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    • 63. 发明申请
    • COMPOSITIONS AND METHODS FOR TREATING CANCER AND MODULATING STRESS GRANULE FORMATION
    • 用于治疗癌症和调节应力颗粒形成的组合物和方法
    • US20130156776A1
    • 2013-06-20
    • US13435932
    • 2012-03-30
    • Paul ChangSejal . VyasAnthony LeungPhillip A. Sharp
    • Paul ChangSejal . VyasAnthony LeungPhillip A. Sharp
    • A61K38/47A61K31/713A61K39/395C12Q1/68C07H21/02C12N15/113G01N33/68A61K38/45C07K16/40
    • C12N15/1137A61K31/713A61K38/45A61K38/47A61K39/395A61K39/3955C07H21/02C07K16/40C12N15/113C12N2310/14C12N2320/12C12Q1/6886G01N33/6893G01N2333/91142G01N2500/02
    • The invention provides methods for treating or decreasing the likelihood of developing a stress-granule related disorder and/or cancer by administering one or more poly-ADP-ribose polymerase (PARP) inhibitors, one or more PARP activators, one or more poly-ADP-ribose glycosylase (PARG) activators, and/or one or more poly-ADP-ribose glycohydrolase ARH3 activators. The invention also provides corresponding methods of decreasing stress granule formation and/or proliferation in a cell or a population of cells. The invention further provides methods of increasing the number of stress granules and proliferation in a cell or a population of cells by administering one or more PARP activators, one or more PARP inhibitors, one or more PARG inhibitors, and/or one or more ARH3 inhibitors. The invention also provides methods for screening for agents for treating or decreasing the likelihood of developing a stress granule-related disorder or cancer, and methods for determining the propensity for developing a stress granule-related disorder or cancer, as well as compositions and kits containing one or more PARP inhibitors, one or more PARP activators, one or more PARG activators, and one or more ARH3 activators.
    • 本发明提供了通过施用一种或多种聚ADP-核糖聚合酶(PARP)抑制剂,一种或多种PARP激活剂,一种或多种聚ADP来治疗或降低发展应激颗粒相关病症和/或癌症的可能性的方法 核糖糖酵解酶(PARG)激活剂和/或一种或多种聚ADP-核糖糖水解酶ARH3激活剂。 本发明还提供减少细胞或细胞群体中应激颗粒形成和/或增殖的相应方法。 本发明还提供了通过施用一种或多种PARP激活剂,一种或多种PARP抑制剂,一种或多种PARG抑制剂和/或一种或多种ARH3抑制剂来增加细胞或细胞群体中的应激颗粒数量和增殖的方法 。 本发明还提供筛选用于治疗或降低发展应激颗粒相关病症或癌症的可能性的药剂的方法,以及用于确定发展应激颗粒相关病症或癌症倾向的方法,以及含有 一种或多种PARP抑制剂,一种或多种PARP活化剂,一种或多种PARG活化剂和一种或多种ARH3活化剂。
    • 67. 发明申请
    • COLLAPSABLE GATE FOR DEPOSITED NANOSTRUCTURES
    • 沉积式纳米结构的可收缩门
    • US20120326127A1
    • 2012-12-27
    • US13169542
    • 2011-06-27
    • Josephine B. ChangPaul ChangMichael A. GuillornPhilip S. Waggoner
    • Josephine B. ChangPaul ChangMichael A. GuillornPhilip S. Waggoner
    • H01L51/10H01L51/40
    • H01L29/66045H01L51/055
    • A disposable material layer is first deposited on a graphene layer or a carbon nanotube (CNT). The disposable material layer includes a material that is less inert than graphene or CNT so that a contiguous dielectric material layer can be deposited at a target dielectric thickness without pinholes therein. A gate stack is formed by patterning the contiguous dielectric material layer and a gate conductor layer deposited thereupon. The disposable material layer shields and protects the graphene layer or the CNT during formation of the gate stack. The disposable material layer is then removed by a selective etch, releasing a free-standing gate structure. The free-standing gate structure is collapsed onto the graphene layer or the CNT below at the end of the selective etch so that the bottom surface of the contiguous dielectric material layer contacts an upper surface of the graphene layer or the CNT.
    • 一次性材料层首先沉积在石墨烯层或碳纳米管(CNT)上。 一次性材料层包括比石墨烯或CNT更不惰性的材料,使得可以以目标电介质厚度沉积连续的电介质材料层而没有针孔。 通过图案化连续的介电材料层和沉积在其上的栅极导体层来形成栅极叠层。 一次性材料层在形成栅极叠层期间屏蔽并保护石墨烯层或CNT。 然后通过选择性蚀刻去除一次性材料层,释放独立的栅极结构。 独立栅极结构在选择性蚀刻结束时在石墨烯层或CNT上折叠,使得连续介电材料层的底表面接触石墨烯层或CNT的上表面。