根据预定的最佳性能水平来调节放大器的带宽和增益。通过根据预期的粒子速度调节带宽和增益以及排气管线中是否存在等离子体发光以将气体输送出处理室来维持最佳信噪比。

68. 发明授权

US5212580A Low cost stage for raster scanning of semiconductor wafers 失效
标题翻译：用于半导体晶片光栅扫描的低成本阶段
公开(公告)号：US5212580A
公开(公告)日：1993-05-18
申请号：US836039
申请日：1992-02-12
申请人： George L. Coad , James B. Stolz , Yung C. Lee , Ron B. Whitney , Peter G. Borden , Mark A. Nokes
发明人： George L. Coad , James B. Stolz , Yung C. Lee , Ron B. Whitney , Peter G. Borden , Mark A. Nokes
IPC分类号： G02B21/00 , G02B21/26 , H01J37/20
CPC分类号： G02B21/002 , G02B21/26 , H01J37/20 , H01J2237/20228 , H01J2237/20264 , H01J2237/20292
摘要： A raster scan apparatus provides a scanning assembly capable of moving in a sinusoidal motion along a first direction and stepping in fine steps in a second direction perpendicular to the first direction. In one embodiment, a piezoelectric bimorph sets in scanning motion a scanning assembly formed by a wafer holder and leaf springs. The amplitude of the scanning motion is controlled by a voltage applied across the piezoelectric bimorph. A Hall effect sensor provides an output signal indicating the instantaneous location of the scanning assembly in motion. The output signal of the Hall effect sensor is compared against a predetermined threshold to provide a trigger signal for synchronization. The output signal of the Hall effect sensor is also fed back to the source of sinusoidal voltage to adaptively adjust the sinusoidal voltage so as to achieve a predetermined amplitude for the scanning motion.
摘要翻译：光栅扫描装置提供能够沿着第一方向以正弦运动移动的扫描组件，并且在垂直于第一方向的第二方向上以微细的步骤步进。在一个实施例中，压电双压电晶片将由晶片保持器和板簧形成的扫描组件进行扫描运动。扫描运动的幅度由施加在压电双压电晶片上的电压控制。霍尔效应传感器提供指示扫描组件在运动中的瞬时位置的输出信号。将霍尔效应传感器的输出信号与预定阈值进行比较，以提供用于同步的触发信号。霍尔效应传感器的输出信号也反馈到正弦电压源，以自适应地调节正弦电压，以达到扫描运动的预定幅度。

69. 发明授权

US4967075A Velocity monitoring method and apparatus 失效
标题翻译：速度监测方法及装置
公开(公告)号：US4967075A
公开(公告)日：1990-10-30
申请号：US186685
申请日：1988-04-21
申请人： Peter G. Borden
发明人： Peter G. Borden
IPC分类号： H01L21/00 , H01L21/68
CPC分类号： H01L21/67253 , H01L21/681
摘要： A velocity measuring system useful for monitoring repetitive bidirectional movements of a carrier, which supports workpieces in production, initially stores the values of a number of velocities representative of normal operation to establish a normal velocity range, and then compares the values of subsequent carrier velocities to the normal range. A continuing deviation from the normal range is indicative of defective actuator operation, allowing repair or replacement prior to hard failure and serious disruption of the production line.
摘要翻译：用于监测承载件的重复双向运动的速度测量系统，其支持生产中的工件，其初始地存储表示正常操作的多个速度的值以建立正常速度范围，然后将后续载体速度的值与正常范围。与正常范围的持续偏差表示执行器操作不良，允许在硬故障之前进行修理或更换，并严重破坏生产线。

70. 发明授权

US4812664A Apparatus for scanning a flat surface to detect defects 失效
标题翻译：用于扫描平坦表面以检测缺陷的装置
公开(公告)号：US4812664A
公开(公告)日：1989-03-14
申请号：US119762
申请日：1987-11-12
申请人： Peter G. Borden
发明人： Peter G. Borden
IPC分类号： G01N21/88 , G01N21/95
CPC分类号： G01N21/9501
摘要： A surface scanner useful for detecting defects on the surface of a water that is being processed in a vacuum equipment employs a light beam that scans the wafer surface in an arc. The scanning light beam impinges on the wafer surface at a low angle of incidence which permits the beam to pass under photosensing elements disposed in an arcuate array substantially congruous with the arc defined by the scanning light beam. The photosensing elements are patterned close to the wafer surface to receive light scattered by defects on the wafer surface.
摘要翻译：用于检测在真空设备中正在处理的水表面上的缺陷的表面扫描器采用以弧形扫描晶片表面的光束。扫描光束以低入射角照射在晶片表面上，这允许光束通过设置在与由扫描光束限定的弧形基本上一致的弓形阵列的光敏元件下面。光敏元件被图案化成靠近晶片表面以接收由晶片表面上的缺陷散射的光。

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